Thin Solid Films 2000: Vol 365 Index

9 Pages·2000·1.7 MB·English

ELSEVIER
Thin Solid Films 365 (2000) 376-377
www.elsevier.com/locate/tsf
Author Index of Volume 365
Adams, J.B., 201 Feng, L., 99 Labun, A.H., 152 Rau, I., 19
Alford, T., 19 Ford, G.M., 126 Lam: ¥i L... 77 Ren, C.X., 53
Alves, O.L.. 90 Lange, T., 82 Rodriguez, J., 119
Ayllon, J.A., 12 Gomez, M., 119 Rodriguez-Clemente, R..,
Galembeck, A., 90
Balakrishnan, K.S., 322 Gan, W.S., 77 Lengyel, I., Saadoun, L., 12
Baumann, F., 189 Garcia-Cerda, L.A., 30 Lenosky, T., Sadigh, B., 219
Beckers, M., 82 Gill, D.M., 126 Li, C., 94 Sarychev, M.E., 211
Berg, S., 43 Gilmer, G.H., 189 Li, W., 129 Schafbauer, T., 307
Bernard, C., 264 Gobbert, M.K., 368 Li, X., 129 Scharmann, A., 139
Blanquet, E., 264 Gonzalez-Hernandez, J., 3 Li, Y.,. 201 Shimogaki, Y., 176
Block, B.A., 126 Goorsky, M.S., 147 La, CL, 211 Spitzer, A., 242
Borucki, L., 211 Grangqvist, C.G., 119 Liu, X., 116 Stollenwerk, J., 139
Borucki, L.J., 152, 368 Lu, X., 116 Swann, C.P., 19
Buss, R.J., 251 Han, X.Q., 77 Lui, X., 94
Hlavacek, V., 275 Tate, J., 134
Cale, T.S., 152, 368 Ho, P., 251, 334 Madar, R., 264 Theiss, S.K., 219
Cao, L., 129 Ho, S.T., 126 Makhviladze, T.M., 211 Thiart, J.J., 275
Cao, Y., 49 Hong, L.-S., 176 Manabe, T., 36 Tian, J., 49
Caturla, M.J., 219 Hong, S.G., 58 Manzanares-Martinez, J., 30 Trube, J., 139
Chan, Y.C., 77 Hruby, H., 104 McGinnis, S.P., | ‘ean G0. 72
Chen, D.H., 53 Hu, X., 49 Meeks, E., 33
Chen, J.Z., 61 Huang, H., 189 Merchant, T.P., 152, 368
Unruh, K.M., 19
Chen, L., 94 Huang, J.S., 110 Metzger, R., 242
U’Ren, G.D., 147
Chen, Y.S., 61 Huilin, Z., 67 Meyer, B.K., 139
Usui, H., 22
Cheng, S.D., 77 Huo, L., 129 Mizuta, S., 36
Cho, J.-S., 5 Moffat, H.K., 251
Chung, P.L., 72 Jawad, Z.S., 19 Musil, J., 104 Vigil, E., 12
Coltrin, M.E., 251 Jensen, K.F., 231 Viljoen, H.J., 275
Cui, H., 129 Jiang, D., 129 Niklasson, G.A., 119
Jiang, Y., 116 Njoroge, W., 82 Wang, G., 116
Dalla Torre, J., 189 Johnson, M.D., 219 Nyberg, T., 43 Wang, H., 94
Damodaran, S., 99 Jonsson, L.B., 43 Wang, K.L., 147
Das, B., | Oates, A.S., 110 Wang, W., 116
Daube, C., 139 Kam, C.H., 77 On 3:1,, 77 Wang, X., 94
de la Rubia, T.D., 189 Katardjiev, I., 43 Olowolafe, J.O., 19 Wang, Z., 201
Diaz de la Rubia, T., 219 Kersch, A., 307 Weihua, G., 67
Dimitrova, V., 134 Kim, C.J., 58 Pérez-Robles, J.F., 30 Weis, H., 82
Dobrowolska, M.., | Kim, S.-S., 126 Park, G.-S., 7 Weixing, L., 67
Domenech, X., 12 Kléppel, A., 139 Pingsheng, H., 67 Werner, C., 242
Kleijn, C.R., 294 Pons, M., 264 Wessels, B.W., 126
Economou, D.J.,348 Komjyama, H., 176 Wilson, I.H., 53
Ederth, J., 119 Kondo, W., 36 Que, W.X., 77 Wong, S.P., 53
Edgar, T.F., 322 Kriegseis, W., 139 Wu, S.K., 61
Espinoza-Beltran, F Kumagai, T., 36 Ramirez-Bon, R., 30 Wuttig, M., 82
PII: S0040-6090(00)00929-9
ELSEVIER
Thin Solid Films 365 (2000) 376-377
www.elsevier.com/locate/tsf
Author Index of Volume 365
Adams, J.B., 201 Feng, L., 99 Labun, A.H., 152 Rau, I., 19
Alford, T., 19 Ford, G.M., 126 Lam: ¥i L... 77 Ren, C.X., 53
Alves, O.L.. 90 Lange, T., 82 Rodriguez, J., 119
Ayllon, J.A., 12 Gomez, M., 119 Rodriguez-Clemente, R..,
Galembeck, A., 90
Balakrishnan, K.S., 322 Gan, W.S., 77 Lengyel, I., Saadoun, L., 12
Baumann, F., 189 Garcia-Cerda, L.A., 30 Lenosky, T., Sadigh, B., 219
Beckers, M., 82 Gill, D.M., 126 Li, C., 94 Sarychev, M.E., 211
