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Computer Applications to Chemical Engineering. Process Design and Simulation PDF

499 Pages·1980·6.238 MB·English
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1 0 0 w 4.f Computer Applications to 2 1 0 0- 8 19 Chemical Engineering k- b 1/ 2 0 1 0. 1 oi: d 0 | 8 9 1 0, 3 y a M e: at D n o ati c bli u P In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. 1 0 0 w 4.f 2 1 0 0- 8 9 1 k- b 1/ 2 0 1 0. 1 oi: d 0 | 8 9 1 0, 3 y a M e: at D n o ati c bli u P In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. Computer Applications to Chemical Engineering Process Design and Simulation Robert G. Squires, EDITOR Purdue University 1 0 0 w 4.f G. V. Reklaitis, EDITOR 2 1 0 0- Purdue University 8 9 1 k- b 1/ 2 Based on a symposium 0 1 0. 1 oi: sponsored by the d 0 | 8 9 1 Division of Industrial and 0, 3 y a M Engineering Chemistry at the e: at D n 178th Meeting of the o ati c bli American Chemical Society, u P Washington, D. C., September 11-13, 1979. ACS SYMPOSIUM SERIES 124 AMERICAN CHEMICAL SOCIETY WASHINGTON, D. C. 1980 In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. 1 0 0 w 4.f 2 1 0 0- Library of Congress CIP Data 8 9 1 Computer applications to chemical engineering process bk- design and simulation. 21/ (ACS symposium series; 124 ISSN 0097-6156) 0 1 0. Includes bibliographies and index. oi: 1 I1.. SCqhueimresic, aRl porboecret ssG .c, o1n9t3ro5l-— Co.n gIIr.e sRseesk.l aitis, G. V., d 0 | 1942- . III. American Chemical Society. Division 8 of Industrial and Engineering Chemistry. IV. Series. 9 1 American Chemical Society. ACS symposium series; 0, 124. 3 ay TP155.75.C65 660.2'81 79-27719 M ISBN 0-8412-0549-3 ACSMC8 124 1-511 1980 e: at D n o ati c bli Copyright © 1980 u P American Chemical Society All Rights Reserved. The appearance of the code at the bottom of the first page of each article in this volume indicates the copyright owner's consent that reprographic copies of the article may be made for personal or internal use or for the personal or internal use of specific clients. This consent is given on the condition, however, that the copier pay the stated per copy fee through the Copyright Clearance Center, Inc. for copying beyond that permitted by Sections 107 or 108 of the U.S. Copyright Law. This consent does not extend to copying or transmission by any means—graphic or electronic—for any other purpose, such as for general distribution, for advertising or promotional purposes, for creating new collective works, for resale, or for information storage and retrieval systems. The citation of trade names and/or names of manufacturers in this publication is not to be construed as an endorsement or as approval by ACS of the commercial products or services referenced herein; nor should the mere reference herein to any drawing, specification, chemical process, or other data be regarded as a license or as a conveyance of any right or permission, to the holder, reader, or any other person or corporation, to manufacture, repro duce, use, or sell any patented invention or copyrighted work that may in any way be related thereto. PRINTED IN THE UNITED STATES OF AMERICA In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. ACS Symposium Series 1 M. Joan Comstock, Series Editor 0 0 w 4.f 2 1 0 0- 8 9 k-1 Advisory Board b 1/ 2 10 David L. Allara W. Jeffrey Howe 0. 1 oi: Kenneth B. Bischoff James D. Idol, Jr. d 0 | 98 Donald G. Crosby James P. Lodge 1 0, 3 y Donald D. Dollberg Leon Petrakis a M ate: Robert E. Feeney F. Sherwood Rowland D n o ati Jack Halpern Alan C. Sartorelli c bli Pu Brian M. Harney Raymond B. Seymour Robert A. Hofstader Gunter Zweig In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. 1 FOREWORD 0 0 w 24.f The ACS SYMPOSIUM SERIES was founded in 1974 to provide 1 0-0 a medium for publishing symposia quickly in book form. The 8 9 format of the Series parallels that of the continuing ADVANCES 1 bk- IN CHEMISTRY SERIES except that in order to save time the 1/ 2 papers are not typeset but are reproduced as they are sub 0 1 0. mitted by the authors in camera-ready form. Papers are re 1 oi: viewed under the supervision of the Editors with the assistance d 0 | of the Series Advisory Board and are selected to maintain the 98 integrity of the symposia; however, verbatim reproductions of 1 0, previously published papers are not accepted. Both reviews 3 y and reports of research are