Developments in Surface Contamination and Cleaning Volume Four Detection, Characterization, and Analysis of Contaminants Edited by Rajiv Kohli and K.L. Mittal AMSTERDAMlBOSTONlHEIDELBERGlLONDON NEWYORKlOXFORDlPARISlSANDIEGO SANFRANCISCOlSINGAPORElSYDNEYlTOKYO WilliamAndrewisanimprintofElsevier Developments in Surface Contamination and Cleaning Series Series editors: Rajiv Kohli andK.L. Mittal Volume 1: Fundamentals andApplied ISBN: 978-0-8155-1555-5 Aspects(2008) Volume 2: Particle Deposition,Control ISBN: 978-1-4377-7830-4 and Removal (2010) Volume 3: Methods for Removal of Particle ISBN: 978-1-4377-7885-4 Contaminants (2011) Volume 4: Detection, Characterization, ISBN: 978-1-4377-7883-0 and AnalysisofContaminants(2011) Volume 5: Methods for Removal of ISBN: 978-1-4377-7881-6 Non-Particulate Contaminants (2012) Volume6:Sources,Generation,andBehavior ISBN: 978-1-4377-7879-3 of Contaminants(2012) WilliamAndrewisanimprintofElsevier 225WymanStreet,Waltham,MA02451,USA TheBoulevard,LangfordLane,Kidlington,OxfordOX51GB,UK Firstedition2012 Copyright(cid:1)2012ElsevierInc.Allrightsreserved. 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LibraryofCongressCataloging-in-PublicationData AcatalogrecordforthisbookisavailablefromtheLibraryofCongress BritishLibraryCataloguinginPublicationData AcatalogrecordforthisbookisavailablefromtheBritishLibrary ISBN:978-1-4377-7883-0 ForinformationonallElsevierpublications visitourwebsiteatelsevierdirect.com PrintedandboundinGreatBritain 121314 10987654321 Preface ThepurposeofthisbookseriesonDevelopmentsinSurfaceContaminationand Cleaningistoprovideacontinuousstate-of-the-artcriticallookatthecurrent knowledge of the behavior of both film-type and particulate surface contami- nants. The first 3 volumes, published in 2008, 2010, and 2011, respectively, covered various topics dealing with the fundamental nature of contaminants, their measurement and characterization, and different techniques for their removal. The present bookis the fourthvolumein the series. The individual contributions in the present book provide state-of-the-art reviews by subject matter experts on characterization of contaminants on surfaces. The focus of Roger Welker’s first chapter is on sampling of particles for subsequent size analysis and identification of contamination. Contamination in particle form can originate from the facility, from tooling and work surfaces, from the piece parts, from indirect materials and packaging, and from people. Thesecategoriesarediscussedatlengthtoprovideabetterunderstandingofthe complexity of contamination sources that must be considered in a particle contamination controlprogram.Particles can besampled fromair, compressed gases,liquidsandsurfaces.Thesourcesofpossibleerrorsineachcasearedis- cussed.Thesamplingprocessesareillustratedbytheapplicationincleanrooms withsomesimpleexamplesoftechniquesforcorrectingairflowproblems. Computational fluid dynamics is increasingly employed for analyzing aerosoltransportanddepositioninvariousapplications.Afteranoutlineofthe fundamentalsofcomputationalmodelingofairflowfields,particularlyairflow turbulence, Goodarz Ahmadi describes the hydrodynamic forces on small particles suspended in air, including drag and lift, and the importance of Cunningham slip correction, as well as Brownian motion for nano-size parti- cles, using the Lagrangian particle trajectory analysis procedure. The appli- cation of the computational modeling to aerosol transport and deposition in human airway passages ispresented. Therearemanydirectandindirectmethodsformeasuringandmonitoring thecleanlinessofsurfacesforvariousapplications.Thesemethodsrangefrom direct visual examination of the surface of interest to extracting the contami- nantsfromthesurfaceforofflineanalysisbyoneormoreanalyticaltechniques. Inhisfirstcontribution,RajivKohlidiscussesrecentdevelopmentsinthemore commonsurfacecleanlinessassessmentmethods.Withthecurrentcapabilities of these cleanliness assessment methods, it is possible to characterize