NASA Technical Reports Server (NTRS) 20160008051: A Magnetron Sputter Deposition System for the Development of X-Ray Multilayer Optics George C. Marshall Space Flight Center Research and Technology Report 2014

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by  NASA Technical Reports Server (NTRS)

A Magnetron Sputter Deposition System for
the Development of X-ray Multilayer Optics
Project Manager(s)/Lead(s)
David Broadway/ZP12
(256) 961–7689
Sponsoring Program(s)
Space Technology Mission Directorate
Center Innovation Fund
20 nm
Project Description
Transmission electron microscopy image
The project objective is to establish the capability to
of multilayer structure.
deposit multilayer structures for x-ray, neutron, and
extreme ultraviolet (EUV) optic applications through
the development of a magnetron sputtering deposition
Magnetron Sputter Source
system. A specific goal of this endeavor is to combine
N S N
multilayer deposition technology with the replication
S N S
process in order to enhance NASA Marshall Space
Flight Center’s (MSFC’s) position as a world leader in Target Argon Ions
the design of innovative x-ray instrumentation through Magnetic Field Accelerated to
Target Surface
Electric Field
the development of full shell replicated multilayer optics.
Coating Target Atoms Ejected
The development of multilayer structures are absolutely from Target Surface
Part Being Coated by Argon Ions
necessary in order to advance the field of x-ray astron-
omy by pushing the limit for observing the universe to
ever-increasing photon energies (i.e., up to 200 keV or
higher), well beyond Chandra’s (~10 keV) and NuStar’s
Schematic diagram of the magnetron sputtering process.
(~75 keV) capability. The addition of multilayer technol-
ogy would significantly enhance the x-ray optics capa-
bility at MSFC and allow NASA to maintain its world 100
leadership position in the development, fabrication, and 10–1 CuK α line(λ=1.54 A)
design of innovative x-ray instrumentation, which would
10–2
be the first of its kind by combining multilayer technol-
10–3
ogy with the mirror replication process. This marriage
of these technologies would allow astronomers to see %) 10–4
the universe in a new light by pushing to higher energies R ( 10–5
that are out of reach with today’s instruments. To this 10–6
aim, a magnetron vacuum sputter deposition system for
10–7 N=50, d=75 A, Γ=0.333, σ=3.3 A
the deposition of novel multilayer thin film x-ray optics
10–8 Rp=78.6%, FWHM=5.78 arcmin
is proposed. A significant secondary use of the vacuum
10–9
deposition system includes the capability to fabricate
0 1 2 3
multilayers for applications in the field of EUV optics
Θ (deg)
for solar physics, neutron optics, and x-ray optics for
a broad range of applications including medical imaging. Calculated reflectivity from a periodic multilayer structure.
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Anticipated Benefits Notable Accomplishments
The ultimate goal is to provide the x-ray astrophys- Funding cuts in the first year prohibited the completion
ics community with improved instrumentation for the of first year goals. However, a vacuum chamber was
discovery of how the universe works from the very designed, procured, and received.
moment of its creation through the evolution of galax-
ies, stars, and planets, how it will continue to evolve,
and what its ultimate fate may be.
This project is specifically related to the following tech-
nology theme: x-ray telescope systems and associated
technologies.
C
The activity of this project also stimulates the neutron, I
F
EUV, and x-ray instrumentation development in other
fields including medical imaging.
131