Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 1993: Vol B74 Index

16 Pages·1993·4.4 MB·English

Nuclear Instruments and Methods in Physics Research B74 (1993) 601-610 IN| |W AI Bb
North-Holland Beam Interactions
with Materials & Atoms
Author index
Abu-Jarad, F., S.M.A. Durrani and M.A. Islam, CO, pulsed laser effect on CR-39 registration properties ... B74 (1993) 419
en i sa PG Aw od kb a Sa A wie Wa bo a Ee eee ee es B74 (1993) 18
I a ge og a gc iy wl ral ey tge r ake gia yng cae ie tee tee See B74 (1993) 175
aaa a yl iy be we es wee wee NEE be ab ae 6 ee a B74 (1993) 181
ns rein I 5 GW 6 Sw bela wi OW ele We babes vbw wo cae ees B74 (1993) 399
ee i gs ns de Sie ececa haw aia ga ded Se es ee De a ee Pe eas B74 (1993) 213
a Gy <a ina 6g oie nao chico te dea cg hk aca ee ee eee eee B74 (1993) 443
Ss gw GoWgnh eo eo dice 8 4 SE OS ds eee B74 (1993) 545
Ne ee ee 6 a wikia cae bw hide Be win ce Gk ce ale dk ae enon ear te B74 (1993) 554
Aoki, N., K. Ishikawa, T. Namura, Y. Fukuzaki, G. Fuse, M. Yoshida and M. Inoue, Evaluation of ion
implentation charging by using EEPROM .... wc ci ee ieee acces weavecbeocdvedeues B74 (1993) 306
a a hin ancl Unc hink pcm <gone la we ORR Nea u ene ta Wo rae ao eee a B74 (1993) 317
Asoka-Kumar, P., P. Sferlazzo, H.L. Au and K.G. Lynn, Positron annihilation study of P implanted Si ...... B74 (1993) 89
Sn Acs 2 6 y's case gie nine. bcd wo Wb Fe nd woe hw arab et ala eae eel B74 (1993) 89
I ei I og oad, owt 4 daw ww Ae el pect & eK a a ee B74 (1993) 457
es I aia wh ee ek ba ES Sb RO RED ea eee bee cee B74 (1993) 291
Back, B.B., Radiation safety at low energy heavy-ion accelerators ........0..0. e. ee. ee.eee.en.ea s B74 (1993) 527
ek al ag 2 arn ee ye Te adie eacnw gig “By tens lg Sa ga baa cea alee wha aN B74 (1993) 275
Ne Be NM a a ag hig ed CU ve te He Se Sd Dk BW OUI GA Rb 6 UTE dee ee eee B74 (1993) 514
I ogi grcg eb wks Wie meR EEMA OO NES ORK haw aS ee ee eae B74 (1993) 287
Baumvol, I.J.R., Aluminides and silicides formation by ion beam mixing of multilayers ................. B74 (1993) 98
ne i ac hae othe ake RO PORDAS Swe wtb Aedes oes eae B74 (1993) 84
ee iy a i ae hl OAK EMD Doe OP ed whee oS ee B74 (1993) 368
Neen en en ep end Ah ok ed ROR NORM OLY kee hle eee nn eee B74 (1993) 545
i A es oak ek ek aN SA aos MoS On be Se ae ewe ne bee obs ea ee B74 (1993) 554
se Sy oa oe EA de BAe a RS Re oS ieee bee B74 (1993) 573
a a re eg cg dere eiriigr Racal pa ag age B74 (1993) 243
RRS Sega Rape a8 erie eRe vas ee AM De tee Nat SED RRM ma ee eae |A este Besp adsM t B74 (1993) 496
Nee neake be eb eee hak AR ee sw B74 (1993) 186
I ncaa onal a 6 We acvard @ pcb Salad kDa AAA ea ee ee B74 (1993) 263
Nn eG a bees oA eh owe Ke Oe wha wR ks On B74 (1993) 60
SNE SEES ONG SERIE Te aes rr ORE Me re Ry tc MER esa ae ens ek Raney np ee B74 (1993) 170
Neen enn nd ewe b HRS e Bek Wy hk Ue ee i Le hls Bg Ck ee Oe on es B74 (1993) 197
i edwg eayl gl hk pie gW k Week Wie le as we ees ek B74 (1993) 281
(ISS EEC TLR TL TE SE OR Ga EE iy) eT eR a” gear Lesa Cont See a Ne ete Oe B74 (1993) 156
Ne ne bs ee OR Se WE Oe Rees a ee OE Ce a ee B74 (1993) 336
EEE ESS. dll PIL LE LT ERE A NE hk 1K ene” B74 (1993) 27
Nee ne eeie Bek we aw lerg eke er a ae ee ai es B74 (1993) 453
Se aig wie ak ee We LS EES SL ek ae B74 (1993) 266
(ISS EES POE LE EY Oe ar Nee MUI, ET nee BPM soe: B74 (1993) 210
Re I i gcd wrung dein ae imac dime a eretNg ad ROR Fm wk wee B74 (1993) 405
EES ELT IEE OS Pe I ONT AI! ent eR ET earl eee iy B74 (1993) 565
Campbell, J.L. and W.J. Teesdale, Micro-PIXE analysis of major elements in mineral specimens .......... B74 (1993) 503
Neen Tn ne se pte cy glee WP Ew Ee We do a Oe ee a ee B74 (1993) 47
SS ISS TSE RG Sa aoe a tye SNe LG ae hh LVR O ge to rs a ag” B74 (1993) 27
I a nTee ey le oe re ae B74 (1993) 109
Teenn n enn en ene eee hin eae GLA AE EW ke de eee eee Cee etek B74 (1993) 347
Ra EE NEEL es RPE UY PRN eID DE PEE GEI NN cen eM gg RG eI FN RL Gg B74 (1993) 170
i eeie a a a oa ake eae B74 (1993) 197
I OoEe ala ea e a a ia eT i Dae aha B74 (1993) 134
0168-583X /93 /$06.00 © 1993 — Elsevier Science Publishers B.V. All rights reserved
602 Author index
Chen, L.J., see Liauh, H.R. B74 (1993) 134
Chen, L.J., see Chu, C.H. B74 (1993) 138
Chen, M.C., see Liauh, H.R. B74 (1993) 134
