Ultra-Clean Technology Handbook: Volume 1: Ultra-Pure Water

945 Pages·1993·47.851 MB·\945

by  Ohmi (Author)

Ultraclean
Technology
Handbook
V olum e 1
Ultrapure Water
edited by
Tadahiro Ohmi
Tohoku University
Sendai, Japan
Marcel Dekker, Inc. New York »Basel «Hong Kong
Library of Congress Cataloging-in-Publication Data
Ultraclean technology handbook / edited by Tadahiro Ohmi.
p. cm.
Includes bibliographical references and index.
Contents: v. 1. Ultrapure water
ISBN 0-8247-8753-6 (v. 1)
1. Manufacturing processes—Cleaning. I. Ohmi, Tadahiro.
TS183.U46 1993
670.42—dc20 93-19413
CIP
The publisher offers discounts on this book when ordered in bulk quantities. For more
information, write to Special Sales/Professional Marketing at the address below.
This book is printed on acid-free paper.
Copyright © 1993 by Marcel Dekker, Inc. All Rights Reserved.
Neither this book nor any part may be reproduced or transmitted in any form or by any
means, electronic or mechanical, including photocopying, microfilming, and recording,
or by any information storage and retrieval system, without permission in writing from the
publisher.
Marcel Dekker, Inc.
270 Madison Avenue, New York, New York 10016
Current printing (last digit):
10 9 8 7 6 5 4 3 2 1
Preface
The development of ultralarge-scale integration (ULSI) manufacturing has led to the need
for ultraclean technology, and nowhere has this need been more prevalent than in
semiconductor manufacturing. This technology now is moving into other areas of
electronic manufacturing, as well as the pharmaceutical and medical fields.
Ultraclean technology is a total concept of advanced scientific semiconductor man­
ufacturing establishing completely reproducible production of highly valuable ULSIs.
This is achieved by creating an environment free of pollutants and contaminants—a
substrate surface free from particles, impurities, native oxide and surface microroughness,
and allowing perfect process parameter control. As the trend toward developing smaller
components, devices, and systems continues, manufacturing lines supported by clean
rooms and various utilities become increasingly important.
Ultrapure Water includes detailed chapters on ultrapure water technologies, such as
production, component, construction/operation, and quality analysis techniques as well as
wet chemical processings. The book has been prepared by over 75 leading experts in the
field and includes many of the latest results, such as requirements of ultrapure water
quality as it relates to the cleanliness of silicon wafer surfaces.
The book begins with a discussion of the history of structural studies of water which
forms an essential basis for the field. It then goes on to detail the processing technologies
necessary to build an ultrapure water production system. Following chapters discuss
ultrapure water piping systems which are needed to connect production subsystems and
use points. The manufacture of hot ultrapure water, which has recently been developed to
clean wafers, is then discussed. Methodologies covered include deaeration, which is used
exclusively in dissolved oxygen and static electricity removal methods. Specifications for
high-purity monitors are also discussed.
These elements are brought together to form the most comprehensive and practical
work on this subject to date. The emphasis in presenting the data has been to serve as a
III
IV
working guide for engineers and surface scientists. Therefore, the book will be useful to
electrical and electronics, semiconductor process, semiconductor facility, liquid chemical
manufacturing, clean gas manufacturing, clean components and manufacturing, assem­
bly, and semiconductor manufacturing machine engineers, as well as all personnel
involved in the design, construction, validation, operation, and monitoring of phar­
