SVC - 47th Annual Technical Conference Proceedings

18 Pages·2004·0.199 MB·English

47th Annual
Technical Conference
Proceedings
April 24–29, 2004
Dallas, Texas USA
Copyright © 2004 by Society of Vacuum Coaters
71 Pinon Hill Place NE • Albuquerque, NM 87122-1914 USA
Telephone [phone] • Fax [phone]
E-mail [email protected]
Web Site www.svc.org
Executive Director: Vivienne Harwood Mattox
Technical Director: Donald M. Mattox
Annual Technical
Conference Proceedings
Prior Proceedings available in print:
19th Annual Technical Conference Proceedings (1976) ISBN 1-878068-00-8
20th Annual Technical Conference Proceedings (1977) ISBN 1-878068-01-6
21st Annual Technical Conference Proceedings (1978) ISBN 1-878068-02-4
22nd Annual Technical Conference Proceedings (1979) ISBN 1-878068-03-2
24th Annual Technical Conference Proceedings (1981) ISBN 1-878068-04-0
28th Annual Technical Conference Proceedings (1985) ISBN 1-878068-05-9
30th Annual Technical Conference Proceedings (1987) ISBN 1-878068-06-7
31st Annual Technical Conference Proceedings (1988) ISBN 1-878068-07-5
32nd Annual Technical Conference Proceedings (1989) ISBN 1-878068-08-3
33rd Annual Technical Conference Proceedings (1990) ISBN 1-878068-09-1
34th Annual Technical Conference Proceedings (1991) ISBN 1-878068-10-5
35th Annual Technical Conference Proceedings (1992) ISBN 1-878068-11-3
36th Annual Technical Conference Proceedings (1993) ISBN 1-878068-12-1
37th Annual Technical Conference Proceedings (1994) ISBN 1-878068-13-X
38th Annual Technical Conference Proceedings (1995) ISSN 0737-5921
39th Annual Technical Conference Proceedings (1996) ISSN 0737-5921
40th Annual Technical Conference Proceedings (1997) ISSN 0737-5921
41st Annual Technical Conference Proceedings (1998) ISSN 0737-5921
42nd Annual Technical Conference Proceedings (1999) ISSN 0737-5921
43rd Annual Technical Conference Proceedings (2000) ISSN 0737-5921
44th Annual Technical Conference Proceedings (2001) ISSN 0737-5921
45th Annual Technical Conference Proceedings (2002) ISSN 0737-5921
46th Annual Technical Conference Proceedings (2003) ISSN 0737-5921
Proceedings available on CD-ROM:
The SVC Technical Conference Proceedings CD-ROM is an annually updated reference containing conference
manuscripts from 1991 to the present and abstracts and paper summaries from 1957 to the present. Each year’s
edition contains all the information from earlier editions.
Notice: The manuscripts in the SVC Conference Proceedings have not been peer reviewed. SVC assumes no
responsibility for the content.
Copyright © 2004 by Society of Vacuum Coaters
All rights reserved. No part of this book may be used or reproduced in any manner without written permission
except in the case of brief quotations embodied in critical articles and reviews. For information, contact the
publisher.
Society of Vacuum Coaters
47th Annual Technical Conference Proceedings
Published by:
Society of Vacuum Coaters
71 Pinon Hill Place NE
Albuquerque, NM 87122-1914 USA
Telephone [phone]
Fax [phone]
E-mail [email protected]
Web Site www.svc.org
ISSN 0737-5921
Printed in the United States of America
ii
2004 Conference
Program Committee
SVC Conference Program Chairs
Ric Shimshock, MLD Technologies LLC
Ludvik Martinu, École Polytechnique, Canada
Smart Materials Symposium Chair
Carl Lampert, Star Science
Director of TACs
Hana Baránková, Uppsala University, Sweden
Optical Coating Committee Chairs
Ludvik Martinu, École Polytechnique, Canada
George Dobrowolski, National Research Council of Canada (retired)
Vacuum Web Coating Committee Chairs
Roger S.A. Kelly, Amcor Flexibles CAMVAC
Peter J. Moulds, Ursa International Corporation
Tribological and Decorative Coating Committee Chairs
Dale McIntyre, Vapor Technologies, Inc.
Roel Tietema, Hauzer Techno Coating BV
Gary Doll, Timken Research
Large Area Coating Committee Chairs
Michael Andreasen, VACUUM COATING Technologies, Inc.
Johannes Strümpfel, VON ARDENNE Anlagentechnik GmbH
Emerging Technologies and Heuréka! Committee Chairs
Hana Baránková, Uppsala University, Sweden
Ladislav Bárdos, Uppsala University, Sweden
Process Control & Instrumentation Committee Chairs
J. Grant Armstrong, Carberry Technologies
David Chamberlain, MKS Instruments, Inc.
Plasma Processing Committee Chairs
Vasgen Shamamian, Dow Corning Corporation
Scott Walton, Naval Research Laboratory
Falke Milde, VON ARDENNE Anlagentechnik GmbH
Innovators Showcase Chair
Frank T. Zimone, Denton Vacuum, LLC
Education Committee Chairs
H. Angus Macleod, Thin Film Center, Inc.
S. Ismat Shah, University of Delaware
Exhibit Committee Chair
John Felts, Nano Scale Surface Systems, Inc.