Cheng, H., see Tang, J. B74 (1993) 491
Cheng, H.C., see Lin, C.T. B74 (1993) 147
Chereckdjian, S., see Yarling, C.B. B74 (1993) 252
Cherekdjian, S., see Wood, C. B74 (1993) 123
Cherekdjian, S., Low dose monitors — the movements and causes B74 (1993) 259
Cheung, N.W., see Peng, C.T.J. B74 (1993) 222
Cheung, N.W., see En, B. B74 (1993) 311
Chevacharoenkul, S., see Osburn, C.M. B74 (1993) 53
Chong, M., see Li, J. B74 (1993) 204
Chu, C.H., see Liauh, H.R. B74 (1993) 134
Chu, C.H., J.J. Yang and L.J. Chen, Influence of point defects on formation of fluorine bubbles and
characterization of defects in BF} implanted silicon B74 (1993) 138
Chu, C.H., see Lin, C.T. B74 (1993) 147
Chung, W.-J., see Hahn, S. B74 (1993) 275
Ciavola, G., see La Ferla, A. B74 (1993) 109
Clarysse, T., see Huyskens, D. B74 (1993) 573
Coffa, S., N. Tavolo, F. Frisina, G. Ferla and S.U. Campisano, Diffusion and lifetime engineering in silicon .. B74 (1993) 47
Corcoran, S.F., see Felch, S.B. B74 (1993) 156
Corey, P., see Mack, M.E. B74 (1993) 287
Coste, Ph., see Farchi, A. B74 (1993) 457
Cristoforo, M., see Farley, M. B74 (1993) 271
Curaudeau, J.M., see Della-Negra, S. B74 (1993) 453
Current, M.I., M. Inoue, S. Nakashima, N. Ohno, M. Kuribara, Y. Matsunaga, T. Hara, D. Wasser, S. Leung,
B. Adibi, G. Lecouras, L.A. Larson and S. Prussin, Defect engineering of p*-junctions by multiple-species
ion implantation B74 (1993) 175
Current, M.I., S. Wada, K. Akedo, T. Yamada, G.H. Takaoka and I. Yamada, Al metallization by cluster
beam and physical vapor deposition on heavily implanted Si(100) surfaces B74 (1993) 181
Current, M.I., see Yamada, I. B74 (1993) 341
Dabagov, S.B., V.V. Beloshitsky and M.A. Kumakhov, Planar-channeling radiation from MeV electrons in
diamond and silicon B74 (1993) 368
Darken, L.S., Role of disordered regions in fast-neutron damage of HPGe detectors B74 (1993) 523
Davidson, J., see Ozafran, M.J. B74 (1993) 542
Davidson, M., see Ozafran, M.J. B74 (1993) 542
De Cesare, N., see Hu, Z. B74 (1993) 426
Debray, M.E., see Ozafran, M.J. B74 (1993) 542
Della-Negra, S., A. Brunelle, Y. Le Beyec, J.M. Curaudeau, J.P. Mouffron, B. Waast, P. Hakansson, B.U.R.
Sundqvist and E. Parilis, Acceleration of CZ) molecules to high energy B74 (1993) 453
Dixon, W., see Lukaszek, W. B74 (1993) 301
Downey, D.F., R.J. Eddy and S. Mehta, Low energy ion implantation and its characterization and processing . B74 (1993) 160
Duan, Z., see Liu, Z. B74 (1993) 439
B74 (1993) 419
B74 (1993) 581
Eddy, R., see McOmber, J.I. B74 (1993) 266
Eddy, R.J., see Downey, D.F. B74 (1993) 160
Efeoglu, H., see Zhang, J.P. B74 (1993) 127
Elmoursi, A.A., see Malaczynski, G.W. B74 (1993) 13
En, B. and N.W. Cheung, Wafer charging monitored by high frequency and quasi-static C-V measurements B74 (1993) 311
Evans, J.H., see Zhang, J.P. B74 (1993) 127
Fan, T.W., see Zhang, J.P. B74 (1993) 127
Fang, Z., see Yang, Q. B74 (1993) 431
Farchi, A., J. Aubert, L. Wartski, Ph. Coste and C. Mardirassian, A broad beam microwave N* ion source B74 (1993) 457
Farley, M., see McCarron, D. B74 (1993) 238
Farley, M., D. McCarron, J. Grant and M. Cristoforo, Performance characteristics of the NV-20A high current
ion implantation system B74 (1993) 271
Felch, S.B., R. Brennan, S.F. Corcoran and G. Webster, A comparison of three techniques for profiling
ultra-shallow p + —n junctions B74 (1993) 156
Author index
Feng, S.W., R.E. Hummel and D.R. Hagmann, Solid phase epitaxial regrowth of ion-implanted amorphous
silicon characterized by differential reflectometry .......... 2... cece cece ee eee reece eee eeeeee B74 (1993) 151
legOG bie ke ae A en E E Ae ERT ES Ree B74 (1993) 47
ne es gas a's 6 aw OS Ow CRESS Rew RR So eine ee B74 (1993) 105
oe SS as hoe oe a RON EER Re ER B74 (1993) 385
a a er a gg ae oS RE EEE ee B74 (1993) 186
i Se ee ie he ee a aicg PLR A ee Ob thia ae ba ee hed eee o B74 (1993) 47
Frisina, F., see Galvagno, G. B74 (1993) 105
aeig 5 esp a dn Sk ae VO a a a B74 (1993) 191
i a TS ge ee a eS ee ed Ok CRA Oo he Ee ee B74 (1993) 7
Fukayama, N., see Gotoh, Y. B74 (1993) 35
Ce
Fukuzaki, Y., see Aoki, N. B74 (1993) 306
ee
Fuse, G., see Inoue, M. B74 (1993) 7
Ce ee
Fuse, G., see Aoki, N. B74 (1993) 306
ee
Galvagno, G., A. Scandurra, V. Raineri, E. Rimini, A. La Ferla, V. Sciascia, F. Frisina, M. Raspagliesi and G.
