MEMS Materials and Processes Handbook MEMS Reference Shelf SeriesEditors: StephenD.Senturia RogerT.Howe ProfessorofElectrical ProfessorDepartment Engineering,Emeritus ofElectricalEngineering MassachusettsInstitute StanfordUniversity ofTechnology Stanford,California Cambridge,Massachusetts AntonioJ.Ricco SmallSatelliteDivision NASAAmesResearchCenter MoffettField,California Forothertitlesinthisseries,goto: www.springer.com/series/7724 · Reza Ghodssi Pinyen Lin Editors MEMS Materials and Processes Handbook 123 Editors RezaGhodssi PinyenLin DepartmentofElectricalandComputer TouchMicro-systemTechnologyCorp. Engineering Taoyuan InstituteforSystemsResearch Taiwan MEMSSensorsandActuatorsLaboratory and UniversityofMaryland WalsinLihwaCorporation CollegePark,Maryland Taipei USA Taiwan [email protected] [email protected] ISSN1936-4407 ISBN978-0-387-47316-1 e-ISBN978-0-387-47318-5 DOI10.1007/978-0-387-47318-5 SpringerNewYorkDordrechtHeidelbergLondon LibraryofCongressControlNumber:2011921730 ©SpringerScience+BusinessMedia,LLC2011 Allrightsreserved.Thisworkmaynotbetranslatedorcopiedinwholeorinpartwithoutthewritten permission of the publisher (Springer Science+Business Media, LLC, 233 Spring Street, New York, NY 10013, USA), except for brief excerpts in connection with reviews or scholarly analysis. Use in connection with any form of information storage and retrieval, electronic adaptation, computer soft-ware,orbysimilarordissimilarmethodologynowknownorhereafterdevelopedisforbidden. Theuseinthispublicationoftradenames,trademarks,servicemarks,andsimilarterms,eveniftheyare notidentifiedassuch,isnottobetakenasanexpressionofopinionastowhetherornottheyaresubject toproprietaryrights. Printedonacid-freepaper SpringerispartofSpringerScience+BusinessMedia(www.springer.com) Foreword Thefieldthatisaffectionatelyknownas“MEMS”(anacronymforMicro-Electro- Mechanical Systems) is a descendant of the integrated circuits industry, but a descendent that has developed in ways and directions never anticipated by its par- ent.Nowahighlyspecializeddisciplineinitsownright,MEMSdrawsnotonlyon allofconventionalmicroelectronicsbutalsoonnovelfabricationmethodsanduses ofnon-microelectronicmaterialstocreatedevicesthataremechanical,orfluidic,or biochemical, or optical, many without any transistors in sight. The key words are sensors and actuators, sometimes combined with (or without) microelectronics to create complete microsystems. MEMS devices and microsystems are now found everywhere – in automobiles, in ink-jet printers, in computer games, in mobile telephones, in forensic labs, in factories, in sophisticated instrumentation systems launchedintospace,intheoperatingroomandintheclinic.Thegenieisoutofthe bottle.MEMSdevicesareeverywhere. Because of this immense diversity, no single book can capture the essence of the entire field. But all MEMS devices represent highly specific answers to two criticalquestions:“HowshallImakeit?AndfromwhatmaterialsshallImakeit?” Processesandmaterials.Materialsandprocesses.Becausethesetwochallengesare common to all MEMS devices, it makes sense to gather the wisdom of the least severaldecadeson“howtomakeit”and“fromwhatmaterials”intoasingledata- rich,process-detail-richcompendium.Thatistheraisond’etreforthisvolume,and thatisitsgoal:todocumentMEMSprocessesandmaterialsatasufficientlevelof detailtobeofsignificantpracticaluse. Icongratulatetheco-Editors,RezaGhodssiandPinyenLin,aswellasourcon- sultingeditorsandallofthecontributors,fortheirdiligence,persistence,care,and skill in bringing this material to published form, and I invite the MEMS commu- nity world-wide to benefit from the knowledge, wisdom and cumulative expertise gatheredintothesepages. Brookline,Massachusetts StephenD.Senturia June2010 v ThisisBlankPageIntegra vi Preface Throughout the relatively short history of microelectromechanical systems (MEMS), there have been numerous advances and inventions directly related to devicefabrication.FromhumblebeginningsusingborrowedandmodifiedICfabri- cationtechniquestocurrentMEMS-specifictoolssuchasdeepreactiveionetching (DRIE) using inductively coupled plasma (ICP) sources, MEMS researchers have continually advanced and augmented the capabilities of wafer-based fabrication technologies. These advances have been instrumental in the demonstration of new devicesandapplications–TexasInstruments’DigitalMicromirrorDevice,theMIT microturbine, Analog Devices’ accelerometers – and even in the creation of new fields of research and development: bioMEMS, microfluidic devices, and optical MEMS. Todate,anumberofbookshavebeenwrittenaboutthesenewfabricationtech- nologies and materials in general, but discussion of their relationship to MEMS design has been minimal. As a particularly diverse and multidisciplinary area of research, the field of MEMS offers a vastly different set of challenges relative to typicalICfabricationanddesign.Mucheffortisoftenfocusedoncharacterization runs and developing in-house recipes and specific processes to develop and man- ufacture MEMS structures, each time at the risk of wasting research efforts and “reinventing the wheel.” A wealth of knowledge exists in the MEMS community, butmuchofthisexpertiseismostreadilyaccessedbyinformal,nonmethodological meanssuchasdiscussionswithcolleaguesatconferences.Theauthorsofthisbook have observed an unnecessarily steep learning curve for the development of com- mon MEMS processes, and believe the time spent traversing this curve would be better spent brainstorming new ideas and uncovering new applications. This book wasconceivedandbornofthisbelief. A fundamental and comprehensive MEMS-focused reference book will be an important asset for current and future research scientists and engineers. It was decided early in the brainstorming sessions for this book to include materials as well as processes in the discussion, as MEMS utilizes a wide variety of each in commonapplications.Weintendthisbooktoprovidethereaderwiththebasicsof MEMSmaterialsandprocesses,butbeyondthisgoal,weintendforittogiveprac- ticalinsightintotheworkingsandstandardprocedurescarriedoutinresearchlabs vii viii Preface andproductionfacilitiesonadailybasis.Tothisend,eachchapterhasanextended section with case studies, giving step-by-step examples and recipes prepared by experts in industry and academia. Particularly, the effect of processing conditions on material properties are covered where applicable, illustrating the interdepen- dence and multidisciplinary nature of MEMS fabrication. The chapters are meant to be a springboard of sorts, providing basic information about each topic, with a largenumberofclassicandcontemporaryliteraturereferencestoprovidein-depth knowledge.Ultimately,itisourgoaltoprovideausefuldesignreferencevolumefor theseasonedresearcherandtheMEMSnewcomeralike.Wehopethisbookconsol- idatesimportantinformationforreadersandtherebyspursthecreationofmanynew devicesandprocesses. MEMS devices are essentially microsystems that have structures and empty space built together. The authors of this book view the materials and processes as the fundamental building blocks for making those structures and empty spaces. Keepingthisinmind,thebookisdividedintotwomainsections:Chapters2,3,4, 5, and 6 covering materials and Chapters 7, 8, 9, 10, 11, 12, and 13 covering fab- ricationtechniques.ThesetwogeneralthrustsarebookendedbyChapter1,which discussesgeneralMEMSdesign,andChapter14,whichdealswithMEMSprocess integration. Chapter1providesabasicframeworkforthedesignofMEMSsystemsandpro- cesses, which we highly recommend reading before diving into the materials and process sections of the book. Chapter 2 presents an overview of the recipes and methods used in the deposition of semiconductor and dielectric thin-films, partic- ularly those most commonly used in the fabrication of MEMS. The basics here includechemicalvapordeposition,epitaxy,physicalvapordeposition,atomiclayer deposition, and spin-on techniques. Additive processes for depositing metal films are discussed in detail in Chapter 3, where particular attention is paid to thick metaldepositionwithsignificantcoveragedevotedtoelectrochemicalandelectro- lessplatingprocessesthatareoftenrequiredforMEMSfabrication.Theentiretyof