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Wide Band Gap Electronic Materials PDF

522 Pages·1995·42.49 MB·English
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Wide Band Gap Electronic Materials NATO ASI Series Advanced Science Institutes Series A Series presenting the results of activities sponsored by the NA TO Science Committee, which aims at the dissemination of advanced scientific and technological knowledge, with a view to strengthening links between scientific communities. The Series is published by an international board of publishers in conjunction with the NATO Scientific Affairs Division A Life Sciences Plenum Publishing Corporation B Physics London and New York C Mathematical and Physical Sciences Kluwer Academic Publishers D Behavioural and Social Sciences Dordrecht, Boston and London E Applied Sciences F Computer and Systems Sciences Springer-Verlag G Ecological Sciences Berlin, Heidelberg, New York, London, H Cell Biology Paris and Tokyo I Global Environmental Change PARTNERSHIP SUB-SERIES 1. Disarmament Technologies Kluwer Academic Publishers 2. Environment Springer-Verlag 3. High Technology Kluwer Academic Publishers 4. Science and Technology Policy Kluwer Academic Publishers 5. Computer Networking Kluwer Academic Publishers The Partnership Sub-Series incorporates activities undertaken in collaboration with NATO's Cooperation Partners, the countries of the CIS and Central and Eastern Europe, in Priority Areas of concern to those countries. NATO-PCO-DATA BASE The electronic index to the NATO ASI Series provides full bibliographical references (with keywords and/or abstracts) to more than 30000 contributions from intemational scientists published in all sections of the NATO ASI Series. Access to the NATO-PCO-DATA BASE is possible in two ways: - via online FILE 128 (NATO-PCO-DATA BASE) hosted by ESRIN, Via Galileo Galilei, 1-00044 Frascati, Italy. - via CD-ROM "NATO-PCO-DATA BASE" with user-friendly retrieval software in English, French and German (© WTV GmbH and DATAWARE Technologies Inc. 1989). The CD-ROM can be ordered through any member of the Board of Publishers or through NATO- PCO, Overijse, Belgium. 3. High Technology - Vol. 1 Wide Band Gap Electronic Materials edited by Mark A. Prelas University of Missouri-Columbia, Columbia, Missouri, U.S.A. Peter Gielisse Florida A&M University/Florida State University, Tallahassee, Florida, U.SA Galina Popovici Rockford Diamond Technology, Inc., Columbia, Missouri, U.S.A. Soris V. Spitsyn Russian Academy of Sciences, Moscow, Russia and Tina Stacy University of Missouri-Columbia, Columbia, Missouri, U.S.A. Springer-Science+Business Media, B.V. Proceedings of the NATO Advanced Research Workshop on Wide Band Gap Electronic Materials - Diamond, Aluminum Nitride and Boron Nitride Minsk, Belarus May 4-6, 1994 A C.I.P. Catalogue record for this book is available from the Library of Congress. ISBN 978-94-010-4078-5 ISBN 978-94-011-0173-8 (eBook) DOI 10.1007/978-94-011-0173-8 Printed on acid-free paper AII Rights Reserved © 1995 Springer Science+Business Media Dordrecht Originally published by Kluwer Academic Publishers in 1995 Softcover reprint of the hardcover 1s t edition 1995 No part of the material protected by this copyright notice may be reproduced or utilized in any form or by any means, electronic or mechanical, including photo- copying, recording or by any information storage and retrieval system, without written permission from the copyright owner. This book is dedicated to Dr. Steven Lin. His efforts in assembling this book were no less than Herculean. Additionally we wish to thank Dr. Kim Bigelow of Norton Diamond Film Division, Dr. Paul Blackborow of ASTex Inc., and John Tompkins of Rockford Tech- nology Corp. for supporting this Workshop financially. CONTENTS Preface ••••••••..••••.••.•••.•.•.•••.•.•••••.•..•••.•••.•••••.•••••••.•••••••.