Berg, S., 43 Gilmer, G.H., 189 Li, W., 129 Schafbauer, T., 307
Bernard, C., 264 Gobbert, M.K., 368 Li, X., 129 Scharmann, A., 139
Blanquet, E., 264 Gonzalez-Hernandez, J., 3 Li, Y.,. 201 Shimogaki, Y., 176
Block, B.A., 126 Goorsky, M.S., 147 La, CL, 211 Spitzer, A., 242
Borucki, L., 211 Grangqvist, C.G., 119 Liu, X., 116 Stollenwerk, J., 139
Borucki, L.J., 152, 368 Lu, X., 116 Swann, C.P., 19
Buss, R.J., 251 Han, X.Q., 77 Lui, X., 94
Hlavacek, V., 275 Tate, J., 134
Cale, T.S., 152, 368 Ho, P., 251, 334 Madar, R., 264 Theiss, S.K., 219
Cao, L., 129 Ho, S.T., 126 Makhviladze, T.M., 211 Thiart, J.J., 275
Cao, Y., 49 Hong, L.-S., 176 Manabe, T., 36 Tian, J., 49
Caturla, M.J., 219 Hong, S.G., 58 Manzanares-Martinez, J., 30 Trube, J., 139
Chan, Y.C., 77 Hruby, H., 104 McGinnis, S.P., | ‘ean G0. 72
Chen, D.H., 53 Hu, X., 49 Meeks, E., 33
Chen, J.Z., 61 Huang, H., 189 Merchant, T.P., 152, 368
Unruh, K.M., 19
Chen, L., 94 Huang, J.S., 110 Metzger, R., 242
U’Ren, G.D., 147
Chen, Y.S., 61 Huilin, Z., 67 Meyer, B.K., 139
Usui, H., 22
Cheng, S.D., 77 Huo, L., 129 Mizuta, S., 36
Cho, J.-S., 5 Moffat, H.K., 251
Chung, P.L., 72 Jawad, Z.S., 19 Musil, J., 104 Vigil, E., 12
Coltrin, M.E., 251 Jensen, K.F., 231 Viljoen, H.J., 275
Cui, H., 129 Jiang, D., 129 Niklasson, G.A., 119
Jiang, Y., 116 Njoroge, W., 82 Wang, G., 116
Dalla Torre, J., 189 Johnson, M.D., 219 Nyberg, T., 43 Wang, H., 94
Damodaran, S., 99 Jonsson, L.B., 43 Wang, K.L., 147
Das, B., | Oates, A.S., 110 Wang, W., 116
Daube, C., 139 Kam, C.H., 77 On 3:1,, 77 Wang, X., 94
de la Rubia, T.D., 189 Katardjiev, I., 43 Olowolafe, J.O., 19 Wang, Z., 201
Diaz de la Rubia, T., 219 Kersch, A., 307 Weihua, G., 67
Dimitrova, V., 134 Kim, C.J., 58 Pérez-Robles, J.F., 30 Weis, H., 82
Dobrowolska, M.., | Kim, S.-S., 126 Park, G.-S., 7 Weixing, L., 67
Domenech, X., 12 Kléppel, A., 139 Pingsheng, H., 67 Werner, C., 242
Kleijn, C.R., 294 Pons, M., 264 Wessels, B.W., 126
Economou, D.J.,348 Komjyama, H., 176 Wilson, I.H., 53
Ederth, J., 119 Kondo, W., 36 Que, W.X., 77 Wong, S.P., 53
Edgar, T.F., 322 Kriegseis, W., 139 Wu, S.K., 61
Espinoza-Beltran, F Kumagai, T., 36 Ramirez-Bon, R., 30 Wuttig, M., 82
PII: S0040-6090(00)00929-9
Author index
Xi, S., 129 Yu, K.H., 72 Zhao, J., 110
Xu, J., 116 Yu; Y¥-E, 53 Zheng, Z., 94
Zhitnikov, Y.V., 21]
Yamaguchi, |., 36 Zeng, G., 129 Zhou, Y., 77
Yang, G.-M., 7 Zhang, F., 94 Zhu, J., 219
ELSEVIER Thin Solid Films 365 (2000) 378-382
www.elsevier.com/locate/tsf
Subject Index of Volume 365
a-Al,O; substrates deposited on LTI-carbon by IBED, 94
Effects of temperature and atmosphere on the epitaxial growth Chemical vapor deposition
of hematite (a—Fe,O0;) films on the R-, A- and C-planes of Characterization of SnO, films on glass by transmission elec-
sapphire (a—Al,O;) by coating-pyrolysis process, 36 tron microscopy, 7
a-Fe,O; thin film Macro/microcavity method and its application in modeling che-
Effects of temperature and atmosphere on the epitaxial growth mical vapor deposition reaction systems, 176
of hematite (a—Fe,O;) films on the R-, A- and C-planes of Adsorption of precursor molecules in the CVD process of
sapphire (a—Al,0;) by coating-pyrolysis process (Ba;Sr)titanate simulated by ab-initio calculations, 242
Absorption behaviour Chemical kinetics in chemical vapor deposition: growth ofs ili-
