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Thin Solid Films 2000: Vol 372 Index PDF

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3 - 6 4 2 1 0 ) 0 0 ( S00P4II0: -6090 70 N., Fukuhara, 16M9. ,F ujii, 163 H., Fuchs, 21M7. ,F ischer, 185 J., Fick, 232 O.A., Fedorova, 223J ., RabFo.l t, 284 P.R., Edwards, 284 K., Durose, 94 S., Dligatch, 37 E.C., Dickey, 1ZD.1e,4n JT 1dg.o169 S., D3eki, e,M4on. n Jd.,egi, WG 1dr.i3e,,t4 h , 185 C., Coutier, Corraze, B., 54 Cooper, T.M., 85 60 M., Clin, J.H., Chu, 265 Choy, K.-L., 6 CW.hJoiin,. , 252 Chen, R., 114 Cheary, R.W., 94 Chahboun, N., 149 85 T.J., Bunning, 212 J.S., Britt, Boyer, M.I., 54 Boakye, F., 220 265 L.X., Bo, BAe.rAe.z,i n, 70 Bennouna,A ., 149 Benlahsen, M., 60 B., Basol, 212 Baryshnikova, E.A., 232 FB.a,n hart, 1 78 F., Balzer, 6WBa. i,B,Y 3a .7gM i.y,o nAM1o.u8,,d5 AiE 1.em4Lre9.A,M z2,l .3 ifV2ai. AJM2nm,al1.eo s 2M,vAKs 1.. ,ik6,, m9a ,AW 2m .h2a,n3t AK, 2s.d 2uGa0,. n, u , a , n a YM2.a5iW7,. 1SM ,.4aA 4h. ZM2,.ma6 X5,o. u, dLynch, P., 94 , 37 G., Lian, 25 S.F., Li, 118 C., Lexcellent, Lee, Y.-H., 45, 270 S.-G., Lee, 45 270 M.-B.L,e e, 270 270, J.-H.L,e e, 208 A.N., Lebedev, 185 M., Langlet, Laaziz, Y., 149 156K ., KuroyaFK.o,z lowski, 217 1 M., Konum 45 K.-T., Kim, 2DK.7i-0mJKK 1,..h0, Ao4 .MKr 7,.a,0 H z KD.e2a.,m5n H2ege i,on ni.,, 270 Y.-B., Jung, Jiang, H., 85 Jett, S.D., 78 IY1.n6,9o IM u1n.e6a,,9t IA 1a.b4,Ar4 .a ,h im,HB 2.i1,l7 lHJ 8e.a5r,z iHeSc1a.lh6,y,,9 a HF2s.1ah,2s iHY 1o,.8ao, 1m n HS2a,.3a ,k2c KHa 2kia2weR,3,ay ,on g.SG2,.u6 L5o. G,Y,1 0.u 4W, GS2. .3r,P2 o. 8JG,m.5 roT a.vGBn9,.,4 to, , n GT2g.i1,,l2 l GS2e.a8sA4lpG.B 1lia,.1oe ,b8,w r ayy,, Autho r , d I lar , n SchouwSiantko,, QuilQiu, Qian de SA1e. MmSC.b1.e,6i,i3 a dSM 2nec.0l,h,8, r 1Pe.6i,3 b SA1ec.6rhH3,a. F2 f,.3e, 9r SH 3,.a0 ,k ata, Rubahn, H.-G., 78 Rogers J.W., Jr., 10 Rockett, A., 212 10 D.W., Robinson, 185 R., Rimet, Riad, A.S., 144 S., Rho, 223 Ramasamy, P., 1 54 S., Y., 259 , JQ.i,a o, 259 50 Y., PX2e.9nL2.g ,, Outzourhit, A., 149 Okamoto, H., 242 NV1o.1,H8.NR 2.,k2K 0u.NS 1m,.i8, ,s1 N hT1.ei8,wg1 a NCa6.kam0,iui ,NYd3, .a0, ,t sumeM,J2.u 4,,2 Morvan, H., 54 Moorthy BS.a,b u, 1 MD.o,b ius, 232 Mizutani, N., 156 Miyazaki, S., 118 MT.i,n emoto, 181 Meng, X.J., 265 McKenzieD.R., 257 McCredie, G.M., 94 McBride, W.E., 257 Matsumoto, M., 239 Matson, R., 212 Marshall, C., 212 Malzbender, J., 134 x of Volume 3 (STF332oi07h0ll02ii0m nd0s ) , n , 7 2LZ.5hX e.ZD2n,.h5g Ga ,.oZT1 ,.,1h ,4 aZ S 2nh.5gaM ,Z.nQ2 ,h.g5 aC,7.n 6KZ,g.0e ,, l ZW 2le.3ai,2ms ZA 6as.e0,,,i nZS2ea.3riY2ttuZD 2,s..a0 e,Rh8v .n ,T, . K.Hyun., Yoon, ,252 Yescheulova, O.V., 232 265 H.J., Ye, 25 H., Yang, Yamamoto, K., 169 XueW., 114 XuaY., 156 25 D., Xu, WR2.u5H ,.1JW ,. e, bWY2ea.5rTn W.,Wg5,a .0, ,n W Sg5.a0,,n g1NW.5,a,6k W T 3i.a7y,g an,e r, TV8.s5Vu T.Tk1s,.r9 eYu8.n kTM1,gs,9. ,a8S iTS .2,.,a4, k2 TH e1.a8n,1ka THa2k.ak3a,c9u, h r iab,a nSD2a.y2,,3n nSP9w,.4iD fSJ.2t.,u6,L n5. , ,Suh, S., 223 SWu.,, 85 StenzeOl.,, 2 08 StelzlMe,. ,2 23 StamaMt.eD,.2 4,8 SolinDa,. M.9,4 SS.iBn.n,o tt,37 ShinozKa.k,1i 5,6 ShenY,. 