Chapter4isdevotedtotheuseofpolymericmaterialsforMEMS.Polymers,suchas polydimethylsiloxane(PDMS),areimportantmaterialsforavastarrayofdevices, as encapsulants for tactile sensors and as an integral enabling technology for the emerging field of bioMEMS. The piezoelectric films detailed in Chapter 5 are an importantpartofMEMStechnology,servingasbothsensorandactuatorelements. The basic properties of these materials and the physics of operation are described indetailaswellaspracticaldepositionandfabricationmethods.Chapter6focuses on the fabrication and integration of shape memory alloy (SMA) materials, which providehigh-forceandhigh-displacementactuatormechanismsforMEMS. Chapter7beginsthesectiononprocessingofmaterialsforMEMSapplications by covering the very important area of dry etching methods (including DRIE), particularly the influence of different parameters on the etch recipe development process. Complementing the coverage of dry etching, wet etching processes for MEMSmicromachiningarecoveredinChapter8withacomprehensiverecipeand referencelistincludedinthischaptertoaidinfindingetchratesandetchselectivities forawiderangeofmaterialsfromsilicontoIII–Vcompoundsemiconductors. Preface ix Chapter 9 describes the technology of lithography and related techniques, cov- ering traditional contact lithography, projection and X-ray lithography, and more exoticdirect-writeandprintinglithographictechniques.Dopingprocessestypicalin andforMEMSapplicationsforelectricalpurposesandetchingcontrolarereviewed in Chapter 10, along with diagnostic techniques for these methods. Wafer bond- ing, a crucial fabrication technique for silicon MEMS encapsulation and structure fabrication, is covered in detail in Chapter 11 with emphasis placed on direct and intermediatelayerbondingmethods. Chapter 12 discusses the still-evolving field of MEMS packaging, pointing out differences with current microcircuit packaging techniques; this chapter in partic- ular highlights how MEMS devices present very unique challenges as compared totraditionalmicrocircuits.SurfacetreatmentsforMEMSdevicesarediscussedin Chapter 13, covering antistiction and planarization coatings, functionalization of surfacesforbiologicalandopticalapplications,andchemicalmechanicalpolishing (CMP).Chapter14concludesthebookwithadiscussionoftheintegrationofany number of the above processes and materials into a compatible and efficient pro- cess flow, referred to here as process integration. The final chapter also discusses economic and practical aspects of process integration, citing some commercially successfulexamplesofMEMSdevices. Thisreferencevolumewouldnothavebeenpossiblewithoutthehelpofmanyof ourcolleaguesintheMEMSfields,frombothacademiaandindustry.Wewouldlike to extend words of thanks and gratitude to Stephen (Steve) Senturia for providing thevision,support,andguidancetoourteamoverthepastfiveyearsinnavigating thecompletionofthechaptersandforreviewingthemdiligently,andtotheSeries Associate Editors Roger Howe and Antonio (Tony) Ricco for carefully reviewing thechapters,providinghelpfulcomments,andforrecommendingprospectivecon- tributingauthors.WethankSteven(Steve)Elliot,fromSpringer,forhispatiencein dealingwiththirty-fiveuniqueandindependentexperts,andhispersistenceincon- tactingeachofusinordertodevelopthelogisticsforthebookpublishingprocess. Last but not least, we acknowledge all thirty-five contributing authors, who self- lesslygavetime,expertise,effort,andcreativitytomakethisbookaone-of-a-kind contribution to the current and future MEMS community, including industry and governmentprofessionals,academicfacultyandstaff,andstudents. The idea for this book was born at the Transducers 2005 Conference in Seoul, SouthKorea,anditwasfinalizedandfinishedatTheHiltonHead2010Workshop on Hilton Head Island, South Carolina. The five years of cooperative activity that culminated in this handbook prove that great ideas can become reality when col- leagues work collaboratively to achieve a common goal. This message, which we havetriedtoconveybywritingthisbook,iswhatthegreaterMEMScommunityis allabout. CollegePark,Maryland RezaGhodssi Taoyuan,Taiwan PinyenLin