Table Of Content

Thin Solid Films 376 (2000) 275-276 www.elsevier.com/locate/tsf Author Index of Volume 376 Abd. Majid, W.H., 225 Grmek, R., 5 Lee, C., 38 Pejovnik, S., 5 Abe, K., 140 Grzadziel, L., 214 Lee, C.C., 164 Pham, M.T., 188 Andrade, E., 99 Guan, H., 144 Lee, S.E., 208 Platen, J., 47 Arce, R.D., 267 Lee, W.-J., 26 Pranevicius, L., 56 Lenzner, J., 82 Hance, R.L., 73 Li, J.F., 179 Bai, M., 170 Hashimoto, K., 140 Liang, W., 159 Range, H., 89 Bele, M., 5 Hau Tseng, M., 124 Lihui, G., 249 Ray, A.K., 16 Bente, K., 82 Hayashi, T., 152 Lin, Y.-Z., 67 Reuther, H., 188 Berera, G.P., 9 He, D., 144 Logothetidis, S., 56 Richardson, T.H., 225 BBuriethrmaeg,o , S.R,. H4.7, 267 Huan, C.H.A., 255 LLuo,r enSz.-,Y .,M .,6 7 82 RRiocnhgtmeri,n g,E. , L.1,8 82 49 Byun, K.-M., 26 Rubinelli, F.A., 267 Ichino, Y., 220 Igari, Y., 89 Magtoto, N., 115 Cattani, M., 264 Chang, K.-M., 124 Ishidzuka, S., 89 Maiti, N., 16 Sakurai, H., 220 Chen, L., 115 Matsumuro, A., 152 Salvadori, M.C., 264 Chen, L.-W., 124 Matz, W., 188 Schmidt, J.A., 267 Cheung, W.Y., 131 Jiang, X., 144 Mettlach, N.R., 73 Selle, B., 47 Choe, S., 164 Jimbo, T., 1 Miki-Yoshida, M., 99 Shin, S.-C., 38 Choi, S.W., 208 Jin, Y.M., 198 Miyake, Y., 170 Sieber, I., 47 Chuang, R., 164 Jiujun, X., 159 Mominuzzaman, S., | Smith, K.C., 73 Moodera, J.S., 9 So, W.W., 164 Mozetié, M., 5 Soga, T., 1 Miicklich, A., 188 Desai, U.B., 16 Kaito, A., 220 Sun, X., 144 Muramatsu, M., 152 Ding, C.X., 179 Kato, K., 170 Sun, Y.-M., 73 Kelber, J., 115 Swati, R., 241 Kim, H.Joon., 110 Szuber, J., 214 Ekstrom, B., 115 Kim, J.Yong., 110 Nakajima, A., 140 El-Korashy, A., 236 Kim, R., 183 El-Zahed, H., 236 Kim, S.Gil., 110 Takada, N., 220 Era, M., 232 Kim, Y., 183 Oka, S., 232 Takami, T., 89 Estrada-Lépez, W., 99 Kohzaki, M., 152 Ong, C.W., 131 Tanigaki, N., 220 Koropecki, R.R., 267 Oppermann, D., 82 Tapati, J., 241 Kreider, K.G., 32 Tokisue, H., 170 Fuhs, W., 47 Kusunoki, I., 89 Topacli, A., 225 Kwok, R.W.M., 131 Tsyganovy, I., 188 Panjan, P., 5 Galdikas, A., 56 Paraguay-Delgado, F., 99 Gillen, G., 32 Lacey, D., 225 Park, J.-W., 183 Gioti, M., 56 LeClair, P., 9 Patsalas, P., 56 Umeharab, N., 170 PII: S0040-6090(00)01656-4 276 Author Index of Volume 376 Umeno, M., 1 White, J.M., 73 Xu, J., 170 Wieser, E., 188 Wong, H.Y., 131 Zalar, A., 5 Wagner, G., 82 Wong, K.W., 131 Yamaguchi, K., 152 Zeimer, U., 47 Watanabe, T., 140 Wong, S.P., 131 Yang, J.-Y., 124 Zhang, K., 255 Wee, A.T.S., 255 Yi, J., 208 Zhu, F., 255 WWeeen,g , H.G,. J.3,8 198 Yokokawa, S., 220 Zukun, H., 159 Xiaolei, X., 159 Yoshida, M., 220 thi 6) aj ELSEBAVT I4E5 R Thin Solid Films 376 (2000) 277-281 www.elsevier.convlocate/tsf Subject Index of Volume 376 wc-Si films Chalcogenide Studies on the formation of microcrystalline silicon with PECVD Influence of composition on the electrical and optical properties of under low and high working pressure, 249 Ge) BixSe80 — x films, 236 Acetone Chemical vapor deposition Reaction of Si(111) surface with acetone, 89 Growth mechanisms of crystallites in the mixed-phase silicon films Adsorption deposited by low-pressure chemical vapor deposition, 38 Electronic properties of the space charge layer of in situ prepared Low-temperature epitaxial growth of Si by electron cyclotron reso- copper phthalocyanine thin films exposed to oxygen, 214 nance chemical! vapor deposition, 47 AES Pd-Ag alloy films prepared by metallorganic chemical vapor depo- Effect of surface impurities on the Cu/Ta interface, 115 sition, 67 Alternating current plasma display panel Microcrystalline silicon phase in silicon oxide thin films developed Improvement of secondary electron emission property of MgO by photo-CVD technique, 241 protective layer for an alternating current plasma display panel Chromium by addition of TiO,, 183 An effective diffusion barrier metallization process on