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tSeelin1uentltEalemoCsc2hl os 4 megof8hnuuo nayB-d clGroccfbl y4 drymlplIeefaCToe,roy C seilaprgn Car,r oeuca ne muitc Da mwh/etl-teiiensmime1taashvnnhCoM igm4odrnhcgauoeypoP/sbtsc4d dgie gs Ppcuerpn hudlorS yttotCtfainS c hsroeone bliea oyih fh/fdesyio a s rc-li pC olzmthleiT,SsnptitgamneeifihaeiCsreu iige irs eott a ruartmdncm aarnl/adinlcDreeaa ettg in dfSooi ardllei ainennimcdrazin e, o t10 edlae nss2Otleiesetsepy4e a, uceusing 1d,i1m-edtihmyeltehtyhlhyyl-a mine ust8crySi(100) aalnadn e t mttr DipoTtfdeeretohii frzeriinmeilne oapecOLtoewam tlpaogeymroreaifoarc lwnt iutuothmnrr ieid neu m cpmn,r lpDstod,rs e ieie is onc lgaryoewrt h erioAtomic ptglt5ftner eii4e ricle d85 filtmhsti,cn choint osan tms Sas coisr t,fhnpeisCce,ol.mf-p-plaoesrxspeehmsyb rliyn r asdecsulfonated Eolfe ctrostatic mur 5c cea0tt(AFM) microscofpotryc e Atco mic ruthoPoLtfbpuresiohfluryaaionrcglaundiicn g rlifilms, ctdl7s8e lf-assembled e l,mnimrosb,6p s Ozaeepa a ospytsitceamlsl y as, itacmNncleoatutnnisa-ovtllese ircsna elaerds in rotc heacesvni doolptaioes micfrorocseAc toopmy ic rdicpncta,o Poopfost-yfl nroru re-248 systesmp,u ntetterroinng u i lerofaodey1ps fsrrn(0taesiamaDa bgCy-d feitplhoTmoisisnfi Optr,eDo dipe elretcitersi c tvacridzteitSaudaaesiidniisl)tnitncvmaterialAsm orpho y(a ieidem el1nnd, oLtalgoae i0eg afnterotl10d 0drazine, y omohwu)eDpempwy nrm eru1ds,ii1mn-egdt ihmyeltehtyhlyhyl-a mine ietSi(100) leaalnadno e picrh ceon ea tsusotnn itarolifgd ulerm aoaiywtentortuh mLem imo cpw e rature himsuyt rloans2initride Aluminue-nnu5aoS b 2mnis aAlllo-y,Ci Pu-Mp goc o t1o1n4 tion fxrohnr iopoeaCdpopt toxmibdiyacf- uroc oroacmaoreetfcrir d aen Gmgguirsl coa wrtithy eexeeop ri,retrd 2 lalloy Aluminueio1e e2ucs s60f ilam-sC,d :eHpp loasmisdu.tmlceat.d i potlar roof preolapenecsdrttt otrhrniieuc ae coasntflE un frefaaellc itn g chCepropertiesS truc4t4u8r:a l umlinc60f ilam-sC,d :eHpp losamisdu.tmlceat.d i polar SaleC ,of propeelreactntidre issct tarhloue nc t uaraonlfn eEaflfeicntg o ppAnn1e7:a ling erC60f ilam-sC,d :eHpp loasmisdu .tmlceat.d i polar onparnonpeearltiinegs 2fsdelectrical tsEoooahtfffnnerf d ue ccttu ral io0ull8cmi tsmaterials Amo15r:p hous d,i vCif60f ilam-sC,d :eHpp loasmisdu.tmlceat.d i polar oitmlympcogioig of preolapenecsdrttt otrhrniieuc ae coasntflE un frefaaellc it ng slnnofone a f adsoslte(FTIR) spectroscionpfmyr ared transformF ouri1e5r3 i: suine:tent tengeCrc sroye a, vdCft aeihipplneomogmsrss i i ctailo n-dSubject Index of Volume 372 iamond 301-305( 20003)7 2 Films Solid Thin www.elsevier.com/locate/tsf SEVIER ELa at l o 134 of l-gel scells, 1,1-nditirmiedteh ylh1y,-1 -nditirmiedteh ylhmyi-c roamrce tthhoidn, baD yC oligoanspiyplrrioanlyey