Adsorption of precursor molecules in the CVD process of con dioxide from tetraethoxysilane (TEOS), 251
(Ba;Sr)titanate simulated by ab-initio calculations, 242 Chemical vapor deposition and morphology problems, 275
Adsorption Computational modeling of transport phenomena and detailed
Two dimensional array of magnetoferritin on quartz surface, 99 chemistry in chemical vapor deposition — a benchmark solu-
Annealing tion, 294
Stress evolution of Ni/Pd/Si reaction system under isochronal Multiple scale integrated modeling of deposition processes, 368
annealing, 72 Chemical vapor deposition simulation
Anti-reflection coating A chemical mechanism for in situ boron doping during silicon
Better thermochromic glazing of windows with anti-reflection chemical vapor deposition, 231
coating, 5 Coatings
Ar pressure effect on peak intensity Superhard nanocomposite Ti,_,Al,N films prepared by magne-
Composition control of r.f.-sputtered TisgNiyoCuj) thin films tron sputtering, 104
using optical emission spectroscopy, 61 Coating-pyrolysis process
Atomic scale model Effects of temperature and atmosphere on the epitaxial growth
Atomic scale models of ion implantation and dopant diffusion of hematite (a—Fe,O;) films on the R-, A- and C-planes of
in silicon, 219 sapphire (a—Al,0;) by coating-pyrolysis process, 36
Auger electron spectroscopy Colloidal particles
Compositional and structural studies of DC magnetron sput- Stabilization of copper-based colloidal particles in sol-gel SiO;
tered SiC films on Si(111), 53 thin films, 30
Composite LB film
Bismuth titanate niobate Bi;Ti,NbO, Study of ferric oxide nanoparticles tris-(2,4-di-t-amylphenoxy)-
Ferroelectric properties of bismuth titanate niobate (8-quinolinolyl) copper phthalocyanine composite LB film,
Bi;TisNbO>, thin film, 58 129
BiVO, thin film Copper
BiVO, thin film preparation by metalorganic decomposition, 90 Stabilization of copper-based colloidal particles in sol-gel SiO,
Borane thin films, 30
A chemical mechanism for in situ boron doping during silicon Copper-based colloidal particles
chemical vapor deposition, 231 Stabilization of copper-based colloidal particles in sol-gel SiO,
thin films, 30
C-axis orientation Copper phthalocyanine derivative
C-axis oriented sol-gel derived LiNb Ta,O, thin films on Study of ferric oxide nanoparticles tris-(2,4-di-t-amylphenoxy)-
Si(111) substrates, 77 (8-quinolinolyl) copper phthalocyanine composite LB film,
Characterization 129
Study of ferric oxide nanoparticles tris-(2,4-di-t-amylphenoxy)- Corrosion
(8-quinolinolyl) copper phthalocyanine composite LB film, Effect of cracks in TiN anti-reflection coating layers on early
129 via electromigration failure, 110
Chemical composition Crystal growth
Chemical composition and structure of titanium oxide films Lattice Monte Carlo models of thin film deposition, 189
PII: S0040-6090(00)00909-3
Subject index
Cuprous oxides Bi; TisNbO,, thin film, 58
Stabilization of copper-based colloidal particles in sol-gel SiO, Fluorescence
thin films, 30 Guided wave absorption and fluorescence in epitaxial Er
TiO; on MgO, 126
DC magnetron sputtering
Compositional and structural studies of DC magnetron sput- GeO,
tered SiC films on Si(111), 53 Physical properties of thin GeO, films produced by reactive |
Deposition magnetron sputtering, 82
Topography simulation for the virtual wafer fab, 152
Deposition process Hardness