“Meet the Experts” Corner
Donald M. Mattox, SVC Technical Director
Conference Administrator
Vivienne Harwood Mattox, SVC Executive Director
xiii
Corporate Sponsors
3M Company Helix Technology Corporation SAGE industrial sales, inc.
Representative: Clark Bright Representative: Michael J. Eacobacci Representative: Pamela Diesing
520/746-7061 • Fax [phone] • Fax [phone] • Fax [phone]
Academy Precision Materials Heraeus Incorporated Semicore Equipment, Inc.
Representative: Jim Ridout Representative: Kevin Williams Representative: Christopher A. Malocsay
800/854-8595 • Fax [phone] • Fax [phone] • Fax [phone]
Advanced Energy Industries, Inc. Huettinger Electronic, Inc. SHI-APD Cryogenics, Inc.
Representative: Marna Shillman Representative: Paul Oranges Representative: Karen Phillips
970/407-6280 • Fax [phone] • Fax [phone] •Fax [phone]
Applied Films Corporation IGC-Polycold Systems Inc. Singulus Technologies, Inc.
Representative: Elizabeth Josephson Representative: Jennifer Hammond Representative: John R. Marcantonio
315/682-7081 • Fax [phone] • Fax [phone] • Fax [phone]
Astron Advanced Materials, Ltd. IonBond Inc. Soleras Ltd.
Representative: Anthony R. Wilson Representative: Helmut Ott Representative: Dean Plaisted
44/120-269-5747 • Fax [phone] • Fax [phone] • Fax [phone]
Automated Vacuum Systems, Inc. ITN Energy Systems, Inc. Southwall Technologies
Representative: Craig Lubkey Representative: Ashutosh Misra Representative: Sicco Westra
941/379-5046 • Fax [phone] • Fax [phone] • Fax [phone]
Bekaert Advanced Coatings Jeol Ltd. Sputtering Materials, Inc.
Representative: Ann Lacres Representative: Yasuo Maki Representative: Greg Howard
32/9 381 6161 • Fax [phone] • Fax [phone] • Fax [phone]
Bekaert Specialty Films, LLC Kurt J. Lesker Company Steag HamaTech AG
Representative: Gary Phillips Representative: Bill Zinn Representative: Christian Weindel
858/576-0200 • Fax [phone] • Fax [phone] • Fax [phone]
BOC Edwards Leybold Optics USA, Inc. Telemark
Representative: Dave Sobiegray Representative: Antonio Requena Representative: Gary Henderson
716/773-7552 • Fax [phone] • Fax [phone] • Fax [phone]
CeramTec, Ceramaseal Division Materials Science International, Inc. Thermionics Vacuum Products
Representative: Jason Marlin Representative: Neil Crabbe Representative: Tom Howard
800/752-7325 • Fax [phone] • Fax [phone] • Fax [phone]
Comdel, Inc. MDC Vacuum Products Corporation Thin Film Center, Inc.
Representative: Scott Johnson Representative: Dan Jennings Representative: H. Angus Macleod
978/282-0620 • Fax [phone] • Fax [phone] • Fax [phone]
CompuVac® Systems, Inc. MeiVac, Inc. Thin Film Technology, Inc.
Respresentative: Robert Choquette Representative: Harry Grover Representative: James R. Wafer
941/379-0550 • Fax [phone] • Fax [phone] • Fax [phone]
CPFilms, Inc. Micro Photonics, Inc. Tico Titanium, Inc.
Representative: Joseph J. Gordon Representative: George Ferrio Representative: Joe P. Cruzen
818/882-5744 • Fax [phone] • Fax [phone] • Fax [phone]
Darly Custom Technology, Inc. Mill Lane Engineering Company, Inc. Toray Plastics (America), Inc.
Representative: Yimou Yang Representative: Jerry Martin Representative: Wolfgang Decker
860/243-5518 • Fax [phone] • Fax [phone] • Fax [phone]
Denton Vacuum, LLC Mitsubishi Plastics, Inc. Ulvac Technologies, Inc.
Representative: Frank T. Zimone Representative: Shigeru Matsuoka Representative: Evan Sohm
856/439-9100 • Fax [phone] 3834 8709 • Fax [phone] • Fax [phone]
Dexter Magnetic Technologies, Inc. MKS Instruments, Inc. Umicore Thin Film Products
Representative: Courtney M. Stone Representative: Lisa Robillard Representative: William Reeves
847/956-7824 • Fax [phone] • Fax [phone] • Fax [phone]
DynaVac Nor-Cal Products, Inc. VacuCoat Technologies, Inc.
Representative: Thomas Foley Representative: Tim Nilsson Representative: Martin Goldsberry
781/740-8600 • Fax [phone] • Fax [phone] • Fax [phone]
Eddy Company Optical Coating Laboratory, Inc. VACUUM COATING Technologies, Inc.
