Optical and Electrical Properties of Nanoscale Materials

503 Pages·2022·15.45 MB·english

by  Alain Diebold

Springer Series in Materials Science 318
Alain Diebold
Tino Hofmann
Optical and
Electrical
Properties
of Nanoscale
Materials
Springer Series in Materials Science
Volume 318
SeriesEditors
RobertHull,CenterforMaterials,Devices,andIntegratedSystems,Rensselaer
PolytechnicInstitute,Troy,NY,USA
ChennupatiJagadish,ResearchSchoolofPhysicsandEngineering,Australian
NationalUniversity,Canberra,ACT,Australia
YoshiyukiKawazoe,CenterforComputationalMaterials,TohokuUniversity,
Sendai,Japan
JamieKruzic,SchoolofMechanical&ManufacturingEngineering,
UNSWSydney,Sydney,NSW,Australia
RichardM.Osgood,DepartmentofElectricalEngineering,ColumbiaUniversity,
NewYork,USA
JürgenParisi,UniversitätOldenburg,Oldenburg,Germany
UdoW.Pohl,InstituteofSolidStatePhysics,TechnicalUniversityofBerlin,
Berlin,Germany
Tae-YeonSeong,DepartmentofMaterialsScience&Engineering,
KoreaUniversity,Seoul,Korea(Republicof)
Shin-ichiUchida,ElectronicsandManufacturing,NationalInstituteofAdvanced
IndustrialScienceandTechnology,Tsukuba,Ibaraki,Japan
ZhimingM.Wang,InstituteofFundamentalandFrontierSciences-Electronic,
UniversityofElectronicScienceandTechnologyofChina,Chengdu,China
TheSpringerSeriesinMaterialsSciencecoversthecompletespectrumofmaterials
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·
Alain Diebold Tino Hofmann
Optical and Electrical
Properties of Nanoscale
Materials
AlainDiebold TinoHofmann
SUNYPolytechnicInstitute DepartmentofPhysicsandOpticalScience
Albany,NY,USA UniversityofNorthCarolinaatCharlotte
Charlotte,NC,USA
ISSN0933-033X ISSN2196-2812 (electronic)
SpringerSeriesinMaterialsScience
ISBN978-3-030-80322-3 ISBN978-3-030-80323-0 (eBook)
https://doi.org/10.1007/978-3-030-80323-0
©SpringerNatureSwitzerlandAG2021
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TomylovingwifeAnnalisa,andour
wonderfulandinquisitivechildrenLauraand
GregoryandsoninlawAustin.
AlainDiebold
TomyparentsRosietaandEberhardandmy
wonderfulwifeJulianeandour
curiouschildrenAnnelieseandOswin.
TinoHofmann
Preface
Thewritingofthisbookisanendeavourofloveforthesubject.Oneofthegoalsof
thisbookistoprovidetheellipsometryandopticalphysicscommunityanoverviewof
2Dmaterialsphysics.Onemightsaythatthephysicscommunityworkontopological
materials speaks a different language from the materials science community. This
bookprovides anintroductiontoboththephysics of2Dmaterialsandtopological
physicsaimedatthematerialssciencecommunitywhoseresearchisintheareaof
opticalcharacterizationofmaterials.
Itisclearfromteachingopticalphysicsatthegraduatelevelthatthereisaneed
forprovidingadvancedundergraduateandintroductorygraduatestudentswithatext
on optical physics. It is also clear that many students can be described as “math
allergic”.Inordertoaddressthatneed,thisbookprovidesadditionaldetailsabout
derivations.
ACD and TH both gratefully acknowledge the expert and professional artwork
of Yangzi Isabel Tian. Isabel endured roughly two years of weekly reviews of the
figuresandchapters.Herworkbringsthetexttolife.Manyofthefigureshavebeen
adaptedforuseinthisbook.
Aswithmostbooks,anumberofpeopleprovidedcriticalassistancethatmadethis
bookpossible.WethankZachEvensonwhoisoureditoratSpringer.Hehaspatiently
workedthroughthecountlessissuesassociatedwiththeauthorshipandpublication.
WealsothankRobertHullofRPIwhoverykindlyputusincontactwithZachmaking
the book possible. ACD very gratefully acknowledges many discussions with Ed
Seebauer whose guidance greatly influenced not only the text but the philosophy
behind it. We note that Paul van der Heide and Brennan Peterson provided many
usefulcommentsformostofthechaptersofthebook.
We note the following read specific chapters and provided detailed review and
commentaryasfollows:
Chapter 1. Gerald Jellison very kindly provided detailed edits and suggestions.
TonyHeinzfordiscussionsaboutcharacterizingnanoscalethickfilms.
Chapter3.StefanSchöcheforhelpwiththeopticalpathofellipsometers.
Chapters 4 and 5. Edmund Seebauer very kindly provided detailed edits and
suggestions.
vii
viii Preface
Chapter 6. Ji Ung Lee for several critically important comments including the
needforthetheorybehindtheintegerquantumHalleffectfora2Delectrongas
toexplainthe1partin109uncertainty.
Chapter9.Shun-QingShenfordiscussionsaboutThoules,Kohmoto,Nightingale,
