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529 Pages·1979·15.85 MB·English
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Surface Contamination Genesis, Detection, and Control Volume 1 Surface Contamination Genesis, Detection, and Control Volume 1 Edited by K. L. Mittal IBM Corporation East Fishkill Facility Hopewell Junction, New York PLENUM PRESS . NEW YORK AND LONDON Library of Congress Cataloging in Publication Data Main entry under title: Surface contamination. Proceedings of a symposium on Surface Contamination: Its Genesis, Detection, and Control held at the fourth International Symposium on Contamination Con trol in Washington, D.C., on September 10-14,1978, sponsored by the Institute of Environmental Sciences and the International Committee of Contamination Control Societies Includes index. 1. Surface contamination-Congresses I. Mittal K. L., 1945- II. Interna- tional Symposium on Contamination Control, 4th, Washington, D.C., 1978. III. Institute of Environmental Sciences. IV. International Committee of Con tamination Control Societies. TA418.7.S8 620.1'129 79-15433 ISBN-13: 978-1-4684-3508-5 e-ISBN-13: 978-1-4684-3506-1 001: 10.1007/978-1-4684-3506-1 Proceedings of a Symposium on Surface Contamination: Its Genesis, Detection, and Control, held at the Fourth International Symposium on Contamination Control in Washington, D.C., on September 10-14, 1978, published in two volumes, of which this is volume one. ©1979 Plenum Press, New York A Division of Plenum Publishing Corporation 227 West 17th Street, New York, N.Y. 10011 Softcover reprint of the hardcover 1s t edition 1979 All rights reserved No part of this book may be reproduced, stored in a retrieval system, or transmitted, in any form or by any means electronic, mechanical, photocopying, microfilming, recording, or otherwise, without written permission from the Publisher Preface The present volume and its companion Volume 2 document the proceedings of the Symposium on Surface Contamination: Its Genesis, Detection and Control held in Washington, D.C., September 10-13, 1978. This Symposium was a part of the 4th International Symposium on Contamination Control held under the auspices of the International Committee of Contamination Control Societies, and the Institute of Environmental Sciences (U.S.A.) was the official host. The ubiquitous nature of surface contamination causes concern to everyone dealing with surfaces, and the world of surfaces is wide and open-ended. The technological areas where surface clean ing is of cardinal importance are too many and very diversified. To people working in areas such as adhesion, composites, adsorp tion, friction, lubrication, soldering,device fabrication, printed circuit boards, etc., surface contamination has always been a bete noire. In short, people dealing with surfaces are afflicted with molysmophobiat, and rightfully so. In the past, the subject of surface contamination had been discussed in various meetings, but this symposium was hailed as the most comprehensive symposium ever held on this important topic, as the technical program comprised 70 papers by more than 100 authors from 10 countries. The symposium was truly international in scope and spirits and was very well attended. The attendees represented a broad spectrum of backgrounds, interests, and pro fessional affiliations, but all had a common interest and concern about surface contamination and cleaning. This Symposium was organized with the following objectives in mind: to bring together scientists, technologists, and engineers tMolysmophobia means fear of dirt or contamination, from Mrs. Byrne's Dictionary of Unusual, Obscure, and Preposterous Words, University Books, Secaucus, N.J. 1974. v PREFACE interested in all aspects of surface contamination, to review and assess the current state of the knowledge, to provide a forum for exchange and cross-fertilization of ideas, and to define problem areas which need intensified efforts; the comments from the aud ience confirm that these objectives were definitely fulfilled. For example, there were brisk and enlightening - not exothermic - dis cussions and information exchanges between the presenters and the audience. It should be added that the purpose of a symposium is to present the state of the knowledge of the topic under consider ation, and this is best accomplished by inviting the leading workers to present overview papers covering topics of their special inter est; these should be complemented and augmented by original research papers. This is exactly what was done for this symposium as there were 