Ferla, Implants of aluminum into silicon B74 (1993) 105
Ce ee ee
Ns On A eo eae Mae be ee be wR OE Rew E ERO Te eee eee B74 (1993) 109
Dee en ad caw kM ae RAW cae owe hea hee a a ae eee B74 (1993) 109
en or I Pe a's oh wk ee Das aie ee OSE OE OS ee Oe a ee eee eee ees B74 (1993) 70
Gibson, U.J., Low energy ion modification of thin films ....2.... .eee. eee. ee.e ee.e ee.e ee ns B74 (1993) 322
Ne ee lg a eae pie hor ea aaa a B74 (1993) 170
Glikman, E., I. Kelson, D. Nir, A. Zidon, H. Haas and P. Hill, Radioisotope transfer by direct implantation of
I a a ig wala ek Ag cae a cae a sang eh ea area B74 (1993) 450
Gong, L., L. Frey, S. Bogen and H. Ryssel, A novel delineation technique for 2D-profiling of dopants in
ee ee ee es wack oas Ok. he 6 ON SE ke RR A a B74 (1993) 186
Gotoh, Y., J. Ishikawa, H. Tsuji, N. Fukayama and Y. Ogata, Metal-sheet-beam formation using an
impregnated electrode-type liquid-metal ion source with a linear array of emission points ............ B74 (1993) 35
Gottschalk, B., A.M. Koehler, R.J. Schneider, J.M. Sisterson and M.S. Wagner, Multiple Coulomb scattering
of 160 MeV protons B74 (1993) 467
i
Grant, J., see Farley, M. B74 (1993) 271
Cr ]
Ne nn eS i a a kis dome ae ead Oe A ee Ee B74 (1993) 426
Greater Silicon Valley Implant Users’ Group see Felch,S.B. ....2.02. cec.e e.ee .eee. ee .eee eee B74 (1993) 156
ES SNR RI ete era A aN het RRS Rate vay eRe PEE URN er Re TEMA E iy Ane are ee Meee B74 (1993) 545
Nees LS ae a ee 4e e ae B74 (1993) 554
I IIS OTE, SSRI SEC a INL at crCh etO U eGR a eT yar e roa IN EL NLR ar ar Ree re rT B74 (1993) 60
Gwilliam, R.M., R.J. Wilson, T.D. Hunt and B.J. Sealy, The use of multi-species implantation for carrier
profile control in GaAs MESFETs fabricated using silicon ion implantation B74 (1993) 94
Gwilliam, R.M., see Zhang, J.P. B74 (1993) 127
i
Neen Ne a lee aie te ey oe ea a a ee ae oe B74 (1993) 450
i eos Wad be Dak ee oe Rd KOVED A ee B74 (1993) 151
Hahn, S., T. Hara, T. Maekawa, N. Satoh, Y.-K. Kwon, K.-I. Kim, Y.-H. Bae, W.-J. Chung, E.K. McIntyre,
W.L. Smith, L. Larson and R. Meinecke, Damage and its rapid thermal annealing kinetics in Ar* ion
EES SANS She AE OL ENO PT PR Eee Oe a te eee ar eg ee B74 (1993) 275
IE OEE ESSE ERE RED rN REA ee EIS ORE SON Pe AS a aE Te eg B74 (1993) 453
SE ES EE EE ES PDR EMS PE NO I Eerie, CLG B74 (1993) 13
Neen eeit 5 el ee Ae LN es Le EA B74 (1993) 175
Hara, T., T. Muraki, M. Sakurai, S. Takeda, M. Inoue and S. Fuji, Damage depth profiles for high energy ion
implanted silicon B74 (1993) 191
Cr
Hara, T., see Hahn, S. B74 (1993) 275
Cr
Hay, H.J., see Yang, Q. B74 (1993) 431
ed
EES SOE oe TE RPP Bae RE Ren MN NRE RC RSet Oa PUN AD ERE ae MEMO aT rere nn eS B74 (1993) 439
i da dice ww a 1d ea AS Rn os a A ee ee B74 (1993) 519
Hemment, P.L.F., B.J. Sealy, K.G. Stephens, J.E. Mynard, C. Jeynes, M.D. Browton, R.J. Wilson, M.X. Ma,
A. Cansell, D.J.W. Mous and R. Koudijs, A 2 MV heavy ion Van de Graaff implanter for research and
a nNee oS eR a eae erie ar ak ie bees kh de eae B74 (1993) 27
ES SSE SSE LLORES IE CO OS EE TD Oe ee eae ee B74 (1993) 127
Nee eehee ke a ee eee ase one ec he B74 (1993) 170
ns ce es 6p kD bd Waals bas anes Cae ede ae wed awaeen wes B74 (1993) 197
Ne nekn Wb ek ee Des eR hea A A OA EERO B74 (1993) 206
604 Author index
Hemment, P.L.F., see Shi Zuoyu B74 (1993) 210
Hemment, P.L.F., see Zhu Wenhua B74 (1993) 218
Herz, P.R., see Leung, K.N. B74 (1993) 291
Higashi, G.S., see Jacobson, D.C. B74 (1993) 281
Hill, P., see Glikman, E. B74 (1993) 450
Hirao, T., see Yoshida, A. B74 (1993) 331
Hirzebruch, S.E., G. Rusch, E. Winkel and W. Heinrich, Response of BP-1 to '°’Au heavy ions at 11.3
GeV /nucleon B74 (1993) 519
Ho, S., see Lukaszek, W. B74 (1993) 301
Hockett, R., see Jacobson, D.C. B74 (1993) 281
Homewood, K.P., see Hunt, T.D. B74 (1993) 60
Hsu, C.C. and S. Lee, Interference pattern of He* and H* ions scattered by the (111) surface of Si crystals . . B74 (1993) 511
Hu, Z., N. De Cesare, D. Grassi, F. Murolo and M. Vigilante, The energy resolution of a position sensitive
spectrometer based on plane crystals B74 (1993) 426
Hummel, R.E., see Feng, S.W. B74 (1993) 151
Hunt, N.E.J., see Vredenberg, A.M. B74 (1993) 84
Hunt, T.D., B.J. Sealy, K.J. Reeson, R.M. Gwilliam, K.P. Homewood, R.J. Wilson, C.D. Meekison and G.R.
