Surface Contamination and Cleaning: Volume 1

373 Pages·2003·26.019 MB·English

by  Kash L. Mittal

Surface Contamination
and Cleaning,
Volume 1
K.L. Mittal,
Editor
VSP
Surface Contamination and Cleaning, Volume 1
This page intentionally left blank
S
URFACE
C
ONTAMINATION
C
AND LEANING

VOLUME 1

Editor:
K.L. Mittal

UTRECHT (cid:1) BOSTON 2003
VSP BV Tel: [phone]
P.O. Box 346 Fax: [phone]
3700 AH Zeist [email protected]
The Netherlands www.vsppub.com

© VSP BV 2003

First published in 2003

ISBN 90-6764-376-9

All rights reserved. No part of this publication may be reproduced, stored in a retrieval
system, or transmitted in any form or by any means, electronic, mechanical, photocopy-
ing, recording or otherwise, without the prior permission of the copyright owner.

Printed in The Netherlands by Ridderprint bv, Ridderkerk
Contents

Preface vii
Mapping of surface contaminants by tunable infrared-laser imaging
D. Ottesen, S. Sickafoose, H. Johnsen, T. Kulp, K. Armstrong,
S. Allendorf and T. Hoffard 1
Monitoring cleanliness and defining acceptable cleanliness levels
M.K. Chawla 23
Tracking surface ionic contamination by ion chromatography
B. Newton 43
A new method using MESERAN technique for measuring surface
contamination after solvent extraction
M.G. Benkovich and J.L. Anderson 49
Methods for pharmaceutical cleaning validations
H.J. Kaiser 75
Influence of cleaning on the surface of model glasses and their
sensitivity to organic contamination
W. Birch, S. Mechken and A. Carré 85
Decontamination of sensitive equipment
R. Kaiser and K. Haraldsen 109
The fundamentals of no-chemistry process cleaning
J.B. Durkee II 129
Development of a technology for generation of ice particles
D.V. Shishkin, E.S. Geskin and B. Goldenberg 137
Cleaning with solid carbon dioxide pellet blasting
F.C. Young 151
Development of a generic procedure for modeling of waterjet
cleaning
K. Babets and E.S. Geskin 159
vi Contents
Experimental and numerical investigation of waterjet derusting
technology
K. Babets, E.S. Geskin and B. Goldenberg 173
Practical applications of icejet technology in surface processing
D.V. Shishkin, E.S. Geskin and B. Goldenberg 193
Correlating cleanliness to electrical performance
T. Munson 213
Qualifying a cleaning system for space flight printed wiring assemblies
J.K. “Kirk” Bonner and A. Mehta 225
Investigation of modified SC-1 solutions for silicon wafer cleaning
C. Beaudry and S. Verhaverbeke 241
Performance qualification of post-CMP cleaning equipment
in a semiconductor fabrication environment
M.T. Andreas 249
Spatial and temporal scales in wet processing of deep
submicrometer features
M. Olim 261
Microdenier fabrics for cleanroom wipers
J. Skoufis and D.W. Cooper 267
Fine particle detachment studied by reflectometry and atomic
force microscopy
A. Feiler and J. Ralston 279
Dust removal from solar panels and spacecraft on Mars
S. Trigwell, M.K. Mazumder, A.S. Biris, S. Anderson and C.U. Yurteri 293
Laser cleaning of silicon wafers: Prospects and problems
M. Mosbacher, V. Dobler, M. Bertsch, H.-J. Münzer, J. Boneberg and
P. Leiderer 311
Particle removal using resonant laser detachment
K. Kearney and P. Hammond 335
The future of industrial cleaning and related public policy-making
C. LeBlanc 345
Surface Contamination and Cleaning, Vol. 1, pp. vii–viii
Ed. K.L. Mittal
© VSP 2003
Preface
This volume chronicles the proceedings of the International Symposium on Sur-
fase Contamination and Cleaning held under the aegis of MST Conferences in
Newark, New Jersey, May 23–25, 2001.
Even a cursory look at the literature will evince that there has been tremendous
interest and R&D activity in the arena of surface contamination and cleaning, so
we decided to organize this symposium. Because of the importance of this topic
in many technological areas, tremendous efforts have been devoted to devise
novel and more efficient ways to monitor, analyse and characterize contamination
on surfaces as well as ways to remove such contamination from a wide variety of
surfaces.
The ubiquitous nature of surface contamination causes concern to everyone
dealing with surfaces, and the world of surfaces is wide and open-ended. A con-
taminant is defined as “unwanted matter or energy” or “material or energy in the
wrong place”. Also contaminants can by broadly classified as: film-type, particu-
lates; ionic, and biological or microbial. The technological areas where surface
contamination has always been a bete noire and thus surface cleaning is of cardi-
nal importance are too many and range from aerospace to microelectronics to
biomedical. Here a few eclectic examples will suffice to underscore the impor-
tance of surface contamination and cleaning. In the world of ever-shrinking de-
vice dimensions in the microelectronics, the need to remove ever smaller particles
(of nanosize dimension) is quite patent. On the other hand, film-type (organic)
contamination is of crucial importance in the area of adhesive bonding, as even a
very thin layer of contamination can be very detrimental in attaining good bond
strength. In operation theaters, the concern about microbial contamination is all
too obvious. So in light of the great concern about surface contamination, people
dealing with surfaces are rightfully afflicted with molysmophobia.*
The technical program for this symposium comprised 45 papers dealing with
all kinds of contaminations on a host of surfaces, and many ramifications of sur-
face contamination and cleaning were addressed. There were brisk and illuminat-
ing (not exothermic) discussions, both formally and informally, throughout the
symposium. Also if comments from the participants are a barometer for the suc-
cess of a symposium then this event was quite successful.
Now coming to this volume, it contains a total of 24 papers (others are not in-
cluded for a variety of reasons). It must be recorded that all manuscripts were rig-
orously peer reviewed and suitably revised (some twice or thrice) before inclusion
in this volume. So this volume is not a mere collection of unreviewed papers −
viii Preface
which is generally the case with many symposia proceedings − rather it reflects
information which has passed peer scrutiny. The topics covered include: mapping
of surface contaminants; various techniques for cleaning surfaces; various tech-
niques for monitoring level of cleanliness; acceptable cleanliness levels, ionic
contamination; pharmaceutical cleaning validations; cleaning of glass surfaces;
decontamination of sensitive equipment; no-chemistry process cleaning; waterjet
cleaning; cleaning with solid carbon dioxide pellet blasting; cleanroom wipers;
dust removal from solar panels and spacecraft on Mars; laser cleaning of silicon
surfaces; particle removal; implications of surface contamination and cleaning;
and future of industrial cleaning and related public policy-making.
I sincerely hope that this volume addressing many aspects and recent develop-
ments in the domain of surface contamination and cleaning will be of interest to a
wide range of people working in many different industries.
Acknowledgements
It is always a pleasure to write this particular segment of a book as it offers the
opportunity to thank those who helped in many ways. First, my sincere thanks are
extended to my colleague and friend, Dr. Robert H. Lacombe, for taking care of
the organizational aspects of this symposium. The comments from the peers are a
sine qua non to maintain the highest standard of a publication, so I am most ap-
preciative of the time and efforts of the unsung heroes (reviewers) in providing
many valuable comments. I am profusely thankful to the authors for their interest,
enthusiasm and contribution without which this book would not have seen the
light of day. In closing, my thanks go to the staff of VSP (publisher) for giving
this book a body form.