20 invited overviews covering a wide range of sub topics within the purview of surface contamination. May it be added that there are three components of the subject of surface contamination: (i) cleaning of surfaces, (ii) characterization of the degree of surface cleanliness, and (iii) storage of clean sur faces or the kinetics of recontamination. All these components were covered in this symposium. The present proceedings volumes contain a total of 64 papers (some papers from the original program are not included for a variety of reasons, and a few papers which were not presented but are included) which were reviewed by at least two qualified re viewers, and most of these were modified and revised in light of the reviewers' comments before inclusion in these volumes. Only about half of these papers (unreviewed) in their abbreviated form (long abstract) were included in the document distributed to the registrants at the time of the meeting. So the present volumes contain a great deal more material. The papers included are in their full form and are divided into four sections as follows: General Papers; Cleaning of Surfaces; Surface Contamination Detec tion, Identification, Characterization, and Control; and Implica tions of Surface Contamination. Sections I & II are embodied in Volume 1, and Volume 2 contains Sections III & IV. Broadly speak ing, all kinds of surfaces (metal, oxide, ceramic, glass, alloy, polymer,and liquid) and contaminants (organic film, inorganic, particulate, microbial"and radioactive) are covered in these vol umes as the intent of the Symposium was to cover the topic of sur face contamination in general and broad terms rather than to con centrate on a particular surface/contamination combination. The topics covered include: sources, forms, and mechanism(s) of surface contamination; various techniques (including solvent, plasma, UV/ozone, chemical, mechanical, ion milling, and surface chemical) for cleaning surfaces; radioactive and microbial con tamination of surfaces; atomically-clean surfaces; preparation of clean mineral surfaces; particle adhesion; preparation of clean PREFACE ~i water surfaces; cleaning of polymeric surfaces; various techniques [including contact angle or wettability, evaporative rate analysis, indium adhesion test, surface potential difference, spectroscopy (Auger, ESCA, ISS, SIMS), ellipsometry, plasma chromatography, ion chromatography, and microfluorescence] for characterizing the degree of surface cleanliness; ionic contamination detection and charac terization; and implications of surface contamination. It should be added that the availability of sophisticated surface analytical tools has been a boon in the area of surface contamination and a series of papers deal with the utility of such techniques for monitoring and characterizing microamounts of sur face contaminants. The papers dealing with implications. of surface contamination cover topics ranging from microelectronics to the public health sector. In essence, these proceedings volumes present a very compre hensive coverage of the latest state of the knowledge relative to the important subject of surface contamination. A special feature of these volumes is the inclusion of 20 invited overviews which should provide a veritable gold mine of valuable information, and these overviews coupled with the 44 contributed research papers should serve as a vade ~ for anyone interested in surface con tamination and cleaning. It should be added that originally it was intended to include a Discussion at the end of each section, but in spite of the continuous exhortation, the number of questions re ceived in written form (although there was a brisk verbal discus sion at the end of each paper) did not warrant inclusion of written Discussions in these volumes. Acknowledgements: First of all, I am thankful to the manage ment of IBM Corporation for permitting me to organize this sympo sium and to edit these volumes. Particularly, I would like to acknowledge the understanding and patience of my manager, Dr. H. R. Anderson, Jr., during this activity. Special thanks are due to Mr. R. W. Martin for his help and cooperation during the various stages of putting together the technical program, to Mrs. Betty Peterson of the Institute of Environmental Sciences for her ready and willing help whenever it was needed. The reviewers should be thanked for their sacrifice of time and many valuable comments. The cooperation and enthusiasm of the authors is a must for any proceedings volume and I would like to thank them for their efforts and cooperation in