Table Of Content

5S. Valen, P. Pavadial, P. Lames, A. Gi OMS 0. ce cece reste eeicenn ee ee ee eee Growth and morphology of Te films on Mo P. Tagtstrém, U. Jansson Chemical vapour deposition of epitaxial WO, films J. Caro, J. Fraxedas, J. Santiso, A. Figueras, J.M. Rawson, J.N.B. Smith, G. Antorrena, F. Palacio.............. Preparatioann d characterizatioofn o rientedt hin films of a sulfur—nitrogreand ical L. Jiang, X. Chen, X. Wang, L. Xu, F. Stublhan, K.-H. Merkel 2... ceceee ewees ene wesens applications resistant a-SiC,:H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion B. Li, L. Pottier, J.P. Roger, D. Fournier......... COPE Ebr OEE ORO EROS E 2 DES OE VER Thermal characterization of thin superconducting films by modulated thermoreflectance microscopy E. Fujii, A. Tomozawa, H. Torii, R. Takayama, M. Nagaki, T. Narusawa.... 1... eee ee ee ee Preferred orientations and microstructure of MgO films prepared by plasma-enhanced metalorganic chemical vapor deposition Da CO, Vi0 . VERON, a RE, Rats GAD ee See ee hehe eer e ee Cees es tte oN See, Investigationo f borophosphosilicatglea ss roughnessa nd planarizationw ith the atomic force microscopet echnique A. Gulino, G. Compagnini, R.G. Egdell, |. Fragala ........... eae 8 ee ek he eh ee ek Thin films of tetragonal zirconia with Bi doping: deposition, characterisation and thermal behaviour Sy eT eS OC PPS eT ETE CET EUR EOE TEL CETTE ee Heteroepitaxialg rowth of PZT thin films on LiF substrate by pulsed laser deposition Se RK Peee ee eee eee eee Se ee ee ee ee ee ee eee ee Se eee Fabricatioan nd electrochromipcr opertieso f spin-coateTdi O, thin films from peroxo-polytitanaicci d Fe SE, FSU, Be. es hs IG Oe, REE heb ee Hdd e oe eee Neel eee e Cake Ce eee (Ba,Sr)TiO; solid solution thin-films grown by a molecular beam epitaxy method J. Gonzalez-Garci, J. Iniesta, E. Exposito, V. Garcia-Garci, V. Montiel, A. Aldaz.............. 000000000. erEsldototaloneiifareu ato glcgdaxeyt hnis r idplasma ECR-r.f. in a dual deposited films (a-C:H) carbon amorphous on hydrogenated study Raman and Ellipsometry ouedm e pJ. Stiegler, A. Bergmaier, J. Michier, S. Laufer, G. Dollinger, E. Blank... 0... cc cee eee eee ee eens osintgiertmorpwoetgrhea nt ure odfi amond efoolTfinfohfl weem c st tioneeeee eee es OORk 8 80k 0 4S ls Ew Bw 0cbS e Oe .0 -w Wb 0) Ss CO ae eis: MgOo(n1 00) depositfeidl ms oxide iron of characatnedr isation Preparation eeLee 0 caeO a w* e AS en-8B iela e 4b2 'e 5. yy UII SL CIE,Ls GaanE , Geen,a properties materials interfaancdi al chemistrsyu rface films: hexafluorodperpoopsyilteendpe l asma discharGgleo w Charaacntde rizatioSny nthesis PeNy.g hambarHioanSnk. a.n.e.n,. ..D.es.c.ou.rM.,. R... .L.e.vR.y.,. 00000Ra5n taJl.aT,. AyrPa.s , mask gra ay-sucsailneg UV-esxiapn ogsleuw irteh filmtsh in soiln- gel structureMsu ltilevel eee ee Le ie ee mee oe© acer, esPe aoke acheb ed Whe 6.