Booker, Ion beam synthesis of a and B FeSi, layers B74 (1993) 60
Hunt, T.D., see Gwilliam, R.M. B74 (1993) 94
Huyskens, D., P.D. Bisschop, T. Clarysse and W. Vandervorst, Ion beam simulation SIMION OS /2: 1 200000
points, multitasking and new options B74 (1993) 573
Inoue, M., S. Fujii and G. Fuse, Damage analysis and engineering for ion implantation in ULSI process B74 (1993) 7
a re Te ak pk ORT E Oe SKM A OOo Ree Raab Oo ROS B74 (1993) 175
Inoue, M., see Hara, T. B74 (1993) 191
Inoue, M., see Aoki, N. B74 (1993) 306
Irkaev, S.M., M.A. Andreeva, V.G. Semenov, G.N. Belozerskii and O.V. Grishin, Grazing incidence Méssbauer
spectroscopy: new method for surface layers analysis. Part I. Instrumentation B74 (1993) 545
Irkaev, S.M., M.A. Andreeva, V.G. Semenov, G.N. Belozerskii and O.V. Grishin, Grazing incidence M6ssbauer
spectroscopy: new method for surface layers analysis. Part II. Theory of grazing incidence Mossbauer
spectra B74 (1993) 554
Ishii, M., see Yamada, I. B74 (1993) 341
Ishikawa, J., see Gotoh, Y. B74 (1993) 35
Ishikawa, J. and H. Tsuji, Carbon negative ion implantation into silicon B74 (1993) 118
Ishikawa, K., see Aoki, N. B74 (1993) 306
B74 (1993) 419
Jackman, T.E., see Yang, Q. B74 (1993) 431
Jacobson, D.C., see Vredenberg, A.M. B74 (1993) 84
Jacobson, D.C., J.M. Poate, G.S. Higashi, T. Boone and R. Hockett, Implanted standards for detection of
transition metal contamination of silicon surfaces B74 (1993) 281
Jagadish, C., see Williams, J.S. B74 (1993) 80
Jeynes, C., see Hemment, P.L.F. B74 (1993) 27
Jiang, T., see Northby, J.A. B74 (1993) 336
Johnson, W.H., C.L. Mallory, W.A. Keenan, G. Yetter and D. Kamenitsa, Improved gauge capability for ion
implant monitors using temperature compensation for resistivity measurements B74 (1993) 229
Jones, K.S., see Venables, D. B74 (1993) 65
Juang, M.H., see Lin, C.T. B74 (1993) 147
Kachurin, G.A., V.D. Akhmetov, I.E. Tyschenko and A.E. Plotnikov, Roles of implantation temperature and
ion dose rate in ion-beam synthesis of buried Si,N, layers B74 (1993) 399
Kamenitsa, D., see Johnson, W.H. B74 (1993) 229
Kamenitsa, D., see Pearce, N.O. B74 (1993) 263
Kamenitsa, D.E. and R.B. Simonton, Sources of variation in Therma Wave measurements of ion implanted
wafers B74 (1993) 234
Kaschieva, S., Reduction of the radiation sensitivity of MOS structures by irradiation—anneal cycle treatment B74 (1993) 396
Kase, M., Y. Kikuchi, Y. Kataoka and H. Mori, B diffusion in Si predamaged with Si* or Get and
preannealed at 200-—1000°C B74 (1993) 75
Kataoka, Y., see Kase, M. B74 (1993) 75
B74 (1993) 229
Author index 605
Neen ee ne ee kk 6 66 we ee OO LEK ORAS RAD TO ERS B74 (1993) 450
Kesque, J.M., see Ozafran, M.J. B74 (1993) 542
Khokonov, M.Kh., Axial channeling and radiation of multi-GeV electrons B74 (1993) 375
a ce a ho ea ERE Ok SAE A ee ee Ul ok eh ee B74 (1993) 75
Kilner, J.A., see Nejim, A. B74 (1993) 170
Kilner, J.A., see Marsh, C.D. B74 (1993) 197
a eg ig ee alu) Gy Wig caw eit @ Sy MR Ca Ad wmR n Sd oda ila ie usS ak cae 8 ke keel ae B74 (1993) 275
Kitagawa, M., see Yoshida, A. B74 (1993) 331
gg nd B's ge hare ee ew. BU Ow hack pc Bon nie ie eI BIE oad w Gere MUR B74 (1993) 467
eh aig kos af Wot ea RE RE RS eek Wik ee ee ee bs Lea ER B74 (1993) 70
Sg gh eke aa ee a tele glige gty ge gas eae ed wep ene ane 3 de B74 (1993) 27
Kreiner, A.J., see Ozafran, M.J. B74 (1993) 542
ee re, go bo wie a's de we0 d-s Sate bo bo ele bd ele dw Ss alka a eee ees wee B74 (1993) 368
Kuribara, M., see Current, M.I. B74 (1993) 175
Kwon, Y.-K., see Hahn, S. B74 (1993) 275
Kwor, R.Y., see Shen, D.S. B74 (1993) 113
La Ferla, A., see Galvagno, G. B74 (1993) 105
La Ferla, A., L. Torrisi, G. Galvagno, E. Rimini, G. Ciavola, A. Carnera and A. Gasparotto, High energy
implants of aluminum in Czochralski and floating zone grown silicon substrates B74 (1993) 109
Larsen, C.A., see Williams, J.S. B74 (1993) 80
ne Says OG lee ee eR AE OR Rew EN Pa wae a wee NE eee eee B74 (1993) 275
Larson, L.A., see Current, M.I. B74 (1993) 175
aD i i ce og pw Www We ow law's w plac le ad ek No Ue We a ee gle pe eS B74 (1993) 453
Lecouras, G., see Current, M.I. B74 (1993) 175
Lee, E.H., G.R. Rao, M.B. Lewis and L.K. Mansur, Ion beam application for improved polymer surface
properties B74 (1993) 326
Lee, S., see Hsu, C.C. B74 (1993) 511
Lennard, W.N., see Dygo, A. B74 (1993) 581
Leung, K.N., D.A. Bachman, P.R. Herz and D.S. McDonald, Rf driven multicusp ion source for pulsed or
steady-state ion beam production B74 (1993) 291