copper, 164 Aluminide coating Coatings Manufacturing, structure and high temperature corrosion of palla- Fractal character of circumferences of polishing-induced pull outs dium-modified aluminide coatings on nickel-base superalloy M38, of plasma sprayed Cr;C,—NiCr coatings, 179 144 Condensation Aluminium Application of mathematical morphology in measurement of Phase formation in aluminium implanted titanium and the corre- droplet size distribution in dropwise condensation, 16 lated modification of mechanical and corrosive properties, 188 Copper Aluminum bronze coatings Effect of surface impurities on the Cu/Ta interface, 115 Microstructures and properties of PVD aluminum bronze coatings, An effective diffusion barrier metallization process on copper, 164 159 Corrosion Amorphous materials Titanium nitride thin films obtained by a modified physical vapor Energy-resolved photon flux dependence of the steady state photo- deposition process, 9 conductivity in hydrogenated amorphous silicon: implications for Phase formation in aluminium implanted titanium and the corre- the constant photocurrent method, 267 lated modification of mechanical and corrosive properties, 188 Annealing Critical exponents Dependence of microstructure and nanomechanical properties of Critical exponents of diamond films: possible influence of spatially amorphous carbon nitride thin films on vacuum annealing, 170 correlated noise, 264 Atomic force microscopy (AFM) Crystallinity Dependence of microstructure and nanomechanical properties of Studies on the formation of microcrystalline silicon with PECVD amorphous carbon nitride thin films on vacuum annealing, 170 under low and high working pressure, 249 Crystallization Growth mechanisms of crystallites in the mixed-phase silicon films Barrier metallization deposited by low-pressure chemical vapor deposition, 38 An effective diffusion barrier metallization process on copper, 164 Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique, 241 Carbon Growth kinetics of sputtered amorphous carbon thin films: compo- Deposition rate sition studies and phenomenological model, 56 Studies on the formation of microcrystalline silicon with PECVD Carbon nitride under low and high working pressure, 249 Wear resistance of carbon nitride thin films formed by ion beam Diamond films assisted deposition, 152 Critical exponents of diamond films: possible influence of spatially Cation ordering correlated noise, 264 CuAu-I type ordering and orientation domains in tetragonal Zn2 Diamond-like carbon —2xCuxInxS, films (0.78 <x < 1) crystallized on (001) gallium Camphoric carbon soot: a new target for deposition of diamond-like phosphide by pulsed laser deposition, 82 carbon films by pulsed laser ablation, 1 PII: S0040-6090(00)01657-6 278 Subject Index of Volume 376 Diffusion barrier High-energy electron diffraction (RHEED) Effect of surface impurities on the Cu/Ta interface, 115 Reaction of Si(111) surface with acetone, 89 Hot corrosion ECR PECVD Manufacturing, structure and high temperature corrosion of palla- Water absorption characteristics of fluorinated silicon oxide films dium-modified aluminide coatings on nickel-base superalloy M38, deposited by electron cyclotron resonance plasma enhanced 144 chemical vapor deposition using SiH, ,S iF, and O,, 26 Electrical conductivity Impurities Influence of composition on the electrical and optical properties of Effect of surface impurities on the Cu/Ta interface, 115 Ge BixSe80 —x films, 236 Indium Electron microscopy An effective diffusion barrier metallization process on copper, 164 CuAu-I type ordering and orientation domains in tetragonal Zn2 Indium tin oxide —2xCuxInx§, films (0.78 <x < 1) crystallized on (001) gallium Indium tin oxide films prepared by radio frequency magnetron phosphide by pulsed laser deposition, 82 sputtering