Thin Solid Films 1997: Vol 304 Index

7 Pages·1997·1.2 MB·English

Author Index of Volume 304
Serra, A. 339 Tada, M Van Dijk, K. 191 Xu,
Serrini, P. 113 Taga, Y Varela, M. 225
Shi, Z. 1710 Takai, O. 18 3 Vasasnaenlel i, I 3% ” Yang. H-Y. 37!
Shih, H.-J. 201 Taki, Y. 183 Vassilev, V. 315 es
Siciliano, P. 339 Tang, C.C. 170 Veerrt hoeven 1 1i‘9 1 Yang, P.-K. 299
Smilgys, R.V. 303 Taoudi, H. 48 Yoo“ n, K.H. 85
Sokolowski, S. 344 Toméik, B. 136
Song, S.K. 85 Touihri, S. 16 Wang, C.D. 278 Zhai, X. 327
Suder, S. 157 Trehokt, C. 212 Wang, P.W. 160 Zhang, L. 13
Sulak, J. 160 Traverse, A. 113 Weber, B. 98 Zhang, L.P. 160
Sulpice, A. 319 Irtik, V. 225 Welch, W. 245 Zhang, Y. 386
Sung, M.C. 85 Isai, J.-H. 201 Willett, G.D. 130 Zhang, Z. 196
Suzuki, M. 333 Wu, H.-S. 299 Zhu, J. 386
ELma SEAAYV IER
Thin Solid Films 304 (1997) 394—399
Subject Index of Volume 304
Adhesion
An X-ray diffraction (XRD) study of vapor deposited gold thin films Studies on chemically deposited cadmium sulphoselenide (CdSSe)
on aluminum nitride (AIN) substrates, 229 films, 56
Advanced solar reflector “eramics
Optical performance and durability of solar reflectors protected by an Study of the influence of oxygen on the composition of thin films
alumina coating, 303 obtained by r.f. sputtering from a Ca.(PO,),OH target, 191
AFM ‘halcogens
Growth phenomena of Bi,Sr,CaCu,O,,, thin films deposited on Lateral self-diffusion of selenium in CulnSe, thin films, 365
(110) oriented SrTiO, substrates, 212 ‘hemical bath deposition
Alumina Studies on chemically deposited cadmium sulphoselenide (CdSSe)
Optical performance and durability of solar reflectors protected by an films, 56
alumina coating, 303 “*hemical vapor deposition
Aluminium nitride Chemical vapor deposition of Al,O, films using highly volatile single
Nanostructure and local chemical composition of AIN—Si,N, layers sourc- es, 22e 2e2]
grown by LPCVD, 256 ‘hemical vapor deposition (CVD)
Aluminium oxide Three-dimensional morphological instabilities in chemical vapor de
Nanoindentation of amorphous aluminum oxide films. III. The influ position films, 371
ence of the substrate on the elastic properties, 70 ‘hemical vapour deposition
Aluminum nitride (AIN) substrate Characterization of electron cyclotron resonance source plasma for
An X-ray diffraction (XRD) study of vapor deposited gold thin films etching and deposition, 294
on aluminum nitride (AIN) substrates, 229 Deposition of LiTaO, thin films by pyrosol process, 239
Aluminum oxide Iteratively derived optical constants of MoO, polycrystalline thin
Chemical vapor deposition of Al,O, films using highly volatile single films prepared by CVD, 39
sources, 222 Two-component phthalocyanine films: impedance study, 36
Amorphous hydrogenated carbon ‘hemical vapour deposition (CVD)
Laser-ablation Fourier-transform mass spectrometry of films based on Initial growth phase of diamond thin films observed by thermal
amorphous hydrogenated carbon, 130 emission spectrometry, 98
Amorphous materials ‘leavage
Electrode limited currents in amorphous Ge—S—Ga thin films, 315 Thin solid film sample preparation by a small-angle cleavage
Atomic force microscopy (AFM) transmission electron microscopy, 157
Molecular structure of dipalmitoylphosphatidylcholine Langmuir oatings
Blodgett monolayers studied by atomic force microscopy, 327 4 simple in-situ optical film thickness monitor for infrared coatings
Atomic hydrogen 24
ITO surface ball formation induced by atomic hydrogen in PECVD obalt
and HW-CVD tools, 123 Durable giant magnetoresistive sensors using Co/Cu superlattices
Atomic oxygen 333
Plasma etching and patterning of CVD diamond at < 100°C for onductivity
microelectronics applications, 245 Electrode limited currents in amorphous Ge—S—Ga thin films, 315
Avalanche multiplication Magnetoresistance of granular ferromagnet—insulator films, 319
