Table Of Content

Thin Solid Films 368 (2000) 319-320 www.elsevier.com/locate/tsf Author Index of Volume 368 Almazouzi, A., 26 Forster, A., 93 Kwok, R.W.M., 241 No, K., 61 Alonso, J.C., 74 Fritz, T., 130 Nollau, A., 130 Andrade, E., 74 Fujisawa, S., 151 Lai, K.H., 198, 222, 292 Aoki, T., 181, 244, 287 Funakubo, H., 261 Langford, S.R., 169 Ortiz, A., 74 Arthur, N.L., 176 Fung, M.K., 198, 222, 292 Langlet, M., 35 Ashfold, M.N.R., 169 Lee, C.S., 61, 198, 222, 292 Pailloux, F., 142 Atakan, B., 185 Gaboriaud, R.J., 142 Lee, S.T., 198, 222, 292 Pan, Z., 249 Ge, Z., 147 Lenssen, D., 15 Pankov, V., 74 Bay, H.L., 15 Geshev, P.I., 156 Leo, K., 130 Park, S.O., 41 Bello, I., 198, 222, 292 Grosso, D., 116 Leskela, M., | Peng Bonevich, J.E., 41 Gu, Y.W., 86 Lévy, F., 26 Poon, M.C Butler, T.M., 105 Guggi, D., 15 Ly Gin. Gupta, A., 80 i, G.H., 163 Que, D.-L., 300 Caneve, L., 8 i, J.B., 237, 279 Cao, C., 203 Hatanaka, Y., 181, 244, 287 i, K.Y., 292 Rahtu, A., | Chan, C.Y., 198 Hillebrands, B., 216 Li, L.H., 249 Redman, S.A., 169 Chang, C., 211, 303 Hoffmann, M., 130 Lt, SF. 279 Ritala, M., | Chaudhari, S.M., 80 Hosomi, T., 269 be, 23, 140 Rizzo, A., 8 Chen, D., 315 Hu, S., 138 Liang, J., 307 Rosenholm, J.B., 35 Chen, G., 241, 312 Huanosta, A., 74 Liang, L., 315 Rotter, L.D., 41 Chen, H.-Z., 300 Hussain, A., 193 Liao, K.J., 283 Chen, K., 315 Liao, Y., 211, 303 Sajavaara, T., | Chen, L., 138 Ikeda, T., 244 Lin, Y.W., 249 Sano, K., 287 Chen, L.-Z., 257 Isakina, A., 49 Lindén, M., 35 Scaglione, S., 8 Cheng, J.G., 22 Lid, HL; 15) Schaublin, R., 26 Cheung, W.Y., 55 Jelenkovié, E.V., 55 Liu, S., 307, 315 Schulte, A., 193 Cho, J.-S., 111 Jersch, J., 156 Liu, X.-H., 257 Sermon, P.A., 116 Chow, L., 193 Ji, Z.-G., 300 Liu, Z.-J., 208, 253, 266 Shao, Q.Y., 211 Cho, KE. 22 Jin, Y.X., 163 Lodha, G.S., 80 Shen, D., 138 Cook, M.A., 169 Joo, H.Y., 67 Lowe, A., 185 Shinozaki, K., 261 Cooper, I.A., 176 Jorzick, J., 216 Shtutina, S., 49 Czerwinski, A., 176 Jung, K., 216 MacCraith, B.D., 105 Simola, J., 35 Maki, T., 269 Skryshevsky, V.A., 125 de Almeida, P., 26 Kaiser, D.L., 41 Malins, C., 105 Smith, J.A., 169 Demming, F., 156 Katz, E.A., 49 Mantl, S., 15 Song, H.W., 61 Deng, J., 312 Khor, K.A., 86 Mao, D.S., 198 Song, X., 241 Dickmann, K., 156 Kim, D.G., 61 Matero, R., | Sun, J.L., 22 Ding, S.-J., 208, 253, 266 Kim, H.J., 67 Matsumoto, S., 231 Sun, X.L., 237, 279 Ding, Xi.-Z., 257 Kim, S.J., 67 Meng, G.Y., 275 Sun, Y.W., 283 Dong, Z.L., 86 Kim, S.Y., 67 Meng, X.J., 22 Suresh, N., 80 Du, C., 147 Kleckley, S., 193 Miles, L.A., 176 Kobayashi, T., 227, 269 Mizutani, N., 261 Tachiki, M., 227 Enomoto, Y., 151 Koh, S.-K., 111 Modi, M.H., 80 Tagliente, M.A., 8 Kohse-Hoéinghaus, K., 185, Muramatsu, T., 181 Tan, J., 22 Faiman, D., 49 208, 253 Tan, L., 312 Fang, R.C., 211, 303 Korzec, D., 244 Nagashima, K., 261 Tanaka, A., 151 Fang, X., 227 Kremnican, V., 292 Nandedkar, R.V., 80 Taniyama, M., 181 PII: $0040-6090(00)00964-0 320 Author index Pillmann, K., 93 Wang, W., 315 Xu, Q.-F., 300 Zhang, H., 315 Tong, K.Y., 55 Wang, W.L., 283 Xu, X., 297 Zhang, J.-Y., 208, 253, 266 Tripathi, P., 80 Wang, X., 198 Xu, Y.-Y., 181 Zhang, L.D., 163 Wang, Y.M., 222 Xun, K., 138 Zhang, W., 249 Vaudin, M.D., 41 Wang, Zhang, W.J., 222 Victoria, M., 26 Wang, 2 Yan, H., 241, 312 Zhang, Y., 138 Viitala, R.I., 35 Wei, A., : Yang, H., 237, 279 Zhao, D.G., 279 Wiehn, V., Yang, L., 163 Zheng, L.X., 237 Wang, B., 241, 312 Wilson, I.H., 55 Veer. 2a Zheng, Y., 138 Wang, i324. 211, 305 Wittkowski, T., Ye, fl; 22 Wang, H., 193, 203, 249 Wong, S.P., Ye, Z.Y., 303 Zhou, D., 193 Wang, H.B., 275 Wrobel, A.M., 287 Ying, X., 297 Zhou, J., 138 Wang, H.