Introduction to Plasma Technology

232 Pages·2010·0.894 MB·English

by  John Ernest Harry

JohnHarry
Introductionto
PlasmaTechnology
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John Harry
Introduction to Plasma Technology
Science, Engineering and Applications
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V
Contents
Preface XI
Symbols,ConstantsandElectronicSymbols XIII
1 Plasma,anOverview 1
1.1 Introduction 1
1.2 Plasma 4
1.2.1 SpacePlasmas 4
1.2.2 KineticPlasmas 4
1.2.3 TechnologicalPlasmas 5
1.3 ClassicalModels 5
1.3.1 SimpleBallisticandStatisticalModels 5
1.3.2 StatisticalBehaviour 6
1.3.3 CollisionsBetweenParticles 8
1.3.4 CoulombForces 9
1.3.5 BoundariesandSheaths 10
1.3.6 DegreeofIonization 10
1.4 PlasmaResonance 11
1.5 TheDefiningCharacteristicsofaPlasma 11
References 13
FurtherReading 13
2 ElasticandInelasticCollisionProcessesinWeaklyIonizedGases 15
2.1 Introduction 15
2.2 TheDriftVelocity 15
2.2.1 ElectricalConductivity 17
2.2.2 Mobility 17
2.2.3 ThermalVelocity 18
2.2.4 CollisionFrequency 18
2.2.5 CollisionCross-section 19
2.3 InelasticCollisionProcesses 21
2.3.1 Excitation 22
2.3.1.1 MetastableProcesses 22
IntroductiontoPlasmaTechnology:Science,EngineeringandApplications.JohnHarry
Copyright2010WILEY-VCHVerlagGmbH&Co.KGaA,Weinheim
ISBN:978-3-527-32763-8
VI Contents
2.3.2 IonizationandRecombinationProcesses 23
2.3.2.1 ChargeTransfer 24
2.3.2.2 Dissociation 24
2.3.2.3 NegativeIonization 24
2.3.2.4 Recombination 24
2.3.2.5 MetastableIonization 25
References 26
3 TheInteractionofElectromagneticFieldswithPlasmas 29
3.1 Introduction 29
3.2 TheBehaviourofPlasmasatDCandLowFrequenciesintheNear
Field 29
3.2.1 ChargedParticlesinElectromagneticFields 31
3.2.1.1 BehaviourofaChargedParticleinanOscillatingElectric
Field 32
3.2.1.2 PlasmaFrequency 34
3.2.1.3 TheDebyeRadius 35
3.3 BehaviourofChargedParticlesinMagneticFields(Magnetized
Plasmas) 37
3.4 InitiationofanElectricalDischargeorPlasma 41
3.5 SimilarityConditions 41
References 43
FurtherReading 43
4 CouplingProcesses 45
4.1 Introduction 45
4.2 DirectCoupling 45
4.2.1 TheCathode 49
4.2.1.1 EmissionProcesses 51
4.2.2 TheCathodeFallRegion 56
4.2.3 TheAnode 57
4.2.4 TheDischargeColumn 57
4.2.5 InteractionofMagneticFieldswithaDischargeor
Plasma 59
4.3 IndirectCoupling 62
4.3.1 InductionCoupling 62
4.3.2 CapacitiveCoupling 64
4.3.3 PropagationofanElectromagneticWave 65
4.3.4 TheHelicalResonator 68
4.3.5 MicrowaveWaveguides 69
4.3.6 ElectronCyclotronResonance 70
4.3.7 TheHeliconPlasmaSource 74
References 75
FurtherReading 75
Contents VII
5 ApplicationsofNonequilibriumColdLow-pressureDischargesand
Plasmas 77
5.1 Introduction 77
5.2 PlasmaProcessesUsedinElectronicsFabrication 77
5.2.1 TheGlowDischargeDiode 80
5.2.2 TheMagnetron 83
5.2.3 InductivelyCoupledPlasmas 84
5.2.4 ElectronCyclotronResonanceReactor 85
5.2.5 TheHelicalReactor 86
5.2.6 TheHeliconReactor 87
5.3 Low-pressureElectricDischargeandPlasmaLamps 88
5.3.1 TheLow-pressureMercuryVapourLamp 88
5.3.2 ColdCathodeLow-pressureLamps 91
5.3.3 ElectrodelessLow-pressureDischargeLamps 91
