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Thin Films for Emerging Applications PDF

370 Pages·1992·5.741 MB·English
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Contributors to This Volume FRED J. CADIEU NEELKANTH G. DHERE MICHAEL S. MENDOLIA K.V. REDDY PAUL H. WOJCIECHOWSKI Physics of Thin Films Advances in Research and Development THIN FILMS FOR EMERGING APPLICATIONS Edited by Maurice H. Francombe Department of Physics The University of Pittsburgh Pittsburgh, Pennsylvania John L. Vossen John Vossen Associates Technical and Scientific Consulting Bridgewater, New Jersey VOLUME 16 ® ACADEMIC PRESS, INC. Harcourt Brace Jovanovich, Publishers Boston San Diego New York London Sydney Tokyo Toronto This book is printed on acid-free paper. @ COPYRIGHT © 1992 BY ACADEMIC PRESS, INC. ALL RIGHTS RESERVED. NO PART OF THIS PUBLICATION MAY BE REPRODUCED OR TRANSMITTED IN ANY FORM OR BY ANY MEANS, ELECTRONIC OR MECHANICAL, INCLUDING PHOTOCOPY, RECORDING, OR ANY INFORMATION STORAGE AND RETRIEVAL SYSTEM, WITHOUT PERMISSION IN WRITING FROM THE PUBLISHER. ACADEMIC PRESS, INC. 1250 Sixth Avenue, San Diego, CA 92101 United Kingdom Edition published by ACADEMIC PRESS LIMITED 24-28 Oval Road, London NW1 7DX Library of Congress Catalog Card Number 63-16561 ISBN 0-12-533016-2 92 93 94 95 9 8 7 6 5 4 3 2 1 PRINTED IN THE UNITED STATES OF AMERICA Contributors Numbers in parentheses indicate the pages on which the authors' contributions begin. FRED J. CADIEU (146), Queens College of the City University of New York, Department of Physics, Flushing, New York 11367 NEELKANTH G. DHERE (1), Florida Solar Energy Center, 300 State Road 401, Cape Canaveral, Florida 32920 K.V. REDDY (234), Department of Physics, Indian Institute of Technology, Madras 600 036, India MICHAEL s. MENDOLIA (272), Department of Material Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104 PAUL H. WOJCIECHOWSKI (272), Department of Mechanical Engineering, Rochester Institute of Technology, Rochester, New York 14623 ix Preface Volume 16 of Physics of Thin Films emphasizes two main technical themes. The first is essentially an extension of the topical thrust on "Thin Films for Advanced Electronic Devices," developed in Volume 15 of this series. The second deals primarily with the physical and mechanical behavior of films and the influence of these in relation to various applications. The first of the four articles in this volume, by Neelkanth G. Dhere, discusses high-transition-temperature (Γ) superconducting films. Since their discovery in 1986, both world-wide research activity and published literature on high-Γ oxide films have exploded at a phenomenal rate. In his treatment, Dr. Dhere presents an effective survey of the already vast literature on this subject, discusses the numerous techniques under development for the growth of these perovskite-related complex oxides, and describes their key properties and applications. In particular, factors affecting the epitaxial structure, critical current capability, and microwave conductivity in Y- Ba-Cu-0 and Bi-Sr-Ca-Cu-O-based film compositions are evaluated in relation to their use at 77 K. An overview of potential applications in a variety of microwave devices, wide-band optical detectors, SQUID-type high-sensitivity magnetometers, etc., is included. The second article, by Fred J. Cadieu, discusses the synthesis, properties, and applications of permanent thin films. The film compositions considered are primarily of the rare-earth-transition metal type (RE-TM), discussed by Krusor and Connell in Volume 15 of this series, for use in magneto-optic recording. However, the objective here is to synthesize very high magnetic energy density layers, mainly for incorporation into monolithic integrated circuits. Professor Cadieu's treatment deals in particular with the challenging problems of develop- ing highly anisotropic crystalline structures in sputtered films based on the Sm(TM), Nd-Fe-Ti, and similar systems, with energy products approaching values of 20 MGOe and with geometries suitable for use in microwave magneto- static wave {cf. Adam et al. in Volume 15), magneto-optic, magneto-electron beam, and other devices. xi xii PREFACE Semiconductor integrated circuit failures due to electromigration in the metal- lic conductors has long been a source of concern. In