acceptable since symposia may a M e: embrace both types of presentation. at D n o ati c bli u P In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. PREFACE his volume contains selected papers from a five-session symposium Α on "Computer Applications to Chemical Engineering Process Design and Simulation" sponsored by the I&EC Division of ACS held in Wash­ ington, D.C. in September of 1979. Although shorter symposia on special topics in chemical engineering computation have been held under the auspices of the AIChE, this was the first symposium devoted to the entire field to be held in the United States. The European Federation of 1 0 pr0 Chemical Engineers has held regular symposia on Computer Applications 4. in Chemical Engineering but the proceedings of these meetings have 2 1 0 enjoyed only limited circulation in the United States. This volume thus 0- 98 represents the only collection of works on computer applications to appear 1 k- in the United States since the C.E.P. Symposium Series volumes on b 21/ computational topics which appeared in the middle sixties. 0 1 0. The papers comprising this volume are subdivided into four cate­ 1 oi: gories: reviews of four major areas of computation research, reviews of d 0 | several key computational topics within these areas, papers discussing 98 specific new advances in methodology, and papers demonstrating the 1 0, effective use of computation in modeling, design, and control covering a 3 y broad range of applications. a M e: The first of the broad computational area reviews discusses the Dat general direction of research in steady-state process simulation and sum­ on marizes the new ideas in computational architecture to have emerged cati since 1975. This is followed with a review of the main thrusts in control bli u theory and on evaluation of the relevance to chemical engineering P applications. Next the significant developments in numerical methods for minimizing nonlinear constrained and unconstrained functions are traced. The new developments in recursive quadratic programming methods for general nonlinear programs should be of particular interest to chemical engineers since they appear to offer a significant advance over the generalized reduced gradient techniques that have dominated the field for some ten years. Finally, research in computer-aided synthesis is appraised, and a summary is given of the significant results in six problem areas: heat exchanger networks, separation systems with and without heat integration, reaction paths, total flowsheets, and control systems. xi In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. These wide-ranging reviews are followed by analyses of progress in several specialized problem categories: chemical and physical equilibrium computations; vapor-liquid equilibrium computations including single and multistage VLE separations, multiliquid phase systems, and VLE systems with reaction and electrolytes; treatment of measurement errors in process networks and computations of choking flows in gas pipe networks. Next follows a series of reports on important developments in computational methods or program packages incorporating novel com putational features. Finally, the volume is capped with papers discussing computer applications involving modeling, design, and control spanning a wide range from microbial conversion to industrial reactor modeling to drug 1 therapy control. 0 0 pr The scope and quality of these contributions have made the sym 4. 2 posium a milestone in chemical engineering computation and ensure 1 0 0- that this volume will be of permanent significance to those involved or 8 19 interested in this area. Both the papers and the symposium as a whole k- b have benefitted substantially from the anonymous contributions of a 1/ 02 large number of conscientious referees for whose efforts we are indebted. 1 0. Finally, the organization and smooth functioning of the symposium as 1 oi: well as the successful assembly of this volume are in large part due to the d 0 | commendable work of the following session chairmen: D. A. Mellichamp 8 9 and R. G. Rinker of the University of California-Santa Barbara, G. Blau 1 0, of Dow Chemical USA, and J. Zemaitis of OLI Systems, Inc. 3 y a M ate: School of Chemical Engineering G. V. REKLAITIS D n Purdue University R. G. SQUIRES o ati West Lafayette, IN 47907 c bli October, 1979 u P xii In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. 