TiO, thin film deposition from solution using microwave heat- Superhard nanocomposite Ti,_,Al,N films prepared by magne-
ing, 12 tron sputtering, 104
Polymeric film deposition by ionization-assisted method for Heterostructures
optical and optoelectronic applications, 22 Influence of misfit strain on {311} facet development in selec
Dichlorosilane tive epitaxial growth of Si,;_,Ge,/Si(100) grown by gas-
A chemical mechanism for in situ boron doping during silicon source molecular beam epitaxy, 147
chemical vapor deposition, 231
Dopant diffusion Indium tin oxide
Atomic scale models of ion implantation and dopant diffusion Second harmonic generation investigation of indium tin oxide
in silicon, 219 thin films, 116
Dependence of the electrical and optical behaviour of ITO
Electrical properties and measurements silver-ITO multilayers on the silver properties, 139
Dependence of the electrical and optical behaviour of ITO lon beam enhanced deposition
silver-ITO multilayers on the silver properties, 139 Chemical composition and structure of titanium oxide filn
Electroluminescence deposited on LTI-carbon by IBED, 94
Synthesis and characterization of some ZnS-based thin film lon implantation
phosphors for electroluminescent device applications, 134 Atomic scale models of ion implantation and dopant diffusion
Electromigration in silicon, 219
Effect of cracks in TiN anti-reflection coating layers on early
via electromigration failure, 110 Langmuir—Blodgett films
A new, general model for mechanical stress evolution during LB films formed from arachidic acid monolayers on an aqueous
electromigration, 211 solution of a ruthenium(II) complex, 67
Embedded atom method Lattice Monte Carlo models
A new, general model for mechanical stress evolution during Lattice Monte Carlo models of thin film deposition, 189
electromigration, 211 LiNb, _ ,Ta,O;
Energy minimization C-axis oriented sol-gel derived LiNb,_,Ta,O; thin films on
Modeling Cu thin film growth, 201 Si(111) substrates, 77
Epitaxy Local thermochemical equilibrium
Effects of temperature and atmosphere on the epitaxial growth Combined thermodynamic and mass transport modeling for
of hematite (a—Fe,O;) films on the R-, A- and C-planes of material processing from the vapor phase, 264
sapphire (a—Al,0;) by coating-pyrolysis process, 36 Luminescence
Er:BaTiO; The effect of electric field on the photoluminescence and
Guided wave absorption and fluorescence in epitaxial Er:Ba- absorption spectra of porous silicon, |
TiO; on MgO, 126 LB films formed from arachidic acid monolayers on an aqueous
Etch solution of a ruthenium(II) complex, 67
Topography simulation for the virtual wafer fab, 152 Guided wave absorption and fluorescence in epitaxial Er:Ba-
Evaporation TiO; on MgO, 126
Synthesis and characterization of some ZnS-based thin film Luminous transmittance
phosphors for electroluminescent device applications, 134 Better thermochromic glazing of windows with anti-reflection
coating, 5
Faceting
Influence of misfit strain on {311} facet development in selec- Macro/microcavity method
tive epitaxial growth of Si,_,Ge,/Si(100) grown by gas- Macro/microcavity method and its application in modeling che-
source molecular beam epitaxy, 147 mical vapor deposition reaction systems, 176
Ferric oxide nanoparticles Mechanical stress evolution