-M., 257 Wu, R.H., 279 Yoon, K.H., 111 Zhou, Z.F., 222, 292 Wang, J.-T., 208 Yu, R.K.W Zhou, Z.Q., 249 Wang, M., 300 Xia, G., 138 Yuan, J., 300 Zhu, D., 147 Wang, P.-F., 208, 253, 266 Xu, D., 279 Zhu, H., 203 Wang, S., 147 Au; DP 237 Zhang, D.W., 208, 253, 266 Zhu, J., 307 Wang, S.X., 283 Xu, M.-S., 300 Zhang, F.-M., 257 Zollinger, K., 193 thin... piBo ts DUUM ELSEVIER Thin Solid Films 368 (2000) 321—326 www.elsevier.com/locate/tsf Subject Index of Volume 368 Alloys c-BN Magnetic and magneto-optical properties of DC-sputtered The growth of cubic boron nitride films by RF reactive sputter, (CoPt;);- Ni, (x=0-0.5) alloy films, 138 BP. Aluminum nitride h-BN The optical and structural properties of AIN thin films charac- terized by spectroscopic ellipsometry, 67 Aluminum oxide Effect of water dose on the atomic layer deposition rate of oxide thin films, | Characterization of amorphous aluminum oxide films prepared by the pyrosol process, 74 Microstructure and semiconducting properties of c-BN films Ammonia using r.f. plasma CVD thermally assisted by a tungsten fila- Influence of the surface polarity of dye-doped sol-gel glass ment, 283 films on optical ammonia sensor response, 105 Brillouin light scattering Amorphous hydrogenated carbon Characterization of elastic properties of hard carbon and boron Characterization of elastic properties of hard carbon and boron nitride films using the Brillouin light scattering technique, nitride films using the Brillouin light scattering technique, 216 216 Buffer layer Amorphous materials Influences of initial buffer layer deposition on electrical and Correlation of the optical gap of (Ba,Sr),TiO>., thin films with optical properties in cubic GaN grown on GaAs(100) by film composition, 41 metalorganic chemical vapor deposition, 279 Annealing Buried SiC layers Dependence of texture development on thickness of single- Structure characteristic of buried SiC layers, 24 annealed-layer in sol-gel derived PZT thin films, 22 Antireflective Capacitance—voltage CVD diamond thin film for IR optics and X-ray optics, 297 Characterization of CeO, thin films as insulator of metal ferro- Argon gas electric insulator semiconductor (MFIS) structures, 61 Enhanced diamond film growth by Xe-added microwave Carbon plasma CVD, 269 Chemical vapor deposition of novel carbon materials, 193 Atomic force microscopy CeO, Aerosol—gel deposition of doped titania thin films, 35 Characterization of CeO; thin films as insulator of metal ferro- Influences of initial buffer layer deposition on electrical and electric insulator semiconductor (MFIS) structures, 61 optical properties in cubic GaN grown on GaAs(100) by CH; radicals metalorganic chemical vapor deposition, 279 Enhanced diamond film growth by Xe-added microwave Atomic layer deposition plasma CVD, 269 Effect of water dose on the atomic layer deposition rate of oxide Resonance enhanced multiphoton ionization probing of H thin films, 1 atoms and CH; radicals in a hot filament chemical vapour deposition reactor, 169 Bond strength Chemical vapor deposition Influence of oxide mixtures on mechanical properties of plasma Deposition of a-SiC:H thin film from organosilicon material by sprayed functionally graded coating, 86 remote plasma CVD method, 181 Boron Chemical vapor deposition of novel carbon materials, 193 Low temperature doping of poly-SiGe films with boron by co- Effects at reactive ion etching of CVD diamond, 222 sputtering, 55 Development of diamond synthesis techniques at low pressures, Boron