Regenerative switching phenomenon of a graded Al Ga,_ . As/In ‘onfinement effect
GaAs /GaAs heterostructure, 201 Regenerative switching phenomenon of a graded Al Ga As /In
Band structure GaAs /GaAs heterostructure, 201
Electrode limited currents in amorphous Ge—S—Ga thin films, 315 ontacts
Barrier lowering effect High aspect ratio contacts: A review of the current tungsten plug
Regenerative switching phenomenon of a graded Al Ga,_,As/In process, ]
GaAs /GaAs heterostructure, 201 opper
BiSrCaCuO Durable giant magnetoresistive sensors using Co/Cu superlattices
Growth phenomena of Bi,Sr,CaCu,O,,; thin films deposited on 333
(110) oriented SrTiO, substrates, 212 ‘rystallisation
Carbon Crystallisation of thin anatase coatings on muscovite, 204
Shielded arc ion plating and structural characterization of amorphous ‘rystal orientation
carbon nitride thin films, 183 Growth phenomena of Bi,Sr,CaCu,O, , ry thin films deposited on
(110) oriented SrTiO, substrates, 212
Elsevier Science S.A
Subject Index of Volume 304
Cyclotron resonance studies FeCo coatings
Characterization of electron cyclotron resonance source plasma Effect of microstructure on the wear behaviour of Fe Co thin films
etching and deposition, 294 6
Defects Ferromagnet—insulator mixture films
An oXn- raayl umdiifnfurmac tinoint ri(deX R(DA)I N)s tudsyu bstofr atveasp or 2> 2d9e posited gold thin fils THs FilmsM agnetoresistance of granular ferromagnet—insulator films 319
Deposition process Metal—organic vapor deposition of YSZ electrolyte layers for solid
Deposition of LiTaO thin films by pyrosol process, 239 oxide fuel cell applications, 106
Effects of wavelength, deposition rate and thickness on laser ablation Fourier—transform mass spectrometry
leposited YSZ films on Si( 100), 225 Laser-ablation Fourier-transform mass spectrometry of films based on
Electrode limited currents in amorphous Ge—S—Ga thin films, 315 amorphous hydrogenated carbon, 130
Study of the influence of oxygen on the composition of thin film Gas sensors
obtained by r.f. sputtering from a Ca.(PO,),OH target 191 Properties and mechanism study of Ag doped SnO, thin films as H,S
The characterization of undoped SnO,. thin film grown by reactive , sensors, 13
ion-assisted deposition RS Giant magnetoresistance
Depth profiling Magnetoresistance of granular ferromagnet—insulator films 319
Chemical vapor deposition of Al ,O films using highly volatile single Goid film
sources, io22 2i e) An X-ray diffraction (XRD) study of vapor deposited gold thin films
Diamond m aluminum nitride (AIN) substrates 229
Axial distribution of emission and rate of deposition of diamond-like Growth mechanism
film in r.f. discharges in CH,, 136 \ ace EXAFS study of thin nickel deposits on (110) TiO
Initial growth phase of diamond thin films observed by thermal surfaces 26
emission spectrometry 98 Initial growth phase of diamond thin films observed by thermal
PEELS and EXELFS characterization of diamond films grown by the mis spectrometry OS
HF-CVD technique on non-scratched Si substrates, 45 Hardness
Plasma etching and patterning of CVD diamond at 100°C for Shielded arc ion plating and structural characterization of amorphous
microelectronics applications 45 carbon nitride thin films, 183
Diffusion High-resolution electron microscopy
Lateral self-diffusion of selenium in CulnSe, thin films, 365 Nanostructure and local chemical composition of AIN—Si,N layers
Three-dimensional morphological instabilities in chemical vapor de grown by LPCVD, 256
position films 4 i HRTEM
Doping Growth phenomena of Bi,Sr,CaCu,0, thin films deposited on
Interdiffusion in CoN /CN soft X-ray multilayer mirrors ) oriented SrTiO substrates 212
Elastic deformations Hydroge sulphide
\ ‘hydrostatic core’ model of elastic deformations in an indented Properties and mechanism study of Ag doped SnO, thin films as H,S
film substrate system 8 ensors, 13