© 0.5 SSiUe E eles discharge glowR F an in tetraeftrhoyml germanpiurmo ducfeidl ms alloy germatnhiinu m/carbon semiofc onductisntga bility Thermal ......Ma.tTs..u. o.. .Le.e., ..I.-Y0Si.n. 4 ShimY.a da, Tanaka,Y .-K. NakTa.n o, NiiYd.o me, YamS.a da, generathiaorn mosneicco nodp tiacnadl electron-trpahnbosytfo eirn sdtuucdeiedd as films polymer watienr -cast complexes ruthenium-polaymppyohrfi ipdhiinliec anchorinsgu rfoanc e tails alipohfa tic Effect Letters Contents 1999 Se8p temb3e5r2, Volume : 107 102 97 91 85 77 73 66 62 57 49 GFPkeaOeeoeOee4eeOe1'seko s e NkS e 29 e e22 13 9 6 l , t t y e t g i TK.a wai film LB complex polyion phootno chromic alignmenctry stal liquid controlfloirncge Driving 88 aw ae Ee nO ON OE OS OES4 6 a kd ew ods e sae I i I I es ey es nanopaTrtiiOc,l aensd poropfh yrin assemfbillme d comopfo site properties phottohpeh oyfs ical Study SEW ORES WSR oO00 aN Oe eS ee ee ee os 6 I Os I ae es re a derivaatciivde s tetracarboxfyulliloecfr ene films monoofl ayer property conversion Photoelectric EEA SERSSO ECA DH ODER ED ER REESE CEE ....... JiaLn.g . BouPl.l angDeur,, Y.-K.L i, J.-R. charges diffoefr ent matrixes glyctohleii pni d oxidase gluocfo se activity enzymaandt ic foldinTgh e Films Relataendd Biological Langmuir-Blod oe eee ee ee a Wee ON Oe Ire ae en ee A ak a a a films thin Cu,O-_5 YiBn a content oxytgo en ellipsometry speocft roscolpiimict s sensitTihveit y Superconductiv c.f eS Pee eee ee re er erie Se ee oe ee Oe ee ee ee eee are peal iSPesaofOoinifnatinfobsOf lthd osue,mue lelcs rratre7, stability organic light emitting high Improved monolayers a interfaces diodes materials and self-assembled of in with tv—tiaFinotrgnie M. Uekawa, Y. Miyamoto, H. Ikeda, K. Kaifu, T. Ichi, T. Nakaya................. i ices ka as te a er onnk el ccgodcAndferorooeaoli gnormvvreaatu eibcpmnaplcatioiimonitoring sputtered piezoelectric s ezof zinc In situ oxide films for transducers rncnu sooe in ll nedug B.F. Chen, J. Hwang, G.P. Yu, JH. Huang. ..... re re ee ee ee ee ee eee eae eae ee ii m inescIn situ observation of the cracking behavior of TiN coating on 304 stainless steel subjected to tensile strain ent Electronics, Optics and Opto-electronics Measuring mechanical properties of thin flexible films by a shaft-loaded blister test SB.e nLF.ao yuoiFulonlua,iJn l.HdlJ-a.a Pnnadti-lzPwaa elapeire lelreeeg,eee au w e.e . ....... Microscratch test studies of thin silica films on stainless steel substrates Mechanics and Nanomechanics of Thin Layers A. Zalar, B.M.M. Baretzky, S. Hofmann, M. Rihle, P. Panjan................... ee ee are ay Interfacial reactions in Al,O;/Ti, Al,O;/Ti;Al and Al,O,;/TiAI bilayers H. Liu, A. Tanaka, T. Kumagai............. jones Se 6 ee ae eee ee See e Oe oe ace a Influence of sliding mating materials on the tribological behavior of diamond-like carbon films Metallurgical, Protective and Hard Layers Y.-H. Kim, D.B. Wurm, M.W. Kim, Y.