sdies potfsihliimnts i on1-, 1-nditirmiedteh ylhy- tfihlimns pbss3Zofopryi0xilie li n-nmpdgc-saee c l ro eadti ng, 134 o 4 s 8 oxida- coated 2 films mag- thin by on on 45 on ACbadoATf2pausiif7iLp rlf/ 0NlrmEf Si isu iec sra isbo,in l ity a Ktahe gpgdsadlreitenaasrrvdsituCfNis NsioaNnrcouacenena intaser-( lbu-d : mcIuref aotennr,inni,e ozctGeneea a,dis) n,Si en,g aholoStolpbeohiffitstsin miosneeuce raralsrbloa i gtneigons anDotemhoeolhffn aeoolae drtud-s dgetsunier lcelmu s issn ation films Langmuir s9c4o pspXarXufyeipsn-h-,scopy,9 4 fleidrro lmcn aapuotsitoIestglnfhtfyynlospectcro-p hotXo-eraaln yed c trroefnl eXc-triuavsyiit fnyi gl ms r tte r vt aeoMer uietl-uravcsplatiunliuotmfer a-thsitnr uctiunrteteh roeff a cial Investigationf -littncatttui2dctyhutirgiy3 hi45 methsoodtl,h-be g ye l substrateP ton/ Trmi/pSrieOpa,r/eSdi elaae2ni o atl, abaantofLyn i ih-foefimtlhmisn hetteirtoanlnzaailtyreeoece afrod en adt e Chaaracter ization ole v1nprinnMm e5zsh osgol-o iInterfaces nm ncdp-uori1hcilo5-223i ods, a6wr alp n Mbypft/TPeip-ihmethbp- spectirnbofsryac roepdim cu ltilayercsrL angymuier—BIlModgett Oeli(i5 e rOgmnZtd CaobgantosXAps,O ra acid penorff luoorrooifse thnetaarftiiCcoh fna ractertiuzateinon ranPV ,x( e uchdori S1 DdlMa awe0 yespectroslcoIpnfyr ared v,tdO0 aih )ttoAoa1C il in1rlloo V4 on-n ombfccorGyD xfeCoie,yor70 system, sputDteCr ing i g acr ruodutMoramw-laixiomreacetivcea thohdaoe l louws ibnyg films TiNt,hioOnf, Formation ta-niMaicdr hgd2bd/CafTAoArcrgi Sss aiaif7pci oitLcathodHeo llow u lrtf p0 NaymrEfil M r siuoi e c45 metshotolhbd-ey,g els uebstraPtoten / Tpir/eSpiaOr,e/dS i snctr i aa2tstrtafsobohilu2e,ennfitlhmisn hetteirtoalnzaailtyreeocea ford ne adt e Characterization i el lbl0md ilmsia p taorfsaMrsitztehflpena -tHeterostructuresrisai uirdgyMaMinotcna nst nniat ttees208o filmss,o lid u niu thsnavg9rciot i4eathin heteraoboogsfeo nrleboosisuneosgsp tilciaonplfe ar Simulattion ir spy noe y,spXarXufnese,ips n-h- materialHse terogeneous sifl eidrrolpImsecn aatisutooesnlttg nlhtffyyo134 geoiomnfed etinrngtyfloel,anru sc ceso:n caet ings varta ter t eetoter ufinn2ls-ruaiivcic5soolf- gehlaa rnddn emsosde luatlshoutefis c eDeterminationt f l-nitnte7iacmttgupsrnu scgSacyihtrisrpim,i nhtainHardness rdetotu a arnted oerptMslr ui nnoe tpaacog reuctngettrrttu nfatts2niteeereohiu2nnaenoparticle-s, gold eerdlam169 elb0ldstria lpiMsrms o af soatit rerspeatshltfnnis -iorconftia1li1m nsi nNgy lthoiinnn effectst unnerlingS ingle-electron gisui igodnMMaannn scc nm t ttan tsesoieunanoparGtoilcdl es ug thv marniois1teepte8prisy 1nuteo PZ,fm, btitsofrnrr nyatMicaf i eee ,gld gsrMpqmi_nt,isauaoc ea nb1rO eogtgna0ana n,rr4cttc r eotgfpoepTiiyifunrshnrl ho eppLstooharnobogitul-oistlt iyu ngoesilicon, a aineoi2nf1 7 rscpmrgFds ru,teamuremmm Er/SiO,-TiO,, irtanad185 aao et2cclclcd -nlriri4hot esaiyeq 2apidAerLosporle—pgaeorlfoa pttiiocanac ltlilyvae y einrt sh sey