surface cleanliness from the macroscale to the nanoscale for the major types of vii viii Preface contaminants, namely, particles, thin films or molecular contamination, ionic contamination, and biological contaminants. In his second chapter, Roger Welker discusses size analysis and identifi- cation ofparticles based ontheconceptofequivalentsphericaldiameters and the sampling considerations in his previous chapter. Particle identification is directedtowardcharacterizationoftheatomicand/ormolecularcompositionof the individual particles. This is often important to applications such as contamination control in a cleanroom or industrial quality control or failure analysis. Another method to identify particles is via bulk material analysis, where the entire sample is analyzed for atomic or molecular identification. A representativesetofthelargenumberofanalysismethodsisdiscussedwiththe hopethatthiswillleadtheinterestedreaderintoamoreindepthexplorationof candidatechemical analysismethods. Rajiv Kohli, in his second contribution, describes recent developments in a variety of techniques for imaging and analysis of submicrometer and sub- nanometer size particles and surface features. For example, aberration-free imaging with sub-Angstrom resolution can be routinely achieved in high- resolution transmission electron microscopy. Other developments include combiningtechniquessuchastransmissionelectronmicroscopywithscanning probe microscopy and other chemically-sensitive sensors, in-situ wet trans- mission electron microscopy, electron and X-ray tomography, neutron holog- raphy, four-dimensional ultrafast microscopy and spectroscopy, nanometer resolutionscanningthermalmicroscopy,andhigh-resolutionX-raymicroscopy ofnon-crystallinestructures.Thesedevelopmentshavenowmadeitpossibleto image particlesand surface featuresdownto0.1nm size. In recent years atomic force microscopy (AFM) has emerged as a signifi- cant experimental technique. Unlike other forms of microscopy, AFM is capable of acquiring information beyond a simple topographical or morpho- logical assessment of a surface. In their chapter, Frank Etzler and Jaroslaw Drelich review the types of measurements on particles possible with AFM. Particle adhesion and particle surface chemistry are important to the perfor- manceandmanufactureofawidevarietyofproductsincludingelectronicand pharmaceutical products. Specifically, the use of AFM for the assessment of particlesize,particlemechanicalpropertiesandparticlesurfacecontamination isaddressed.AFMisuniqueinitsabilitytoaddressthemechanicalproperties of small particles. Overall, AFM provides a useful tool for investigating the nature of surfaces and their interactions with particles and for investigating particle-particleinteractions. Thecontributionsinthisbookprovideavaluablesourceofinformationonthe currentstatusandrecentdevelopmentsintherespectivetopicsoncharacteriza- tionofsurfacecontaminants.Thebookwillbeofvaluetogovernment,academic, and industry personnel involved in research and development, manufacturing, processandqualitycontrol,andprocurementspecificationsinmicroelectronics, aerospace,optics,xerography,joining(adhesivebonding)andotherindustries. Preface ix Wewouldliketoexpressourheartfeltthankstoalltheauthorsinthisbook for their contributions, enthusiasm and cooperation. Our sincere appreciation goestoMatthewDeans,ourpublisher,whohasstronglysupportedpublication of this book and the future volumes in this series. Melissa Read and Debbie Clark have been instrumental in seeing the book to publication. Rajiv Kohli wouldalsoliketothankJodyMantellforhertirelesseffortsinlocatingobscure and difficult-to-accessreference materials. Color versions of images presented in the book are also available on the companionwebsite:http://www.elsevierdirect.com/companions/9781437778830. Rajiv Kohli Houston,Texas Kash Mittal HopewellJunction,NewYork About the Editors Dr. Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminantparticlebehavior,surfacecleaning,andcontaminationcontrol.At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflighthardwarefortheSpaceShuttleandtheInternationalSpaceStation, as well as for unmanned spacecraft. Dr. Kohli was involved in developing solvent-basedcleaningapplicationsforuseinthenuclearindustryandhealso developed an innovativemicroabrasivesystem for awidevariety of precision cleaning and micro-processing applications in the commercial industry. He is the principal editor of the new book series ‘Developments in Surface Contamination and Cleaning’; the first three volumes in the series were pub- lishedin2008,2010and2011,respectively,andthepresentbookisthefourth volume in the series. Previously, Dr. Kohli co-authored the book Commercial UtilizationofSpace: AnInternationalComparison ofFrameworkConditions, and he has published more than 200 technical papers, articles, and reports on precision cleaning, advanced materials, chemical thermodynamics, environ- mental degradation of materials, and technical and economic assessment of emergingtechnologies.Dr.Kohliwasrecentlyrecognizedforhiscontributions toNASA’sSpaceShuttleReturntoFlighteffortwiththePublicServiceMedal, one ofthe agency’s highest awards. xi xii AbouttheEditors Dr.KashmiriLal‘Kash’MittalwasassociatedwithIBMfrom1972to1994. Currently, he isteaching and consultingin the areas of surface contamination andcleaningandinadhesionscienceandtechnology.HeistheEditor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 100 published books, many of them dealing with surface contamination and cleaning.Dr.Mittalwasrecognizedforhiscontributionsandaccomplishments by the worldwide adhesion community which organized in his honor on his 50th birthday the 1st International Congress on Adhesion Science and TechnologyinAmsterdamin1995.TheKashMittalAwardwasinauguratedin his honor for his extensive efforts and significant contributions in the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title of doctor honoris causa by the Maria Curie-Sklodowska UniversityinLublin,Poland,in2003.Morerecently,hewashonoredinBoston bytheinternationaladhesioncommunityontheoccasionofpublicationofhis 100th edited book. Contributors , Goodarz Ahmadi Department of Mechanical and Aeronautical Engineering, Clarkson University,Potsdam,NY13699-5725, USA , Jaroslaw Drelich Department of Materials Science and Engineering, Michigan TechnologicalUniversity, 1400TownsendDr,Houghton, MI49931, USA , Frank M. Etzler School of Pharmacy, Lake Erie College of Osteopathic Medicine, Erie, PA16509, USA , Rajiv Kohli The Aerospace Corporation, 2525 Bay Area Blvd, Suite 600, Houston, TX 77058, USA , Roger W. Welker RW Welker Associates, 19060 Brasilia Drive, Northridge, CA 91326, USA xiii Chapter 1 Basics and Sampling of Particles for Size Analysis and Identification Roger W. Welker R.W.WelkerAssociates,19060BrasiliaDrive,Northridge,CA91326,USA Chapter Outline 1. Introductionandbasics 2 2.2. Sampling 19 1.1. PotentialSources 3 2.2.1. AirborneParticle 1.2. ClassificationofAnalysis Sampling 19 Methods 6 2.2.2. Aerosol 1.3. ParticleInventories 7 Properties 22 1.4. WhyParticles? 8 2.2.3. Isokinetic 1.5. WhoistheAudience? 10 Sampling 24 1.6. Applicability(Small 2.2.4. Nonisokinetic Volumevs.HighVolume)11 Sampling 26 1.7. Contamination 2.2.5. CriticalandBusy MeasurementStrategies Sampling 27 (Grossvs.Precision 2.3. Samplingfrom MeasurementStrategies) 11 CompressedGas 1.8. Directvs.Indirect Sources 28 Measurements 12 2.4. SamplingSurfaces 29 2. Sampling 12 2.4.1. TapeLift 29 2.1. WhatHoldsParticlesto 2.4.2. WitnessPlates 29 Surfaces? 12 2.4.3. Agitationand 2.1.1. vanderWaals Undulation 30 attraction 12 2.4.4. Ultrasonic 2.1.2. Electrostatic Extraction 31 Attraction 14 2.4.5. SprayExtraction 32 2.1.3. Capillary 2.5. SamplingLiquids 34 Attraction 17 3. Solventsandsolubility 2.1.4. ChemicalBonding 18 parameters 35 DevelopmentsinSurfaceContaminationandCleaning,vol4.DOI:10.1016/B978-1-4377-7883-0.00001-8 EditedbyRajivKohli&K.L.Mittal.Copyright(cid:1)2012ElsevierInc.Allrightsreserved. 1