-T. Kim. ......... ee ee 5 ky eS a eee as oe ee a ee Electrochemistry of Langmuir—Blodgett and self-assembled monolayers of pyrrole derivatives pe Ceeee ee ee eee eee ee ee oe High-rate reactive deposition of indium oxide films on unheated substrate using ozone gas J.S. Kim, Y.C. Shin, K.T. Lee, W.T. Kang, T.H. Kim, K.Y. Lee, Y.J. Park, JW. Park... ............... Prevention of adhesion failure of a W/TiN/Ti(Co) layer on SiO, eeake C E LC t Suek eeeM W adok e Oew eOeeW e ee&e eb Interfacial processes during plasma polymer deposition on oxide covered iron Surfaces, Interfaces and Colloidal Behaviour vi Contents ee ae OO ra owe = eS 223 218 213 205 195 185 173 SACGS1DAtFopMSLio ad..i.o8i..ei r o ee9 n- re socA a, ahvr lmdev,e. eds,.- .Co.n.tZRGGACP1NRK.ShHonsSe.aoosrri..7.ao.,.a.eSyg t,e.Re eJ e9eNKn.de ele e. . ...enl rrefC i ,es,..e , lr. l,. ..... .... eaeere e eeeeeeeeee Wan, 167 KKLeee..eei- eeaT . o e.eCRneDeeo o ceeet r 156 151 145 138 133 128 119 . . .e e. .e t n NGS e Erratum Errata Transfer e Enhanceme ernandez, Monte Properties I nfrared Patterned Real-time Thin A leaflet describing our requirementsi s available from the Publisher upon request. The publisher encourages the submission of articles in electronic form thus saving time and http://www.elsevier.nl/locate/tsf For more information on Thin Solid Films, please visit our website at: SVO6ckOhaOeBoOBeoee keadeKleeeaeE eeeL Oe e e eACS808weo6eS8eOeD e.eeeeda 4eaen O 4 E O0 to: Reduction and separation of Silica-alumina mixture with argon-hydrogen thermal plasmas eee Se Se a I oo kak Skah ae WR eS 8 ee ee ee ee e toI3EAVofn3ru:o d6rtle ahuxto murem esbesr eneeee e eee RECUFRF.. REGDA.M IST, SERN.S . Fas, A.M. We, 1.2. Si(11B1ao)nF >M;bB-ycEg or aoteewpdni layPoebfrS se /PbEuS ee eee 0. cUsui1... . eAkiyMa.m a, eWatTa.n abe, Zheng, X.-G.X u, C.-N. of adhesion and triboluminescence of ZnS:Mn films by annealing technique .......Va.zCq..u e.z-.Lo.pe0z 000N avHa.r ro-CoVnitdraelr,a Ms.,A . SalBa.z ar-HEpitaxial GaAs(001) oSFoGGntifer rl oamwistn ehd KORD ORS bak Ree oe he pce beh Anewk g og Sea ni-ni deal phenomenweat tianngd transitionsl ayeIIr:i ng adsorption multilaymeirx oefd simulatCiaornl o he ERE TA eee hb ee eoAe OR eS ek0 CWitIs eSy y Triethylsilane orgatnhoes ilafnreo m deposiftieldm s thin C,:H a-Sofi , CMFBiaeolthnmtad everin osehe e Ss SeOk ee ke od 8 rk Nw G 86-0 ba x6 O2s EE rFee uerd polymers conducthiinggho lny based devices electroemissswiivtec hing Ree EPRC UT ERLE OTce EAD KARadE NS k 36 00 aNe S as diodes light-pemoiltcytomilenorgr multiple eeo e e6 aie Ke ig Ge be a OS Aks hs x ee ek coppoen r merocfa ptobenzboethhaivaizoorl e inhibtihtei oofn studies wave acoustbiucl k Actuaatnodr s Sensors DeviceFsi, lm Contents e e o avoiding 6eo ed re eee eereee n eee e eee eee e ixtures n eeoe e eae ee we rekey beeess ee sebe s eee eee a m ee a i ng eA e r r o rs. 290 288 283 278 273 269 259 249 239 234 TTCePdgPCTCeTC2 TTkRC8CTREk O EC7UTTLO E e CT C E