••.•.••..•••••••.••••.••••••.•.••.••••••..••.•••• vii DIAMOND Growth and Doping Problems of n-type Diamond Doping. Forced Methods ofDoping •..••.•..........•....• 1 Galina Popovici, RDT; and M. A. Prelas, UMC. Diffusion of Boron, Hydrogen, Oxygen and Lithium in Single Crystalline and Polycrystailine Diamond. A Novel Method for the Determination of the State of an Impurity: Forced Diffusion of Boron in IA Type Natural Diamond 15 Galina Popovici, RDT; T. Sung, M. A. Prelas, UMC; R. G. Wilson, HRL; and S. Khasawinah, UMC. Chemical Aspects ofDiamond Doping •..••.•••••••..••••.•••..••.•••••••..••••.•.•••.•..•..••.•.•........ 31 B.V. Spitsyn, RAS. Diamond Growth by Hot Carbon Filament Chemical Vapor Deposition ....••..•.. 47 C. C. Chao, E. J. Charlson, E. M. Charlson, J. Meese, M. A. Prelas and T. Stacy, UMC. Diamond Particles on Silicon Tips: Preparation, Structure, and Field-Emission Properties 53 E.I. Givargizov, A.N. Stepanova, L.L. Aksenova, E.V. Rakova, P.S. Plekhanov, V.V. Zhirnov, and A.N. Kiselev, RAS. To the Question of the Diamond Nuclei's Formation from the Gas Phase 63 A.P. Rudenko, and I.I. Kulakova, MSU. Characterization and Properties ElectricaUy and Optically Active Impurities and Defects in Diamond 69 A.A. Gippius, RAS. Prediction of Diamond Film Thermal Conductivity •..••.•..••••.••.•••••.••••.••.•..•.••.•..•. 81 N.V. Novikov, T.D. Ositinskaya, A.P. Podoba, and S.V. Shmegerea, UAS. viii Spectral Hole-Burning Study of the Defects Created by Neutron Irradiation in a Natural Diamond 89 I. Sildos, G. Zavt, and A. Osvet, EAS. Calculations of Phosphorous Electronic Levels in Diamond 97 V.V. Tokiy and D.L. Savina, DICE. Hydrogen Chemistry on Diamond Surface 105 J. E. Butler, B. D. Thomas, M. McGonial, J.N. Russell, Jr., and P.E. Pehrsson, NRL. Surface and Bulk Conductivity of Hydrogen Treated PolycrystaUine Diamond 115 G.A. Sokolina, L.L. Bouilov, A.A. Botev, A.V. Markin, RAS; and M.A. Timofeev, MSU. Positron Annihilation in Diamond Films 123 1.1. Bardyshev, L.L. Bouilov, and B.V. Spitsyn, RAS. ESR Study of Paramagnetic Defects in Free Standing Diamond Films 129 T. A. Karpukhina, RAS; M. A. Prelas, G. Popovici, S. Khasawinah, UMC; and B. V. Spitsyn, RAS. Applications Efficient Reduction of Nitride and Nitrate to Ammonia Using B-doped Diamond Electrodes 137 C. Reuben, E. Galun, R.Tenne, WI; R. Kalish, Tech; Y. Muraki, K. Hashimoto, A. Fujishima, UT; J.M. Butler, NRL; and C. Levy-Clement, CNRS. Electronic and Sensing Properties ofDiamond 143 J.L. Davidson, VU. Diamond MIS Capacitors With Silicon Dioxide Dielectric 161 M.J. Marchywka, D. Moses, and P.E. Pehrsson, NRL. Diamond Photovoltaics: Characterization of CVD Diamond Film-Based Heterostructure for Light to Electricity Conversion 171 PJ. Perov, V.1. Polyakov, A.V. Khomich, N.M. Rossukanyi, A.I. Rukovishnikov, V.P. Vamin, and I.G. Teremetskaya, RAS. Laser Modes in Diamond 187 L.-T. S. Lin, M.A. Prelas, UMC; and G. Popovici, RDT. Advanced Applications ofDiamond Electronics 207 C.B. Wallace, BDM. Laser-assisted Chemical Etching of Diamond Films in Oxygen 219 V. G. Ralchenko, K. G. Horotushenko, A. A. Smolin and E. D. Obraztsova, RAS. Ion Milling of PolycrystaUine Diamond Films 225 A. E. Alexenko, RAS; A. F. Belyanin, CRTI; L. L. Bouilov, RAS; A. P. Semenov, SRAS; and B. V. Spitsyn, RAS. ix AMORPHOUS AND DIAMOND-LIKE CARBON FILMS Growth and Doping Doping ofDiamond-Like Carbon Films •••••••••.•..- 235 S. Mitura, TUL; J. Szmidt, and A Sokolowska, WUT. Unhydrogenated DLC Films Obtained by Magnetron Sputtering 243 C. Morosanu, IPTM; N. Tomozeiu, UB; C. Cordos, and T. Stoica, IPTM. Simulation ofDitJusion in an Amorphous Structure 249 A. V. Nazarov, IBMI. Characterization and Properties Optical and Electrical Properities of Quantum-dimentional Multilayer Structures Based on Carbon Films 257 V.V. Sleptsov, V.M. Elinson, AM. Baranov, and S.A Tereshin, NPO. Thermal Stability and Structural Reactions at the Tantalumla-C Interface Under Vacuum Annealing Conditions 265 AP. Novikov, E.A. Shilova, L.D. Buiko, and VA Zaikov, RCEMT. Extended and Localized Electronic States in Tetrahedral Carbon Films .......... 