nitride Characterization of elastic properties of hard carbon and boron Projective phase diagrams for CVD diamond growth from C—H nitride films using the Brillouin light scattering technique, and C-H-—O systems, 253 216 Comparison of deposition behavior of Pb(Zr,Ti)O; films and its Formation of cubic boron nitride films on nickel substrates, 292 end-member-oxide films prepared by MOCVD, 261 PII: S0040-6090(00)00965-2 Subject index Thermodynamics analyses of the effect of CH; and C,H; on Development of diamond synthesis techniques at low pressures, morphology of CVD diamond films, 266 231 Aerosol and plasma assisted chemical vapor deposition pro- Diamond cess for multi-component oxide Lay Sry 2MnO; thin film, Chemical vapor deposition of novel carbon materials, 193 Pe Effects of fluorine addition on driving force for CVD diamond Experiments and analyses of SiC thin film deposition from growth, 208 organo-silicon by a remote plasma method, 287 Effects at reactive ion etching of CVD diamond, 222 CVD diamond thin film for IR optics and X-ray optics, 297 Development of diamond synthesis techniques at low pressures, Two-step growth of high quality diamond films, 303 231 Raman study on residual strains in thin 3C-SiC epitaxial layers Projective phase diagrams for CVD diamond growth from C-H grown on Si(001), 307 and C—H-—O systems, 253 Chemical vapour deposition modelling CVD diamond thin film for IR optics and X-ray optics, 297 Rates of reactions of H atoms with some CVD precursors, Diamond chemical vapour deposition 176 Resonance enhanced multiphoton ionization probing of H CIAIPcCl atoms and CH; radicals in a hot filament chemical vapour Photoconductive properties of CIAIPcCl and ClInPc composite deposition reactor, 169 thin film prepared by physical vapor deposition approach, Investigations of the gas phase mechanism of diamond deposi- 300 tion in combustion CVD, 185 ClinPe Diamond films Photoconductive properties of CIAIPcCl and ClinPe com- Study of diamond film growth mechanism on porous posite thin film prepared by physical vapor deposition silicon during hot-filament chemical vapor deposition, approach, 300 211 Combustion Thermodynamics analyses of the effect of CH; and C,H, on Investigations of the gas phase mechanism of diamond deposi- morphology of CVD diamond films, 266 tion in combustion CVD, 185 Two-step growth of high quality diamond films, 303 Composition control Diamond thin film Field effect transistor Comparison of deposition behavior of Pb(Zr,T1)O; films and its Enhanced diamond film growth by Xe-added microwave end-member-oxide films prepared by MOCVD, 261 plasma CVD, 269 Computer simulations Diamond-like carbon Critical dimensions for the formation of interfacial misfit dis- Mechanical properties and corrosion studies of amorphous car- locations of Iny «Gay 4As islands on GaAs(001), 93 bon on magnetic disks prepared by ECR plasma technique, Corrosion 198 Mechanical properties and corrosion studies of amorphous car- Diamond-like carbon films bon on magnetic disks prepared by ECR plasma technique, Electrodeposition diamond-like carbon films from organic 198 liquids, 203 Crystallization Dielectrics Low temperature doping of poly-SiGe films with boron by co- Correlation of the optical gap of (Ba,Sr), TiO, . thin films with sputtering, 55 film composition, 41 Cubic GaN Characterization of amorphous aluminum oxide films prepared The content calculation of hexagonal phase inclusions in cubic by the pyrosol process, 74 GaN films on GaAs(001) substrates grown by metalorganic Distribution chemical