Table Of Content

R AERTS. 4, ELSEVIER Volume 340, 26 February 1999 Contents Letters Fabrication of diamond microstructures for microelectromechanical systems (MEMS) by a surface micromachining process R. Ramesham H_ ESD observed from B-state NH; adsorbed on Pt(111) C. Bater, J.H. Campbell. J.H. Craig Jr Electrosynthesis of the molybdenum disulphide thin films and characterization R.S. Patil Microstructure analyses of the titanium films formed by the ionized sputtering process D-H. Ko, E-H. Kim, S. Choi, B-Y. Yoo. H-D. Lee Synthesis and Characterization Chemical bath deposition of indium sulphide thin films: preparation and characterization C.D. Lokhande, A. Ennaoui, P.S. Patil, M. Giersig. K. Diesner. M. Muller. H. Tributsch Temperature determination by solubility measurements and a study of evaporation of volatile components in LPE V.A. Mishurnyi, F. de Anda, I.C. Hernandez del Castillo. A-Yu. Gorbatchey Field-lowering carrier excitation in cadmium arsenide thin films M. Din, R.D. Gould Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates D. Rats, V. Hajek, L. Martinu Anisotropy in wear processes measured by scanning probe microscopy K. Schouterden, B.M. Lairson Chemical vapor deposition of copper—cobalt binary films S. Gu, P. Atanasova, M.J. Hampden-Smith, T.T. Kodas Fabrication and characterization of (1 —x)SrBiyTa,Oy-xBi;TaTiOy layered structure solid solution thin films for ferroelee- tric random access memory (FRAM) applications S.O. Ryu, S. Tirumala, P.C. Joshi, S.B. Desu Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD S.F. Yoon, X. Rusli, J. Ahn, Q. Zhang. C.Y. Yang. H. Yang. F. Watt Quantitative analysis of the oxygen content in BaTiO; films deposited by PLD using '“O(@.@)'°O resonant elastic scattering W. Li, F. Lu, Z-G. Liu, Y. Zhu, F-X. Wang. X-D. Liu. C-Y. Tan. K-M. Wang... ... Growth of yttria stabilized zirconia thin films by metallo-organic. ultrasonic spray pyrolysis Y. Matsuzaki, M. Hishinuma, I. Yasuda Non-vacuum laser deposition of buffer layers for coated conductors N.B. Dahotre, V. Semak, C. Xiao. M.H. McCay Ellipsometric analysis of the oxidation of a—Fe and €-Fe.N,_, P.C.J. Graat, M.A.J. Somers, E.J. Mittemeijer Structural characterization of C,B,N. (x = 0.1 to x = 0.2) layers obtained by laser-driven synthesis I. Morjan, O. Conde, M. Oliveira, F. Vasiliu Separation of CO, and CH, through two types of polyimide membrane J. Zhang, J. Lu, W. Liu, Q. Xue Influence of substrate temperature on atomic layer growth and properties of HfO, thin films J. Aarik, A. Aidla, A.-A. Kiisler. T. Uustare. V. Sammelselg vi Contents Electrodeposition of CulnSe, thin films in a glycine acid medium R. Ugarte, R. Schrebler, R. Cordova, E.A. Dalchiele, H. Gomez Preparation and photoelectrochemical properties of Ti,-,V,O> solid solution thin film photoelectrodes with gradient bandgap G. Zhao. H. Kozuka, H. Lin, M. Takahashi, T. Yoko Total dose radiation effects of Au/PbZrp 5>Tip 4803) Y BaxCu;O7.6 capacitors J. Gao, L. Zheng, X. Duo, J. Huang, L. Yang, C. Lin, R. Yan Preparation of AIN thin films by nitridation of Al-coated Si substrate J. Huang, L. Wang, Q. Shen, C. Lin, M Ostling Epitaxial growth of RuO, thin films by metal-organic chemical vapor deposition P. Lu, S. He, F.X. Li, Q.X. Ji Intensity profiles along the RHEED streaks for various thin film surface morphologies K. Mae, V.V. Moshchalkov, Y. Bruynseraede Neutron and X-ray reflectivity analysis of ceramic-metal materials A. Gibaud, C. Sella, M. Maaza, L. Sung, J. Dura, S.K. Satija Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition T. Vandevelde, T.D. Wu. C. Quaeyhaegens, J. Viekken, M. D’Oliesleeger, L. Stals. 