271 V.E. Maschenko, ISA;V.M. Puzikov, UAS; and A.V. Semenov, SRAS. Optical Properties of Sputtering and Glow Discharge a-C:H Films 285 T. Stoica, A. Dragomir, IPTM; M. Gartner, IPCR; C. Morosanu, and G. Pavelescu, IPTM. Applications Application ofAmorphous Hydrogenated Carbon Coating to Semiconductor Radiation Detectors 291 I.M. Kotina, T.A Antonova, G.V. Patsekina, V.D. Saveliev, L.M. Tuhkonen, PNPI; 0.1. Konkov, and E.I. Terukov, IP17. OTHER WIDE BANDGAP SEMICONDUCTORS Growth and Doping Device for Growing and Doping in the Growth Process of Thin AIN Films 297 AF. Belyanin, CRTI; A.P. Semenov, SRAS; and B.V. Spitsyn, RAS. x Peculiarities of Chemical Vapor Heteroepitaxy of Wide Band Gap 111-V Nitrides 305 E.B. Sokolov, G.A. Naida, and N.V. Barovskii, MSIEE. The Peculiarities of Cubic Boron Nitride Formation Mechanism Using Hexa-Ammonicate Boron Hydride ofMagnesium 313 H.I. Polushin, MSSAV; and KP. Burdina, MSV. Investigation of Cubic Boron Nitride Crystallization Processes in the BN-Li3N-(H~N) System 321 V.B. Shipilo, L.M. Gameza, and A.I. Lukomskii, ASB. Epitaxial Growth ofAIN by Plasma Source Molecular Beam Epitaxy 329 G.W. Auner, T.D. Lenane, F. Ahmad, R Naik, P.K Kuo, and Z. Wu, WSV. Characterization and Properties Electronic Structure and Related Properties ofTetrahedrally Bonded Wide-Band-Gap Materials Containing Early Elements of the Periodic Table 335 W.RL. Lambrecht, C.H. Lee, K Kim, A.G. Petukhov, E.A. Albanesi, and B. Segall, CWRV. Ion·Implantation into Wide Bandgap Semiconductors 373 V.S. Vavilov, PNLPI. Thermodynamic Properties ofBoron Nitride 377 V.L. Solozhenko, VAS; and K.S. Gavrichev, RAS. Electrical Conductivity ofCeramic Based on Different Boron Nitride Modifications 393 A.V. Bochko, VAS; G.A. Sokolina, and S.V. Bantsekow, RAS. Cathodoluminescent Investigation of External Factors Influence on Defective Cubic Boron Nitride Structure 397 V.B. Shipilo, E.M. Shishonok, A.I. Lukomskii, and L.M. Gameza, ASB. Macro and Micro Structural Factors in Thin Film Growth of III-V Compounds 401 PJ. Gielisse and H. Niculescu, FAMV. The Features of the Sintering Process Under High Pressure of Aluminum Nitride Ceramic with High Thermal Conductivity 421 V.B. Shipilo, T.V. Rapinchuk, and N.A. Shishonok, ASB. Reactive Ion Etching ofSilicon Carbide with Fluorine Containing Plasmas 427 V.E. Sizov, and KV. Vassilevski, CREE. 1.54-Jlm Photoluminescence from Er-Implanted AIN & GaN 431 RG. Wilson, R.N. Schwartz, HRL; c.R. Abernathy, S.1. Pearton, VF; N. Newman, M. Rubin, T. Fu, LBL; and J.M. Zavada, ARO. xi AES-SIMS Analitical System for Compositional Measurements of Wide Band Gap Semiconductors •.••••.•••..••••.••.....•..•••••....•..••.••.•••••...•••..•.•...•..••.•..••.. 437 A.I. Babanin, IPTI and CREE; and A.A. Lavrentev, SEU. Positron Annihilation in Sintered Boron Nitride 447 1.1. Bardyshev, and A.D. Buravov, RAS. Applications Wide Band Gap Electronic Devices 453 V.E. Chelnokov, IPTl; K.V. Vassilevski, CREE; and V.A. Dmitriev, CR!. Wide Band-gap Photovoltaics .....•.••.•...•.••.....••.•........••.•.....•............••••..•.••..•..••..•..•.. 463 M. A. Prelas, UMC; G. Popovici, RDT; S. Khasawinah, and T. Sung, UMC. Considerations in Further Development ofAluminum Nitrides as a Material for Device Applications 475 T. Stacy, B. Y. Liaw, A. H. Khan, and G. Zhao, UMC. Theoretical Aspects ofAluminum Nitride and Diamond in View of Laser and Photovoltaic Action 487 H. Hora, UR; R. Hopfl, HT; and M. A. Prelas, UMC. Oral Presentations 511 Poster Presentations 513 List of Participants 519 Affiliations Key 525 Author Index 527 Key Word Index 529

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