Representative: Charles R. Vogel Representative: Patrick K. Higgins Representative: Philip Johnson
925/283-0148 • Fax [phone] • Fax [phone] • Fax [phone]
Engelhard Corporation Pfeiffer Vacuum, Inc. Vacuum Engineering & Materials Company, Inc.
Representative: John Lazzari Representative: Roland Hellmer Representative: Jack Kavanaugh
732/205-5832 • Fax [phone] • Fax [phone] • Fax [phone]
Ferrotec (USA) Corporation Plasma Surface Engineering Corporation Vacuum Process Technology, Inc.
Representative: Joan Deichler Representative: John R. Miller Representative: Steven J. Chiavaroli
603/598-7212 • Fax [phone] • Fax [phone] • Fax [phone]
Flex Products, Inc. Process Materials, Inc. Varian Inc., Vacuum Technologies
Representative: Kent Coulter Representative: Barry Nudelman Representative: Bill Foley
707/525-7163 • Fax [phone] • Fax [phone] • Fax [phone]
Galileo Vacuum Systems, Inc. Providence Metallizing Company, Inc. Vergason Technology, Inc.
Representative: Paolo Raugei Representative: Harold Gadon Representative: Gary E. Vergason
678/513-0303 • Fax [phone] • Fax [phone] • Fax [phone]
GENERAL Vacuum Equipment, Ltd. PTB Sales, Inc. VON ARDENNE Anlagentechnik GmbH
Representative: Andrew C. Jack Representative: Brendan Riley Representative: Johannes Strümpfel
44/1706 622 442 • Fax [phone] • Fax [phone] • Fax [phone]
Goodfellow Corporation PVT, Plasma and Vacuum Technologies LLC Wacker Ceramics
Representative: Stephen Aldersley Representative: Andy Korenyi Both Representative: Steve Sedlak
800/821-2870 • Fax [phone] • Fax [phone] • Fax [phone]
Hanwha L&C Corporation R.D. Mathis Company Williams Advanced Materials, Inc.
Representative: Se Jin Han Representative: Robert Lumley Representative: Rod Martinez
82/2-729-1264 • Fax [phone] • Fax [phone] • Fax [phone]
Hauzer Techno Coating BV Research and PVD Materials Corporation Yeagle Technology, Inc.
Representative: Thomas Krug Representative: Melvin J. Hollander Representative: Edward W. Yeagle
31/77355 9774 • Fax [phone] • Fax [phone] • Fax [phone]
Charter Corporate Sponsors are underlined
xiv
Table of Contents
Plenary Session
11 Electrospray: Wings for Molecular Elephants
Plenary Speaker: Professor J.B. Fenn, Virginia Commonwealth University, Richmond, VA
Executive Summary provided by: V.A. Shamamian, Dow Corning Corp., Midland, MI .............................................3
Keynote Presentation
12 Essence of UHV Technology in Surface Processing Systems
C. Hayashi, ULVAC, Inc., Chigasaki, Kanagawa, Japan .........................................................................................11
Special Presentation
13 Vacuum Coating—An Enabling Technology
D.M. Mattox, Management Plus, Inc., Albuquerque, NM.........................................................................................23
Process Control & Instrumentation
14 Modeling of Sputtering Equipment, Process and Film Growth as an Engineering Tool: Building a
Virtual Sputter Tool
J.C.S. Kools, Veeco Instruments, Fremont, CA.......................................................................................................31
15 Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases
D.C. Carter, W.D. Sproul, and D.J. Christie, Advanced Energy Industries, Inc., Fort Collins, CO...........................37
16 Flexible Reactive Gas Sputtering Process Control
V. Bellido-González, B. Daniel, J. Counsell, and M. Stevens, Gencoa Ltd., Liverpool, United Kingdom; and
E. Momeñe, Cromo Duro, Bilbao, Spain..................................................................................................................44
17 Stabilizing RF Generator and Plasma Interactions
V. Brouk and R. Heckman, Advanced Energy Industries, Inc., Fort Collins, CO .....................................................49
18 Computer Aided Design of Optical Transmittance and Electromagnetic Shielding Efficiency on
Conductive Anti-Reflection Coating
S.M. Yang and J.C. Yang, Department of Aeronautics and Astronautics, National Cheng Kung
University, Taiwan....................................................................................................................................................55
19 Fundamentals of Feedback Control for Reactive Sputtering
M.A. George and E.A. Craves, Deposition Sciences Incorporated, Santa Rosa, CA; and R. Shehab and
K. Knox, Ametek Incorporated, Pittsburgh, PA ........................................................................................................62
10 Combination Gauges: Responding to the Technological Challenges
S.J. Smith and P.M. Rutt, Helix Technology Corporation, Granville-Phillips Product Center, Boulder, CO..............67
11 High Accurate In Situ Optical Thickness Monitoring for Multilayer Coatings
A. Zoeller, M. Boos, H. Hagedorn, W. Klug, and C. Schmitt, Leybold Optics GmbH, Alzenau, Germany...............72
Emerging Technologies
12 Optical Coatings for Special Effect Pigments