vapor deposition, 237 Structure characteristic of buried SiC layers, 241 Influences of initial buffer layer deposition on electrical and Doped titanium oxide optical properties in cubic GaN grown on GaAs(100) by Aerosol—gel deposition of doped titania thin films, 35 metalorganic chemical vapor deposition, 279 Driving force Cycloaddition Effects of fluorine addition on driving force for CVD diamond Stable monolayers and Langmuir—Blodgett Films of a new growth, 208 crown ether-bearing [60]fulleropyrrolidine containing ben- zothiazolium styryl dye, 147 Elastic properties Characterization of elastic properties of hard carbon and boron DC active N> plasma nitride films using the Brillouin light scattering technique, Epitaxial growth of GaNAs/GaAs heterostructure materials, 216 249 Electrical properties and measurement Deposition mechanism Microstructure of indium oxide films in oxygen ion-assisted Comparison of deposition behavior of Pb(Zr,Ti)O; films and its deposition, 111 end-member-oxide films prepared by MOCVD, 261 Electrochemical deposition Deposition process Electrodeposition diamond-like carbon films from organic Aerosol-gel deposition of doped titania thin films, 35 liquids, 203 Deposition and structural characterization of high quality tex- Electron cyclotron resonance tured C,, thin films, 49 Mechanical properties and corrosion studies of amorphous car- Subject index bon on magnetic disks prepared by ECR plasma technique, H atoms 198 Resonance enhanced multiphoton ionization probing of H Epitaxy atoms and CH; radicals in a hot filament chemical vapour Microstructure and growth modes of stoichiometric NiAl and deposition reactor, 169 Ni;Al thin films deposited by r.f.-magnetron sputtering, H atom reactions 26 Rates of reactions of H atoms with some CVD precursors, Excitons Hexagonal phase content Dissociation of excitons in organic dye layers of perylene deri- The content calculation of hexagonal phase inclusions in cubic vatives, 130 GaN films on GaAs(001) substrates grown by metalorgani hic Experimental methods chemical vapor deposition, 23 ~ Characterization of elastic properties of hard carbon and boron Hollow cathode plasma nitride films using the Brillouin light scattering technique, ZnSe growth by radical assisted MOCVD using hollow cathode 216 plasma, 244 External electric field Hot-filament chemical vapor deposition Controlling and improving the microtribological properties of Study of diamond film growth mechanism on porous silicon Langmuir—Blodgett monolayer films using an external elec- during hot-filament chemical vapor deposition, 211 tric field, 151 Indium oxide Ferroelectric properties Microstructure of indium oxide films in oxygen ion-assisted Dependence of texture development on thickness of single- deposition, 111 annealed-layer in sol-gel derived PZT thin films, 22 Infrared spectroscopy Film The preparation of nanosized silicon by laser-induced chemical CVD diamond thin film for IR optics and X-ray optics, 297 vapour deposition, 315 Flash photolysis Insulators Rates of reactions of H atoms with some CVD precursors, 176 Characterization of amorphous aluminum oxide films prepared Fluorine by the pyrosol process, 74 Effects of fluorine addition on driving force for CVD diamond Interfaces growth, 208 Heat resistance of electron beam deposited Mo/C X-ray multi- Fourier transform infrared spectroscopy layers, 80 The influence of the momentum transfer on the structural and Thin film PV module, 125 optical properties of ZnSe thin films prepared by r.f. mag- Interface trap density netron