Neen ee na ak sae whan cco ckeS iac nha oc sa lin. a eae See ele ka a B74 (1993) 175
a So kg ah wean oy let Wew eal to a a UTA a aac donald wat latatede: # oe ee B74 (1993) 326
Li, A.Clark.G., see Williams, J.S. B74 (1993) 80
Li, B., see Liu, Z. B74 (1993) 439
Li, J.. M. Chong and J. Zhu, A new type of silicon-on-insulator with a perfect surface silicon layer B74 (1993) 204
Nee ee eee ee hh aoe ace Malia Sig pipe alae BSR Ge SO ee B74 (1993) 206
Li, Y., see Nejim, A. B74 (1993) 170
Li, Y., see Marsh, C.D. B74 (1993) 197
Liauh, H.R., M.C. Chen, J.F. Chen, L.J. Chen, W. Lur and C.H. Chu, Interfacial reactions of titanium thin
films on ion implanted (001) Si B74 (1993) 134
Lin, C., P.L.F. Hemment, A. Nejim, J.P. Zhang, J. Li and S. Zou, Insulator structures obtained by high dose
nitrogen implantation into aluminium on silicon B74 (1993) 206
Lin, C.T., M.H. Juang, C.H. Chu and H.C. Cheng, Formation of excellent shallow n*p junctions by As*
implantation into thin CoSi films on Si substrate ; B74 (1993) 147
Lin, S., see Wang, W. B74 (1993) 514
Lin Chenglu, see Shi Zuoyu B74 (1993) 210
Lin Chenglu, see Zhu Wenhua B74 (1993) 218
Liu, Z., B. Li, Z. Duan and H. He, Cross section measurements for 170° backscattering of protons from carbon
in the energy range 0.3-3.0 MeV B74 (1993) 439
I GETS SEAS S It ee Cpa aE MIT NER CU OSOR OT erry te Mae Cae eee Oe Ne ae PS RCE rs ARR Fe Nay B74 (1993) 352
Lukaszek, W., W. Dixon, E. Quek, W. Weisenberger and S. Ho, Charging studies using the CHARM2 wafer
surface charging monitor B74 (1993) 301
Lur, W., see Liauh, H.R. B74 (1993) 134
Oe ee a Ng ice Ste i osu Sate mele Mietata Bleed ark ob WU be owe weO U ed es B74 (1993) 89
McCarron, D., M. Farley and W. Parmantie, Pressure compensated dose control in high current ion
implantation systems : B74 (1993) 238
SS ELE EOE PEL TE DI Pe a Ee SE DE rng em Es) Wert B74 (1993) 243
McCarron, D., see Farley, M. B74 (1993) 271
en a od 6 wk WW de RR OOO a OAs EEO ORCS HERA CORRS B74 (1993) 291
606 Author index
ne ae ces ba ARN ROTO OED eee eee TENE Oe ee we Oe B74 (1993) 53
McIntyre, E.K., see Hahn, S. B74 (1993) 275
McOmber, J.I., K. Ostrowski, M. Meloni, R. Eddy and P. Buccos, Resist preparation and removal techniques
for high dose implantation on 200 mm wafers B74 (1993) 266
a ak ha oid ee A wo ee eR nek a ee ow oe Oe B74 (1993) 27
Ma, T.P., Reliability issues concerning thin gate SiO, and SiO,/Si interface for ULSI applications B74 (1993) 295
Mack, M.E., P. Barschall, P. Corey, S. Satoh and S. Walther, Progress in wafer charging and charge
neutralization B74 (1993) 287
Maehara, T., M. Yanagihara, M. Yamamoto and T. Namioka, Optical constants of very thin Pt and Rh films
determined from soft-X-ray reflectance and photoelectric yield measurements B74 (1993) 362
eeka wd OA D Ae eee wh eee eee Ae ea RS ORG B74 (1993) 275
ek ay ip es aN ae OA OR 0 eae ee B74 (1993) 142
Malaczynski, G.W., A.A. Elmoursi, A.H. Hamdi and X. Qiu, High-voltage implantation facility at GM
Research B74 (1993) 13
Mallory, C.L., see Johnson, W.H. B74 (1993) 229
esGd Fa ee A ee ee Ae ie OS 0% oa Nee eB B74 (1993) 326
Mardirossian, C., see Farchi, A. B74 (1993) 457
Margail, J., SIMOX material manufacturability B74 (1993) 41
Markus, K., see Osburn, C.M. B74 (1993) 53
Marsh, C.D., see Nejim, A. B74 (1993) 170
Marsh, C.D., A. Nejim, Y. Li, G.R. Booker, P.L.F. Hemment, R.J. Chater and J.A. Kilner, Control of the
buried SiO, layer thickness and Si defect density in SIMOX substrates — structural investigation and
process optimisation B74 (1993) 197
Matsunaga, Y., see Current, M.I. B74 (1993) 175
Mazzei, R.O. and E.D. Cabanillas, Submicroscopic theory for the charge changing process and generalized
chemical etching velocity B74 (1993) 405
Meekison, C.D., see Hunt, T.D. B74 (1993) 60
egRaia MO an ly CAE BRS ee B74 (1993) 263
Neen na og as oy ipc g dee gh ea CWA ES KE B74 (1993) 347
Mehta, S., see Downey, D.F. B74 (1993) 160
Meinecke, R., see Hahn, S. B74 (1993) 275
ETI OS OU PE ENE eR a FRO RT PTR EC En EP ME B74 (1993) 266
Michaelian, K. and E. Andrade, A direct approach to analyzing Rutherford backscattering spectra B74 (1993) 443
Mikoda, M., see Nakata, T. B74 (1993) 131
Mitchell, I.V., see Dygo, A. B74 (1993) 581
IN a Ac by ld Sik A AE ik A he aa a aE we ies B74 (1993) 131
Morgenstern, G., see Skorupa, W. B74 (1993) 70
ES RES RR ZS a en mg iO a ae ls SpA ere B74 (1993) 75
ENS EERE OEE AO PPE PET a a ey B74 (1993) 453
NEES DE POEL PL IEP LP EE PE I Pe B74 (1993) 27
