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Circuit Sizing w/ Corner Models Challenges & Applications - MOS-AK PDF

37 Pages·2013·2.07 MB·English
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Improve Design Performance & Yield Circuit Sizing w/ Corner Models Challenges & Applications Matthias Sylvester April 11th, 2013 © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield Agenda  Introduction  Corners & Process Monte Carlo  Application: Performance Tuning  Application: Customer Cases © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield MunEDA Corporate Overview  EDA Software Vendor – Design Tool Suite WiCkeDTM for Porting, Analysis, Modeling & Sizing of nanometer IC designs  Founded in 2001 – Headquarters in Munich Germany  Worldwide Sales & Support Offices in USA, Korea, Taiwan, Japan, UK, Ireland, Scandinavia, South America  Worldwide Customer Base of Semiconductor IDMs, Fabless Design Houses & Foundries © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com 3 Improve Design Performance & Yield MunEDA WiCkeDTM Circuit Design & Sizing Environment © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com 4 Improve Design Performance & Yield Challenges of advanced node design  Circuit sizing: Designers have to carefully set circuit parameters like W, L, R, C, … – to meet performance targets – to reduce sensitivities vs. Vdd, temperature, process, LDE, mismatch  Creating a robust design becomes more challenging in advanced nodes Speed – higher sensitivity vs. supply voltage – higher sensitivity vs. temperature – reduced voltage headroom – wider corner spread FF TT – increased local variation SS – layout dependent effects (LDE) 28nm 40nm 65nm Technology See Beacham et al. (Synopsys Inc.): “Mixed-Signal IP Design Challenges in 28 nm and Beyond”. www.design-reuse.com © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com 5 Improve Design Performance & Yield Process corner support  Process variation is usually modeled in two ways 1. Process corners (ss/ff/sf/fs/ …) 2. Process Monte Carlo vth ~ N(µ , σ² ) vth vth tox ~ N(µ , σ² ) tox tox … Most foundry PDKs contain both models. Local variation (mismatch) is always modeled by MC statistics.  What‘s the advantages / disadvantages of using corners or process MC? © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield Corners & Process Monte Carlo © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield Comparison: Corners vs Process Monte Carlo Corners Process MC Simulation effort for pure CMOS low medium Simulation effort for large # of device types high medium (MOS/BJT/res/cap/…) per design Check timing for full-custom digital designs yes no Correct device correlation no yes Check operating conditions of analog yes yes designs Check analog performance variability no yes Estimate yield no yes Process parameter sensitivities no yes © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield Analog performance variability  Compare ss/ff/fs/sf corner results with global MC for a popular 65nm process that’s used by analog designers worldwide: Red line connects corners (ff,ss,fs,sf). Green dots: global MC samples Isat: realistic corner Cgs: analog feature, Gain: analog feature, results, fits very well error >80%. error >30%.  Good estimate for Isat, Vth; difference at analog small signal parameters. © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com Improve Design Performance & Yield Circuit Tools of WiCkeD – Analysis & Verfication – WCO Worst-Case Operation Analysis & Verification  Find worst-case operating condition & corner  Includes structural constraints  Can handle non-linear dependency (=worst-case not in the corner) © Copyright by MunEDA GmbH - All rights reserved - www.muneda.com 10

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Apr 11, 2013 MunEDA WiCkeDTM Circuit Design & Sizing Environment. 4 Tools of WiCkeD- Analysis & Verification — CRN Corner Run Analysis. ⬈ Check
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