Elastic properties Indium tin ox ide
Nanoindentation of amorphous aluminum oxide films. III. The influ ITO surface ball formation induced by atomic hydrogen in PECVD
ence of the substrate on the elastic properties, 70 and HW-CVD tools, 123 5
Electrical properties and measurements Infrared film thickness monitor
Magnetoresistance of granular ferromagnet insulator films 319 \ simple n-situ optical film thickness monitor for infrared coatings
Electrochemical characteristics 4
Electrochemical and optical characteristics of conducting poly( Interdiffusivity
toluidine) films 65 Interdiffusion in CoN /CN soft X-ray multilayer mirrors
Electrochemistry lodine
Optical and electrochemical characteristics of sol-gel deposited tung Comparison of the properties of iodine-doped poly( N-vinylcarbazole)
sten oxide films: a comparison 310 (PVK) thin films obtained by evaporation of pure powder fol
Electron energy loss spectroscopy we DY iodine post-deposition doping and iodine pre-doped
Nanostructure and local chemical composition of AIN—Si,N layers powder, 16
grown by LPCVD 2> 56 lon-beam-assisted deposition (IBAD)
PEELS and EXELFS characterization of diamond films grown by the Optical performance and durability of solar reflectors protected by an
HF-CVD technique on non-scratched Si substrates, 45 alumina coating, 303
Electron spectroscopy lon implantation
Tantalum plasma etching with minimum effect on underlying nickel Transmission electron microscopic studies of ternary FeNi—silicide
iron thin film, 381 layers prepared by metal vapour vacuum arc ion implantation, 196
Ellipsometry lon plating
Optical and electrochemical characteristics of sol—gel deposited tung Shielded arc ion plating and structural characterization of amorphous
sten oxide films a comparison 310 carbon nitride thin films, 183
Epitaxy Langmuir—Blodgett films (LB films)
Effects of wavelength, deposition rate and thickness on laser ablation Preparation and structure of lanthanum stearate films 23 3
deposited YSZ films on Si( 100), 225 Langmuir-Blodgett films (LB films)
Texture development of evaporated nickel films on molybdenum Molecular structure of dipalmitoylphosphatidylcholine Langmuir
substrates, 170 Blodgett monolayers studied by atomic force microscopy, 327
Etching Laser ablation
Characterization of electron cyclotron resonance source plasma for Effects of wavelength, deposition rate and thickness on laser ablation
etching and deposition, 294 deposited YSZ films on Si( 100), 225
396 Subject Index of Volume 304
Laser irradiation Nanostructures
Changes in photoluminescence behaviour and structure of porous Changes in photoluminescence behaviour and structure of porous
silicon related to preparation conditions and laser irradiation, 358 silicon related to preparation conditions and laser irradiation, 358
Luminescence Negative differential resistance (NDR)
Changes in photoluminescence behaviour and structure of porous Regenerative switching phenomenon of a graded Al Ga As /In
silicon related to preparation conditions and laser irradiation, 358 GaAs /GaAs heterostructure, 201
Quantum size effect does not yield photoluminescence in nanometer Nichrome alloy
silicon crystals, 353 Study of a polycrystalline Ni/Cr alloy V. Hydrogen-atom exposure
Magnetic properties and measurements 73
Growth, structural characteristics and magnetoresistance in La—Ca Nickel
Mn-—O thin films prepared by dc magnetron sputtering, 386 \ surface EXAFS study of thin nickel deposits on (110) TiO
Magnetoresistance of granular ferromagnet—insulator films, 319 surfaces, 267
Mean-field Texture development of evaporated nickel films on molybdenum
Monte-Carlo simulation of mixed multilayer adsorption, 344 substrates, 170
Metallization Nitride
High aspect ratio contacts: A review of the current tungsten plug Shielded arc ion plating and structural characterization of amorphous