method at a low processing temperature, 255 Electrostatic spray pyrolysis Insulating substrates Deposition of MgO thin films by modified electrostatic spray Evaluation of precursors for chemical vapor deposition of ruthe- pyrolysis method, 110 nium, 73 Ellipsometry Intermetallic phases Growth kinetics of sputtered amorphous carbon thin films: compo Phase formation in aluminium implanted titanium and the corre- sition studies and phenomenological model, 56 lated modification of mechanical and corrosive properties, 188 Epitaxy Ion beam assisted deposition Low-temperature epitaxial growth of Si by electron cyclotron reso- Wear resistance of carbon nitride thin films formed by ion beam nance chemical vapor deposition, 47 assisted deposition, 152 Extraction electrode Ion implantation Deposition of MgO thin films by modified electrostatic spray Phase formation in aluminium implanted titanium and the corre- pyrolysis method, 110 lated modification of mechanical and corrosive properties, 188 Ion plating Fourier transform infrared spectroscopy (FTIR) Microstructures and properties of PVD aluminum bronze coatings, Qualitative evaluation of pyroelectric mechanisms in 159 Langmuir-Blodgett films containing a cyclic polysiloxane substi- tuted with aliphatic side chains using Fourier transform in- Langmuir—Blodgett Films frared (FTIR) spectroscopy, 225 PbBr-based layered perovskite film using the Langmuir—Blodgett Fractals technique, 232 Fractal character of circumferences of polishing-induced pull outs Langmuir—Blodgett films (LB films) of plasma sprayed Cr,C,—NiCr coatings, 179 Qualitative evaluation of pyroelectric mechanisms in Fracture toughness Langmuir—Blodgett films containing a cyclic polysiloxane substi- Fractal character of circumferences of polishing-induced pull outs tuted with aliphatic side chains using Fourier transform in- of plasma sprayed Cr;C,—NiCr coatings, 179 frared (FTIR) spectroscopy, 225 Friction coefficient Layered perovskite Wear resistance of carbon nitride thin films formed by ion beam PbBr-based layered perovskite film using the Langmuir—Blodgett assisted deposition, 152 technique, 232 Friction-transfer method Low dielectric constant Polarized electroluminescence from a uniaxially oriented polysi- Water absorption characteristics of fluorinated silicon oxide films lane thin film, 220 deposited by electron cyclotron resonance plasma enhanced FTIR chemical vapor deposition using SiH,, SiF, and O,, 26 Water absorption characteristics of fluorinated silicon oxide films Low dielectric constant material deposited by electron cyclotron resonance plasma enhanced A novel process and thermodynamic mechanisms of air gap forma- chemical vapor deposition using SiH,, SiF, and O,, 26 tion for ULSI application, 124 Low power Gas-dielectric process A novel process and thermodynamic mechanisms of air gap forma- A novel process and thermodynamic mechanisms of air gap formation for ULSI application, 124 tion for ULSI application, 124 Growth mechanism Magnesium oxide Low-temperature epitaxial growth of Si by electron cyclotron reso- Deposition of MgO thin films by modified electrostatic spray nance chemical vapor deposition, 47 pyrolysis method, 110 Growth kinetics of sputtered amorphous carbon thin films: compo- Martensitic transformation sition studies and phenomenological model, 56 Micromechanics study of thermomechanical characteristics of poly- Guide crystal shape-memory alloy films, 198 Deposition of MgO thin films by modified electrostatic spray Mathematical morphology pyrolysis method, 110 Application of mathematical morphology in measurement of droplet size distribution in dropwise condensation, 16 Hardness Metal-organic chemical vapor deposition Preparation of hard super-hydrophobic films with visible light Evaluation of precursors for chemical vapor deposition