stem Lflpsaus iooosaf tlliaalr niilfnnaydu andln yadl orgoanic light emitting diodes, 163 emygsgl esF sreiflmuml ifldybuuunThien fluoefmn oclee aceguglraerog nat htdeie ovpnir coep eorft ies os oeFiiecxtrimt-rraieii c—cencienL PES i Glea yegrrso wonnS i( 100s)u bstra1t es, tnlns1oBuede9sne sl 8it.B;»nsS,Influoefcn ocoelr iatnoegnt hdei slocaantrdie olnatstu emdi nes- foocot aTtrip Nihhfdnia ,lu,iba ,gnm ort nLuminescence r, Teoroteasieet xafal,hnfn)hlnteyc ftee idge.rtpteicgcencienL PES iGlea yegrrso wonnS i( 100s)u bstra1t es, aF Ocoeetrbe et rrdio,nr ili p,-Influoefcn ocoelr iatnoegnt hdei slocaantrdie olnalstu emdi nes- rciseto,attrlyeo iphase Lepiiqtuaixdy t l-cevaporation isource, emodified 144 saec rstchain liquidc rystal copolysiloxanes2,4 2 g ra usfiitnlhCmgids nc S o taohtfei prnrgmPo ahplye sritciaels oincLangamnuLdia rn gmuifri—loBmffsl l oudogreintets- icdoen taining Evaporation Liquid crystal copolysiloxanes scopy, 94 156 urXpseps-hfeirolcnatetgyocr t eoil-ve ictyt rXo-nr ay fainldm s epitaPxbi(aZlr ,T/iMIgIOO0(t,h1i f0ni0 lp)mr epbayMr eOdC VD, Ipnlvaetsitniugma tion isnttreurcftaucriea l otoulhffte r a-thin An XPS study of the nucleation and growth behavior of an evaporation Ebleeacmt ron Lead zirconium titanate (PZT) deposited substrates, (100) cubic-zircon3oin7a 50 method, Prcerfyoesrrrtieraeolenlnfafidlt itc oalkigtmeorislnao spnhh iipcs Preparation of La,O, thin films by pulse ultrasonic spray pyrolysis Ebdilafecfckrtsarccoatnti tone red Lanthanide ApopAfTlLf iiaiCEcsNldua m ibb/sfia S2frl7iuri0s it ieyor ns , Echalin ecliqtuid rocrymstal igcorpolyasilotxaneis, on 242 Langmuir and Langmuir—Blodgett films of fluorine-containing side substrate, ann- Si o2n5 2 output modes, 239 Phoptroocofeoop tlxpefhiecrpiidcoltenemati r ster eso dc hemical Hybrid Langmuir—Blodgett films of APT and cyanine with binary Electrochemistry thia-15-crown-5 dye, 232 outpumto des23,9 Langmuir films of the novel anion-capped amphiphilic benzodi- HybLraindg mufiiolrAfm—s Pa BTncld yo adwnigbiteinhtne at r y Langmuir—Blodgett films Zoixfniipcldr mbeess yop s lap-rig3nee0-dl c oating, ods, 223 modifieevda poratsioounr ce1,4 4 Langmuir—Blodgett multilayers by infrared spectroscopic meth- Physipcraolp erotfti hees rmcaolat iCndgSt h ifni lmuss ina g CEharlacteerizcatiton rpircaolpof eroraitentnaitiodnem se asof uperrflueorostmeariec ntsa cid Langmuir—Blodgett substrdaetrei vffielmr do am c hemiscoallu ttioenc hni2q6u5e , Higholryi enPtbeZdc,ha rinT li,quiidc r yystal, cotpoOlhysi0lioxaf;nnes2i,4 2 lomn L aNiO;-Scio ated Electrical properties Langmuir and Langmuir—Blodgett films of fluorine-containing side 302 Subject Index of Volume 372 mm ei n e s c e n c e e n i m a i d - ’ 4 , 4 - ] ,l Ny PhoteOolrsegtocaartnbgriiaTioclnnhl iifeutcl ymu iennoecresg caTiennhnifecclf eu ile mnSsct,e r uOscpptteuiocrcutaatrllpHo uystcb orpiydL anLgomnusgoi-lrtiS dii mmeZou xilinadcte i onPh