process, | carbon nitride thin films, 183
Methane Nitrides
Axial distribution of emission and rate of deposition of diamond-like An XRD study of highly textured HfN films, 286
film in r.f. discharges in CH,, 136 Optical characteristics
Mg Electrochemical and optical characteristics of conducting poly(o
Preparation and characterization of MgF, thin film by a trifluoroacetic toluidine) films, 65
acid method, 252 Optical properties
Mica 4 simple in-situ optical film thickness monitor for infrared coatings
Crystallisation of thin anatase coatings on muscovite, 204 24
Microstructure Iteratively derived optical constants of MoO, polycrystalline thin
Effect of microstructure on the wear behaviour of Fe—Co thin films films prepared by CVD, 39
61 Optical and electrochemical characteristics of sol—gel deposited tung
Preparation and characterization of MgF, thin film by a trifluoroacetic sten oxide films: a comparison, 310
acid method, 252 Structural and optical properties of amorphous hydrogenated fluori
Microwave plasma nated carbon films produced by PECVD, 149
Plasma etching and patterning of CVD diamond at < 100°C for Optical spectroscopy
microelectronics applications, 245 Axial distribution of emission and rate of deposition of diamond-like
MOCVD film in r.f. discharges in CH,, 136
Metal—organic vapor deposition of YSZ electrolyte layers for solid Initial growth phase of diamond thin films observed by thermal
oxide fuel cell applications, 106 emission spectrometry, 98
MOCVD process Structural and optical properties of amorphous hydrogenated fluori
Synthesis and characterization of organometallic precursors for the nated carbon films produced by PECVD, 149
preparation of Sn /chalcogenide heterostructures, 144 Organic substances
Molecular beam deposition Preparation and structure of lanthanum stearate films
Thin pyrite (FeS,) films by molecular beam deposition, 178 Organometallic precursors
Molecular orientation Synthesis and characterization of organometallic precursors for the
Determination of the orientation of CuPc film by Raman spec preparation of Sn /chalcogenide heterostructures, 144
troscopy, 166 Organometallic vapor deposition
Molybdenum oxide Chemical vapor deposition of Al,O, films using highly volatile single
Iteratively derived optical constants of MoO, polycrystalline thin sources, 222
films prepared by CVD, 39 Oxides
Monolayers Iteratively derived optical constants of MoO, polycrystalline thin
Molecular structure of dipalmitoylphosphatidylcholine Langmuir films prepared by CVD, 39
Blodgett monolayers studied by atomic force microscopy, 327 Oxygen
Monte-Carlo simulation Study of the influence of oxygen on the composition of thin films
Monte-Carlo simulation of mixed multilayer adsorption, 344 obtained by r.f. sputtering from a Ca.(PO,),OH target, 191
Multilayer PECVD
Monte-Carlo simulation of mixed multilayer adsorption, 344 ITO surface ball formation induced by atomic hydrogen in PECVD
Multilayers and HW-CVD tools, 123
Durable giant magnetoresistive sensors using Co/Cu superlattices, Phase transitions
333 Transmission electron microscopic studies of ternary FeNi-—silicide
Interdiffusion in CoN /CN soft X-ray multilayer mirrors, 278 layers prepared by metal vapour vacuum arc ion implantation, 196
Preparation and structure of lanthanum stearate films, 323 Physical vapour deposition (PVD)
Nanoindentation Texture development of evaporated nickel films on molybdenum
A ‘hydrostatic core’ model of elastic deformations in an indented substrates, 170
film /substrate system, 78 Plasma etching
Nanoindentation of amorphous aluminum oxide films. II. The influ Plasma etching and patterning of CVD diamond at < 100°C for
ence of the substrate on the elastic properties, 70 microelectronics applications, 245
Nanostructure Plasma processing and deposition
Quantum size effect does not yield photoluminescence in nanometer Axial distribution of emission and rate of deposition of diamond-like