K.L. Mittal
P.O. Box 1280
Hopewell Jct., NY 12533

*Molysmophobia means fear of dirt or contamination, from Mrs. Byrne’s Dictionary of Unusual,
Obscure, and Preposterous Words, University Books, Secaucus, NJ (1974).
Surface Contamination and Cleaning, Vol. 1, pp. 1–22
Ed. K.L. Mittal
© VSP 2003
Mapping of surface contaminants by tunable
infrared-laser imaging
∗
DAVID OTTESEN, SHANE SICKAFOOSE, HOWARD JOHNSEN,
TOM KULP, KARLA ARMSTRONG, SARAH ALLENDORF and
1
THERESA HOFFARD
Sandia National Laboratories, P.O. Box 969, MS 9403, Livermore, CA 94551-0969
1Naval Facilities Engineering Service Center, 1100 23rd Avenue, Port Hueneme, CA 93043-4370
Abstract—We report the development of a new, real-time non-contacting monitor for cleanliness
verification based on tunable infrared-laser methods. New analytical capabilities are required to
maximize the efficiency of cleaning operations at a variety of federal (Department of Defense
[DoD] and Department of Energy [DOE]) and industrial facilities. These methods will lead to a re-
duction in the generation of waste streams while improving the quality of subsequent processes and
the long-term reliability of manufactured, repaired or refurbished parts.
We have demonstrated the feasibility of tunable infrared-laser imaging for the detection of con-
taminant residues common to DoD and DOE components. The approach relies on the technique of
infrared reflection spectroscopy for the detection of residues.
An optical interface for the laser-imaging method was constructed, and a series of test surfaces
was prepared with known amounts of contaminants. Independent calibration of the laser reflectance
images was performed with Fourier transform infrared (FTIR) spectroscopy. The performance of
both optical techniques was evaluated as a function of several variables, including the amount of
contaminant, surface roughness of the panel, and the presence of possible interfering species (such
as water). FTIR spectra demonstrated that a water film up to 7 µm thick would not interfere with the
effectiveness of the laser-imaging instrument. The instrumental detection limit for the laser reflec-
tance imager was determined to be on the order of a 10-20 nm thick film of a general hydrocarbon
contaminant.
Keywords: Infrared; tunable-laser; imaging; cleaning; surface contamination.
1. INTRODUCTION
Real-time techniques to provide both qualitative and quantitative assessments of
surface cleanliness are needed for a wide variety of governmental and industrial
applications. The range of potential applications include aircraft, shipboard, vehi-
cle, and weapon component surfaces to be coated, plated, or bonded. The avail-

∗To whom all correspondence should be addressed. Phone: [phone],
Fax: [phone], E-mail: [email protected]