User Manual (.pdf - 9.1 MB)

480 Pages·2014·9.14 MB·English

Helios NanoLab 660
DualBeam System User’s Guide
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Hillsboro, Oregon 97124 USA
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Principal Contributors
Zdenek Kral, Rob Routh, Michael Schmidt, Valerie Brogden
Technical Publications Team
Martin Dufek
Judy Lane Green
Alicia Gallimore
email: [email protected]
Copyright © 2014 by FEI Company
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Document History
Rev A: xT 5.5 SW, Jan2014
Helios NanoLab 660
DualBeam System User’s Guide
Chapter 1 Overview
Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9
Helios NanoLab 660 List of Features. . . . . . . . . . . . . . . . . . . . . . . . . 10
DualBeam System. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 13
System Components. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15
Options . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18
Chapter 2 Safety & Handling
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19
FEI Microscope Systems Safety Manual . . . . . . . . . . . . . . . . . . . . 19
Miscellaneous Guidelines. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 20
Equipment Terms, Symbols, and Labels . . . . . . . . . . . . . . . . . . . . . 22
Trained, Authorized Service Personnel . . . . . . . . . . . . . . . . . . . . . . 25
Machine Classification . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Code Compliance . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Lockouts/Tagouts . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 27
Emergency Off Circuit . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 27
Voltages . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 30
Chemicals . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 32
Decontamination and Decommissioning. . . . . . . . . . . . . . . . . . . . . 36
Miscellaneous Precautions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38
Chapter 3 System Startup & Shutdown
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39
System Status . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39
Logging On and Logging Off . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 40
Launching xT microscope Server Software. . . . . . . . . . . . . . . . . . . 41
Starting the xT Microscope Control Software. . . . . . . . . . . . . . . . . 43
Leaving the System. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 44
Standby Mode . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 46
FEI CONFIDENTIAL, Limited Rights Data
Complete System Shutdown. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 50
Emergency Main Off. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 54
Chapter 4 User Interface
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 57
Help Functions. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 59
Unique Interface Elements . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 60
Hardware Elements. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 64
Entering Commands . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 67
xT Control Interface Elements . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 74
Main Window. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 75
File Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 97
Edit Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 104
Detectors Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 105
Scan Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 106
Beam Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Patterning Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 131
Stage Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 133
Tools Menu. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 139
Window Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 147
Help Menu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 149
Beam Control Page . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 150
Navigation Page. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 160
Patterning Page . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 176
Processing Page . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 189
Detector Page . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 199
Sample Preparation Page. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 203
Alignments Page . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 204
Chapter 5 Getting Started
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 205
FEI CONFIDENTIAL, Limited Rights Data
Starting the xT-UI . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 206
Guide to System Settings . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 207
Beginning Your Session . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 208
Ending Your Session . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 213
Preparing the Sample. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 214
Obtaining an Image . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 216
Working with Detectors. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 218
Optimizing the Image . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 236
Selecting Beam Conditions. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 248
SEM Imaging Modes . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 251
Capturing and Handling a Single Image. . . . . . . . . . . . . . . . . . . . 257
Recording Movies (Multiple Image Capture) . . . . . . . . . . . . . . . 265
Importing and Exporting Files . . . . . . . . . . . . . . . . . . . . . . . . . . . . 273
Stage Movement Limits . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 274
Moving the Stage . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 276
Nav-Cam (In-Chamber Navigation Camera). . . . . . . . . . . . . . . . . 291
Chapter 6 EasyLift NanoManipulator
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 293
About EasyLift . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 293
EasyLift Software Control. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 294
EasyLift Needle Exchange. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 299
EasyLift Needle Exchange/Calibration Alignment . . . . . . . . . . . 300
EasyLift Needle Control . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 304
Chapter 7 MultiChem
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 307
About MultiChem. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 308
MultiChem Software Control. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 310
Basic Process . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 318
Starting a Manual Single Gas Flow . . . . . . . . . . . . . . . . . . . . . . . . 319
FEI CONFIDENTIAL, Limited Rights Data
Starting a Manual Mixed Gas Flow . . . . . . . . . . . . . . . . . . . . . . . . 319
Precautions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 320
MultiChem Gas Names . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 321
MultiChem Pattern Application File Names. . . . . . . . . . . . . . . . . 322
MultiChem Pattern Application Files. . . . . . . . . . . . . . . . . . . . . . . 323
MultiChem Supervisor Alignments . . . . . . . . . . . . . . . . . . . . . . . . 324
Chemical Maintenance Alignment . . . . . . . . . . . . . . . . . . . . . . . . . 325
Needle Alignment. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 327
New Crucible Evacuation. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 331
Chapter 8 Patterning & Milling
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 333
About Patterning . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 334
Patterning Tools. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 335
Patterning Properties . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 341
Magnification and Patterns. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 344
Selecting a Pattern . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 344
Editing Patterns . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 344
Cursor Used with Patterns . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 346
Serial Patterning . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 346