sputtering, 8 Characterization of CeO, thin films as insulator of metal ferro- Aerosol-gel deposition of doped titania thin films, 35 electric insulator semiconductor (MFIS) structures, 61 Deposition of a-SiC:H thin film from organosilicon material by lon beam assisted deposition remote plasma CVD method, 181 Reactive ion beam assisted deposition of a titanium dioxide film Experiments and analyses of SiC thin film deposition from on a transparent polyester sheet, 257 organo-silicon by a remote plasma method, 287 lon bombardment Formation of cubic boron nitride films on nickel substrates, 292 Microstructure of indium oxide films in oxygen ion-assisted Fourier transform infrared spectroscopy of intensity deposition, I 11] Epitaxial growth of GaNAs/GaAs heterostructure materials, IR optics 249 CVD diamond thin film for IR optics and X-ray optics, 297 Friction Controlling and improving the microtribological properties of Kinetic data Langmuir—Blodgett monolayer films using an external elec- Rates of reactions of H atoms with some CVD precursors, 176 tric field, 151 Fullerenes Lay eSty »>MnO; films Deposition and structural characterization of high quality tex- Aerosol and plasma assisted chemical vapor deposition process tured C,o thin films, 49 for multi-component oxide Lay sSry »2MnO; thin film, 275 Fulleropyrrolidine Langmuir Stable monolayers and Langmuir—Blodgett Films of a new Stable monolayers and Langmuir—Blodgett Films of a new crown ether-bearing [60]fulleropyrrolidine containing ben- crown ether-bearing [60]fulleropyrrolidine containing ben- zothiazolium styryl dye, 147 zothiazolium styryl dye, 147 Langmuir—Blodgett films GaNAs Controlling and improving the microtribological properties of Epitaxial growth of GaNAs/GaAs heterostructure materials, Langmuir—Blodgett monolayer films using an external elec- 249 tric field, 151 Growth mechanisms Laser ablation plume Stress relaxation inc —c, YBaCuO thin films on MgO substrate Preparation of SrRuO; thin film by chemical reactive pulsed studied by LACBED, 142 laser deposition, 227 Subject index Multilayers Laser irradiation Calculation of the temperature field induced in a sample by Heat resistance of electron beam deposited Mo/C X-ray multi- laser illuminated STM-probe, 156 layers, 80 Laser probing Resonance enhanced multiphoton ionization probing of H Nanosized silicon powder atoms and CH; radicals in a hot filament chemical vapour The preparation of nanosized silicon by laser-induced chemical deposition reactor, 169 vapour deposition, 315 Laser spectroscopy Nanostructures Investigations of the gas phase mechanism of diamond deposi- Critical dimensions for the formation of interfacial misfit dis- tion in combustion CVD, 185 locations of Inj «Gay sAs islands on GaAs(001), 93 Laser-induced chemical vapour deposition Calculation of the temperature field induced in a sample by The preparation of nanosized silicon by laser-induced chemical laser illuminated STM-probe, 156 vapour deposition, 315 Near-infrared Light scattering CVD diamond thin film for IR optics and X-ray optics, 297 Thin film PV module, 125 Nickel Luminescence Formation of cubic boron nitride films on nickel substrates, 292 Dissociation of excitons in organic dye layers of perylene deri- Nitrogen vatives, 130 Mechanical properties and corrosion studies of amorphous carbon on magnetic disks prepared by ECR plasma technique, Magnetic 198 Magnetic and magneto-optical properties of DC-sputtered Nitrogen content (CoPt;))— Ni, (x=0—0.5) alloy films, 138 Epitaxial growth of GaNAs/GaAs heterostructure