Muraki, T., see Hara, T. B74 (1993) 191
IRD ESERIES 0°01 AteG E eg UN EG ir aE al eR A DR lenny ane RSM en cetera gre Kae ree B74 (1993) 426
Neen nnn nn ei ep ad wa SMS dak ok a TA hd be B74 (1993) 123
Myers, S., D. McCarron and J. Blake, Integration of a particle monitor into the control system for an ion
implanter B74 (1993) 243
Mynard, J.E., see Hemment, P.L.F. B74 (1993) 27
Nakashima, S., see Current, M.I. B74 (1993) 175
Nakata, T., Y. Mizutani, M. Mikoda, M. Watanabe, T. Takagi and S. Nishino, Evaluation of Al ion implanted
6H-SIC single crystals B74 (1993) 131
Namioka, T., see Maehara, T. B74 (1993) 362
I es B74 (1993) 306
Nejim, A., Y. Li, C.D. Marsh, P.L.F. Hemment, R.J. Chater, J.A. Kilner, L.F. Giles and G.R. Booker, Process
optimisation for direct formation of device worthy thin film SIMOX structures using 90 keV oxygen
implantation B74 (1993) 170
Nejim, A., see Marsh, C.D. B74 (1993) 197
Nejim, A., see Lin, C. B74 (1993) 206
Nejim, A., see Zhu Wenhua B74 (1993) 218
Nir, D., see Glikman, E. B74 (1993) 450
ee a die oa hao be ee ee eee eee B74 (1993) 131
Author index 607
Northby, J.A., T. Jiang, G.H. Takaoka, I. Yamada, W.L. Brown and M. Sosnowski, A method and apparatus
for surface modification by gas-cluster ion impact B74 (1993) 336
Nunes, J., see Yarling, C.B. B74 (1993) 252
|
eea ek Se one eee rn ee Wahl WARNE acca Aa B74 (1993) 431
O’Connor, J.P., N. Tokoro and J. Adamik, Performance characteristics of the Genus Inc. 1510 high energy ion
implantation system B74 (1993) 18
|
wi eg ae or oe Be ie ew ttidg glace giant gaily ered emA CE W OO Ria ie ee B74 (1993) 35
ks ao ba eo ee a OO OR a eS Eee eee eee eee eee B74 (1993) 175
a SS Tg ig aris ae owt aie le Wi y BS Ae Bie i ee ia ae ee ke aay aea e B74 (1993) 431
Orlic, I., K.K. Loh, C.H. Sow, S.M. Tang and P. Thong, Parametrization of the total photon mass attenuation
coefficients in the energy range 0.1-1000 keV... ccectc cet cere t ense esesees B74 (1993) 352
Osburn, C.M., S. Chevacharoenkul, Q.F. Wang, K. Markus, G.E. McGuire and P.L. Smith, Materials and
device issues in the formation of sub-100-nm junctions B74 (1993) 53
Ostrowski, K., see McOmber, J.I. B74 (1993) 266
i ]
en yk 5s ne mine pane eg a cies a ee a SR OO % A a eure kana a aed B74 (1993) 317
Ozafran, M.J., M.E. Vazquez, A.J. Kreiner, M.E. Debray, J.M. Kesque, A.S.M.A. Romo, C. Pomar, H.
Somacal, M. Davidson and J. Davidson, PIXE analysis of heavy water from a nuclear power plant B74 (1993) 542
iw he aL wk Oak g e w peels wee Sa hl All eek a ee ee B74 (1993) 380
Panknin, D., E. Wieser, W. Skorupa, H. Vohse and J. Albrecht, Formation of buried iron—cobalt-silicide
layers by high dose implantation B74 (1993) 213
a nad -ahisg-s ic ah Sa akon aieW ore Re sm WL ee a oe ee ae B74 (1993) 453
ae alg fd ww obs I OO haw OM we we ERR S bee ve ew ees B74 (1993) 238
I A i ae al ad ala keg bd yg beak etek Sid a ew la ee B74 (1993) 127
Pearce, N.O., Z. Bokharey, D. Kamenitsa, R. Simonton, N. Tripsas and B. Mehrotra, Modification of time
dependence in thermal wave signal from ion implanted wafers ......0..2.. .e ee.e e.ee .ee .ee e B74 (1993) 263
Peng, C.T.J. and N.W. Cheung, Two-dimensional implantation profile simulator - RETRO B74 (1993) 222
a os eg sn geek em A Bw Ow aE oe ee ee a ee ee SReERS B74 (1993) 399
es nik whe b Mh eee eA OAD pene a 6 weo ils be WE RNGR EL B74 (1993) 84
Poate, J.M., see Jacobson, D.C. B74 (1993) 281
Pomar, C., see Ozafran, M.J. B74 (1993) 542
I egalge 5)b A lloen Bickel et S e ee oO ae B74 (1993) 175
Puri, S., D. Mehta, B. Chand, N. Singh and P.N. Trehan, Measurements of L to M shell vacancy transfer
probabilities for the elements in the atomic region 70 < Z < 92 B74 (1993) 347
I a ccs fal gs muses wiA N Rr a A a a ea B74 (1993) 127
Qiu, X., see Malaczynski, G.W. B74 (1993) 13
Quek, E., see Lukaszek, W. B74 (1993) 301
ne Ula back ie $a 446 0 ee Re Oe OE eh ee COMO Oe ae B74 (1993) 105
aS ae le eo ace 9 ahaa eg bles Sod ake eae kd WEN AO eee B74 (1993) 326
Raspagliesi, M., see Galvagno, G. ............. es beds a ice # ber oe oe 6 ae ae a eee ae B74 (1993) 105
Reeson, K.J., see Hunt, T.D. B74 (1993) 60
Rimini, E., see Galvagno, G. B74 (1993) 105
i a spe aa as GA dae URE EOE DEE rob enter B74 (1993) 109
Romo, A.S.M.A., see Ozafran, M.J. B74 (1993) 542
Ne ee eee 6 ede EASE LEO AMOCLAM Ras B74 (1993) 514
Rusch, G., see Hirzebruch, S.E. B74 (1993) 519
Ce
Ryssel, H., see Gong, L. B74 (1993) 186
Ned ee oa ek dO Kd ee Sa AER Ce owed aa eae ee Le Pee B74 (1993) 191