G. Pfaff, Merck KGaA, Darmstadt, Germany...........................................................................................................79
13 Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster
System Implementing Electron Beam and Sputter Technology
U. Beck, A. Hertwig, G. Reiners, M. Weise, Bundesanstalt für Materialforschung und -prüfung (BAM),
Division VIII.2 Surface Technology, Berlin, Germany; and J. Hartung, E. Reinhold, and J. Strümpfel,
VON ARDENNE Dresden, Dresden, Germany........................................................................................................86
14 Hot Hollow Cathode Arc Deposition of Highly Oriented Chromium and Chromium Nitride Films
L. Bárdos and H. Baránková, Uppsala University, Angstrom Laboratory, Uppsala, Sweden...................................91
15 The Reactive Sputter Deposition of Aluminum Oxide Coatings Using High Power Pulsed
Magnetron Sputtering (HPPMS)
W.D. Sproul, D.J. Christie, and D.C. Carter, Advanced Energy Industries, Inc., Fort Collins, CO...........................96
16 Industrial Precision Deposition for Microelectronics and Next Generation Hard Disk
J. Berthold, Fraunhofer IWS, Dresden, Germany; W. Hentsch, FHR Anlagenbau, Ottendorf-Okrilla,
Germany; H. Hilgers, IBM Germany, Mainz, Germany; T. Schülke, Fraunhofer USA; P. Siemroth, Arc
Precision GmbH, Dresden, Germany; S. Seifried, UNAXIS Balzers, Liechtenstein; and C. Wenzel, TU
Dresden, Dresden, Germany.................................................................................................................................101
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Table of Contents
17 Characterization of RF Polymer Sputtering by Ion Mass Spectrometry
M. Misina, Academy of Sciences of the Czech Republic, Prague, Czech Republic; H. Koshelyev,
Czech Technical University, Prague, Czech Republic; H. Biederman, A. Choukourov, D. Slavinska,
Charles University, Prague, Czech Republic; and E. Fuoco, A. Bowers, and L.Hanley, University of
Illinois at Chicago, Chicago, IL ..............................................................................................................................108
18 A Novel Pulsed Supply With Arc Handling and Leading Edge Control as Enabling Technology for
High Power Pulsed Magnetron Sputtering (HPPMS)
D.J. Christie, W.D. Sproul, D.C. Carter, and F. Tomasel, Advanced Energy Industries, Inc., Fort Collins, CO......113
19 Continuous, Substrateless Production of Nanoparticles and Nanosheets
W.C. Kittler, Jr., Gnomic Enterprises, Rohnert Park, CA........................................................................................119
20 p-Type Sb-doped ZnO Thin Films Prepared with Filtered Vacuum Arc Deposition
T. David, S. Goldsmith, and R.L. Boxman, Electrical Discharge and Plasma Laboratory,
Tel Aviv University, Tel Aviv, Israel..........................................................................................................................122
Heuréka! Post-Deadline Recent Developments Session
21 Electromechanics of a Highly Flexible Transparent Conductor for Display Applications
J. Lewis, S. Grego, B. Chalamala, E. Vick, and D. Temple, MCNC Research and Development Institute,
Research Triangle Park, NC..................................................................................................................................129
22 Quality of Plasma Polymerized Corrosion Resistant Layers of New Materials in Large Scale
Coating Machines for Car Reflectors
K. Nauenburg, P. Fiedler, W. Dicken, G. Deppisch, K. Kruse, and G. Ickes, Leybold Optics GmbH,
Alzenau, Germany.................................................................................................................................................134
23 Stress Reduction in Sputter Deposited Thin Films Using Physically Self-Assembled
Nanostructures as Compliant Layers
T. Karabacak, J.J. Senkevich, G.-C. Wang, and T.-M. Lu, Department of Physics, Applied Physics
and Astronomy, Rensselaer Polytechnic Institute, Troy, NY..................................................................................138
24 Internal ICP Assisted Magnetron Sputtering for Fast Deposition at Low Pressure (10-4 mbar range)
in Semi Industrial Coating Chamber (0.1 m3)
C. Nouvellon, J.P. Dauchot, Y. Paint, F. Monteverde, and M. Hecq, Materia Nova, Mons, Belgium......................146
25 Vacuum Deposition of Thick Multilayers on Thin Flexible Polymer Substrates
N. Magriotis, Arcotronics Nissei Group, Sasso Marconi, Italy; and G. Comini, Department of Energy
and Fluid Machinery, University of Udine, Italy......................................................................................................150
26 Modeling of the Film Thickness Distribution Along Transport Direction in In-line Coaters for
Reactive Sputtering
A. Pflug and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig,
Germany; and M. Geisler, A. Kastner, C. Braatz, U. Schreiber, and J. Bruch, Applied Films GmbH & Co.