of ruthe- transmission, 140 nium, 73 Dependence of microstructure and nanomechanical properties of MgO—TiO, film amorphous carbon nitride thin films on vacuum annealing, 170 Improvement of secondary electron emission property of MgO Subject Index of Volume 376 protective layer for an alternating current plasma display panel Physical vapor deposition by addition of TiO,, 183 Titanium nitride thin films obtained by a modified physical vapor Micromechanics deposition process, 9 Micromechanics study of thermomechanical characteristics of poly- Plasma processing crystal shape-memory alloy films, 198 A method of studying carbon particle distribution in paint films, 5 Mixed-phase Plasma processing and deposition Growth mechanisms of crystallites in the mixed-phase silicon films Low-temperature epitaxial growth of Si by electron cyclotron reso- deposited by low-pressure chemical vapor deposition, 38 nance chemical vapor deposition, 47 Monolayers Fractal character of circumferences of polishing-induced pull outs Qualitative evaluation of pyroelectric mechanisms in of plasma sprayed Cr;C,—NiCr coatings, 179 Langmuir—Blodgett films containing a cyclic polysiloxane substi- Studies on the formation of microcrystalline silicon with PECVD tuted with aliphatic side chains using Fourier transform in- under low and high working pressure, 249 frared (FTIR) spectroscopy, 225 Polarized electroluminescence Polarized electroluminescence from a uniaxially oriented polysilane thin film, 220 Nanostructures Polymer Pd-Ag alloy films prepared by metallorganic chemical vapor depos- A method of studying carbon particle distribution in paint films, 5 ition, 67 Polymers Nickel Qualitative evaluation of pyroelectric mechanisms in An effective diffusion barrier metallization process on copper, 164 Langmuir—Blodgett films containing a cyclic polysiloxane substi- tuted with aliphatic side chains using Fourier transform infrared (FTIR) spectroscopy, 225 Optical coatings Polysilane Double-layer anti-reflection coating using MgF, and CeO, films Polarized electroluminescence from a uniaxially oriented poly- on a crystalline silicon substrate, 208 silane thin film, 220 Optical properties Polysilicon Camphoric carbon soot: a new target for deposition of diamond-like Growth mechanisms of crystallites in the mixed-phase silicon films carbon films by pulsed laser ablation, 1 deposited by low-pressure chemical vapor deposition, 38 Titanium nitride thin films obtained by a modified physical vapor Protective layer deposition process, 9 Improvement of secondary electron emission property of MgO Double-layer anti-reflection coating using MgF, and CeO, films protective layer for an alternating current plasma display panel on a crystalline silicon substrate, 208 by addition of TiO,, 183 Influence of composition on the electrical and optical properties of Pulsed laser deposition Ge) BixSe80 —x films, 236 Camphoric carbon soot: a new target for deposition of diamond-like Energy-resolved photon flux dependence of the steady state photo- carbon films by pulsed laser ablation, 1 conductivity in hydrogenated amorphous silicon: implications for the constant photocurrent method, 267 Organic semiconductors Raman scattering Electronic properties of the space charge layer of in situ prepared Camphoric carbon soot: a new target for deposition of diamond-like copper phthalocyanine thin films exposed to oxygen, 214 carbon films by pulsed laser ablation, 1 Oxidation Rapid thermal processing Manufacturing, structure and high temperature corrosion of palla- High temperature materials for thin-film thermocouples on silicon dium-modified aluminide coatings on nickel-base superalloy M38, wafers, 32 144 Reflection spectra Electronic properties of the space charge layer of in situ prepared Double-layer anti-reflection coating using MgF, and