ne ace ee ie ae al ee ade RR Oa eek ew Ra a wee eel B74 (1993) 275
Nene en ee ie ag a's oak ee WR EE ee Owe Cee eb bee nes ede oe B74 (1993) 287
EEE ESS SEEDS LS SELLE AA DSO EE OO RT EP WATE EN Lh in Maar ea ee wg Ce | B74 (1993) 105
Nn ne cea akb w eae Oee ek ORR ahead Os Ck EAR eas B74 (1993) 70
nn a a whee ee Rae kee does CC eRe ER eae eT ER OR B74 (1993) 467
EE EE EE EOE FS SPS Pe Sere rere eer er ee eee rr B74 (1993) 84
i ee a heehee aA TEM Eee eke ae awan (ee B74 (1993) 105
Neen nnen e nen nee ey WR Rae RA ODE ROE CAS CAE RD OR ERED OSA OER B74 (1993) 27
eee, Me I, ED. gk ec te cence secese i eka ae Oke ee OE Oe ees B74 (1993) 60
608 Author index
OR So ES ore ee rr eer err eer ee ee ee ee re ee eee eS ee eee B74 (1993) 94
ks ne ke es ck eas oO OOD OS he Ode KR RE Oe EO TEED EP OR B74 (1993) 545
rn ks bsa yhk A ALA LE AAR ONS AD OR ERA TESORO RROD OD B74 (1993) 554
Serruys, Y., J. Tirira and P. Calmon, Concentration profile reconstitution from Rutherford backscattering
spectra B74 (1993) 565
Sferlazzo, P., see Asoka-Kumar, P. B74 (1993) 89
Shapiro, M.H., T.A. Tombrello and J. Fine, A molecular dynamics simulation of collisional excitation
mechanisms in Al B74 (1993) 385
Shen, D.S. and R.Y. Kwor, Ion implantation in polycrystalline silicon thin film transistors B74 (1993) 113
Shen, H., see Tang, J. B74 (1993) 491
Shi Zuoyu, Lin Chenglu, Zhu Wenhua, P.L.F. Hemment, U. Bussmann and Zou Shichang, Computer
simulation of SIMOX and SIMNI formed by low-energy ion implantation B74 (1993) 210
Shi Zuoyu, see Zhu Wenhua B74 (1993) 218
Simonton, R., see Pearce, N.O. B74 (1993) 263
Simonton, R.B., C.W. Magee and A.F. Tasch, High Miller index channeling in silicon substrates B74 (1993) 142
Simonton, R.B., see Kamenitsa, D.E. B74 (1993) 234
Singh, N., see Puri, S. B74 (1993) 347
Sisterson, J.M., see Gottschalk, B. B74 (1993) 467
Skorupa, W., R. K6gler, K. Schmalz, P. Gaworzewski, G. Morgenstern and H. Syhre, Iron gettering and
doping in silicon due to MeV carbon implantation B74 (1993) 70
a SS PS eae oid) Ge Oke aka AON ETS AN ORS Ee OCS oe Oe OOo B74 (1993) 213
Smith, P.L., see Osburn, C.M. B74 (1993) 53
Smith, W.L., see Hahn, S. B74 (1993) 275
Snowden-Ifft, D.P., A detailed study of the registration temperature effect in CR-39 useful for cosmic ray
experiments B74 (1993) 414
eS eA Le aay wk sk Oe We BAe EM als be dees B74 (1993) 542
Sosnowski, M., see Northby, J.A. B74 (1993) 336
Sow, C.H., see Orlic, I. B74 (1993) 352
Stack, A.P., Pressure compensation for high current ion implanters B74 (1993) 248
Stack, A.P., The relationship between sheet resistance and ion implant dosimetry B74 (1993) 257
EE ARRIS NaRSE e aP Pgn e NICAL Gee sein Pe ea eee a B74 (1993) 27
Sun, J., see Wang, W. B74 (1993) 514
Sun, Y., see Tang, J. B74 (1993) 491
Sundavist, B.U.R., see Della-Negra, S. B74 (1993) 453
a a a ld sig a ig ae Bie AUR a ew a ee hl le oe B74 (1993) 70
ESS GREE SESS MER OE SERS YOR RUN DOF a SO eR i ah cE ae Se aea ea are er OP RT Ea eM B74 (1993) 317
Takagi, T., see Nakata, T. B74 (1993) 131
Deen nn na Maeb Mik ee i AROS OES Kk dee ew B74 (1993) 181
ae a ee Nb ig a aed Oa AA A Oe de Mae eee REE B74 (1993) 336
I a oe ah a Slee A a A AR A ee B74 (1993) 341
Se SIL PE pc en a aR TY Op gee POR aR ECR B74 (1993) 191
Tanaka, S., T. Tagami, T. Yamaoka, K. Oyoshi and Y. Arima, Ion implantation for large-area optoelectronics
on glass substrates B74 (1993) 317
Tang, J.. Y.S un, H. Cheng and H. Shen, Comments on the classical approach to non-Rutherford cross section
calculations B74 (1993) 491
TES CESSES RESIST tH:O E NRT oa a OMEN APTN EM ET eAINA PP Ga PE EOE PURI R SGIM EEM on CVA. Moe B74 (1993) 352
Tao Zhenlan, see Wang Zhenxia B74 (1993) 380
Tasch, A.F., Ion implantation in future MOS technology B74 (1993) 3
re ae galas (a aa Alo’ a Whi gigi ck gach whe ok KOO a he boo ae B74 (1993) 142
Tavolo, N., see Coffa, S. B74 (1993) 47
Teesdale, W.J., see Campbell, J.L. B74 (1993) 503
INOS aS rs gee Nome ae a tg eM tl gE ate Cee ae a RRR AE cE IOLo erA aea PO tp Ep oe B74 (1993) 352
Tirira, J. and F. Bodart, Alpha—proton elastic scattering analyses up to 4 MeV B74 (1993) 496
Tirira, J., see Serruys, Y. B74 (1993) 565
SES EASE Tie he PEO NE 5 OS RG ROPE esC re NRE ee eee PEPE Eee nT B74 (1993) 18
Tombrello, T.A., see Shapiro, M.H. B74 (1993) 385
Torrisi, L., see La Ferla, A. B74 (1993) 109
Teen ee eaa ai Seam een B74 (1993) 347
Tripsas, N., see Pearce, N.O. B74 (1993) 263
Nee a a ce oe ee eg ed aes ee ee B74 (1993) 35
Author index 609