Study of ferric oxide nanoparticles tris-(2,4-di-t-amylphenoxy)- A new, general model for mechanical stress evolution during
(8-quinolinolyl) copper phthalocyanine composite LB film, electromigration, 211
129 Mechanism
Ferroelectric A chemical mechanism for in situ boron doping during silicon
Ferroelectric properties of bismuth titanate niobate chemical vapor deposition, 231
f index
Metalorganic decomposition Perturbation growth
BiVO, thin film preparation by metalorganic decomposition, 90 Chemical vapor deposition and morphology problems, 275
Microelectronics Phase transition
Chemical kinetics in chemical vapor deposition: growth of sili- Physical properties of thin GeO, films produced by reactive D(C
con dioxide from tetraethoxysilane (TEOS), 251 magnetron sputtering, 82
Modeling plasma chemistry for microelectronics manufactur- Planar growth
ing, 334 Chemical vapor deposition and morphology problems, 275
Model-based controller Plasma chemistry
Model-based control in rapid thermal processing, 322 Modeling plasma chemistry for microelectronics manufactur-
Molecular beam, epitaxy ing, 334
211
Influence of misfit strain on {311} facet development in selec- Plasma etching reactor
tive epitaxial growth of Si, ,Ge,/Si(100) grown by gas- Modeling and simulation of plasma etching reactors for micro-
source molecular beam epitaxy, 147 electronics, 348
Molecular dynamics Plasma modeling
Modeling Cu thin film growth, 201 Modeling and simulation of plasma etching reactors for micro-
Monte Carlo methods electronics, 348
Modeling Cu thin film growth, 201 Plasma processes
Multilayers Topography simulation for the virtual wafer fab, 152
Dependence of the electrical and optical behaviour of ITO Plasma simulation
silver-ITO multilayers on the silver properties, 139 Modeling and simulation of plasma etching reactors for micro-
electronics, 348
Nanostructures Polyamide
he effect of electric field on the photoluminescence and Ni-Cr selective surface based on polyamide substrate, 49
absorption spectra of porous silicon, | Polymers
[wo dimensional array of magnetoferritin on quartz surface, 99 Polymeric film deposition by ionization-assisted method for
Nickel optical and optoelectronic applications, 22
Stress evolution of Ni/Pd/Si reaction system under isochronal Precursor molecules
annealing, 72 Adsorption of precursor molecules in the CVD process of
Non-linear optical anisotropy (Ba;Sr)titanate simulated by ab-initio calculations, 242
Second harmonic generation investigation of indium tin oxide Processor
thin films, 116 Modeling plasma chemistry for microelectronics manufactur-
Numerical model ing, 334
Modeling plasma chemistry for microelectronics manufactur- Pulsed DC
ing, 334 Frequency response in pulsed DC reactive sputtering processes,
43
Optical coatings
Thickness dependence of the optical properties of sputter Quantum chemistry predictions
deposited Ti oxide films, 119 A chemical mechanism for in situ boron doping during silicon
Optical properties chemical vapor deposition, 231
Physical properties of thin GeO, films produced by reactive DC Quantum effects
magnetron sputtering, 82 The effect of electric field on the photoluminescence and
Thickness dependence of the optical properties of sputter absorption spectra of porous silicon, |
deposited Ti oxide films, 119
Dependence of the electrical and optical behaviour of ITO Raman microprobe
