Table Of Content

QZAY ‘ ia) re ELSE34 VI4EN4 R Thin Solid Films 280 (1996) 285 Author Index of Volume 280 Acharya, H.N., 20 Hacke, M., 107 McAleese, J., 152 Sitter, H., 83 Adamik, M., 5 Hodes, G., 86 McKenzie, D.R., 95 Skripka, S.V., 211 Afonso, C.N., 278 Hynninen, P.H., 244 Melekh, B.T., 163 Slangen, M.H.J., 136 Al-Shareef, H.N., 265 Moore, J.F., 101 Sreemany, M., 167 An, J.Y., 115 Ishikawa, A., 233 Moser, J.H., 67 Stambolova, I., 112 Anis, M.K., 262 Islam, M.N., 20 Stankiewicz, B., 178 Asim, H., 262 Nakamura, K.-I., 238 Starbov, N., 278 Janéa, J., 26 Neerinck, D.G., 136 Steele, B.C.H., 152 Ballif, C., 67 Jeong, B.S., 115 Nesheva, D., 51 Stifter, D., 83 Barna, P.B., 5 Jing, C., 90 Neumann-Spallart, M., 86 Stritzker, B., 147 Baxendale, M., 117 Jou, S., 256 Niwa, T., 233 Strongin, D.R., 101 Bay, H.L., 107 Sugai, K., 142 Bollmeier, T., 147 Kaiser, U., 5 Ohki, Y., 117 Borgmann, D., 171 Kang, J.-K., 43 Ohlidal, I., 26 Takahashi, M., 124 Khalifa, M., 56 Ohtsuka, T., 124 Briickner, W., 227 Tang, W., 221 Brunel, M., 56 Khan, M.S., 262 Okabayashi, H., 142 Tauber, A.Y., 244 Bunshah, R.F., 256 Khrustalev, A.B., 211 Ollacarizqueta, M.A., 278 Thomy, A., 61 Kikuchi, R., 117 Ong, C.W., 1 Tkachenko, N.V., 244 Kim, D.S., 204 Ota, E., 117 Cameron, D.C., 221 Troisi, L., 249 Kim, T.W., 115 Carpio, R.A., 37 Tsang, Y.C., 1 Kingon, A.1., 265 Padiou, J., 76 Chan, P.W., | Tsuchida, T., 124 Kishida, S., 142 Park, H.L., 115 Chen, H.C., 188 Tsujii, Y., 238 Knuth, Th., 227 Park, Y.-B., 43 Chen, X., 265 Konstantinov, K., 112 Parsons, R.R., 130 Choi, J.C., 115 Ushio, Y., 233 Kools, J.C.S., 136 Perrin, A., 76 Chopra, K.L., 20 Kosinova, M.L., 16 Pfender, E., 188 Choy, C.L., | Kotelyanskii, I.M., 163 Plakatouras, J.C., 152 Valli, L., 249 Clarke, G.A., 130 Koumoto, K., 160 Ponomarev, E.A., 86 Velitchko, T.V., 211 Czerwinski, F., 199 Kovacheva, D., 112 Vinzelberg, H., 227 Kravchenko, V.B., 163 Rauschenbach, B., 147 Dahman, H., 56 Kuwabara, K., 160 Regula, M., 67 Wallace, W.E., 37 Dauscher, A., 61 Kuznetsov, F.A., 16 Reiss, G., 227 Wang, T.M., 90 De Veirman, A.E.M., 136 Rella, R., 249 Wang, W.J., 90 Dikaev, Yu.M., 163 Laux, S., 5 Remy, M., 183 Wedler, G., 171 Dimitrov, D., 278 Lee, J.H., 204 Rezig, B., 56 Wu, W.L., 37 Doerr, H.J., 256 Lee, Y.H., 204 Rhee, S.-W., 43 Donchev, T., 112 Lemmetyinen, H., 244 Richter, W., 5 Xie, Y., 130 Lévy, F., 67 Rijks, Th.G.S.M., 136 Easwarakhanthan, T., 183 Lévy-Clément, C., 86 Rossel, C., 76 Edelmann, J., 227 Lichtenwalner, D.J., 265 Riihrnschopf, K., 171 Yin, Y., 95 Eldridge, J.E., 130 Liu, S.-G., 271 Rumyantsev, Yu.M., 16 Yoshimoto, T., 238 Yoshimura, S., 117 Liu, Y.-Q., 271 Yudasaka, M., 117 Fainer, N.I1., 16 Luzanov, V.A., 163 Safran, G., 5 Yukawa, T., 160 Farouk, B., 204 Salman, E.G., 16 Manno, D., 249 Scherrer, H., 61 Galkin, N.G., 211 Mantl, S., 107 Schweitzer, D., 147 Zajitkova, L., 26 Ghosh, T.B., 20, 167 Matsui, T., 117 Sergent, M., 76 Zhao, X.-A., 1 Guilloux-Viry, M., 76 Matsumoto, M., 238 Shinzawa, T., 142 Zhu, D.-B., 271 Elsevier Science S.A. SPP AG ELSEVIER Thin Solid Films 280 (1996) 287-290 Subject Index of Volume 280 Alkali halides Chemical vapour deposition (CVD) electronic properties of the Ge/RbF/GaAs system: the effect of the ultrathin silicon oxide films deposited by synchrotron irradiation of RbF intralayer, 178 condensed layers of silanes and water, 101 Alloys Chromium in-situ measurement of stress generated during electrocrystallization of semiconducting and structural properties of CrSi, A-type epitaxial Fe-Ni alloys, 199 films on Si(111), 211 degradation of NiCr/CuNiMn/NiCr films on alumina substrates, 227 Coatings Aluminium implantation effect of diamond-like carbon films by 110 keV nitrogen titanium-containing hydrofluoric acid pretreatment for aluminum ions, 90 chemical vapor deposition, 142 microstructure of plasma-sprayed Ni—Al alloy coating on mild steel, Amorphous carbon 188 a theory for the formation of tetrahedral amorphous carbon including in-situ measurement of stress generated during electrocrystallization of deposition rate effects, 95 Fe-Ni alloys, 199 Amorphous materials Computer simulation mechanical properties of a-C:H and a-C:H/SiO, nanocomposite thin the infrared properties of magnetron-sputtered diamond-like thin films, films prepared by ion-assisted plasma-enhanced chemical vapor 130 application of Rachinger’s method to separate overlapped doublets in deposition, 204 the X-ray photoelectron spectrum, 167 amorphous semiconducting film