ysicaslo liSdi mulastoiloinSd i mulaAtieorOcnopo staoitfliic-lnagmglSses t,l r uctural Nuctluenagtsitoenn Structudreaplo sitNeicdk deelp oPsriefteerdrg eodl dS ingle-Tienhlfeel cuternocne diaminePhotostability enylN),-N['1-,b1i'p-hbeinpyhle-n muirHy—bBrliodd gett Nitrogen h g light light 54 and modLeas,n gmufiilrm—sstB albfioildlimgtosyef, t tfi lms propertfiilemsos f, filmosf, 54 andO ligome1r5s6 nitride properties crystalnlaongorpaaprhtiicc les, cal (1-nap Lan and emitotfi ng emitotfi ng spectroscopic 208 linear Oprpotpi2ec0ra8tl li iense ar 208 linear preparatisopne ctroscopic Ntfihilitmnros in d e on of Nanostructures do giis- morphologmioclOadeplect vuoilecalersem cotlreocnuilca r 239 othfe opfh otoloupmtiipcnraeelsp caeroenfdc e optical optEi1rc8a5/l S iO,-TiO,, films, and (c1u0b0i)c -zirc(co1un0bi0ia)c -zirc1o6n9i tau nnelimnogl ecular morphaonlN'-boutput modes, 239 diodes, diodes, novel thermal OlcMpolestutsis,act lae rls aggregatioang gregacthairoanc terifzialdmtt2ysi3h eo2i,n aa s-n 1i5o-nc-rcoawpnlp-oes5sd bse oysl -gel losses losses oopft ically characterizations 257 tfn2uii5lnt7mgr snsi,idt teer no gen-loss orientatioenf fects aggregation films stabilit1y6 3 on 163 on oAfP T oafb ssopribesnm1ivo-4onauc4dgpro ic coafoetria,iate ntidgin ,og n oafb sorbingoa fb sorbaicntgi ve charactseurbissttriactse s,s ubsrterlataNcslthiatoeeettiisaetoon, irrn cc ysei hditienhp insolendt1i mr i 6gigo3htadt otne niis n,c g ence, stability APTof the the and in CdS Nylon sc d ohtfor laen sportidpnergvo ipceer tiesdp ervoipceer tooifle isg oanilicwniyeta hn inea mppshioilrpihocoiunls,hi ce t3e0r ogentfeihliomnus s heterogenheeotuesr olitgnahe eyn ereso us oofl igoaniline in 37 37 onifc kel 1f1i lms tdpherevoio fips7nricee8lcger lmla tfsun,i-di eaicssn sge mbleoemui2drlna5s g et9eace dntr iircao llsu morganic electroluminem2a5t9e rials iiuns ed neranspohroltei onfg scence, th cyanianne benzodi- sputtered containing t yw i using r Resis1t9i8v cosSB;,.tfihiThfprOiNtliaa pu.,ybmn,r.ot,Te oorotear sy af ftafel,hn,xhn cf lte ee dyeteiic rR g eacoteebetr rldi iinil ctsabrm1-aiate4ranettbli9fcadyaio c lokn Ocolottffls-sef ihspfphhoirau c lit tmtaiworrtmniyciri Rmsg aec kcate noamnactfclsneeltatRl ep s ehnnea esirctcmcn iets taz a,preponaP rte/dT is/uSbisbtOtyr,ha s/eto Sel im-g eetl4h 5o d, rann otc sieCharacotlfee rzaiidzr acttoinitaoahtnneea tt ee rtohlfiainly mesr ed co onb piPZT yn armethod, 50 y PrepaofrL aatt,ihOfioi,nnl b mpysu luslet rsapsropanyyir co lysis 2Pyrolysis 17 technique, a ss2dfcou6erhlb5roeus immttv iirecoadant l e t;Ti,,O, HLiagNhilOy, -coated PbZr, horiented Sftoiihn li mn in Pt/PZT/LNO/Si 85 films,t hin chiotno san asCce,ol.mf-p-plaoesrxspeehsmyb rliyn sulfonated oEfl ectrostatic method, based 6 cost-eeflfeeccttrisovpsert aayt-ivacas spdioesuptreo ds ition- tpoly(vinylidene Pbryhe paration fluoride) atfoo hifril inme sn ted in Polymers scopy, 94 thspectrpoh-oX