anddenNijsquantization;ShiyuanLiufordiscussionsaboutZrTe ;AnaAkrap
5
for discussions about ZrTe and Cd As ; and Ken Burch for comments on the
5 2 3
opticalcharacterizationoftetradymites,especiallyBi Se .
2 3
AppendixC.EmilioCobaneraformanydiscussionsabouttopologicalclassifica-
tionandthetopologicalperiodictableandEyalCornfeldforguidanceoninter-
pretingthetopologicalclassificationandtopologicalperiodictablethatincludes
spatialsymmetry.
Others have knowingly or unknowingly provided inspiration that also deserves
recognition.Overthepastseveraldecades,theellipsometrycommunityhasheldone
ofthemostenjoyableandscientificallyusefulconferences:theInternationalConfer-
enceonSpectroscopicEllipsometry(ICSE).DiscussionsatICSE8aboutnanoscale
materialsprovidedconsiderableinspiration.ICSE8washeldinBarcelonain2019
andwaschairedbyM.IsabelAlonso.OriolArteagaandMiquelGarrigawerethe
otherkeyorganizers.ShiyuanLiu’sinvitedtalkanddiscussionsclearlypointedout
thechallengesassociatedwithdeterminingtheopticalpropertiesofanisotropictopo-
logical materials such as zirconium pentatelluride. ACD acknowledges the great
fortuneofbeinginvitedtopresentatICSE5inStockholm,Sweden.Thistripprovided
anintroductiontotheellipsometrycommunity.Atthattime,DaveAspnesandJay
Jellisonwerekindenoughtodiscussthetopicsthatbecameinspiration.Bothofthem
aresoenthusiasticthatonecannothelpbutfollowtheirlead.Iwillneverforgetthe
time Dave derived a useful electromagnetic expression at an AVS meeting on the
backofanapkinforACD.WealsoacknowledgecountlessdiscussionswithStefan
Zollner. The generous guidance of John Woollam and his company are specially
mentioned as both inspiration and assistance. James Hilfiker, Tom Tiwald, Gerry
Cooney,BlaineJohsandHarlandTompkinshavebeensogenerouswiththeirtime
overthepastcountlessyears.WealsoacknowledgethoseatWoollamwhohelpkeep
the equipment operational including Mark Brayton. The many scientists at NIST
includingDaveSeilerneedspecialacknowledgement.
ACD acknowledges the students also provided insight into the challenges of
teaching optical physics through their questions and comments. Vimal Kamineni,
ManasaMedikonda,RajaMuthinti,FlorenceNelson,LayWaiKong,DhairyaDixit,
SamO’Mullane,AveryGreenandMadhulikaKordealltooktheopticalphysicsclass
thatevolvedintothistext.VimalKaminenidesignedandbuiltaphotoluminescence
system. The experience of mentoring undergraduate student Colin Wadsworth in
ellipsometryandscatterometryhasbeenveryuseful.GertLeusink’sgroupatTEL
TechnologyCenterAmericadeservesspecialacknowledgementforfundingresearch
that included optical characterization of high k dielectrical films such as hafnium
zirconiumoxides.HisgroupincludingSteveConsiglio,DinaTriyoso,KandaTapily
andRobClarkprovidedthestudentswithmaterialsthatareessentialtothesemicon-
ductorindustry.WealsoacknowledgeTomAdamsandAlexReznicekwhoprovided
Preface ix
nanoscalefilmsofSi1−xGex alloysforopticalcharacterization.Thegrouppostdocs
especiallyEricBerchandSonalDeyalsoprovidedthesestudentspracticalexamples
oftheapplicationofellipsometryandcriticalmentoring.
Theauthorsalsohopethatthebookwillbeusefultothematerialssciencecommu-
nitythatusesellipsometry,photoluminescenceandRamanspectroscopy.Thebook
is intended to address the need for increased communication between the users of
thesemethods,thecommunityofpractitionersandthephysicscommunity.
Theauthorsalsorecognizethatmanytopicscannotbecoveredinthisintroductory
text especially the mathematical foundations of topological physics. These topics
mightbeausefuladditiontoasecondeditionofthisbook.
Niskayuna,NY,USA AlainDiebold
Charlotte,NC,USA TinoHofmann
Acknowledgements
YangziIsabelTianforalltheartworkincludingtheadaptationofpublishedfigures.
ZachEvensonforeditingandguidingusthroughthepublicationprocess.
RobertHullforconnectingustoSpringer.
General comments on the book—Paul van der Heide and Brennan
Peterson.ReviewofthePreface—HowardHuff.
Chapter1.GeraldJellison.
Chapters4and5.EdmundSeebauer.
Chapter6.JiUngLeeforseveralcriticallyimportantcommentsincludingtheneed
forthetheorybehindtheIQHEfora2DEGtoexplainthe1partin109uncertainty.
Shun-QingShenfordiscussionsaboutTKNNquantization.
Chapter9.AnaAkrap(ZrTe andCd As ),EmilioCobanera(topologicalclas-
5 2 3
sificationandperiodictable),EyalCornfeld(topologicalclassificationandperiodic
table),KenBurch(tetradymites).
Niskayuna,NY,USA AlainDiebold
Charlotte,NC,USA TinoHofmann
xi