Table Of Content

VACUUM SURFACE ENGINEERING, SURFACE INSTRUMENTATION & VACUUM TECHNOLOGY PERGAMON Vacuum 56 (2000) V- VII www.elsevier.nl/locate/vacuum Contents Volume 56 Number 1 AUTHORS EDITORIAL Dr A P Webb 1 E-MRS 1999 spring meeting ARTICLES W G Graham, C M O Mahony and 3 Electrical and optical characterisation of capacitively and induc- P G Steen tively coupled GEC reference cells C V Budtz-Jorgensen, J Bottiger 9 Energy spectra of particles bombarding the cathode in glow and P. Kringhoj discharges M D Whitfield, R B Jackman and Spatially resolved optical emission spectroscopy of the second- J S Foord ary glow observed during biasing of a microwave plasma R Martins, V Silva, | Ferreira, Role of the gas temperature and power to gas flow ratio on powder A Domingues and E Fortunato and voids formation in films grown by PECVD technique H Aguas, R Martins and E Fortunato 31 Plasma diagnostics of a PECVD system using different R.F. elec- trode configurations Sz Katai, Z Tass, L Bori, Gy Hars and Plasma analyser for plasma-assisted surface process diagnos- P Deak tics up to 100 mbar H S Kim, D H Lee, J W Lee, T | Kim Effects of plasma conditions on the etch properties of AlGaN and G Y Yeom J Baborowski, P Muralt, N Ledermann Etching of RuQO, and Pt thin films with ECR/RF reactor and S Hiboux A Piotrowska, E. Kaminska, Application of CCI,F,- and CCl,-based plasmas for RIE of GaSb T T Piotrowski, M Guziewicz, and related materials K Golaszewska, E Papis, J Wrobel and L Perchuc J Walkowicz, J Smolik and K Miernik Research on physico-chemical bases of the ion nitriding process control with the use of plasma spectroscopic diagnostics Ph Bertrand, M Ignatiev, G Flamant Pyrometry applications in thermal plasma processing and | Smurov JW Bae, H J Kim, J S Kim, N E Lee Effects of oxygen ion beam plasma conditions on the properties and G Y Yeom of Indium tin oxide thin films G Dinescu, B Mitu, E Aldea and M Dinescu 83 Adouble-chamber capacitively coupled RF discharge for plasma assisting deposition techniques — 0042-207X/00/$s-e e front matter © 2000 Published by Elsevier Science Ltd. All rights reserved. Contents / Vacuum 56 (2000) V-VII Volume 56 Number 2 AUTHORS EDITORIAL G Carter 87 Preferred orientation in thin film growth — the survival of the fastest model S Wang, H Liang and P Zhu 95 Epitaxial growth of alloy Cr(Ni)Si, by metal vapour vacuum arc ion source implantation and post-annealing N Barreau, S Marsillac and J C Bernéde 101 Physico-chemical characterization of f-In,S, thin films syn- thesized by solid-state reaction, induced by annealing, of the constituents sequentially deposited in thin layers C Engstrom, T Berlind, J Birch, 107 Design, plasma studies, and ion assisted thin film growth in an L Hultman, | P Ivanov, S R Kirkpatrick unbalanced dual target magnetron sputtering system with a and S Rohde solenoid coil R Schennach, D G Naugle, D Cocke, 115 Surface reactivity studies of bimetallic complexes, (y°-C;Me;) R Dembinski and J A Gladysz Re(NO)(PPh,)(C=C),,(Ph3P)(ON)Re(7°-C;Me;) (n = 2, 4, 6): candi- dates for molecular wires Y Qiao and H Bu 123 An investigation on suction force of vacuum pumps for micro- components N Mutsukura 129 Deposition of hydrogenated carbon film in a magnetically con- fined CH, rf discharge J-S Heo and Y-K Hwang 133. DSMC calculations of blade rows of a turbomolecular pump in the molecular and transition flow regions P Gao, L J Meng, M P dos Santos, 143 Characterisation of ZrO, films prepared by rf reactive sputtering V Teixeira and M Andritschky at different O, concentrations in the sputtering gases 149 BOOK REVIEW Volume 56 Number 3 AUTHORS EDITORIAL J S Colligon 151 = Editorial W Ahmed, C A Rego, R Cherry, 153 CVD diamond: controlling structure and morphology A Afzal, N Ali and | U Hassan P J Kelly and R D Arnell 159 Magnetron sputtering: a review of recent developments and applications S R Bradbury and T Huyanan 173 Challenges facing surface engineering technologies in the cut- ting tool industry R Penlington 179 Surface engineering in the glass container industry H Wei, Z Liu and K Yao 185 Influence of microstructure of substrate surface on early stage of thin film growth J Kotaczkiewicz 191 Thermal stability of the atomic structure of ultrathin films of Eu, Gd and Tb adsorbed on W(110) G Velu and D Remiens 199 In situ deposition of sputtered PZT films: control of the growth temperature by the sputtered lead flux D J Li, F Z Cui, HQ Gu and W Z Li 205 lon beam-assisted deposition of DLC films on PMMA and TiIN/PMMA Contents / Vacuum 56 (2000) V-VII S Kurokouchi and S Kato 213 Outgassing characteristics by mechanical action of all-metal gate valve H Errahmani, A Berrada, G Schmerber 221 Magnetic and transport properties of ion beam sputtered and A Dinia Co,Cu,_, granular alloys Volume 56 Number 4 AUTHORS EDITORIAL V E Yurasova and John Colligon 227 Editorial Kenji Morita 233 Studies on energy distributions of species ejected from solid surfaces by means of multiphoton resonance ionization spectroscopy V | Bachurin, P A Lepshin and 241 Angular dependences of surface composition, sputtering and V K Smirnov ripple formation on silicon under Nz ion bombardment A A Promokhov, A S Mosunov, 247 Features of sputtering of nitrides with various component mass S S Elovikov and V E Yurasova ratios V A Kurnaev, N N Trifonov, 253 On the possibility of the in situ growth control and nondestruc- M N Drozdov and N N Salashchenko tive depth profiling of ultrathin multilayer structures using keV hydrogen ions S F Belykh, U Kh Rasulev, 257 High non-additive sputtering of silicon as large positive cluster A V Samartsev, and L V Stroev and ions under polyatomic ion bombardment A V Zinoviev Zdenék Sroubek and Jan Lérinéik 263 Electronic excitations in solids during impact of atomic particles V Philipsen, J Bastiaansen, P Lievens, 269 Resonant electron transfer in the emission of ion-beam sput- E Vandeweert and R E Silverans tered metal atoms studied by double resonance laser ionization A A Pisarev and A M Vaitonene 275 Sorption of athermal hydrogen atoms Yu N Devyatko and S V Rogozhkin 279 Point defects at low-index surfaces of fcc metals and the anom- alous behaviour of surface atoms at elevated temperatures N M Sushkova and A G Akimov 287 Formation of 3D islands of metal oxides on silicon covered by native oxide film by multi-step ion sputtering of Ti, Nb and V E Yu Usman, Yu T Matulevich 293 Calculation of electronic temperature dynamics in a collision and | F Urazgil’din cascade in a solid