t-aronaedyl erecftXlr-eocurtnsai fiyvin ilgtm ys in platuliotnfru ams- tthriuincn tttuhoererfe f aciIanlv estigation syPlatinum stPlasma-etching em coatings, b1a0r4r ier ththegrrmaadlfe udn ctipoolnfaa slplmrya o-pTsehprertraimyeaes dl in spray Plasma 70 system, sputtDeCr ing reacctaithvaho eol udlsbeoiyw fn i gl mTsit hoNif,n O ,F ormation peTb/PMtfprIMybdeposiatnidon processing Plasma hiiOe(g OlitZmsgnpOC;aXtaAonboa r tra212 (x hnffnueVPn,uoir 1e cdh S daDw e0l ayl perfodremvaiancnecd e s, strucgtruarien, t distribgultaissoens,: d0e,v h a)i t oNa-farnede Na-ocno ntaininCgu (In,Gsael)ienS nei,Nz aed iro spnnSaciirpPhotov oltaics nhtntou ardrptru oeta259 eclecotrirng oaunlsiuecmd i mnaetsecreianlcse , grectetrtunieertranhsoplooerf tings tability morpahnod logicalP hotostability -erdalsi los Photostability stsi cods, 223 s meth- spectroscopiicn frabreyd multilayers Langmuir—Blodgett crPoonferacid perfolfu orostearic orieonft ation Characterization iifrrlylc ieasmkefttseacid Perfluorosteanric eia ltrol arnltesoidhgo irfnpia50 method, lspm hsi pyrolysis spray ultrasonic pulse by films thin La,QO,o f Preparation c Oxides 104 coatings, barrier thermal graded functionally plasmao-fs prayed properties Thermal ofresistance Oxidation 265 technique, solution chemia cal from derived substrate osNcnamipylcnoeaSi LaNtiO,-coon ated film thin PbZr,;Ti,);0,; oriented Highly s uttnnitsiac-otevalls223 ods, eeml ic rslsna y elmeth- spectroscopic infrared by multilayers Langmuir—Blodgett aerd acid perfluorosteoafr ic orientation of Characterization tPmsohathroOrientation ofnaoarl bdtnpei osl h169 nanoparticles, gold spiottoNbmN4l(ayN14ri'-e---containing films 11 Nylon ,thin in effects tunneling Single-electron ,3’ ’o b’tp-t - gi-ih hbblineyi78 films, organic self-assembled including iicgnlpsta yph yllhesystems nan oscaliend clusters metal active optically Non-linear ] en nyylsubstances Organic l-)N-,bina259 electroluomrgiiannne iscc enucsee,d materials [ 1, oS3IVuf7nob d2lje euxcm te heterolayered tthiitna natflozCeiefih la ramdcrs o ancatteer ization bmeinczaroomsdpcihoa-ipn npyi ohtoovhinfeelf l -ii clcmLa spa pnegdm uir eTlreacntmriosn sion ssypsuttetme,r ingm oSruprhfaocleo gy DC 70 259 eloieruncg smtaearndtio eclr uimailnse scence, rceahaau bofctsliyTtthoillh iifnoFmiov Ngsdonew e, r Om,a tion trhaoonlfse p sotratbiilnmigto ayr npdh oPlhoogtiocsatla bility oTxiitnaintriiudme ssypsuttetsmet,ra ibnigml iotrSypu rhfoalcoeg ical netron2 48 films, 54 maD badCyfgtei To- hlpfipi monD rOss io ,iep lteeercdtt ireisc thionol fi gcohaansriaplaneicSdcntt teerr ruoicsztcauotrpaiiloc n s oxidTe itanium proSpterurcttiuersa l 2b7ad0/aCrif SsrfTui ioAifli f eAumLN rpss Es pi,ol ni cability 134g eioonmfde ietnnrgftolylnae,us rc seo :na ctei ngs nTiittraidnei um soofl -hgaaernldd mn oeedsltuasohsl fet u iscD etermination 118 adsmlehelpaomopyosesri tye d Stress films, aTnid- Nit-Th—iiC-nuN