Luminous Chemical Vapor Deposition and Interface Engineering PDF
840 Pages·2004·35.803 MB·English
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Description:
Yasuda (chemical engineering, University of Missouri-Columbia) provides in-depth coverage of the technologies and various approaches in luminous chemical vapor deposition (LCVD) and showcases the development and use of LCVD procedures in industrial scale applications. The book provides broad coverage of the relationships involved in the interface between gas/solid, liquid/solid, and solid/solid which can be utilized in low-pressure plasma interface engineering, with attention focused on plasma polymerization. Coverage progresses from fundamentals of LCVD through operation of LCVD and LCVT, surfaces and interfaces, and interface engineering.
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