materials, Magneto-optical 249 Magnetic and magneto-optical properties of DC-sputtered Non-equilibrium thermodynamics (CoPt;); _,Ni, (a=0-0.5) alloy films, 138 Effects of fluorine addition on driving force for CVD diamond Magnetron sputtering growth, 208 Formation of cubic boron nitride films on nickel substrates, 292 Projective phase diagrams for CVD diamond growth from C—H Mass spectrometry and C—H-—O systems, 253 Investigations of the gas phase mechanism of diamond deposi- Nucleation tion in combustion CVD, 185 Dependence of texture development on thickness of single- Metal organic chemical vapor deposition annealed-layer in sol-gel derived PZT thin films, 22 The content calculation of hexagonal phase inclusions in cubic GaN films on GaAs(001) substrates grown by metalorganic chemical vapor deposition, 237 Optical properties ZnSe growth by radical assisted MOCVD using hollow cathode Correlation of the optical gap of (Ba,Sr),TiO,.. thin films with plasma, 244 film composition, 41 Microtribology Structural and optical properties of TiO, thin film and TiO,+2 Controlling and improving the microtribological properties of wt.% ZnFe,O, composite film prepared by r.f. sputtering, Langmuir—Blodgett monolayer films using an external elec- 163 tric field, 151 Reactive ion beam assisted deposition of a titanium dioxide film Microwave plasma on a transparent polyester sheet, 257 Aerosol and plasma assisted chemical vapor deposition process Optical spectroscopy for multi-component oxide Lay sStp2MnO; thin film, 275 Correlation of the optical gap of (Ba,Sr),TiO,.. thin films with Microwave plasma chemical vapor deposition film composition, 41 Enhanced diamond film growth by Xe-added microwave Influence of the surface polarity of dye-doped sol-gel glass plasma CVD, 269 films on optical ammonia sensor response, 105 Modeling Optical coatings Investigations of the gas phase mechanism of diamond deposi- Scandia optical coatings for application at 351 nm, 116 tion in combustion CVD, 185 Organic liquids Molecular beam epitaxy Electrodeposition diamond-like carbon films from organic Epitaxial orientation of MBE grown Ru,Si; films on Si(111) liquids, 203 and Si(001), 15 Organic semiconductors Critical dimensions for the formation of interfacial misfit dis- Dissociation of excitons in organic dye layers of perylene deri- locations of Ing ,Gap4As islands on GaAs(001), 93 vatives, 130 Epitaxial growth of GaNAs/GaAs heterostructure materials, Oxidation 249 Influence of oxide mixtures on mechanical properties of plasma Monolayers sprayed functionally graded coating, 86 Stable monolayers and Langmuir—Blodgett Films of a new Oxides crown ether-bearing [60]fulleropyrrolidine containing ben- Effect of water dose on the atomic layer deposition rate of oxide zothiazolium styryl dye, 147 thin films, | Subject index Correlation of the optical gap of (Ba,Sr),TiO>,. thin films with optical properties in cubic GaN grown on GaAs(100) by film composition, 41 metalorganic chemical vapor deposition, 279 Refractive index Pb(Zr,Ti)O; The optical and structural properties of AIN thin films charac- Comparison of deposition behavior of Pb(Zr,Ti)O; films and its terized by spectroscopic ellipsometry, 67 end-member-oxide films prepared by MOCVD, 261 RF sputter Perylene derivatives The growth of cubic boron nitride films by RF reactive sputter, Dissociation of excitons in organic dye layers of perylene deri- a2 vatives, 130 RF sputtering Phase diagram The influence of the momentum transfer on the structural and Projective phase diagrams for CVD diamond growth