submitting the manuscripts. Thanks are due to all the secretaries who helped with the correspondence typing. I am thankful to my wife, Usha, for letting me work late hours during the tenure of editing these volumes and also for helping with the subject index; to my daughter, Anita, and son, Rajesh, for letting me spend those hours which rightfully belonged to them. vili PREFACE Last, but not least, I would like to express my thanks to Mrs. Edith Oakley (Forbes Services) for meeting, without complaint, var ious deadlines for typing of the manuscripts. K. L. Mittal Symposium Organizer and Chairman IBM Corporation East Fishkill Facility Hopewell Junction, N.Y. 12533 Contents of Volume 1 PART I. GENERAL PAPERS Surface Contamination: An Overview . . . . . 3 K. L. Mittal Relationship Between Surface Energy and Surface Contamination . . . • 47 T. Matsunaga Investigation of the Interaction of Certain Low Energy Liquids with Polytetrafluoroethylene and Its Implications. in the Contamination of Polymeric Surfaces . . • . • . . • . . • 57 F. Galembeck, S. E. Galembeck, H. Vargas, C. A. Ribeiro, L. C. M. Miranda, and C. C. Ghizoni A Study of the Effects of Relative Humidity on Small Particle Adhesion to Surfaces 73 W. J. Whitfield Particulate Removal in Microelectronics Manufacturing • . • • .. •••••...• 83 D. A. Brandreth and R. E. Johnson, Jr. Electrostatic Effects in the Adhesion of Powder Layers 89 J. A. Cross Causes and Cures of Dirty Windows . . . • . • • • . . • .• 103 P. B. Adams Surface Contamination by Ion Bombardment 113 K. Shimizu and H. Kawakatsu ix x CONTENTS OF VOLUME 1 Surface Contamination and Corrosion in Pyrotechnic Actuators •• • . . • . • • 129 R. G. Jungst, R. K. Quinn, T. M. Massis, R. N. Roberts, and R. E. Whan Decomposition of Hydrogen Peroxide Cleaning Solutions by Selectively Plated Leadframes and Its Implications with Respect to Circuit Yield • • • • • • • • • • • 149 R. G. Fekula, W. J. Flood, and D. L. Rehrig Ellipsometric Observations of Aluminum Hydroxide Films Grown in Water Vapor . . • . . •• 165 W. E. J. Neal and A. S. Rehal Contamination on Zinc and Aluminum Surfaces After Extended Urban Exposures • . 183 G. B. Munier, L. A. Psota, B. T. Reagor, B. Russiello, and J. D. Sinclair 238pu02 Surface Contamination of Radioisotopic Heat Sources • • • • 195 D. R. Schaeffer and C. O. Brewer Microbial Contamination of Surfaces 211 J. W. Costerton and G. G. Geesey Surface Cleaning in Thin Film Technology 223 D. M. Mattox PART II. CLEANING OF SURFACES UV/'Ozone Cleaning of Surfaces: A Review •••• 235 J. R. Vig Plasma Cleaning of Surfaces 255 W. W. Balwanz Surface Contamination Removal from Solid State Devices by Dry Chemical Processing 271 H. B. Bonham and P. V. Plunkett Surface Cleaning by Low-Temperature Bombardment with Hydrogen Particles: An AES Investigation on Copper and Fe-Cr-Ni Steel Surfaces • . . . . 287 R. Bouwman, J. B. van Mechelen, and A. A. Holscher CONTENTS OF VOLUME 1 xi Some Promising Applications of Ion Milling in Surface Cleaning 297 S. I. Petvai and R. H. Schnitzel Glass Cleaning and Characterization of Cleanliness • • • •• 313 L. L. Hench and E. C. Ethridge A Systematic Approach to Glass Cleaning 327 P. B. Adams Techniques for Removing Contaminants from Optical Surfaces • • • • • • • • 341 I. F. Stowers and H. G. Patton Cleaning of Polymer Surfaces • • • 351 J. A. Koutsky Removal of Fluid Contaminants by Surface Chemical Displacement 359 R. N. Bolster Cleaning Issues Related to Soldering • • • • • • • • • • •• 369 H. H. Manko Nonionic Contamination Prevention -- The Next Step Toward Guaranteed Printed Wiring Assembly Reliability • • • • • • • • • 377 W. G. Kenyon Techniques for Removing Surface Contaminants in Thin Film Depositon • • • • • • 393 B. Bhushan Cleaning and Surface Preparation Technology and Other Factors Related to Coatings Produced by Flame Spraying • • • • • • 407 Y. A. Kharlamov, M. S. Hassan, and R. N. Anderson Contaminated Concrete Surface Layer Removal 443 J. M. Halter and R. G. Sullivan Preparation and Characterization of Clean Mineral Surfaces • • 457 P. Somasundaran and B.M. Moudgil The Preparation of Clean Water Surfaces for Fluid Mechanics • • • • • • • 477 J. C. Scott

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The present volume and its companion Volume 2 document the proceedings of the Symposium on Surface Contamination: Its Genesis, Detection and Control held in Washington, D.C., September 10-13, 1978. This Symposium was a part of the 4th International Symposium on Contamination Control held under the a
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