KG, Alzenau, Germany..........................................................................................................................................155
27 Sputtering of Very Thin Pd-alloy Hydrogen Separation Membranes
H. Klette and R. Bredesen, Sintef Materials Technology, Oslo, Norway................................................................161
28 Recent Developments in Measuring Permeation Through Barrier Films and Understanding of
Permeation Processes
H. Nörenberg, Technolox Ltd., Oxford, United Kingdom; and V.M. Burlakov, Department of Materials,
University of Oxford, Oxford, United Kingdom.......................................................................................................164
29 Aluminum Soldering Performance Testing of H13 Steel as Boron Coated by the Cathodic Arc
Technique
G. Mackiewicz Ludtka and V.K. Sikka, Oak Ridge National Laboratory, Oak Ridge, TN; and J.M. Williams,
C.C. Klepper, R.C. Hazelton, and E.J. Yadlowsky, HY-Tech Research Corporation, Radford, VA........................168
30 New Modular Roll-to-Roll PVD Web Coater For Clean Room Production
R. Kukla, H.G. Lotz, R. Ludwig, and P. Sauer, Applied Films GmbH & Co. KG, Alzenau, Germany.....................174
31 Innovative Production of High Quality Optical Coatings for Applications in Optics and
Optoelectronics
M. Scherer, J. Pistner, and W. Lehnert, Leybold Optics GmbH, Alzenau, Germany .............................................179
32 High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide
D.A. Glocker and M.M. Romach, Isoflux Incorporated, Rochester, NY; and D.J. Christie and W.D. Sproul,
Advanced Energy Industries, Fort Collins, CO......................................................................................................183
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Table of Contents
Special Joint Session
33 Influence of DC and MF Sputter Technology on the Properties of ITO Layers on PET Film
H.-G. Lotz, P. Sauer, R. Kukla, M. Liehr, and J. Schröder, Applied Films GmbH & Co. KG,
Alzenau, Germany.................................................................................................................................................189
34 AR Coatings by Plasma Enhanced CVD on Flexible Substrates
O. Sakakura, T. Nakajima, and T. Oboshi, Dai Nippon Printing Co. Ltd., Kashiwa-shi, Japan..............................194
35 Slightly Conductive Transparent Films for Space Applications—Manufacturability and Durability
N. Uppala, J. Griffin, J. Vemulapalli, and P.D. Hambourger, Cleveland State University, Cleveland, OH..............199
Large Area Coating
36 Saving $40B Per Year—Performance Needs for Energy Efficient Coated Glazings in Buildings
S. Selkowitz, Building Technologies Department, Lawrence Berkeley National Laboratory, Berkeley, CA...........207
37 Reactive Pulsed Magnetron Sputtering of SiO-Influence of Process Parameters on Layer
2
Properties
R. Nyderle, V. Kirchhoff, R. Vanecek, and H. Sahm, Fraunhofer-Institut für Elektronenstrahl- und
Plasmatechnik (FEP), Dresden, Germany.............................................................................................................209
38 High Power Pulse Reactive Sputtering of TiO
2
J.A. Davis, Applied Films, Inc., Longmont, CO; W.D. Sproul and D.J. Christie, Advanced Energy
Industries, Inc., Fort Collins, CO; and M. Geisler, Applied Films GmbH, Alzenau, Germany................................215
39 Plasma Emission Monitoring of Low Rate Materials on Rotating Cylindrical Magnetrons
P. Greene and S. Nadel, VON ARDENNE Coating Technology, Fairfield, CA.......................................................219
40 Enhancements to Rotating Cylindrical Magnetrons
J. Rietzel and S. Nadel, VON ARDENNE Coating Technology, Fairfield, CA........................................................224
41 Latest Developments of Large Area Coater and Application
M. Geisler, C. Braatz, J. Bruch, A. Kastner, R. Newcomb, A. Reus, G. Kleideiter, and M. Englert, Applied
Films GmbH Co. KG, Alzenau, Germany ..............................................................................................................231
42 Arc Management in DC and MF Generators for Large Area Coating Systems
T. Rettich, P. Wiedemuth, Hüttinger Elecktronik GmbH + Co. KG, Freiburg, Germany; and L. Anderson,
Huettinger Electronic, Inc., Farmington, CT...........................................................................................................237
43 Effects of Methods of Manufacturing Sputtering Targets on Characteristics of Coatings
J.J. Finley and S.D. Walck, PPG Glass Technology Center, PPG Industries, Inc., Pittsburgh, PA; and
E. Bono, Crucible Research, A Division of Crucible Materials Corporation, Pittsburgh, PA...................................241
44 Rotatable ZnO Targets—A New Generation of Ceramic Targets
G. Hüttl and K. Schwarz, FNE Forschungsinstitut für Nichteisen-Metalle Freiberg GmbH, Freiberg,
Germany; and K. Böhme and F. Jürgens, Fremat GmbH & Co. KG, Freiberg, Germany .....................................252
45 Sputtering of Conductive ZAO Films from Metallic and Ceramic Targets using Planar and
Cylindrical Magnetrons
F. Milde, M. Dimer, J. Fiukowski, J. Strümpfel, VON ARDENNE Anlagentechnik GmbH,
Dresden, Germany ................................................................................................................................................255