from C—H optical properties of ZnSe thin films prepared by r.f. mag- and C—H-—O systems, 253 netron sputtering, 8 Phase transitions Ruthenium Deposition and structural characterization of high quality tex- Epitaxial orientation of MBE grown Ru,Si; films on Si(111) tured C,, thin films, 49 and Si(001), 15 Photoconductivity Photoconductive properties of CIAIPcCl and ClinPe composite Scandium thin film prepared by physical vapor deposition approach, Scandia optical coatings for application at 351 nm, 116 300 Scanning electron microscopy Physical vapor deposition Calculation of the temperature field induced in a sample by Microstructure and growth modes of stoichiometric NiAl and laser illuminated STM-probe, 156 NisAl thin films deposited by r.f.-magnetron sputtering, 26 Chemical vapor deposition of novel carbon materials, 193 Development of diamond synthesis techniques at low pressures, Semiconducting properties 231 Microstructure and semiconducting properties of c-BN films Photoconductive properties of CIAIPcCl and ClInPc composite using r.f. plasma CVD thermally assisted by a tungsten fila- thin film prepared by physical vapor deposition approach, ment, 283 300 Sensors Plasma chemical vapor deposition Influence of the surface polarity of dye-doped sol-gel glass Microstructure and semiconducting properties of c-BN films films on optical ammonia sensor response, 105 using r.f. plasma CVD thermally assisted by a tungsten fila- SiC ment, 283 Experiments and analyses of SiC thin film deposition from Plasma process organo-silicon by a remote plasma method, 287 Enhanced diamond film growth by Xe-added microwave a-SiC plasma CVD, 269 Structure characteristic of buried SiC layers, 241 Plasma spray B-SiC Influence of oxide mixtures on mechanical properties of plasma Structure characteristic of buried SiC layers, 241 sprayed functionally graded coating, 86 Silicides Porous silicon Epitaxial orientation of MBE grown Ru,Si; films on Si(111) Thin film PV module, 125 and Si(001), 15 Study of diamond film growth mechanism on porous silicon Silicon-germanium during hot-filament chemical vapor deposition, 211 Low temperature doping of poly-SiGe films with boron by co- Pulsed laser deposition sputtering, 55 Preparation of SrRuO; thin film by chemical reactive pulsed Sol-gel laser deposition, 227 Scandia optical coatings for application at 351 nm, 116 Pyrolysis Sol-gel glass Characterization of amorphous aluminum oxide films prepared Influence of the surface polarity of dye-doped sol-gel glass by the pyrosol process, 74 films on optical ammonia sensor response, 105 Solar cells Raman spectroscopy Thin film PV module, 125 Effects at reactive ion etching of CVD diamond, 222 Spectroscopic ellipsometry Raman spectrum The optical and structural properties of AIN thin films charac- Electrodeposition diamond-like carbon films from organic terized by spectroscopic ellipsometry, 67 liquids, 203 Sputtering Raman study on residual strains in thin 3C-SiC epitaxial layers Low temperature doping of poly-SiGe films with boron by co- grown on Si(001), 307 sputtering, 55 Reaction mechanism The optical and structural properties of AIN thin films charac- Investigations of the gas phase mechanism of diamond deposi- terized by spectroscopic ellipsometry, 67 tion in combustion CVD, 185 Structural and optical properties of TiO, thin film and Ti0)+2 Reflection high-energy electron diffraction wt.