the very small geometry devices now being designed, and the even smaller geometry devices that will be needed in the near future, the failures due to this phenomenon are so severe that a complete rethinking of metallization materials and processing techniques is now underway in the integrated circuit industry. Traditional metallization materials and techniques have just about exhausted their usefulness. In Volume 7 of this series, d'Heurle and Rosenberg presented a comprehensive discussion of the mechanisms involved in the generation of defects such as voids and whiskers by diffusion under high current density conditions. In the third article of this volume, on lateral diffusion and electromigration in metallic thin films, Κ. V. Reddy revisits and updates this topic. Based upon somewhat more sophisticated and quantitative experimental techniques, such as the radioactive tracer method, he explains self-diffusion and electromigration behavior for a wide range of metallic films that are of present and potential importance in integrated circuits. The fourth article, by Paul H. Wojciechowski and Michael S. Mendolia, reviews the causes and interpretation of fracture and cracking phenomena in thin films adhering to high-elongation substrates. These phenomena are crucial to many applications of thin films on flexible polymeric substrates (webs) such as permeation barrier coatings of Al and oxides in packaging of pharmaceuticals, food, solar control films on polymers for attachment to windows, antireflection coatings deposited on polymers for attachment to cathode ray tubes and other display devices, etc. The phenomena are closely related to the failure effects occurring in widely-used composite materials made up of bonded fibers or sheets. The origins and strain-dependence of multiple fracture in the low-elongation component are explained on the basis of yield and load transfer (from film to substrate) effects, and the modulating role of interfacial adhesion is analyzed. M. H. Francombe J. L. Vossen High-Γ Superconducting Thin Films NEELKANTH G. DHERE Florida Solar Energy Center Cape Canaveral, Florida I. Introduction 2 A. Characterization of High-Γ Superconducting Thin Films 5 II. Sputtering and Ion-Beam Deposition 14 A. YBa2Cu307t and Other Rare-Earth-Based Thin Films 17 1. In Situ or Low-Temperature Process 18 2. Buffer Layers 26 3. Degradation 28 B. Bi-Sr-Ca-Cu-0 Thin Films 28 1. In Situ or Low-Temperature Process 29 2. 110 Κ Phase Formation 32 C. Tl-Ba-Ca-Cu-O Thin Films 34 III. Vacuum Evaporation 39 A. YBa2Cu307r and Other Rare-Earth-Based Thin Films 41 1. Fluoride* Route 42 2. In Situ and Low-Temperature Process 51 B. Bi-Sr-Ca-Cu-O Thin Films 52 C. Tl-Ba-Ca-Cu-O Thin Films 54 IV. Laser Ablation 55 A. YBa2Cu307r and Other Rare-Earth-Based Thin Films 59 1. In Situ and Low-Temperature Processing 61 B. Bi-Sr-Ca-Cu-0 Thin Films 78 C. Tl-Ba-Ca-Cu-O Thin Films 80 V. Metalorganic Chemical Vapor Deposition (MOCVD) 81 A. YBa2Cu307x Thin Films 85 B. Bi-Sr-Ca-Cu-O Thin Films 92 C. Tl-Ba-Ca-Cu-O Thin Films 94 VI. Metalorganic Deposition (MOD) and Other Processes 95 A. YBa2Cu307x Thin Films 96 B. Bi-Sr-Ca-Cu-O Thin Films 98 C. Tl-Ba-Ca-Cu-O Thin Films 100 VII. Applications 101 A. Microwave Components 101 1. Resonators and Oscillators 101 2. Band-Pass and Band-Reject Filters 105 3. Delay Lines 106 4. Antennas 108 B. Passive Interconnections in Microelectronic Systems 108 C. Optical Sensors and Radiation Detectors 109 D. Josephson Junction 110 E. SQUIDs 114 F. High-Speed Computer Switches and Transistors 123 References 123 Copyright © 1992 by Academic Press, Inc. All rights of reproduction in any form reserved. ISBN 0-12-533016-2 2 Ν. G. DHERE I. Introduction The new era of high critical-transition-temperature (Γ) superconductors began in 1986 with the discovery of superconductivity above 30 Κ in La (Ba, 2x Sr)Cu0 perovskite oxide by Bednorz and Muller (7). Wu et al (2) discov- x 4 ered superconducting transition temperature with zero resistance (T ) at 93 Κ co in YBa Cu 0 . Following the observation of superconductivity in Bi-Sr-Cu- 2 3 7 x O by Raveau et al, Maeda and co-workers (3) announced superconductivity at 110 Κ in Bi-Sr-Ca-Cu-0 (with a probable composition Bi SrCaCuO ). 