maceutical and medical device clean rooms. It is hoped that this volume will be a valuable
resource and a helpful guide in further developing quality manufacturing around the
world.
The editor would like to thank the contributors for sharing their expertise. Thanks
also to the staff of Marcel Dekker, Inc., for their interest, patience, and cooperation
throughout the preparation of this book.
Tadahiro Ohmi
Contents
Preface 111
Contributors xiii
I. Quality of Ultrapure Water
1. Requirements for Ultrapure Water
Takaaki Fukumoto
2. The Structure of Water
Shoji Kubota
3. Wafer Cleanliness and Requirements for Ultrapure Water Quality 27
Yoshiaki Matsushita
4. Properties of Ultrapure Water 45
Shoji Kubota
5. Afterword 65
Takaaki Fukumoto
II. Ultrapure Production Systems
1. Introduction 69
Koichi Yabe
2. Pretreatment System 71
Kenichi Ushikoshi
Contents
3. The Primary Treatment System 97
Isamu Sugiyama and Yoshitaka Yamaki
4. Ultrapure Water System 137
Koichi Yabe
5. Piping System 151
Takeshi Shinoda
6. Reuse of Wastewater 161
Riichi Ikegami
7. Field Data
A. Operation Data for Actual Units 187
Ikuo Shindo
B. Examples of Operation Data 199
Yoshito Motomura
8. Operation Management and Cost 209
Hiromi Kohmoto
9. Hot Ultrapure Water System 235
Yoshito Motomura
10. Afterword 245
Koichi Yabe
III. Elementary Technology
1. Introduction 249
Yoshiharu Ohta
2. Membranes
A. Membrane Technology 251
Norihisa Urai
B. Ultrafiltration 279
Hiroaki Ishikawa
C. Membrane Filtration 289
Koichi Sawada
3. Ion-Exchange Resin 307
Kenji Oda
Contents vii
4. Deaeration Technology 327
Hitoshi Sato
5. Sterilization Technique 345
Masao Saito
6. TOC Removal Technology 363
Tetsuo Mizuniwa
7. Static Electricity Removal Method 379
Takeo Makabe
8. Afterword 403
Yoshiharu Ohta
IV. Equipment and Piping Materials
1. Introduction 407
Takeshi Shinoda
2. Piping 409
Koichi Yabe
3. Valves and Fittings 425
Mitsugu Abe
4. Pumps 437
Takashi Imaoka
5. Tanks 445
Koichi Wada
6. Heat Exchangers 453
Kazuhiko Takino
7. Afterword 459
Takeshi Shinoda
V. Instrumentation
1. Introduction 463
Tetsuo Mizuniwa
2. Instruments for Operational Control 465
Kazuhiko Takino
vili Contents
3. On-Line Monitors
A. High-Sensitivity Resistivity Meter 475
Makoto Saito
B. TOC Monitor 485
Masami Miura
i. Automatic TOC Analyzer: Wet Oxidation at High Temperature
and Pressure 497
Yoshio Senoo
ii. Ultraviolet-Promoted Chemical Oxidation TOC Analyzer 510
Yoshiki Shibata
C. Particle Counter 519
Hirotake Shigemi and Toshio Kumagai
i. Nano-Sized Particle Analyzer (Nanolyzer) 529
Takashi Sasaki
ii. Particle Counter for Fine Particles in Ultrapure Water 540
Toshiki Manabe
D. High-Purity Monitor 549
Seiichi Inagaki
i. Total Solids Monitor 564
Sankichi Takahashi and Toshihiko Kane ko
E. Silica Analyzer for Ultrapure Water 577
Makoto Satoda
F. Dissolved Oxygen Meter 585
Shinichi Akazawa
G. ATP Monitor 595
Toshiki Manabe
H. Ozone Monitor 601
Akira Yamada
4. Afterword 609
Tetsuo Mizuniwa
VI. Fabrication and Construction Technologies
1. Foreword 613
Akihiko Hogetsu
Contents
2. Cleaning Methods
A. Cleaning and Installation of Polyvinyl Chloride Piping 615
Yukio Hamano
B. Polyvinylidene Fluoride Pipes, Fittings, and Valves 621
Hiroto Fujiiy Shosuke Ohba, and Junsuke Kyomen
C. Polyether Ether Ketone Pipes and Fittings 627
Katsuhito Ito
D. Synthetic Resin Valves 635
Tomoyuki Veda
E. Electropolished Pipe 641
Shigeharu Nakamura
F. Gold-Electropolished Pipe 645
Katsumi Yamazoe
G. Oxidation-Passivated Stainless Steel Pipe 647
Yasuyuki Yagi and Motohiro Okazaki
H. Stainless Steel Valves
i. Common SUS Valves 651
Mamoru Torii
ii. Metal Diaphragm Valves 652
Yoh’ichi Kanno
I. Stainless Steel Pumps
i. Ultraclean Regenerating SUS Pumps 655
Rokuheiji Satoh
ii. Canned Motor Pumps 660
Kotaro Karita
J. Towers and Tanks 665
Katsumi Yamazoe
K. Gages and Meters
i. Pressure Gages 671
Shigenori Hokari
ii. Flowmeters 673
Yoshiaki Hashimoto