46 New Sputtering Targets: to Test or Not to Test?
J.O. McGeever, Technology Assessment International, Cranberry Township, PA.................................................261
47 Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting
Anomalous Erosion
G. Buyle, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, Ghent University, Ghent, Belgium; and
W. De Bosscher, Bekaert Advanced Coatings (Bekaert VDS), Deinze, Belgium ..................................................265
48 Influence of Rotating Magnets on Hysteresis in Reactive Sputtering
O. Kappertz, T. Nyberg, D. Rosén, and S. Berg, Solid State Electronics, The Ångström Laboratory,
Uppsala University, Uppsala, Sweden...................................................................................................................271
49 Optimizing AC Switching Parameters for Rotating Cylindrical Magnetron Sputtering
A. Blondeel, Bekaert Advanced Coatings, Deinze, Belgium; and W. De Bosscher, Bekaert Advanced
Coatings, Zulte, Belgium........................................................................................................................................276
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Table of Contents
50 Cylindrical Magnetron Sputter Deposition of Chromium Coatings for Erosion and Wear Resistant
Application
K. Truszkowska, M. Wotzak, F. Yee, G.N. Vigilante, and M. Cipollo, US Army Armament Research,
Development and Engineering Center, Benét Laboratories, Watervliet, NY..........................................................282
51 High Rate Evaporation of Alloys
J.P. Zijp, J.F.M. Velthuis, and J.L. Linden, TNO TPD, Delft, The Netherlands.......................................................289
Optical Coating
52 Advanced TCO and CIS Coatings Through the Pulsed Magnetron Sputtering of Powder Targets
P.J. Kelly, Y. Zhou, J. Hisek, and R.D. Pilkington, School of Computing Science and Engineering,
University of Salford, Salford, United Kingdom......................................................................................................295
53 Reactive Low Voltage Ion Plating Plasma Assisted (RLVIPPA): A New Perspective for Optical
Coatings
C. Misiano, Romana Film Sottili S.R.L., Anzio, Italy; and S. Schlichtherle and H.K. Pulker, University of
Innsbruck, Innsbruck, Austria.................................................................................................................................300
54 Multilayer Protective Coatings for Polycarbonates Prepared by Plasma Enhanced CVD
Z. Kucerová*, L. Zajícková, and V. Bursíková, Department of Physical Electronics, Masaryk University, Brno,
Czech Republic......................................................................................................................................................304
55 Developments in Materials and Processes: Key to Advances in Thin Film Design
J.A. Dobrowolski, Institute of Microstructural Sciences, National Research Council of Canada, Ottawa,
Ontario, Canada ....................................................................................................................................................310
56 Broadband Antireflection Coating Design Recommendations
R.R. Willey, Willey Optical, Consultants, Charlevoix, MI........................................................................................322
57 The Production of Ultra-Low Loss AR Coatings
I. Stevenson and G. Sadkhin, Denton Vacuum, LLC, Moorestown, NJ.................................................................328
58 Application of Ion Beam Assisted Thin Film Deposition Techniques to the Fabrication of a
Biosensor Chip With Fieldability Potential for Important Biohazard Detection Applications
D. Lloyd, Loats Associates, Westminster, MD; L. Hornak and S. Pathak, West Virginia University,
Morgantown, WV; D. Morton, Denton Vacuum, LLC, Kemp TX; and I. Stevenson, Denton Vacuum, LLC,
Moorestown, NJ.....................................................................................................................................................334
59 Light Scattering, Photothermal Microscopy and Laser Damage of Optical Interference Coatings
C. Amra, M. Commandre, C. Deumié, and J.Y. Natoli, Institut Fresnel, Marseille, France....................................340
60 Optical Response from Metal/Dielectric Nanocomposite Thin Films Systems Modified by Heavy
Ion Irradiation
J.-M. Lamarre* and L. Martinu, Department of Engineering Physics, École Polytechnique de Montréal,
Montréal, Canada; and Z. Yu, C. Harkati, and S. Roorda, Physics Department, Université de Montréal,
Montréal, Canada..................................................................................................................................................343
61 Structural Characterization of Wurtzite Al InN (0.1<x<0.9) Grown by Dual Reactive DC Magnetron
1-x x
Sputter Deposition
T. Seppänen and P.O.Å. Persson, Thin Film Physics Div., Department of Physics and Measurement
Technology (IFM), Linköping University, Linköping, Sweden; G.Z. Radnóczi and B. Pécz, Thin Film Physics
Div., Department of Physics and Measurement Technology (IFM), Linköping University, Linköping, Sweden