containing nanometer particles of Conductivity CuTCNQ: preparation, characterization and electrical switching the effect of the isopoly tungstate anion on the composition and property, 271 conductivity of polypyrrole composite films, 124 crystallization kinetics of Sb,Se,o9_, thin films, 278 Contacts low frequency dispersion in GaSe thin films, 262 Copper Cadmium selenide electrodeposition of CulnS, from aqueous solution. Part I. Electro- photoconductivity and recombination in amorphous Se/CdSe multi- deposition of Cu—S film, 160 layers, 51 Cadmium sulphide growth of PbS and CdS thin films by low-pressure chemical vapour Deposition process deposition using dithiocarbamates, 16 growth structure investigation of MgF, and NdF, films grown by Carbon nitride molecular beam deposition on CaF,(111) substrates, 5 effects of substrate temperature on the structure and properties of effect of NzO/SiH, ratio on the properties of low-temperature silicon reactive pulsed laser deposited CN, films, 1 oxide films from remote plasma chemical vapour deposition, 43 Ceramics electrochemical deposition of MoS, thin films by reduction of the use of Ce( fod), as a precursor for the growth of ceria films by tetrathiomolybdate, 86 metal—organic chemical vapour deposition, 152 a theory for the formation of tetrahedral amorphous carbon including Cerium deposition rate effects, 95 deposition of CeO, films including areas with the different orientation electrodeposition of CulnS, from aqueous solution. Part I. Electro- and sharp border between them, 163 deposition of Cu—S film, 160 Chalcogens deposition of CeO, films including areas with the different orientation structural, chemical, and electrical characterisation of reactively and sharp border between them, 163 sputtered WS, thin films, 67 in-situ measurement of stress generated during electrocrystallization of Chemical vapor deposition Fe-Ni alloys, 199 graphite formation on Ni film by chemical vapor deposition, 117 Depth profiling Chemical vapour deposition chemical—mechanical polishing of SiO, thin films studied by X-ray chemical—mechanical polishing of SiO, thin films studied by X-ray reflectivity, 37 reflectivity, 37 Diamond effect of N.O/SiH, ratio on the properties of low-temperature silicon a theory for the formation of tetrahedral amorphous carbon including oxide films from remote plasma chemical vapour deposition, 43 deposition rate effects, 95 titanium-containing hydrofluoric acid pretreatment for aluminum the infrared properties of magnetron-sputtered diamond-like thin films, chemical vapor deposition, 142 130 the use of Ce( fod), as a precursor for the growth of ceria films by electron emission characterization of diamond thin films grown from a metal—organic chemical vapour deposition, 152 solid carbon source, 256 Elsevier Science S.A. 288 Subject Index of Volume 280 / Thin Solid Films 280 (1996) 287-290 Dielectric properties Hardness low frequency dispersion in GaSe thin films, 262 mechanical properties of a-C:H and a-C:H/SiO, nanocomposite thin films prepared by ion-assisted plasma-enhanced chemical vapor deposition, 204 Electrical conductivity effects of substrate temperature on the structure and properties of Indium phosphide reactive pulsed laser deposited CN, films, 1 site symmetry of Yb** in Ing sGap sP, 115 Electrical properties and measurements Infrared spectroscopy degradation of NiCr/CuNiMn/NiCr films on alumina substrates, 227 the infrared properties of magnetron-sputtered diamond-like thin films, electron emission characterization of diamond thin films grown from a 130 solid carbon source, 256 Insulators Electrochemistry electronic properties of the Ge/RbF/GaAs system: the effect of the electrochemical deposition of MoS, thin films by reduction of RDF intralayer, 178 tetrathiomolybdate, 86 Interfaces the effect of the isopoly tungstate anion on the composition and effect of N.O/SiH, ratio on the properties of low-temperature silicon conductivity of polypyrrole composite films, 124 oxide films from remote plasma chemical vapour deposition, 43 electrodeposition of CulnS, from aqueous solution. Part I. Electro- electronic properties of the Ge/RbF/GaAs system: the effect of the deposition of Cu—S film, 160 RDF intralayer, 178 in-situ measurement of stress generated during electrocrystallization of microstructure of plasma-sprayed Ni—Al alloy coating on mild steel, Fe-Ni alloys, 199 188 electroluminescent zinc sulphide devices produced