CeO, films copper phthalocyanine thin films exposed to oxygen, 214 on a crystalline silicon substrate, 208 Oxygen Rietveld method A method of studying carbon particle distribution in paint films, 5 Structure and morphology of high quality indium-doped ZnO films obtained by spray pyrolysis, 99 Ruthenium Paint Evaluation of precursors for chemical vapor deposition of ruth- A method of studying carbon particle distribution in paint films, 5 enium, 73 Palladium Rutherford back-scattering spectroscopy Pd-Ag alloy films prepared by metallorganic chemical vapor depo- Effects of ion beam bombardment on electrochromic tungsten sition, 67 oxide films studied by X-ray photoelectron spectroscopy and Manufacturing, structure and high temperature corrosion of palla- Rutherford back-scattering, 131 dium-modified aluminide coatings on nickel-base superalloy M38, 144 Phase separation Secondary electron emission yield Preparation of hard super-hydrophobic films with visible light Improvement of secondary electron emission property of MgO transmission, 140 protective layer for an alternating current plasma display panel Photocurrent spectroscopy by addition of TiO,, 183 Energy-resolved photon flux dependence of the steady state photo- Secondary ion mass spectroscopy (SIMS) conductivity in hydrogenated amorphous silicon: implications for Indium tin oxide films prepared by radio frequency magnetron the constant photocurrent method, 267 sputtering method at a low processing temperature, 255 Photoelectron spectroscopy Semiconductors Electronic properties of the space charge layer of in situ prepared Indium tin oxide films prepared by radio frequency magnetron copper phthalocyanine thin films exposed to oxygen, 214 sputtering method at a low processing temperature, 255 280 Subject Index of Volume 376 Shape-memory alloy polycrystal films Surface roughness Micromechanics study of thermomechanical characteristics of poly- Preparation of hard super-hydrophobic films with visible light crystal shape-memory alloy films, 198 transmission, 140 SiF, Surface structure Water absorption characteristics of fluorinated silicon oxide films Preparation of hard super-hydrophobic films with visible light deposited by electron cyclotron resonance plasma enhanced transmission, 140 chemical vapor deposition using SiH,, SiF, and O,, 26 SiH, Tantalum Water absorption characteristics of fluorinated silicon oxide films Effect of surface impurities on the Cu/Ta interface, 115 deposited by electron cyclotron resonance plasma enhanced TEM chemical vapor deposition using SiH,, SiF, and O,, 26 Structure and morphology of high quality indium-doped ZnO films Silicon obtained by spray pyrolysis, 99 Low-temperature epitaxial growth of Si by electron cyclotron reso- Thermomechanical characteristics nance chemical vapor deposition, 47 Micromechanics study of thermomechanical characteristics of poly crystal shape-memory alloy films, 198 Double-layer anti-reflection coating using MgF, and CeO, films on a crystalline silicon substrate, 208 Thin film Energy-resolved photon flux dependence of the steady state photo- Evaluation of precursors for chemical vapor deposition of ruth- conductivity in hydrogenated amorphous silicon: implications for enium, 73 Thin film thermocouples the constant photocurrent method, 267 High temperature materials for thin-film thermocouples on silicon Silicon carbide wafers, 32 Reaction of Si(111) surface with acetone, 89 Thin films Silicon oxide CuAu-I type ordering and orientation domains in tetragonal Zn2 Microcrystalline silicon phase in silicon oxide thin films developed —2xCuxInxS, films (0.78 <x < 1) crystallized on (001) gallium by photo-CVD technique, 241 phosphide by pulsed laser deposition, 82 Silver Influence of composition on the electrical and optical properties of Pd-Ag alloy films prepared