Parallel Patterning. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 347
Patterning Progress . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 347
Milling Order of Patterns. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 349
Milling a Pattern . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 350
Using Image Registration. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 357
Cross-Sectioning . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 359
Application Files . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 367
Gas Injection System . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 378
Fast iSPI Mode. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 380
End Point Monitor . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 381
FEI CONFIDENTIAL, Limited Rights Data
Real Time Monitor . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 382
Measurement and Annotation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 386
Chapter 9 LMIS Operation & Heating
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 391
LMIS Background and Description . . . . . . . . . . . . . . . . . . . . . . . . 391
Normal LMIS Operation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 392
LMIS Heating Procedure—Tomahawk Columns . . . . . . . . . . . . 395
Chapter 10 Alignments
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 397
About Alignments . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 398
General Description and Structure . . . . . . . . . . . . . . . . . . . . . . . . . 400
Alignment List. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 402
5 - Emitter Startup. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 404
17 - Quick Stage Rotation Center Alignment . . . . . . . . . . . . . . . . 405
18 - Accurate Stage Rotation Center Alignment . . . . . . . . . . . . . 407
65 - UHR-FIB Wait Time Configuration. . . . . . . . . . . . . . . . . . . . . 408
114 - Gas Flush Mode. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 409
210 - ION: Beam Alignment . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 410
211 - FIB-I Ion Column Alignment . . . . . . . . . . . . . . . . . . . . . . . . . 411
253 - Supervisor: Ion Beam . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 413
254 - Supervisor: GIS . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 414
Plasma Cleaning . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 415
Automatic Alignments. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 416
E-Column: User Alignments. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 419
E-Column: Aperture Map Selection . . . . . . . . . . . . . . . . . . . . . . . . 421
E-Column: Magnification Correction . . . . . . . . . . . . . . . . . . . . . . . 422
E-Column: Supervisor Alignments . . . . . . . . . . . . . . . . . . . . . . . . 423
E-Column: UC Supervisor tests . . . . . . . . . . . . . . . . . . . . . . . . . . . . 424
Vacuum Actions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 425
FEI CONFIDENTIAL, Limited Rights Data
Chapter 11 Account Management
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 427
Beginning . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 427
FEI User Management Software. . . . . . . . . . . . . . . . . . . . . . . . . . . . 428
User Logins and Account Settings . . . . . . . . . . . . . . . . . . . . . . . . . 434
Chapter 12 Maintenance
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 437
Cleaning Procedures Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . 438
Stage Maintenance . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 440
Scroll Pump. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 442
Compressor and Pneumatics System (Option) . . . . . . . . . . . . . . . 442
Chapter 13 System Options
Overview . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 445
Uninterruptible Power Supply (UPS) . . . . . . . . . . . . . . . . . . . . . . . 448
External Current Measurement
(Keithley Picoamper Meter). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 450
Fast Beam Blanker. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 451
Multi Stub Holder . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 451
I-Beam Charge Neutralizer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 452
CryoCleanerEC. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 455
Quick Loader . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 461
CryoMAT Loader. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 470
FEI CONFIDENTIAL, Limited Rights Data
1 Overview
Introduction
This chapter provides a brief description of the FEI® Helios™
NanoLab™ 660 Series DualBeam™ systems.
Topics include:
 “Helios NanoLab 660 List of Features” on page10
 “DualBeam System” on page13
 “System Components” on page15
 “Options” on page18
The Helios NanoLab 660 DualBeam systems integrate ion and
electron beams for FIB and SEM functionality in one machine.
Users can switch between the two beams for quick and accurate
navigation and milling. Convergence of the SEM and FIB at short
working distance allows precision “slice-and-view” cross-
sectioning and analysis at high resolution.
The FEI Helios NanoLab 660 series DualBeam systems are unique
in their ability to deliver the fastest TEM sample preparation
performance in addition to providing highly flexible failure
analysis capability on advanced (< 20 nm) semiconductor devices.
This SEM/FIB combines the most advanced scanning electron
microscope (SEM) and focused ion beam (FIB) technologies with
innovative gas chemistries, detectors, and manipulators. Featuring
unsurpassed SEM resolution, image quality and stunning
Tomahawk™ FIB performance, imaging, milling, or preparing
samples is fast and easy for semiconductor and data storage labs,
research facilities and industrial applications.
See “DualBeam System” on page13.
FEI CONFIDENTIAL, Limited Rights Data Helios NanoLab 450 Series UG
9
Overview  Helios NanoLab 660 List of Features
Helios NanoLab 660 List of Features
 Ultra-high resolution Elstar™ electron column.
See “Electron Column” on page13.
 High-resolution Tomahawk™ ion column with ICE (in
chamber electronics) ion detector. See “Ion Column” on page13.
 A separate support PC offers a connection to a local area
network (LAN).
 The chamber and stage accommodate up to 150 mm samples.
See “Stage” on page17.
 The high accuracy five-axis (X, Y, Z, Rotation, Tilt) stage
provides full coverage of 150mm samples with software
control and automation of all axes for precise sample
manipulation.
 Automatic vacuum system with turbo-molecular pumping.
See “Vacuum System” on page17.
 1920 x 1200 display resolution on up to three LCD monitors.
 The FEI EasyLift NanoManipulator supports higher yields for
TEM sample lift-out through an intuitive, integrated user
interface and attachment to a TEM grid for further analysis. It
allows for final thinning of the sample to be accomplished after
attachment to the TEM grid holder.
 The design of the optional retractable STEM III detector
improves the sensitivity to materials with similar atomic mass.
 Optional retractable DBS detector.
 Gas Injection System (GIS) – Advanced control of gas
chemistries including FEI proprietary gases for enhanced
precision deposition or bulk material removal.
See “Gas Injection System” on page17.
 FEI’s MultiChem (up to 6 gaseous, liquid, and solid
precursors) gas delivery system for optimized beam assisted
deposition or etching based on gas mixing.
 The FEI xT software user interface integrates all functionality
within a Microsoft® Windows® operating environment for full
digital control. See “Computer Control” on page16.
 iFast Developer’s Kit Professional software and starter recipes
for either ex-situ lift-out or in-situ inverted samples to provide
a solid platform for implementing customized sample recipes
to locate and process demanding features in a routine manner.
 FEI Cell Navigator™ is an integrated software application
used to count to a target cell for processing after locating a
defect electrically. SEM-based, damage-free, robust, and
FEI CONFIDENTIAL, Limited Rights Data Helios NanoLab 450 Series UG
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