Table Of Content

Scanning Probe Lithography The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this versatile and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high- resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials. • Introduces historical background of SPL, including evolution of the technique and tools • E xplains the mechanism of sample modif cation/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied • S hows the different types of devices and structures fabricated by SPL, together with the processing steps • C ontains a complete and state-of-the art package of examples and different approaches, performed by different international research groups • S ummarizes strengths, limitations, and potential of SPL T his book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes. Emerging Materials and Technologies Series Editor: Boris I. Kharissov The E merging Materials and Technologies series is devoted to highlighting publica- tions centered on emerging advanced materials and novel technologies. Attention is paid to those newly discovered or applied materials with potential to solve pressing societal problems and improve quality of life, corresponding to environmental pro- tection, medicine, communications, energy, transportation, advanced manufacturing, and related areas. T he series takes into account that, under present strong demands for energy, material, and cost savings, as well as heavy contamination problems and worldwide pandemic conditions, the area of emerging materials and related scalable technologies is a highly interdisciplinary f eld, with the need for researchers, professionals, and academics across the spectrum of engineering and technological disciplines. The main objective of this book series is to attract more attention to these materials and technologies and invite conversation among the international R&D community. Scanning Probe Lithography Fundamentals, Materials, and Applications Yu Kyoung Ryu and Javier Martinez Rodrigo Engineered Nanoparticles as Drug Delivery Systems N ahid Rehman and Anjana Pandey M Xene Filled Polymer Nanocomposites E dited by Soney C George, Sharika T. Nair and Joice Sophia Ponraj Polymeric Biomaterials F abrication, Properties and Applications E dited by Pooja Agarwal, Divya Bajpai Tripathy, Anjali Gupta and Bijoy Kumar Kuanr I nnovations in Green Nanoscience and Nanotechnology S ynthesis, Characterization, and Applications E dited by Shrikaant Kulkarni S ustainable Nanomaterials for the Construction Industry G hasan Fahim Huseien and Kwok Wei Shah 4 D Imaging to 4D Printing Biomedical Applications E dited by Rupinder Singh F or more information about this series, please visit: w ww.routledge.com/Emerging- Materials-and-Technologies/book-series/CRCEMT Scanning Probe Lithography Fundamentals, Materials, and Applications Yu Kyoung Ryu and Javier Martinez Rodrigo Boca Raton London New York CRC Press is an imprint of the Taylor & Francis Group, an informa business MATLAB® is a trademark of The MathWorks, Inc. and is used with permission. The MathWorks does not warrant the accuracy of the text or exercises in this book. This book’s use or discussion of MATLAB® software or related products does not constitute endorsement or sponsorship by The MathWorks of a particular pedagogical approach or particular use of the MATLAB® software. First edition published 2023 by CRC Press 6000 Broken Sound Parkway NW, Suite 300, Boca Raton, FL 33487–2742 and by CRC Press 4 Park Square, Milton Park, Abingdon, Oxon, OX14 4RN CRC Press is an imprint of Taylor & Francis Group, LLC © 2023 Yu Kyoung Ryu and Javier Martinez Rodrigo Reasonable efforts have been made to publish reliable data and information, but the author and publisher cannot assume responsibility for the validity of all materials or the consequences of their use. The authors and publishers have attempted to trace the copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to publish in this form has not been obtained. If any copyright material has not been acknowledged please write and let us know so we may rectify in any future reprint. E xcept as permitted under U.S. Copyright Law, no part of this book may be reprinted, reproduced, transmitted, or utilized in any form by any electronic, mechanical, or other means, now known or hereafter invented, including photocopying, microf lming, and recording, or in any information storage or retrieval system, without written permission from the publishers. For permission to photocopy or use material electronically from this work, access w ww. copyright.com or contact the Copyright Clearance Center, Inc. (CCC), 222 Rosewood Drive, Danvers, MA 01923, 978–750–8400. For works that are not available on CCC please contact [email protected] T rademark notice : Product or corporate names may be trademarks or registered trademarks and are used only for identif cation and explanation without intent to infringe. ISBN: 978-1-032-12214-4 (hbk) I SBN: 978-1-032-12215-1 (pbk) I SBN: 978-1-003-22361-0 (ebk) DOI: 10.1201/9781003223610 T ypeset in Times b y Apex CoVantage, LLC Dedication Yu Kyoung Ryu “That’s what all we are: amateurs. We don’t live long enough to be anything else.” Charlie Chaplin To my mother and Víctor To Ricardo and Armin, my mentors in SPL J avier Martinez Rodrigo T o my mother Aurora, to my sister Aurori and to my father Alfonso Contents Acknowledgements ...................................................................................................xi Author Biographies ................................................................................................ xiii Acronyms .................................................................................................................xv Chapter 1 Historical Background and Place in the Lithography Roadmap ...............................................................................................1 1.1. Introduction to Nanolithography by AFM ................................1 1.2. Historical Background ...............................................................2 1.3. AFM: The Most Versatile Tool at the Nanoscale ......................5 1.4. Book Scheme .............................................................................6 Chapter References. ..............................................................................7 Chapter 2 Basic Concepts and Modalities ............................................................9 2.1. The Tool: An Atomic Force Microscope ...................................9 2.2. An Atomic Force Microscope for Lithography ....................... 11 2.3. Preparing a Scanning Probe Lithography Experiment ..............................................................................12 2.4. “How to Name the Technique?” ..............................................13 Chapter References. ............................................................................13 Chapter 3 Mechanical Scanning Probe Lithography ..........................................15 3.1. Fundamentals .......................................................................... 