silver-ITO multilayers on the silver properties, 139 BiVO, thin film preparation by metalorganic decomposition, 90
Optical spectroscopy Rapid thermal chemical vapour deposition
Composition control of r.f.-sputtered TisgNiggCu;, thin films Thermal modelling of RTP and RTCVD processes, 307
using optical emission spectroscopy, 61 Rapid thermal processing
Optical spectroscopy Sol-gel C-axis oriented sol-gel derived LiNb .Ta,O; thin films on
Stabilization of copper-based colloidal particles in sol-gel SiO, Si(111) substrates, 77
thin films, 30 Thermal modelling of RTP and RTCVD processes, 307
Optoelectronic devices Model-based control in rapid thermal processing, 322
The effect of electric field on the photoluminescence and Reaction scheme
absorption spectra of porous silicon, | Macro/microcavity method and its application in modeling che-
Polymeric film deposition by ionization-assisted method for mical vapor deposition reaction systems, 176
optical and optoelectronic applications, 22 Reactive sputtering
Organic semiconductors Frequency response in pulsed DC reactive sputtering processes,
Polymeric film deposition by ionization-assisted method for 43
optical and optoelectronic applications, 22 Reactive DC-magnetron sputtering
Subject index
Physical properties of thin GeO, films produced by reactive D¢ Thickness dependence of
magnetron sputtering, 82 deposited Ti oxide films
Reflow Stress
Topography simulation for the virtual wafer fab, 152 Stress evolution of Ni/Pd/Si reaction
Ruthenium complex annealing, 72
LB films formed from arachidic acid monolayers on an aqueous tructural properties
solution of a ruthenium(II) complex, 67 Effect of composition on thermal st
Rutherford backscattering spectroscopy tivity of Ta—Si—N films, 19
Compositional and structural studies of DC magnetron sput- Superhard nanocomposite
tered SiC films on Si(111), 53 tron sputtering, 104
Structure
Scanning electron microscopy Chemical composition and str urree oOfl
['wo dimensional array of magnetoferritin on quartz surface, 99 deposited on LTI-carbon by IBED, 94
Second harmonic generation Surface composition
Second harmonic generation investigation of indium tin oxide Synthesis and characterization of some ZnS-based
thin films, 116 phosphors for electroluminescent device app
Semiconductors Surface structure
Effect of cracks in TiN anti-reflection coating layers on early Two dimensional array of 1
via electromigration failure, 110 Surface-to-volume ratio
Sensitivity analysis Macro/microcavity method and its;
4 chemical mechanism for in situ boron doping during silicon mical vapor deposition reacti:
chemical vapor deposition, 231
SiC films Ta—Si-N
Compositional and structural studies of DC magnetron sput- Effect of composition on thermal stab
tered SiC films on Si(1 11), 53 tivity of Ta—Si—N films, 19
SiGe Temperature control algorithms
Influence of misfit strain on {311} facet development in selec- Model-based control in rapid thermal proce
t
tive epitaxial growth of Si, ,Ge/Si(100) grown by gas- Tetraethoxysilane
source molecular beam epitaxy, 147 Multiple scale integrated modeling of deposit
Silicide Tetraethylsiloxane
Stress evolution of Ni/Pd/Si reaction system under isochronal Chemical kinetics in chemical vapor depositior
annealing, 72 con dioxide from tetraethoxysilane (TEOS)