silicon crystals, 353 film in r.f. discharges in CH,, 136
Subject Index of Volume 304
Characterization of electron cyclotron resonance source plasma for Silicon nitride
etching and deposition, 294 Nanostructure and local chemical composition of AIN—Si,N, layers
Structural and optical properties of amorphous hydrogenated fluori grown by LPCVD, 256
nated carbon films produced by PECVD, 149 Single crystal diamond etching
Polycarbozole Plasma etching and patterning of CVD diamond at < 100°C fr or
Comparison of polycarbazole obtained by oxidation of carbazole microelectronics applications 245
either in solution or in thin film form, 48
Polycrystalline properties of SnO, thin films prepared by the sol
Study of a polycrystalline Ni/Cr alloy V. Hydrogen-atom exposure 339
) ;
Thin pyrite (FeS,) films by molecular beam deposition, 178 ganic vapor deposition of YSZ electrolyte layers for solid
Polymer thin films oxide fuel cell applications, 106
4 real-time poling approach for preparing second-order nonlinear Soft X-ray
optical polymer thin films, 299 Interdiffusion in CoN /CN soft X-ray multilayer mirrors, 278
Post—doping Solar sele e surfaces
Comparison of the properties of 1odine-doped poly( N-vinylcarbazole) Laser-ablation Fourier-transform mass spectrometry of films based on
(PVK) thin films obtained by evaporation of pure powder fol ous hydrogenated carbon, 130
lowed by iodine post-deposition doping and iodine pre-doped
powder, 16 properties of SnO, thin films prepared by the sol—gel
Pre—doped powder 449
Comparison of the properties of iodine-doped poly( N-vinylicarbazole) Solutior
(PVK) thin films obtained by evaporation of pure powder fol Comparison of polycarbazole obtained by oxidation of carbazole
lowed by iodine post-deposition doping and iodine pre-doped itt solution or in thin film form, 48
powder 16 Sputterir
Pulsed laser evaparation An XRD study of highly textured HfN films, 286
Growth of CdMnS films by pulsed laser evaporation, 28 Growt! ructural characteristics and magnetoresistance in La—Ca
Pyrolysis Mr O thin films prepared by dc magnetron sputtering, 386
Deposition of LiTaO, thin films by pyrosol process, 239 Stud the influence of oxygen on the composition of thin films
Quantum well sd by r.f. sputtering from a Ca.(PO,),OH target, 191
Regenerative switching phenomenon of a graded Ga Strain
GaAs /GaAs heterostructure, 201 liffraction (XRD) study of vapor deposited gold thin films
Radioactive tracer techniques num nitride (AIN) substrates, 229
Lateral self-diffusion of selenium in CulnSe, thin films, 365
Raman scattering tudy of highly textured HfN films, 286
Quantum size effect does not yicn photoluminescence in nanometer
silicon crystals, 353 ictural characteristics and magnetoresistance in La—Ca
Raman spectroscopy O thin films prepared by dc magnetron sputtering, 386
Determination of the orientation of CuPc film by Raman Superconductor thin film
roscopy 166 Growth phenomena of Bi,Sr,CaCu,O, thin films deposited on
Regenerative loop feedback oriented SrTiO, substrates
Regenerative switching phenomenon tof
GaAs /GaAs heterostructure, 20 ymposition and crystalline structure of SnO, thin films
Residual stress as sensors, | 13
Effect of microstructure on the wear behaviour » thin film
61 sional morphological instabilities in chemical vapor de
Second harmonic generation (SHG) ims. 471
A real-time poling approach preparing second-order nonlinear y
optical polymer thin films omposition and crystalline structure of SnO, thin films
Segregation as sensors, 113
Lateral self-diffusion of selenium in CulnSe, thin films, 365 nsional morphological instabilities in chemical vapor de
Semiconductors films, 371
Properties and mechanism study of loped SnO,, thin films as H,S
sensors 3 Molecular structure of dipalmitoylphosphatidyicholine Langmui