i 198 sopfus ttrtrtaeeohircfen-o ms v oedrTeyhl ienrgm odynamic ft i»O.,,h l,im;N.nsTS B,bars ioy,,p,f uc thatrearcetde ristics Ti-Ni-Cu raelniedtalo hbenrieca l ttiritioooycx feay Tflgf heeecn t- to-argon 118 sputtering, 181 ftihTlaimTiannsil- dm,sl-N edhoNieyami-pspo — oerCs yui t ed mafrrgbafeyndiq ZelioumotfnPse r, rnoec_npy, a Mragt,iOon sospftur tortehfamtcei eoo Tnrdvsh-ee erlyri mngo dynamic 70 systsepmDu,Ct t ering Ti-Ni rechaaauc obtftslyhiTiilto lovniohdmfeFgiwNse no , rOm,a tion films, s2o0l8i d Sputtering oahpbetstioecrarbloi gnegn eous tlhoisns es looSiffin meualr ation 2t2ste0ruotam f ebhniplseldeiatm rrtrs aia totenu srheisp, filsmoslT ihdi n tahoi-frn eM fssnlaipu snictdMnit avuigattnyie otno resistance measurements, rbtaearnfcadlkn e scm1ti4at9nt caen ce foOlpSputtpiciicctanaull a tions fotcfifhhrl iaomcrmska nctlethoseiwsrn ization sputtering, 181 118 mfrbafraZoyigPedfl nnriqm oe,esu pte_anr,rcoMaynt g i,oOn dsemhapTelaoaTlipsmntoif-eiodhyi-N ti slrNinem y i sd, - —Cu Sceolllasr sospftur tortehfamtcei eoo Tnrdvsh-ee erlyri mngo dynamic 185 Er/SiO,-TiO,, scopy9,4 stiyhlnseaa t cyooetepfimprt v sirAe ce eaprlalorysa otli-ogne l sppeXahc-rnotXerudtrff-as oiloryilee-a nmc lystge i cvtitryo n 4ms5tbesoh yPoutlep nbth- r sgo/etedTprl,iaa t/reeS di O,/Si puollsfatit ttronrhiaftIue-n ecn trutvhfmueiars ncet i iagla tion fthihtzlelioimiCnetftsr aha e cdnaro arontalaeca ttyeee rriezda tion 212 Sol-gel ggplreaarsifsneo sr:m ances, structure, distribution, devicea nd 212 NaanNo-danfC -rsiuNceen( eolaIe n nnt,iazGieand)i Sneg, pdaesegntdrvrgdrifial usacioctsenrtrs muierbaseu:n,t c ieosn,, FTihlimns Cu(InNa,-Gcao)nStea,i ning aNan-df rNsoeneae l eniinz meadp piCngd Te/CdS cells, sEoBlaIrC o2alf8nu 4dm inescence Sodium Thfiislnom cl ealrl s substrate, oan2n-n5 S 2i 156 pcroopppeerrt ies Pootfcihfxohli iaomndtts eeo de elPp/pbrMei(egtcZpOartax(,irr1bTae0oyild0 )c )Oh 0e; mical MOCVD, ftihlimn 2spi1inop7ols irfL htc ooaoobuntnis,gol -ilttuyim msigternuo edwyst hc ence tnbaXhuenPechdS la evaiaooAtonffni r o n Silicon fTihlimn Er/SiO,-TiO,, 185 measurements, rbtaearnfcadlkn e scm1ti4at9nt caen ce Aeprrooofeapl cpstitatsiaonhyicy rleevasa— relttsg lei eymo l n Ocphtoloaifotprc thwtfaahfi iicilrlcctn mkoa eslnmr e iszsa tion system Silica—titania Thickness lgaryoewrns substrates(,1 00) SiGe ciLoSnineP nEc e1 118 cooling Irotdarlaheninuntel sfmde alli tounoeceefdans tc-ie o ns dsemhapTelaoaTlipmsntoif-eiodhyi—N ti slrNinem y isd, - —Cu SiGael loy Thmotoerfhsdre eotsecm frploa ouviitdenntysrge ynr -a mic drazi1n0e , Thermomdoedlyinnagm ical Suids(ii1amn0al_e0gna1) tdn, h e1y -ldeimtehtyhlyalmhyi-n e barcroiae1tr0i 4n gs, tgreomwptelahry aetru re Laoaniftlot ouwrmim idoicenn um pgprrloaapdseemrdfatu -insecpstr iaoynealdl y Thermotafhl e rmal Si(100) Thecrymcaliln g 118 barriceora tin1g0s4, dsemhpaeTaolaTimpslntio-ieofdhy-Nit r isleNin ymd i s -, —Cu Thperoorpfpml