15 3.2. Parameters for the Lithographic Process. ................................ 16 3.3. Manipulation of Nano-Objects ................................................18 3.4. Cleaning of 2D Materials Post-Processing ..............................20 3.5. Applications and Proof of Concepts ........................................22 3.5.1. Lift-Off and Pattern Transfer Processes ....................22 3.5.2. Templates ....................................................................22 3.5.3. Charge Modulation in Quantum Devices. ..................24 3.5.4. 2D Materials Based Devices and Patterns .................25 3.5.5. Other Proof-of-Concept Devices and Nanostructures .....................................................26 Chapter References. ............................................................................27 Chapter 4 Dip Pen Nanolithography ...................................................................33 4.1. Fundamentals .......................................................................... 33 4.1.1. Type of Inks ................................................................ 33 4.1.2. Material Transport Models .........................................34 vii viii Contents ( a) Molecular Diffusion in the Case of Diffusive Inks ................................................34 ( b) Mass Fluid Flow in the Case of Liquid Inks .........................................................34 4.1.3. Derivatives of Dip Pen Nanolithography Method ....................................................................... 35 4.1.4. Developments on the Tool ..........................................35 4.2. Parameters for the Lithographic Process. ................................36 4.2.1. Tip ..............................................................................36 4.2.2. Surface ........................................................................37 4.2.3. Ink ..............................................................................38 4.2.4. Writing Conditions .....................................................38 4.3. Electrochemical and Thermal Dip Pen Nanolithography ...................................................................... 39 4.4. Applications .............................................................................40 4.4.1. Etching Masks and Chemical Templates ................... 41 4.4.2. Biomolecular or Organic Molecule Patterns ..............43 4.4.3. Inorganic Patterns ......................................................44 Chapter References. ............................................................................46 Chapter 5 Field Emission Scanning Probe Lithography ..................................... 53 5.1. Fundamentals .......................................................................... 53 5.2. Parameters for the Lithographic Process. ................................ 53 5.3. Towards Single-Digit Nanometer Lithography ....................... 55 5.4. Other Processes Driven by fe-SPL ..........................................58 Chapter References. ............................................................................59 Chapter 6 Oxidation Scanning Probe Lithography ............................................. 61 6.1. Fundamentals .......................................................................... 61 6.1.1. Oxide Growth Kinetics ..............................................63 6.1.2. Composition of the Oxides Fabricated by o-SPL .....................................................................63 6.1.3. Growth of Oxides over and under the Substrate Surface ........................................................64 6.2. Parameters for the Lithographic Process. ................................65 6.3. Tunability of o-SPL Processes: Polarity and Atmosphere .............................................................................. 67 6.4. Applications and Proof of Concepts ........................................68 6.4.1. Lift-Off and Pattern Transfer Processes ....................68 6.4.2. Templates ....................................................................68 6.4.3. Barriers for Quantum Devices ................................... 71 6.4.4. Control over Metallic/Insulating State Transitions ..................................................................72 6.4.5. 2D Materials Based Devices and Patterns .................73 Contents ix 6.4.6. Other Proof-of-Concept Devices and Nanostructures ........................................................... 73 Chapter References. ............................................................................75 Chapter 7 Thermal Scanning Probe Lithography ...............................................85 7.1. Fundamentals and Components of the Tool ............................85 7.2. From the Millipede to the NanoFrazor ...................................85 7.2.1. The Cantilever ............................................................86 7.2.2. The Tool and the Technique .......................................86 7.2.3. The Resist ...................................................................87 7.2.4. Markless Lithography ................................................88 7.3. Parameters for the Lithographic Process. ................................89 7.4. Applications and Proof of Concepts ........................................90 7.4.1. Lift-Off and Pattern Transfer Processes ....................90 7.4.2. Etching Masks and Templates ....................................90 7.4.3. Three-Dimensional Structures ...................................93 7 .4.4. 2D Materials ...............................................................95 7.4.5. Physical and Chemical Conversion ............................96 Chapter References. ............................................................................97 Chapter 8 Lithography Using a Scanning Tunneling Microscope .................... 103 8.1. Fundamentals and Parameters ............................................... 103 8.2. Manipulation of Atoms and Molecules ................................. 104 8.2.1. Parallel Processes .....................................................104 8.2.2. Perpendicular Processes ........................................... 106 8.2.3. Hydrogen Depassivation Lithography and Atomically Precise Manufacturing ................... 107 8.3. Scanning Proximal Probe Lithography ................................. 110 Chapter References. ..........................................................................110 Chapter 9 High-Throughput Strategies ............................................................. 115 9.1. Array of Cantilevers .............................................................. 115 9.2. Soft/Hard Stamps .................................................................. 116 9.3. Mix and Match Lithography ..................................................120 Chapter References. ..........................................................................120 Index ...................................................................................................................... 125