% ZnFe,O, composite film prepared by r.f. sputtering, Influences of initial buffer layer deposition on electrical and 163 326 Subject index SrRuO; thin film locations of Inj ,GaysA s islands on GaAs(001), 93 Preparation of SrRuO; thin film by chemical reactive pulsed Stress relaxation in c ,—c, YBaCuO thin films on MgO substrate laser deposition, 227 studied by LACBED, 142 Stress Two-step growth Characterization of CeO, thin films as insulator of metal ferro- Two-step growth of high quality diamond films, 303 electric insulator semiconductor (MFIS) structures, 61 Stress relaxation in c ,—c, YBaCuO thin films on MgO substrate Wear-life studied by LACBED, 142 Controlling and improving the microtribological properties of Microstructure and semiconducting properties of c-BN films Langmuir—Blodgett monolayer films using an external elec- using r.f. plasma CVD thermally assisted by a tungsten fila- tric field, 151 ment, 283 Window Structural properties CVD diamond thin film for IR optics and X-ray optics, 297 Structural and optical properties of TiO, thin film and TiO,+2 wt.% ZnFe,O, composite film prepared by r.f. sputtering, Xenon gas 163 Enhanced diamond film growth by Xe-added microwave Superconductivity plasma CVD, 269 Stress relaxation inc ,—c, YBaCuO thin films on MgO substrate X-ray diffraction studied by LACBED, 142 The influence of the momentum transfer on the structural and Surface acoustic waves optical properties of ZnSe thin films prepared by r.f. mag- Characterization of elastic properties of hard carbon and boron netron sputtering, 8 nitride films using the Brillouin light scattering technique, Epitaxial orientation of MBE grown Ru,Si; films on Si(111) 216 and Si(001), 15 Surface morphology Dependence of texture development on thickness of single- Microstructure of indium oxide films in oxygen ion-assisted annealed-layer in sol-gel derived PZT thin films, 22 deposition, 111 Deposition and structural characterization of high quality tex- tured C,o thin films, 49 Thermal barrier coating Heat resistance of electron beam deposited Mo/C X-ray multi- Influence of oxide mixtures on mechanical properties of plasma layers, 80 sprayed functionally graded coating, 86 CVD diamond thin film for IR optics and X-ray optics, 297 Thermodynamics 4-circle X-ray double crystal diffraction Thermodynamics analyses of the effect of CH; and C,H, on morphology of CVD diamond films, 266 The content calculation of hexagonal phase inclusions in cubic Thin film GaN films on GaAs(001) substrates grown by metalorganic Deposition of a-SiC:H thin film from organosilicon material by chemical vapor deposition, 237 remote plasma CVD method, 181 X-ray reflectivity Raman study on residual strains in thin 3C-SiC epitaxial layers Heat resistance of electron beam deposited Mo/C X-ray multi- grown on Si(001), 307 layers, 80 Titania Reactive ion beam assisted deposition of a titanium dioxide film Yttria stabilized zirconia on a transparent polyester sheet, 257 Influence of oxide mixtures on mechanical properties of plasma Titanium oxide sprayed functionally graded coating, 86 Aerosol—gel deposition of doped titania thin films, 35 Structural and optical properties of TiO, thin film and TiO,+2 Zinc selenide wt.% ZnFe,O, composite film prepared by r.f. sputtering, The influence of the momentum transfer on the structural and 163 optical properties of ZnSe thin films prepared by r.f. mag- rransmission electron microscopy netron sputtering, 8 Microstructure and growth modes of stoichiometric NiAl and ZnSe growth Ni;Al thin films deposited by r.f.-magnetron sputtering, 26 ZnSe growth by radical assisted MOCVD using hollow cathode Critical dimensions for the formation of interfacial misfit dis- plasma, 244