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Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 1995: Vol 102 Table of Contents PDF

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Preview Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 1995: Vol 102 Table of Contents

NH Nuclear Instruments and Methods in Physics Research B 102 (1995) xiii-xv ED NUM B sic Beam Interactions with Materials & Atoms ELSEVIER Contents NS 6 sk i ow eo oe ee Sk ach 0-0 ok oe ae a ee & Oe 6 oe 6 oa OR Vii ey ID Ss6 5a 6 ce wS S640 bs 00-0 eed 04 eR ewe 68 ENO Oe ee Ot Vili ati hd hae d be Ub Oe eee ee ek be Oa O46 we Ow Oa e 6 Oo 6 ebb eee ee eee eds ix Section I. Interatomic potentials and theoretical methods A multisite interaction expansion of the total energy in metals es SN DOE 6.6 o.0 9-460 6's 6.4 0b Oo Eee ee ee iS 08 8 eds 6640s reese l Comparison of channeling trajectories and ranges calculated by the continuum potential approximation and Crystal-TRIM a a a a a a ake he il a Ge ere w o Ole Oe ecene wle-ece 3 An improved molecular dynamics scheme for ion bombardment simulations L.A. Marqués, J.E. Rubio, M. Jarafiz, L. Enriquez and J. Barbolla.................00005.- 7 The influence of impurity trapping on formation and growth of defect clusters in irradiated materials ee EDS, on 6 6 4.66 66-04.0 BS oh OOo 0.0604 004 40664 OTR OOS Ee ORES 12 Relocation cross-sections in silicon: theoretical models M.J. Caturia, V. Konoplev, I. Abril and A. Gras-Martl . 0... cc ccc ccc ccc eee e sevens 19 Acceleration of binary collision simulations in crystalline targets using critical angles for ion channeling ee Ts CII 6.b o ac OS oe bbs 0:8 053-0 Oo Soin eS OO 0 8 86 Oe oe OO OO 24 Ab initio pseudopotential calculations of point defects and boron impurity in silicon Jing Zhu, L.H. Yang, C. Mailhiot, T. Diaz de la Rubia and G.H. Gilmer ................4.. 29 Escape probabilities for electrons emitted during the interaction of slow highly charged ions with metal surfaces C. Lemell, HP. Winter, F. Aumayr, J. Burgd6rfer and C. Reinhold. .................205. 33 Section II. Displacement cascades and radiation effects in metals Computer simulation of defect production by displacement cascades in metals D.J. Bacon, A.F. Calder, F. Gao, V.G. Kapinos and S.J. Wooding ........00. e.e e5ee. e ee 37 Simulating the production of free defects in irradiated metals i hs 46 6 ies ss 06 OOS ANON OS +E Re SWE EH OE were KARR OR OD OOK eRe SES 47 Surface effects on damage production during ion bombardment: a molecular dynamics study ve. Goeey, TR.. AAVOURGR GE T. CURE GO TR RED 2 ccc ccc cc cc creer cece vesece 51 Molecular Dynamics Simulations of displacement cascades in metallic systems et 66 cee bee hee ee ERD SPORE CON we ee OE ee wee eee Eee. 58 The correlation of defect distribution in collisional phase with measured cascade collapse probability K. Morishita, H.L. Heinisch, S. Ishino and N. Sekimura ...... 6... 000. eee eee eee ees 67 Phase evolution under irradiation: Monte Carlo and mean-field modelings P. Bellon, Y. Grandjean, M. Przybylowicz, F. Soisson and G. Martin .........00. ee0e 0ee e 72 Collision cascades in Zr,Fe, Zr,Fe and ZrFe, L.M. Howe, D. Phillips, H.H. Plattner and J.D. Bonnett... 2... 0... 6 eee ee ee ee ee es 77 Computer simulations of disordering and amorphization kinetics in intermetallic compounds M. Spaczér, A. Caro, M. Victoria and T. Diaz de la Rubia... . 2.1... ee ee ee ee ee ee es 81 Momentum in atomic collision cascades eee WU I, IES cc ccc creer ener eee rece srecceereeseess 86 0168-/5958 /3$09X.5 0 © 1995 Elsevier Science B.V. All rights reserved XIV Contents Cascade statistics in the binary collision approximation and in full molecular dynamics 93 aE ae ae eae eee ae oe a a Radiation cleansing of vacancies 103 ee ee eas toe be ee eso Ob 6 0 06 oes 0 ee eres eer Simulation of plastic deformation of small iron and copper single crystals 107 ESET OP Oe ee Te eee EES Ca COREE ELAELE ELECT CTT eee The effect of neutron energy on defect production in alumina 113 Sa ae a a eee eS eo Oe 6 Owe wee eece a ec bae' Simulation of radiation induced structural transformation in glassy metals ce 8 F eS FPP ee eee eee ee LeeLee eee ere eee 119 Impact of glissile interstitial loop production in cascades on void ordering and swelling saturation under irradiation ee ee ce ee ee on oe tae ee ae a et 125 Increasing the retained dose by plasma immersion ion implantation and . deposition A. Anders, S. Anders, 1.G. Brown and K.M. Yu 132 oo 2 © eee e-a6. 6.06 8-6 ¢;6.-6:6 6b & Oo @ 6 4 & -¢-e sO 2S Dynamic Monte Carlo simulation for ion beam mixing H.J. Kang, S.C. Lee, S.M. Jung, I.S. Choi and C.N. Whang 136 2. = ee 2 ee ee .e.8 8 6a 6 6 86 © 8 a 8 'ao @ & & CASSIS — a new Monte-Carlo computer program for channeling simulation of RBS, NRA and PIXE 141 An investigation of collision propagation in energetic ion initiated cascades in copper I.R. Chakarov, R.P. Webb, R. Smith and K. Beardmore 145 2 ee @. 