by metallorganic chemical vapor deposition, 67 Ge) BixSe80 — x films, 236 Titanium SiOF Phase formation in aluminium implanted titanium and the corre- Water absorption characteristics of fluorinated silicon oxide films lated modification of mechanical and corrosive properties, 188 deposited by electron cyclotron resonance plasma enhanced Titanium nitride chemical vapor deposition using SiH,, SiF, and O,, 26 Titanium nitride thin films obtained by a modified physical vapor Sol-gel method deposition process, 9 Preparation of hard super-hydrophobic films with visible light Wear resistance of carbon nitride thin films formed by ion beam transmission, 140 assisted deposition, 152 Soldering Tungsten oxide An effective diffusion barrier metallization process on copper, 164 Effects of ion beam bombardment on electrochromic tungsten Solders oxide films studied by X-ray photoelectron spectroscopy and An effective diffusion barrier metallization process on copper, 164 Rutherford back-scattering, 131 Sputtering Effects of ion beam bombardment on electrochromic tungsten ULSI oxide films studied by X-ray photoelectron spectroscopy and A novel process and thermodynamic mechanisms of air gap form- Rutherford back-scattering, 131 ation for ULSI application, 124 Indium tin oxide films prepared by radio frequency magnetron Uniaxial orientation sputtering method at a low processing temperature, 255 Polarized electroluminescence from a uniaxially oriented poly- Structural properties silane thin film, 220 Structure and morphology of high quality indium-doped ZnO films obtained by spray pyrolysis, 99 Vacuum Dependence of microstructure and nanomechanical properties of Wear resistance of carbon nitride thin films formed by ion beam amorphous carbon nitride thin films on vacuum annealing, 170 assisted deposition, 152 Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique, 241 Wafer Sulfides High temperature materials for thin-film thermocouples on silicon CuAu-I type ordering and orientation domains in tetragonal Zn2 wafers, 32 —2xCuxInx§, films (0.78 <x < 1) crystallized on (001) gallium Watershed transformation phosphide by pulsed laser deposition, 82 Application of mathematical morphology in measurement of Super-hydrophobic droplet size distribution in dropwise condensation, 16 Preparation of hard super-hydrophobic films with visible light Wear transmission, 140 Phase formation in aluminium implanted titanium and the corre- Superlattices lated modification of mechanical and corrosive properties, 188 PbBr-based layered perovskite film using the Langmuir-—Siodgett Wear resistance technique, 232 Wear resistance of carbon nitride thin films formed by ion beam Surface morphology assisted deposition, 152 Application of mathematical morphology in measurement of Microstructures and properties of PVD aluminum bronze coatings, droplet size distribution in dropwise condensation, 16 159 Preparation of hard super-hydrophobic films with visible light Wetting transmission, 140 Effect of surface impurities on the Cu/Ta interface, 115 Subject Index of Volume 376 Preparation of hard super-hydrophobic films with visible light X-Ray total reflection analysis (XRTF) transmission, 140 Growth kinetics of sputtered amorphous carbon thin films: composition studies and phenomenological model, 56 X-Ray photoelectron spectroscopy X-TEM Evaluation of precursors for chemical vapor deposition of ruth- Microstructures and properties of PVD aluminum bronze coatings, enium, 73 159 X-Ray photoelectron spectroscopy (XPS) Reaction of Si(111) surface with acetone, 89 Effects of ion beam bombardment on electrochromic tungsten Zinc oxide oxide films studied by X-ray photoelectron spectroscopy and Structure and morphology of high quality indium-doped ZnO films Rutherford back-scattering, 131 obtained by spray pyrolysis, 99