2... ..00002000.0.0.... Electrical characterization of TaOs films deposited by laser reactive ablation of metallic Ta Z-W. Fu, L-Y. Chen, Q-Z. Qin A novel approach to the formation of amorphous carbon nitride film on silicon by ECR-CVD S.L. Sung, C.H. Tseng. F.K. Chiang, X.J. Guo, X.W. Liu, H.C. Shih Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films V. Gauthier, S. Bourgeois, P. Sibillot, M. Maglione, M. Sacilotti Surfaces, Interfaces and Colloidal Behaviour AFM characterization of the structure of Au-colloid monolayers and their chemical etching A. Doron, E. Joselevich, A. Schlittner, I. Willner Effect of surfactant concentration on the size of coated ferromagnetic nanoparticles T. Prozoroyv, G. Kataby, R. Prozorov, A. Gedanken Metallurgical, Protective and Hard Layers Abrasion of thin films deposited onto glass by the Taber test S. Suzuki, E. Ando Mechanics and Nanomechanics of Thin Layers lon irradiation hardening of Cy thin films C.E. Foerster, C.M. Lepienski, F.C. Serbena, F.C. Zawislak Stress formation and relaxation in amorphous Ta-Cr films P. Andersen, M. Moske, K. Dyrbye, J. Bottiger Electronics, Optics and Opto-electronics Micro/nanomechanical characterization of ceramic films for microdevices X. Li, B. Bhushan Information storage based on photochemical effects in mixed Langmuir—Blodgett films R. Ricceri, A. Abbotto, A. Facchetti, G.A. Pagani, G. Gabrielli Conductivity mechanisms in poly(p-phenylene vinylene) light-emitting diodes at high and low bias R. Jones, A. Krier, K. Davidson, J.-P.N. Schmit, J. Zawadzka Enhanced luminescence of silica thin films co-doped with Er** and Yb*" G. Gu, P.P. Ong, J. Cai, W. Yang, Y. Du, S. Yang Refractive indices and thicknesses of optical waveguides fabricated by silicon ion implantation into silica glass J. Gazecki, J.M. Kubica, M. Zamora, G.K. Reeves, C.M. Johnson, M.C. Ridgway Contents Electrical stability of polyimide siloxane films for interlayer dielectrics in multilevel interconnections T. Homma, M. Yamaguchi, Y. Kutsuzawa, N. Otsuka Drying temperature effects on microstructure, electrical properties and electro-optic coefficients of sol-gel derived PZT thin films C. Lee, V. Spirin, H. Song, K. No Charge migration on hydrophobic and hydrophilic silicon dioxide E. Hedborg, F. Winquist, H. Sundgren, I. Lundstr6m Langmuir-Blodgett, Biological and Related Films X-ray photoelectron spectroscopy study of Langmuir—Blodgett films of N-octadecyl-8-hydroxy-2-quinoline carboxamide deposited from subphases containing metal ions J-M. Ouyang, W-J. Zheng, N-X. Huang, Z-H. Tai Photoelectric responses of Langmuir—Blodgett film containing bacteriorhodopsin on ITO modified with polypyrrole film L. Yuan, B. Li, L. Jiang Central metal effect on the organization of porphyrin LB films H-G. Liu, X-S. Feng, Q-B. Xue, L. Wang, K-Z. Yang The anisotropic gas response behavior of LB films of an amphiphilic asymmetrically substituted phthalocyanine X. Ding, H. Xu, L. Zhang, D. Jiang, A. Lu Thin Film Devices, Sensors and Actuators Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs) P. Wohlfart, J. WeiB, J. Kashammer, C. Winter, V. Scheumann, R.A. Fischer, S. Mittler-Nehera Consequences of TiO; doping on the optical properties of porous silica layers coated on silica optical fibers F. Abdelmalek, M. Lacroix, J.M. Chovelon, N. Jaffrezic-Renault, D. Berkova, V. Matejec, I. Kasik, M. Chomat, H. Gagnaire Condensed Matter Film Behaviour Effect of a noble metal coating on a natural aluminum oxide film. L.A. Kuzik, V.A. Yakovlev lon transport studies on vacuum deposited PbSnI, thin films T.A. Kuku Transport property of Sn-doped Inp,;GaosP layers grown by liquid phase epitaxy 1.T. Yoon, H.L. Park On the interpretation of °’Fe Méssbauer spectra from CdTe thin films with substitutions of Fe, In, and Sb H. Yee-Madeira, E. Reguera, O. Zelaya-Angel, H. Montiel-Sanchez, F. Sanchez-Sinencio, R.B. Scorzelli Morphology of sputter deposited Al alloy films T. Onishi, E. Iwamura, K. Takagi Erratum Experimental and numerical analysis of rapid reaction to initiate the radical chain reactions in WSix CVD Y.K. Chae, Y. Egashira, Y. Shimogaki, K. Sugawara, H. Komiyama Author Index of Volume 340 Subject Index of Volume 340 For more information on Thin Solid Films, please visit our website at: http://www.elsevier.nl/locate/tsf The publisher encourages the submission of articles in electronic form thus saving time and avoiding rekeying errors. A leaflet describing our requirements is available from the publisher upon request