and Research Institute for Technical Physics and Materials Science (MFA) of the Hungarian Academy of
Sciences, Budapest, Hungary; and L. Hultman and J. Birch, Thin Film Physics Div., Department of
Physics and Measurement Technology (IFM), Linköping University, Linköping, Sweden .....................................347
62 Versatile Reactive Sputtering Batch Drum Coater with Auxiliary Plasma
M.A. George, H.R. Gray, N. Boling, and E. Krisl, Deposition Sciences Incorporated, Santa Rosa, CA................353
63 High Reflectivity Protected Silver Coatings on Stainless Steel and Aluminum Substrates
F. Sabary, D. Marteau, P. Hamel, and H. Piombini, CEA Le Ripault, Monts, France.............................................358
64 Optical and Compositional Analysis of Annealed SiO Thin Films Deposited by Electron Cyclotron
x
Resonance Plasma Enhanced Chemical Vapor Deposition
T. Roschuk, J. Wojcik, and P. Mascher, Centre for Electrophotonic Materials and Devices and Department
of Engineering Physics, McMaster University, Ontario, Canada............................................................................362
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Table of Contents
65 Removing Surface Contaminants from Silicon Wafers to Facilitate EUV Optical Characterization
R.E. Robinson, Department of Physics & Astronomy, University of Rochester, Rochester, NY; and
R.L. Sandberg, D.D. Allred, A.L. Jackson, J.E. Johnson, W. Evans, T. Doughty, A.E. Baker, K. Adamson,
and A. Jacquier, Department of Physics & Astronomy, Brigham Young University, Provo, UT..............................368
66 Flexible and High Throughput Deposition of Multilayer Optical Coatings Using Closed Field
Magnetron Sputtering
D.R. Gibson, J.M. Walls, and I. Brinkley, Applied Multilayers Ltd., Coalville, Leicestershire, United Kingdom;
and D.G. Teer, P. Teer, and J. Hampshire, Teer Coatings Ltd., Kidderminster, Worcestershire,
United Kingdom.....................................................................................................................................................377
67 Manufacturable Filter for CWDM’s
D. Cushing, 3M Precision Optics Inc., Cincinnati, OH...........................................................................................383
68 Interface Engineering of Porous/Dense Multilayers of SiN : In situ Real-time Spectroscopic
1.3
Ellipsometry Study
A. Amassian, R. Vernhes, J.E. Klemberg-Sapieha, P. Desjardins, and L. Martinu, Regroupement québécois
sur les matériaux de pointe (RQMP) and Department of Engineering Physics, École Polytechnique,
Montréal, Canada..................................................................................................................................................389
69 Improving Rate Control in Electron-Beam Evaporated Optical Coatings: The Role of Arcing and
Controller Tuning
M. Gevelber and B. Xu, Manufacturing Engineering, Boston University, Brookline, MA; D. Smith, Vacuum
Process Technology Inc., Plymouth, MA; and J. Oliver and J. Howe, Laboratory for Laser Energetics,
University of Rochester, Rochester, NY.................................................................................................................395
Plasma Processing
70 Real-time Monitoring of Ion Energy and Ion Flux in Plasma Reactors Using RF Current and
Voltage Measurements
M.A. Sobolewski, National Institute of Standards and Technology, Gaithersburg, MD..........................................405
71 Materials Processing in Electron Beam-Generated Plasmas
C. Muratore, S.G. Walton, D. Leonhardt, R.F. Fernsler, and R.A. Meger, Plasma Physics Division,
U.S. Naval Research Laboratory, Washington, DC...............................................................................................412
72 Method to Design Magnetrons that Match Preferred Erosion Patterns
R. Stelter, Dexter Magnetic Technologies, Inc., Fremont, CA; M. Schilling, Dexter Magnetic Technologies,
Inc., Elk Grove Village, IL; A. Welk and C. Padua, Dexter Magnetic Technologies, Inc., Fremont, CA; and
C. Li, and M. Devine, Dexter Magnetic Technologies, Inc., Hicksville, NY ............................................................418
73 Cylindrical Magnetron Sputtering in a Ferromagnetic Cylinder
F. Yee, M. Wotzak, M. Cipollo, and K. Truszkowska, US Army Armament Research, Development and
Engineering Center, Benét Laboratories, Watervliet, NY.......................................................................................421
74 High-power Pulsed dc Magnetron Discharges for Ionized High-rate Sputtering of Thin Films
J. Vlcek, A.D. Pajdarova, P. Belsky, M. Kormunda, J. Lestina, and J. Musil, Department of Physics,
University of West Bohemia, Plzen, Czech Republic.............................................................................................426
75 Optical Emission Study of the Ionization Fractions in a High Power Pulsed Magnetron Plasma
J. Böhlmark, Department of Physics, Linköping University, Linköping, Sweden; A.P. Ehiasarian and P.Eh.
Hovsepian, Materials Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and U.