2 2 2 3 10 Sheng and Hermann (4) presented a Tl-Ba-Ca-Cu-O system (Tl BaCaCu 2 2 2 3 O ) with superconductivity at 123 K. A Y Ba Cu 0 (or YBa Cu 0 ) phase 10 2 4 8 1c6 j 2 4 8 x has been isolated by Char et al. (5) and Mandlich et al (6). Other rare-earth materials have been substituted for yttrium. All show transition temperatures in the same range. Amador et al (7) have isolated a Bi SrCaCuO_ phase 2 2 2 gx with Γ of 55 K. In the superconductors described above, the charge carriers are holes or vacancies in the valence band. An electronic-charge carrier super- conductor, Nd Ce^Cu0 , with Γ of 20 Κ was first reported by Tokura et al 2 x 4 (8). There have also been some unconfirmed reports of superconductivity at much higher temperatures. The high-Γ superconducting oxides belong to the perovskite, CaTi0 , crys- 3 tal structure. Y von and François (Ρ) have reviewed the work on the structure analysis of high-Γ superconducting oxides carried out by x-ray diffraction (XRD), using single crystals, and powder neutron diffraction, emphasizing precision and completeness. The principal feature of high-Γ superconducting compounds is the formation of infinite layers of Cu0 stoichiometry consist- 2 ing of square or pseudo-square Cu0 planes interconnected by shared-corner 4 oxide ions. The Cu0 planes do not have a strictly tetragonal symmetry. There 2 exists a small but easily detectable orthorhombic distortion. Increasing the number of Cu-0 planes from one to three has resulted in Τ values of <23 K, 90 K, and 110 Κ in Bi-based materials and <80 K, 105 K,'and 125 Κ in Tl- based materials. Wasa et al (10) grew Bi-based thin films with controlled number of Cu-0 planes and found that Γ diminished when the number of Cu- O planes was increased to four or more. In Bi-based superconductors, the nearest-neighbor Bi-Bi separation along the b axis is not constant, but shows a sinusoidal modulation between 6.6 Â and 5.2 Â, with an approximate period- icity of five unit cells (77). This probably leads to the formation of a 5x superstructure on the 6-axis, which is often observed in Bi-based compounds. YBaXu.O^ and YBa,Cu„O phases are also referred to as 123 and 124 e * 2 3 1-x 2 4 8-JC phases, respectively. Similarly, Bi-Sr-Ca-Cu-0 and Tl-Ba-Ca-Cu-O are re- ferred to as 2212, 2223, etc., phases, based on the proportion of the cations. HIGH-rc SUPERCONDUCTING THIN FILMS 3 Both La-Sr-Cu-0 and Y-Ba-Cu-0 systems are very sensitive to oxygen composition. Bulk YBa Cu 0 superconducting compounds are prepared by 2 3 7 x firing mixtures of oxides of Y and Cu and Ba carbonates at 850-900°C in flowing oxygen followed by a slow cooling in the range 400-500°C to help in the incorporation of oxygen. Fueki et al (12,13) have annealed La-based and Y- based materials at temperatures in the range 350-l,100°C. In both materials, oxygen content decreases at high temperatures and at low oxygen pressures. Additionally, in La Sr CuO , the oxygen content was found to be controlled Q 920 08 4 only by content of Sr at low temperatures (<800°C) and high oxygen pressure (1 atm). In YBaCu0_, the metal ratio is fixed and the oxygen content is con- 2 37x trolled only by the temperature and oxygen pressure. The oxygen content is the lowest in samples annealed at high temperatures (>1,000°C) and low oxygen pressures. At the normal synthesis temperatures, the tetragonal phase YBa^Cu.CX is more stable than the orthorhombic YBa Cu,0_ phase with x—> 0. 0 2 3 6 2 3 l-x ~ Increasing the oxygen pressure during the synthesis does not result in the formation of the orthorhombic YBa Cu 0 phase. In fact, the higher oxygen 2 3 7 pressure can impede the formation of the tetragonal YBa Cu 0 phase. It is 2 3 6 preferable to synthesize the tetragonal YBa Cu 0 phase in bulk or thin film 2 3 6 form, maintaining an appropriately low pressure of oxygen. The oxygen content can then be increased by annealing in appropriate ambients at temperatures below 500°C. Specht et al. (14) have carried out high-resolution x-ray diffrac- tion measurements of the lattice constants of YBa Cu 0 ^ during heating and 2 37 cooling through the orthorhombic-tetragonal transition in different oxygen partial pressures and have found that the transition is sharp, continuous, and reversible in temperature and pressure. Above the transition temperature of ~676°C, in 1 atm 0 , the superconducting orthorhombic YBa Cu 0 structure 2 2 3 7x loses a significant amount