I ag a a ee eee eae Ne eh a ke eww ath i bea B74 (1993) 118
Tyschenko, I.E., see Kachurin, G.A. B74 (1993) 399
i
I ne hg 2 ig 5 dee ey ori wae nlW ie aac eR Ne oon ok ke re ee B74 (1993) 573
De ngah ek ET ge od way “tes Bie wea AL ASMUM B74 (1993) 542
Venables, D. and K.S. Jones, Defect formation in high dose oxygen implanted silicon B74 (1993) 65
oe as adie 5 @ yan '¢ Wie RAN db ED ERE EEE AN Ee eae ee RAEN B74 (1993) 426
IS a ata et Peg eMac cee IUD ar ac ee dm MN ERET I ar ga aE RL mY per er" B74 (1993) 213
Vredenberg, A.M., N.E.J. Hunt, E.F. Schubert, P.C. Becker, D.C. Jacobson, J.M. Poate and G.J. Zydzik,
Erbium implantation in optical microcavities for controlled spontaneous emission B74 (1993) 84
ae ia ied ere Se ee Re eee Re eae eee ee B74 (1993) 453
i ag aay Ag wye lect ee a weA sw a ee ek B74 (1993) 181
dg ala yb a aw wk Oe De OE eae ek Pe es ee eee eee B74 (1993) 175
a a Ss ble ele o hele aed WW Os WEAR RAS Dew OY PORE R OS B74 (1993) 467
ny Cae ARES CAUCE US DOWNS UES ON REE Oe B74 (1993) 287
Ne ne aes ke SAREE EES RA EEA ER ETE CARE es B74 (1993) 514
I aS a ine lw ioe BS A Oa Wl ws a ee a de ee B74 (1993) 53
Wang, W., S. Lin, J. Bao, T. Rong, H. Wan and J. Sun, The n-type doping of polyaniline films by ion
Se ci ye Cela wack wok as Sie ae a ew RN OAR AE A REM eee se rd eae B74 (1993) 514
Wang Zhenxia, Pan Jisheng, Zhang Jiping and Tao Zhenlan, The “locally rich element” and preferential
ne ekg ye Sd SRE ORE Od ROE ak ew ee ee ee B74 (1993) 380
ne a ees a kee ce bee ee RO Maw On See eee et eee B74 (1993) 457
Ne ne og a ye cis s eRe Re ke owe oo ea Oe ee a B74 (1993) 131
sa sy ke ROA OR Sd epee eS ea eae B74 (1993) 156
i cect eee MOOR OHNE EOE EDS OO EW ON SOS RD Ohad SE Owe Se eee RES B74 (1993) 301
i oa kp Wiig ceil 6 NER 6 EL esO w ane We eo ee ee B74 (1993) 127
Ne ee a a ed wie Waki ga Es Wie ordi eee a ark oa ee a B74 (1993) 213
Williams, J.S., C. Jagadish, A.Clark.G. Li and C.A. Larsen, Damage accumulation and amorphization in
Teen ee ee vie ao RRA SORA OS HEME Dee ee eee lee aes B74 (1993) 80
sk www oie wb bw bce ae be wy oe ele eb ewe a ew Re ee B74 (1993) 27
seWa ke Se Cao eee eae Wale a eek ee ee ae eee B74 (1993) 60
Neen ne wh cig ab dain Rk Gow a AS Oe RR OA ee a eee Rae B74 (1993) 94
Ne es ee ee a ee AR RRR RO Oh ED RD B74 (1993) 519
Wood, C., J. Murry and S. Cherekdjian, Beam defocusing for channeling reduction B74 (1993) 123
co ie @ ak ag iin OO Li eo ewe Awe Od kee ee een B74 (1993) 181
SRE RSE eo eR Ese” LP ar DP NOR eI CR an EY ORE ertS AL Ml er aD OR Hee B74 (1993) 336
Yamada, I., G.H. Takaoka, M.I. Current, Y. Yamashita and M. Ishii, Irradiation effects of gas-cluster CO, ion
Te ee eee aye MIE A ie wa ov kod ok ee ee a a ee B74 (1993) 341
Ne ne ne ee eee aki e ee a B74 (1993) 181
IS EE SSS, Sele CSE SPELL SP OEE LIES PEE OE PIPE EOIN OP EMT Ia on B74 (1993) 362
ne OOo e ee eke ae gue us ye oe ge ele ska lkle yon bia e'e ae agate meee B74 (1993) 317
Ce en ene ee gea oe a gti eer eed B74 (1993) 341
ee ss ke al ea WE AR RE A Oe ROCA oe Rae se Oh ee B74 (1993) 362
ESSE GAGS GE TIN SRE I GE es PRP ES NP RELA NAM tLM apR OE LT REISC oe ie Ro a B74 (1993) 138
Yang, Q., D.J. O’Connor, Z. Fang, T.R. Ophel, H.J. Hay and T.E. Jackman, Heavy ion RBS analysis of
EE ESS SEE RHEE MRR RR FN Ty AOU Eh Uet e Te tyA LR eR gE ore eee B74 (1993) 431
Yarling, C.B., J. Nunes and S. Chereckdjian, Statistical process analysis of ion implantation B74 (1993) 252
Cee ne ngsad 6U e ee Ce ee EO E Oh Oe DPR RS B74 (1993) 229
Yoshida, A., M. Kitagawa and T. Hirao, Application of a large area ion doping technique to a-Si:H TFT for
LCD B74 (1993) 331
B74 (1993) 306
Cr
Zhang, J.P., T.W. Fan, R.M. Gwilliam, P.L.F. Hemment, J.Q. Wen, Y. Qian, H. Efeoglu, J.H. Evans and A.R.
Peaker, Structural defects and their electrical activity in germanium implanted silicon ............... B74 (1993) 127
Nee I a eS ra wae a aia ete way gle gee aicug B74 (1993) 206
EEE EES SII LE RT CPE PO GT rl IeS F RS Le ID eo ME Pa B74 (1993) 380
Teen een ee ee OEMS LMA RE DRA See heeuees B74 (1993) 204
EO ESSE ESE OE EEN EOL OO Oe TNE GPP VEY SFT B74 (1993) 210
Zhu Wenhua, Lin Chenglu, Shi Zuoyu, Zou Shichang, P.L.F. Hemment and A. Nejim, Electrical characteriza-
tion of thin film SIMOX< structures B74 (1993) 218
i
610 Author index
a 5h a ee do AR RO ORR PA ee Dawe De eae B74 (1993) 450
Zou, S., see Lin, C. B74 (1993) 206
Zou Shichang, see Shi Zuoyu B74 (1993) 210
Zou Shichang, see Zhu Wenhua B74 (1993) 218
Zydzik, G.J., see Vredenberg, A.M. B74 (1993) 84