1 Steady State Chemical Process Simulation: A State-of-the-Art Review Ε. M. ROSEN Monsanto Company, 800 North Lindbergh, St. Louis, MO 63166 1 0 0 h c 4. Perspective. The use of a mathematical model on 2 01 a computer to simulate a chemical process is now approx­ 80- imately two decades old. The field, which has been 9 1 referred to as steady state chemical process simulation, k- b flowsheeting or computer aided chemical process design 1/ 2 to emphasize various shadings and meanings has had a 0 0.1 major impact on moving chemical process design from doi: 1 eesnsgeinnteiearlilny g ascni eanrcet fotromd aoy.f the 1950's to an accepted 0 | The field, which of necessity has always attempted 8 19 to merge the areas of chemical engineering, physical 0, chemistry, thermodynamics and the various disciplines 3 y of computer science, has been especially dynamic the a M last several years. This is no doubt due in part to ate: the increasing pressure to make better use of energy, D minimize operating costs and increase the productivity n o of the chemical processes studied as well as the chem­ cati ical engineer himself. ubli A determination of the state-of-the-art in a par­ P ticular field can probably best be viewed by understand­ ing the motivation of the contributors. Academic work is motivated by a desire to explain nature, a desire to solve unsolved problems and, for pragmatic reasons, a desire to attract funding. Academic work is usually found in the literature. Industrial work is motivated by profit, which in turn leads to a desire to increase productivity and a desire to increase robustness of solutions. Industrial organizations judiciously choose among competing ideas and programs. The implementations carried out to solve their problems are not generally found in the literature. 0-8412-0549-3/80/47-124-003$08.50/0 © 1980 American Chemical Society In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980. 4 COMPUTER APPLICATIONS TO CHEMICAL ENGINEERING Reviews, Books and Projects. The general field was reviewed m 1975 by Motard, Shacham, and Rosen (1) and in a comprehensive fashion in 1977 by Hlavacek (2^) . A first book on the subject is scheduled to be re leased in the latter half of 1979 (3). An indepth evaluation of the field was afforded by the ASPEN project at MIT sponsored by the U. S. Department of Energy. The project was started June 1, 1976 and is entitled, "Computer-Aided Industrial Process Modeling". Its quarterly and annual reports are available from the National Technical Information Service (£). The User Interface. A wide variety of stand alone 1 0 steady state simulation programs and flowsheet systems 0 ch are available to the process engineer. These have been 4. 2 reported in a series of articles by Peterson, Chen and 1 0-0 Evans in 1978 (5) and by Chen and Evans in 1979 (6) . 98 Some practical advice on the use of the computer Tn 1 k- design is reported by Weismantel (])· A course in 1/b the use of several commercially available systems is 02 given in the AIChE Today Series (8). A report on the 1 0. use of networks to share chemical engineering programs 1 oi: among educators was recently issued (9). 80 | d for siThmeu lautsieo no fs oyns-telmisn e issy wsitdeemlsy tuos eedd.i t Htohwee vienpr,ut data 9 1 interacting with the program during its execution 0, 3 is now being carried out industrially. Its y a advantages (or disadvantages) have not yet been dis M e: cussed in the literature. at The continuing decline in costs of graphical D n devices and the broadening availability of easy-to-use o ati graphical software has made computer graphics a blic feasible tool in flowsheeting presentations and anal u ysis (10). P General Direction of the Field. The character istics of early flowsheeting systems and their limita tions were defined by Evans and Seider in 1976 (11). They also attempted to define the criteria for an ad vanced computing system. Several trends have been noted, however, in this field over the last few years: 1. Use of flowsheeting systems has become widespread. Many have been developed to meet the particular needs of their environments (12, 13, 14) and often serve as a repository of the company's or develop er's expertise. In Computer Applications to Chemical Engineering; Squires, R., el al.; ACS Symposium Series; American Chemical Society: Washington, DC, 1980.

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