8 8.9 te 8 88 6 8 2 8 8.68 6 46484 68 4 2 Numerical analysis of stress effects on Frank loop evolution during irradiation in austenitic Fe-—Cr—Ni alloy Be, PE, We MPR CUED wo cece cree etree cdeseersveesseesesces 151 A new model of vacancy loop nucleation in irradiated metals poe PPT STURT LE CLE CLEL ULE LULA eT e Teer 156 Section III. Radiation effects in semiconductors Challenges for predictive process simulation in sub 0.1 jm silicon devices FE Pe GE Ps GES 6c oem eee hese eeEse ee reseee ss resecsceresereces 160 Dynamic simulation of damage accumulation during implantation of BF] molecular ions into crystalline silicon ce eet ae ee aa a ee ie eh eRe id eee ele ed a ee be elkelc bie Modeling of ion implantation in single-crystal silicon A.F. Tasch, S.-H. Yang and S.J. Morris Defects from implantation in silicon by linked Marlowe—molecular dynamics calculations M. Jaraiz, G.H. Gilmer, D.M. Stock and T. Diaz de la Rubia an eae -— we oe Se Ce Se eo Sees 6 OS oe eae eo @ « Round robin computer simulation of ion transmission through crystalline layers K. Gartner, D. Stock, B. Weber, G. Betz, M. Hautala, G. Hobler, M. Hou, S. Sarite, W. Eckstein, J.J. Jiménez-Rodriguez, A.M.C. Pérez-Martin, E.P. Andribet, V. Konoplev, A. Gras-Marti, M. Posselt, M.H. Shapiro, T.A. Tombrello, H.M. Urbassek, H. Hensel, Y. Yamamura and W. Takeuchi Process simulation challenges for ULSI devices: a users perspective M.I. Current, R. Mathur, M. Kump and L.A. Larson .......2. eee. c.ece2 e2e e.ecc0ee s Modelling of amorphous zones in semiconductors by using the randomization-and-relaxation method ey a I ED og cc knw bab 660 6606006 66806006068666 0~e Point defect accumulation in silicon irradiated by energetic particles: A molecular dynamics simulation D.M. Stock, G.H. Gilmer, M. Jaraiz and T. Diaz de la Rubia ......................044. A molecular dynamics study of energetic particle impacts on carbon and silicon R. Smith, K. Beardmore, A. Gras-Marti, R. Kirchner and R.P. Webb .................... Molecular dynamics simulations of implantation damage and recovery in semiconductors M. Sayed, J.H. Jefferson, A.B. Walker and A.G. Cullis Contents lon bombardment of polyethylene I a eeoe a ale o e wig ele oe ee ehi le a bE Low energy ion implantation simulation using a modified binary collision approximation code J. Arias, M. Jaraiz, L. Pelaz, L.A. Bail6n and J. Barbolla..... 0.0.0ee.e ee. ee e.e ee eee Computer simulation of atomic displacements in Si, GaAs, and AlAs M. Sayed, J.H. Jefferson, A.B. Walker and A.G. Cullis... 2... 0... eee eee eee eee ees Comparison of BC and MD simulations of low-energy ion implantation PEST EET ECE CLT CO CUO E RECUR CL Improved efficiency in Monte Carlo simulation of ion implanted impurity profiles in single-crystal materials es: CU Se Oy I EO, WEIN 6 SbF K eS KON ee score eee ese ee beeen Diffusion and interactions of point defects in silicon: molecular dynamics simulations G.H. Gilmer, T. Diaz de la Rubia, D.M. Stock and M. Jaraiz .. 2... ee ee ee ee eee 247 Computer simulation of mechanisms of the SIMOX process ee a 6e Ok 60 6 oo Aw Owe 8 6046686 66.004 066 He OKO R NOOO OOOO 256 Section IV. Sputtering and surface processes Preferential sputtering of alloys: a molecular-dynamics study od ae wk ioe & o.0lR whee Oe b 8.8 Oke we Oe 6 0 hele e 9 es Temporal aspects of sputtering of TaC targets Be OCT TESTE EET TER CCC TCC eT COREA EET LUTE An instantaneous inelastic energy loss algorithm for use in molecular dynamics simulations a Ee ee eee a eee ee ee ee ee Molecular Dynamics studies of cluster emission in sputtering iy So 66 5 oS: 640 60 6 OS Oa Ow OS OOO 68.6 0064S O4N CO OM ROO Low energy ion irradiation of H-terminated Si(001): hydrogen sputtering, beam-induced (2 X 1) recon- struction, and Si epitaxy ee PERT T CCRT TTECCCTCCTO COTLEEUE LLEITLLUE Molecular dynamics simulation of amorphous silicon sputtering by Ar* ions J.E. Rubio, L.A. Marqués, M. Jarafz, L.A. Bailén and J. Barbolla .......5.2. e. ee.e 6e es Section V. Cluster—solid interactions Cluster—solid interaction experiments ey Es 6 och echt ESD SRO D ODEO oe REDO ROH OOOO OH OHS Atomic excitation during the impact of ions and clusters ee SL 4-6-5 6 a GS 6 p56 6.66 54665-0040 0644S SD OSE TH RO ROOK R EOE OS COs Collision dynamics between gold clusters and gold thin films ee 6 oe oo 6 6 Aho 06 Kk Ow Ba 6 06.0 0 0 0.0 :00 8 006.0 8000-8 8 00.00 0 08 Simulation of heavy-ion cluster impact fusion EES TCT Pee ee ee eT TREE i oeee ao es Oe ee ROO

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