of the oxygen and transforms into a non-supercon- ducting tetragonal phase. The orthorhombic-tetragonal transition temperature drops with a decrease in oxygen partial pressure, becoming ~521°C at 2% 0 in 2 He. On being cooled slowly in oxygen, the structure picks up oxygen again at temperatures of 400-500°C and retransforms to the orthorhombic phase, ab- sorbing the quantity necessary for the transformation. The average valence of Cu increases with increasing oxygen content. With decreasing oxygen content in the formula unit, the cell volume of the orthorhombic YBa Cu,0^ phase 0 ' 2 3 l-x * increases; the structure becomes unstable and gradually transforms to a tetrago- nal phase. The oaxis parameter of the superconducting orthorhombic YBa Cu 0 phase, which has a value of 11.679 Â at 20°C in 1 atm 0 , 2 3 679 2 increases rapidly around an oxygen content of 6.5. The tetragonal phase YBa Cu 0 is non-superconducting and has a oaxis value of 11.817 Â at 20°C, 2 3 6 in 1 atm 0 . A direct correlation has been shown to exist between the increase in 2 the oxygen content and the decrease in the oaxis parameter (75). With an 4 Ν. G. DHERE increase in the proportion of the orthorhombic phase, there is a corresponding increase in Γ in Y- and other rare-earth-based superconductors. Morris et al. (16) have shown that the critical temperature, Γ, of Bi-based superconductors can be shifted reversibly over a range of >15 Κ by changing the oxygen concentration. For example, Γ is lowered by heat treatment at 600°C in high oxygen pressures of ~100 atm, while the highest Γ can be achieved by heat treatment at 600°C at P < 10 Torr. These results show that Q2 the Bi Sr CaCu 0 phase has a T range of 85-95 K. Hence, it is now 2 2 28 χ co referred to as the 90 Κ phase, rather than the 85 Κ phase as was done earlier. Bi-based superconductors may be able to provide the advantage of supercon- ducting critical temperatures comparable to those from Tl-based materials with- out the necessity of processing a toxic material such as thallium. However, as compared to Tl BaCaCuO , the preparation of 110 Κ Bi SrCa Cu O has 2 2 2 3 10 2 2 2 3 10 been found to be more difficult. Chavira et al. (17) have shown that partial substitution with Pb facilitates the growth of 110 Κ phase. There were uncon- firmed reports of T at 132 Κ and 153 Κ by partial substitution of Bi with Pb co and Sb (18). Dou et al. (19) have found that Pb addition helps in stabilization of 110 Κ phase, and that while Sb addition depresses Γ for heat treatment in pure oxygen, it does not seem to aid in the formation of higher-Γ superconducting phases. Shi et al. (20) have observed cooperative nucleation and growth of Bi Sr CaCu 0 and CaCu from amorphous matrix of Bi-Sr-Ca-Cu-0 2 2 28 χ 3 3 glasses. The growth of 110 Κ phase at the interface between the crystallized phases is controlled by the diffusion of Ca and Cu atoms and hence is favored by initial high Ca and Cu content and longer anneals at 870°C. They also believe that Pb addition advances the diffusion process. Endo et al. (21) have found that annealing in low oxygen partial pressures of 70 Torr can enhance the formation of the 110 Κ 2223 phase in bulk Bi-based materials. Aselage et al. (22) have found that the vapor pressure established by pure, condensed thallium oxide exceeded the stability limits of the Tl-based super- conducting phases, and hence these phases do not coexist in equilibrium with T10 vapors. Special precautions are essential in processing and disposing of 2 the Tl-based materials to avoid risks from their toxicity (23). There is considerable interest in thin films of high-Γ superconducting mate- rials because of the possibility of fabricating cryoelectronic devices. Of the many techniques for the deposition of thin films, vacuum evaporation, sputter- ing, metalorganic chemical vapor deposition (MOCVD), molecular beam epi- taxy (MBE), and ion-assisted deposition are used widely in laboratories and industries, and have been treated extensively in textbooks (24-27). The other techniques are laser ablation, metalorganic deposition (MOD), spray pyrolysis, electrodeposition, plasma spray, screen printing, dip coating, solution growth, etc. The definitions of thin and thick films are not based entirely on their

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