5.4 GasLasers 91
5.5 FreeElectronandIonBeams 94
5.5.1 ElectronandIonBeamEvaporation 94
5.5.2 IonBeamProcesses 95
5.5.3 High-powerElectronBeams 97
5.6 GlowDischargeSurfaceTreatment 99
5.7 PropulsioninSpace 100
References 101
FurtherReading 101
6 NonequilibriumAtmosphericPressureDischargesandPlasmas 103
6.1 Introduction 103
6.2 AtmosphericPressureDischarges 103
6.2.1 CoronaDischarges 105
6.2.2 CoronaDischargesonConductors 108
6.3 ElectrostaticChargingProcesses 110
6.3.1 ElectrostaticPrecipitators 110
6.3.2 ElectrostaticDeposition 113
6.4 DielectricBarrierDischarges 114
6.5 PlasmaDisplayPanels 116
6.6 ManufactureofOzone 116
6.7 SurfaceTreatmentUsingBarrierDischarges 118
6.8 Mercury-freeLamps 118
6.9 PartialDischarges 118
6.10 SurfaceDischarges 120
FurtherReading 121
7 PlasmasinChargeandThermalEquilibrium;ArcProcesses 123
7.1 Introduction 123
7.2 ArcWelding 124
7.2.1 MetalInertGasWelding 126
VIII Contents
7.2.2 TungstenInertGasWelding 127
7.2.3 SubmergedArcWelding 129
7.2.4 ThePlasmaTorch 129
7.3 ElectricArcMelting 131
7.3.1 TheThree-phaseACArcFurnace 131
7.3.2 DCArcFurnaces 134
7.3.3 ElectricArcSmelting 135
7.3.4 PlasmaMeltingFurnaces 136
7.3.5 VacuumArcFurnaces 137
7.4 ArcGasHeaters 138
7.4.1 InductivelyCoupledArcDischarges 139
7.5 High-pressureDischargeLamps 141
7.6 IonLasers 144
7.7 ArcInterrupters 145
7.7.1 VacuumCircuitBreakersandContactors 147
7.8 MagnetoplasmadynamicPowerGeneration 149
7.9 GenerationofElectricitybyNuclearFusion 149
7.10 NaturalPhenomena 150
7.10.1 Lightning 150
FurtherReading 152
8 DiagnosticMethods 155
8.1 Introduction 155
8.2 NeutralParticleDensityMeasurement 155
8.3 ProbesandSensors 156
8.3.1 TheLangmuirProbe 156
8.3.2 MagneticProbes 158
8.4 OpticalSpectroscopy 159
8.4.1 OpticalEmissionSpectroscopy 159
8.4.2 AbsorptionSpectroscopy 161
8.4.3 ScatteringMeasurements 161
8.5 Interferometry 162
8.5.1 MicrowaveInterferometer 163
8.6 MassSpectrometry 164
8.7 ElectricalMeasurements 165
8.7.1 ElectricalInstrumentation 166
8.7.2 TheOscilloscope 167
8.7.3 ElectricalMeasurementsUsingProbes 168
8.7.4 CurrentMeasurement 170
FurtherReading 172
9 Matching,ResonanceandStability 173
9.1 Introduction 173
9.2 ThePlasmaCharacteristic 173
9.3 StabilizingMethods 176
Contents IX
9.3.1 ReactiveStabilization 176
9.4 EffectofFrequency 179
9.5 InteractionbetweenthePlasmaandPowerSupplyTime
Constants 179
9.6 Matching 180
9.7 Resonance 182
9.8 ParasiticInductanceandCapacitance 183
FurtherReading 185
10 PlasmaPowerSupplies 187
10.1 Introduction 187
10.2 TransformersandInductors 187
10.3 Rectification 191
10.4 SemiconductorPowerSupplies 193
10.4.1 TheInverterCircuit 193
10.4.2 SemiconductorSwitches 195
10.4.3 CurrentControl 195
10.4.4 TheInverterCircuit 196
10.4.5 ConverterCircuits 197
10.4.6 InverterFrequencies 198
10.4.7 High-FrequencyInverter 198
10.5 ElectronicValveOscillators 199
10.6 MicrowavePowerSupplies 199
10.7 PulsedPowerSupplies 200
10.8 IgnitionPowerSupplies 201
10.9 ElectromagneticInterference 205
10.9.1 Conduction 206
FurtherReading 207
Index 209