Helmersson, Department of Physics, Linköping University, Linköping, Sweden...................................................432
76 Influence of Pressure and Power on the Composition and Time Evolution of Plasmas in High
Power Impulse Magnetron Sputtering
A.P. Ehiasarian, R. New, and P.Eh. Hovsepian, Materials Research Institute, Sheffield Hallam University,
Sheffield, United Kingdom; and J. Böhlmark, J. Alami, and U. Helmersson, Department of Physics,
Linköping University, Linköping, Sweden...............................................................................................................437
77 Microwave-Assisted DC Magnetron Sputtering
S. Moh and F. Placido, Thin Film Centre, University of Paisley, Paisley, United Kingdom....................................443
78 Industrial Implementation of Plasma Deposition Using the Expanding Thermal Plasma Technique
M.C.M. van de Sanden, P.J. van den Oever, and M. Creatore, Department of Applied Physics, Equilibrium
and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands;
M. Schaepkens, T. Miebach, and C.D. Iacovangelo, General Electric Global Research Center, Schenectady,
New York; R.C.M. Bosch, M. Bijker, and M. Evers, OTB Engineering B.V., Eindhoven, The Netherlands; and
D.C. Schram and W.M.M. Kessels, Department of Applied Physics, Equilibrium and Transport in
Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands.......................................................447
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Table of Contents
79 Atmospheric Pressure Plasma Source for Wire Cleaning
D. Korzec, M. Teschke, and E.G. Finantu, Forschungszentrum für Mikrostrukturtechnik - fmt, University of
Wuppertal, Wuppertal, Germany; G. Nau, JE Plasma Consult GmbH, Wuppertal, Germany; and
J. Engemann, Forschungszentrum für Mikrostrukturtechnik - fmt, University of Wuppertal, and
JE Plasma Consult GmbH, Wuppertal, Germany..................................................................................................455
80 Plasma Polymerization of Hybrid Organic-Inorganic Monomers in an Atmospheric Pressure
Dielectric Barrier Discharge
R. Rego, S. Paulussen, O. Goosens, and D. Vangeneugden, VITO - Flemish Institute for Technological
Research, Mol, Belgium.........................................................................................................................................461
81 Plasma Diagnostic for Development and Optimization of Plasma Activated Deposition Processes
P. Spatenka, University of South Bohemia, Ceské Budejovice, Czech Republic, and Technical University of
Liberec, Liberec, Czech Republic; K.-D. Nauenburg and T. Schmauder, Leybold Optics Germany GmbH,
Alzenau, Germany; and A. Kolouch, Technical University of Liberec, Liberec, Czech Republic ...........................465
82 Production Equipment for Plasma Enhanced CVD Permeation Barrier Coating of PET Beverage
Bottles
H. Grünwald, Tetra Pak Plastic Packaging R&D GmbH, Darmstadt, Germany.....................................................470
83 Modular Linear Ion Source
H.R. Kaufman, J.R. Kahn, and R.E. Nethery, Kaufman & Robinson, Inc., Fort Collins, CO..................................477
84 Scale-up of Microwave Resonator Plasma Sources for Large Area
H. Sung-Spitzl and R. Spitzl, iplas Innovative Plasma Systems GmbH, Troisdorf, Germany................................483
85 Industrial Size High Power Impulse Magnetron Sputtering
A.P. Ehiasarian, Materials Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and
R. Bugyi, AC Sp. z o.o., Warsaw, Poland ..............................................................................................................486
Tribological and Decorative Coating
86 Engineered Tribological Coatings
D. Zhong, Colorado School of Mines, Golden, CO; K. Ho Kim and I.-W. Park, Pusan National University,
Busan, South Korea; T. Dennin and B. Mishra, Colorado School of Mines, Golden, CO; E. Levashov,
Moscow State Institute of Steels and Alloys, Moscow, Russia; and J.J. Moore, Colorado School of Mines,
Golden, CO............................................................................................................................................................493
87 Laser-Arc Process and Technology for Deposition of Hard Amorphous Carbon (ta-C)
H.-J. Scheibe, Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University,
East Lansing, MI; and B. Schultrich, Fraunhofer Institute for Material and Beam Technology,
Dresden, Germany ................................................................................................................................................501
88 Replacement of Hard-Chrome in Cylinder Liners—A PVD Deposition Approach
V. Bellido-González, Gencoa Ltd., Liverpool, United Kingdom; A. Igartua and G. Mendoza, Tekniker, Eibar,
Spain; S. Powell, Gencoa Ltd., Liverpool, United Kingdom; M.G. Talks, QinetiQ, Farnborough, United
Kingdom; and E. Momeñe, Cromo Duro, Bilbao, Spain ........................................................................................509
89 The Effect of Process Parameters on the Mechanical and Microstructural Properties of Thick UMS
TiN Coatings
M. Bielawski, D. Seo, and R.C. McKellar, National Research Council Canada, Institute for Aerospace
Research, Ontario, Canada...................................................................................................................................516
90 Metal Plasma Immersion Ion Implantation & Deposition (MPIII&D) using a Newly Developed
Plasma Source
R. Wei, T. Booker, C. Rincon, and J. Arps, Southwest Research Institute, San Antonio, TX.................................523
91 High Performance Colorful PVD Coatings
P.Eh. Hovsepian, Sheffield Hallam University, Sheffield, United Kingdom; G.E. Gregory, CATRA, Sheffield,
United Kingdom; M. Fenker FEM, Schwäbisch Gmünd, Germany; P. Nicole Naja, La Chaux du Bombrief,
France; K. Schönhut, Titantec, Schwäbisch Gmünd, Germany; M. Spolding, Ibberson Ltd., Sheffield,
United Kingdom; N. Jackson and E. Ehiyazaryan, Cotelere Ltd., Sheffield, United Kingdom; and
W.-D. Münz, Eifeler Plasma Beschichtungs GmbH, Wien, Austria........................................................................528
92 A Dual Approach for PVD/PECVD Coatings Costs Reduction
H. Delorme, ExproHEF, Andrezieux-Boutheon, France; P. Maurin-Perrier, HEF R&D, Andrezieux-Boutheon,
France; and C. Fountain, HEF USA, Columbus, OH.............................................................................................534
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