Silicon Thermal modelling
Atomic scale models of ion implantation and dopant diffusion Thermal modelling of RTP and RTCVD proc
in silicon, 219 Thermal processes
$10, thin films Topography simulation for the
Stabilization of copper-based colloidal particles in sol-gel SiO hermal stability
thin films, 30 Effect of composition on thermal stabi
SnO, films tivity of Ta—Si-N films, 19
Characterization of SnO, films on glass by transmission elec- Thermochromism
tron microscopy, 7 Better thermochromic glazin
Sol-gel coating, 5
Ferroelectric properties of bismuth titanate niobate Thermodynamic analysis
Bi-TisNbO,, thin film, 58 Combined thermodynamic and mass transport
Sol-gel chemistry material processing from the vapor phase, 264
C-axis oriented sol-gel derived LiNb,_,Ta,O; thin films on Thin films
Si(111) substrates, 77 Ferroelectric properties of
Solar selective surface Bi-Ti,NbO,, thin film, 58
Ni-—Cr selective surface based on polyamide substrate, 49 C-axis oriented sol-gel derived
Spin coating process Si(111) substrates, 77
Characterization of SnO, films on glass by transmission elec- Thin film deposition
tron microscopy ’ 7 Lattice Monte Carlo models of thin film deposition,
Sputtering Thin film growth
Effect of composition on thermal stability and electrical resis- Modeling Cu thin film growth, 201
tivity of Ta—Si-N films, 19 TisgNiggCujy) shape memory alloy
Ni-Cr selective surface based on polyamide substrate, 49 Composition control of r.f.-sputtered TisyNiyol
Composition control of r.f.-sputtered TispNijgCujo thin films using optical emission spectroscopy, 61
using optical emission spectroscopy, 61 Titanium oxide
Superhard nanocomposite Ti, ,Al,N films prepared by magne- TiO, thin film deposition from solution using microwave heat-
tron sputtering, 104 in a | ,
Subject index
Thickness dependence of the optical properties of sputter Vapor phase process
deposited Ti oxide films, 119 Combined thermodynamic and mass transport modeling for
Titanium oxide film material processing from the vapor phase, 264
Chemical composition and structure of titanium oxide films
deposited on LTI-carbon by IBED, 94 Window glazing
Topography simulation Better thermochromic glazing of windows with anti-reflection
Topography simulation for the virtual wafer fab, 152 coating, 5
Transmission electron microscopy
Characterization of SnO, films on glass by transmission elec- X-ray diffraction
tron microscopy, 7 Compositional and structural studies of DC magnetron sput-
Transport phenomena tered SiC films on Si(111), 53
LB films formed from arachidic acid monolayers on an aqueous
Computational modeling of transport phenomena and detailed
chemistry in chemical vapor deposition — a benchmark solu- solution of a ruthenium(II) complex, 67
tion, 294 C-axis oriented sol-gel derived LiNb,_,Ta,O; thin films on
Si(111) substrates, 77
Trapping
Physical properties of thin GeO, films produced by reactive DC
Atomic scale models of ion implantation and dopant diffusion
magnetron sputtering, 82
in silicon, 219
Tungsten
ZnS-based thin films
Effect of cracks in TiN anti-reflection coating layers on early
Synthesis and characterization of some ZnS-based thin film
via electromigration failure, 110
phosphors for electroluminescent device applications,
134
Vanadium dioxide
Better thermochromic glazing of windows with anti-reflection
coating, 5