Sensors tt monolayers studied by atomic force microscopy, 327
Chemical composition and crystalline structure of SnO, thin films Tantalun
used aS gas sensors 13 Tantalum plasma etching with minimum effect on underlying nickel
Durable giant magnetoresistive sensors using Co /( u superlattice
333 Therma
Magnetoresistance of granular ferromagnet—insulator films, 319 X-1 hoton and thermal effects on trimethylsilane covered Sil 100)
Two-component phthalocyanine films: impedance study, 36 i 160
Silicides
Transmission electron microscopic studies of ternary FeNi-—silicide of polycarbazole obtained by oxidation of carbazole
layers prepared by metal vapour vacuum arc ion implantation, 196 solution or in thin film form, 48
Silicon on and characterization of MgF, thin film by a trifluoroacetic
Changes in photoluminescence behaviour and structure of porous acid method, 252
silicon related to preparation conditions and laser irradiation, 358 Thin solid films
Quantum size effect does not yield photoluminescence in nanometer Thin solid film sample preparation by a small-angle cleavage for
silicon crystals, 353 mission electron microscopy, 157
398 Subject Index of Volume 304
Tin oxide Wear
Chemical composition and crystalline structure of SnO, thin films Effect of microstructure on the wear behaviour of Fe-—-Co thin films
used as gas sensors, 113 6!
Properties and mechanism study of Ag doped SnO, thin films as H,S X-ray absorption
sensors, 13 A surface EXAFS study of thin nickel deposits on (110) TiO
The characterization of undoped SnO, thin film grown by reactive surfaces, 267
ion-assisted deposition, 85 X-ray diffraction
Titanium An XRD study of highly textured HfN films, 286
High aspect ratio contacts: A review of the current tungsten plug Crystallisation of thin anatase coatings on muscovite, 204
process, | Deposition of LiTaO, thin films by pyrosol process, 239
Titanium oxide Growth, structural characteristics and magnetoresistance in La—Ca
A surface EXAFS study of thin nickel deposits on (110) TiO Mn-—O thin films prepared by dc magnetron sputtering, 386
surfaces, 267 Preparation and structure of lanthanum stearate films, 323
Crystallisation of thin anatase coatings on muscovite, 204 Texture development of evaporated nickel films on molybdenum
Transmission electron microscopy (TEM) substrates, 170
An X-ray diffraction (XRD) study of vapor deposited gold thin films X-ray line broadening
on aluminum nitride (AIN) substrates, 229 An X-ray diffraction (XRD) study of vapor deposited gold thin films
Transmission electron microscopy on aluminum nitride (AIN) substrates, 229
Thin solid film sample preparation by a small-angle cleavage for X-ray photoelectron spectroscopy
transmission electron microscopy, 157 Structural and optical properties of amorphous hydrogenated fluori
Transmission electron microscopic studies of ternary FeNi-—silicide nated carbon films produced by PECVD, 149
layers prepared by metal vapour vacuum arc ion implantation, 196 X-ray photon
Transmittance X-ray photon and thermal effects on trimethylsilane covered Si( 100)
Preparation and characterization of MgF, thin film by a trifluoroacetic surfaces, 160
acid method, 252 XRD
Trifluoroacetic acid Growth phenomena of Bi,Sr,CaCu,O,,, thin films deposited on
Preparation and characterization of MgF, thin film by a trifluoroacetic (110) oriented SrTiO, substrates 212
acid method, 252 [TO surface ball formation induced by atomic hydrogen in PECVD
Tungsten and HW-CVD tools, 123
High aspect ratio contacts: A review of the current tungsten plug X-ray diffraction (XRD)
process, | Growth of CdMnS films by pulsed laser evaporation, 28
Tungsten oxide YSZ
Optical and electrochemical characteristics of sol-gel deposited tung Metal—organic vapor deposition of YSZ electrolyte layers for solid
sten oxide films: a comparison, 310 oxide fuel cell applications, 106