eaafrlsut mnigcaertt-sahi sdeopernrmdaaa lylley d Tmrspeohucdetoertvlemeirro-nyd g y namic otsothffre a ins Thceornd/dim fuafclut siivviittyy Shmaepamelo loryy barcroiae1tr0i 4n gs, 212 Tphorpefolf rpaugmetnsrrahcmatletadiir -eeomssdna p alrl layy ed gdliagsssrtatsadrrenpieusidenvc:b r i tucfuteori eor,nm ,a nces, Thbearcrmroiaaetlri ng NisanCe luoNe(nana IN-innazcd,-eo fGdnra te)aeSi en,i ng drazine, 10 Selenides Si(u1s0di0ni)gm etahlyaalnn_1eed,t 1h-ydliammeitnhey lhy- inscelolurffd7ig-il8aamn nssgis, c e mbled Ltoewma tploeagymrroeiaaofrct lw n utuiorthmner i i ndeu m Noonp-atlcmitieccinltaivunelaneslaal tsyr ne y orssst ceamlse d Tepmrpdoeergsaorrtapumtrmieeo nd Sechoanrdmg eonneirca tion ceinnL ScPlieEa Ggy eroeS nro(i s1w s 0un0b 1)s trates, Scaenlneimcntigrc orno scopy Ioncrffoota dlnohtiau lreeslne ei lundlnocma gctei ae ntdei so-n s 198 TEM charoasfcp tuSet.rrt,iBe s»irtN ,eibOcd;ty,s hfT, iia,nl m,s , Theeffo eofcx ty gerna-otntitoh eo el- eacartnrgrdeiol cnia alb ility SBT on chitosan thin films, 85 Electrossetaltfi-ca sosfes mubllfyo nCa,t,e.d- porcpohmyprlienx es films and their relationship to substrate temperaturesSs,tur rufcatcuer e2 20 Magnetoresistance and spin fluctuation resistivity of tah-iaM-1n5- crotwnh-i5n dye, 232 304 Subject Index of Volume 372 Transmittance Electrostatic self-assembly of sulfonated C,,.-porphyrin complexes (XPS) spectroscopy photoelXe-crtaryo n scopy, 94 films using X-ray reflectivity and X-ray photoelectron spectro- Investigation of the interfacial structure of ultra-thin platinum drazine, 10 Si(100) using dimethylethylamine alane and _ 1,1-dimethylhy- Lowt emperatautroem ilca yerg rowtohf aluminnuimt ridoen X-Ray photoelectron spectroscopy 156 rmal epitaxiPabl( Zr,Ti)/OM;g O(10th0i)nf ilmp rdtep tarrbeyidM aOC VD, An XPSs tudyo f the nucleatiaonnd growtbhe havioofr a n X-Ray photoelectron microscopy (XPS) tnf2iiu5ltn7mrXg SpancissinthPsirnp,d ar ttoudSeTrurpet uacoentcntgr etugetrtabrm1ernisee4rnaera-et9fdadcialls l eOc nolkottffs so eihpfphhon srtusclit itawim osrmnticcir im s aceskcat na mnactplPcbsemlte4osta eoryts ee5nhunn les /er btct-p siThesgatzo iVoloufm e Index Subjecet ,rradl/ aet ,Stid eio nO ,/Si eeY PreZpianrca tion hz Photoelectrochemical sputtering, Ties abili on films 2 Zirconia oxide rtst an 37 e Zoxiindce rop n-Si using 181 Zofn ,pfi_rle,mpsMa gre,, dO psprayedZrO, substrate,s 9c4o pyX,- ray rXe-fRleacyti vity s - atingr4r ier ofa sma propertiesr eflectivity oa0 l cb1 p 252 by foct8ih5nhli imnts ,o san filmsso l-gel y l nal of and by spin-coatingctio, copper X-ray radio un f oxide photoelectron frequency d e ds(co3eu1un7pb0b so0its)cr i-atzteiedrsc ,o nia 30 ad thin r g l films magnetron ma r he spectro- t coated cronfPoeriirfrlylc ieasmkefttsenei altrol arnltesoidhgoi rnpa sp hic pIotisounlnlhtffvatter eter usraictf-tniatuucghrmiiae ant l i on

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