by sol-gel Ion implantation processing, 221 implantation effect of diamond-like carbon films by 110 keV nitrogen degradation of the electrochromic nickel oxide film upon redox ions, 90 cycling, 233 IR absorption Electronic devices effects of substrate temperature on the structure and properties of amorphous semiconducting film containing nanometer particles of reactive pulsed laser deposited CN, films, 1 CuTCNQ: preparation, characterization and electrical switching Iron property, 271 iron pyrite films prepared by sulfur vapor transport, 56 Electron microscopy growth of Fe on Si (100) at room temperature and formation of iron structural, chemical, and electrical characterisation of reactively silicide, 171 sputtered WS, thin films, 67 Ellipsometry Langmuir—Blodgett films comparison between newly developed and classical determinations of a trough with radial compression for studies of monolayers and index and thickness of thin films on substrates by ellipsometry, 183 fabrication of Langmuir—Blodgett films, 238 Epitaxy photoinduced energy and electron transfer of covalently linked epitaxially grown molybdenum thin films deposited by laser ablation zinc(II)-pyropheophytin-anthraquinone molecules in mono- on (100)MgoO substrates, 76 layers of Langmuir—Blodgett films, 244 thickness correlated effects of the crystal and surface structure of C, Langmuir—Blodgett films of Cu(II) -tetrakis(3,3-dimethylbutoxy- thin films grown on mica by hot wall epitaxy, 83 carbonyl!) phthalocyanine: a spectrophotometric and TEM analysis twinning of YBa,Cu,O, thin films on different substrates, 147 of their structure and morphology, 249 deposition of CeO, films including areas with the different orientation Laser ablation and sharp border between them, 163 pulsed laser deposition of Bi,Te, thin films, 61 semiconducting and structural properties of CrSi, A-type epitaxial epitaxially grown molybdenum thin films deposited by laser ablation films on Si(111), 211 on (100)MgoO substrates, 76 twinning of YBa,Cu,O, thin films on different substrates, 147 Luminescence Fourier transform infrared spectroscopy electroluminescent zinc sulphide devices produced by sol-gel implantation effect of diamond-like carbon films by 110 keV nitrogen processing, 221 ions, 90 Fullerenes Metallization thickness correlated effects of the crystal and surface structure of C,, analysis of the oxidation kinetics and barrier layer properties of ZrN thin films grown on mica by hot wall epitaxy, 83 and Pt/Ru thin films for DRAM applications, 265 Mica thickness correlated effects of the crystal and surface structure of Cy Gallium thin films grown on mica by hot wall epitaxy, 83 site symmetry of Yb** in Ing ;<Gay <P, 115 Molecular beam epitaxy Galliun selenide MBE growth and characterization of buried silicon oxide films on low frequency dispersion in GaSe thin films, 262 Si( 100), 107 Graphite Molybdenum graphite formation on Ni film by chemical vapor deposition, 117 epitaxially grown molybdenum thin films deposited by laser ablation growth mechanism on (100)MgoO substrates, 76 ultrathin silicon oxide films deposited by synchrotron irradiation of Molybdenum disulphide condensed layers of silanes and water, 101 electrochemical deposition of MoS, thin films by reduction of MBE growth and characterization of buried silicon oxide films on tetrathiomolybdate, 86 Si(100), 107 Monolayers growth of Fe on Si (100) at room temperature and formation of iron a trough with radial compression for studies of monolayers and silicide, 171 fabrication of Langmuir—Blodgett films, 238 Subject Index of Volume 280 / Thin Solid Films 280 (1996) 287-290 289 photoinduced energy and electron transfer of covalently linked mechanical properties of a-C:H and a-C:H/SiO, nanocomposite thin zinc( II)-pyropheophytin-anthraquinone molecules in mono- films prepared by ion-assisted plasma-enhanced chemical vapor layers of Langmuir—Blodgett films, 244 deposition, 204 Multilayers electron emission characterization of diamond thin films grown from a photoconductivity and recombination in amorphous Se/CdSe multi- solid carbon source, 256 layers, 51 Polymers the effect of the isopoly tungstate anion on the composition and Nanostructures conductivity of polypyrrole composite films, 124 growth structure investigation of MgF, and NdF; films grown by molecular beam deposition on CaF,(111) substrates, 5 Raman scattering mechanical properties of a~-C:H and a-C:H/SiO, nanocomposite thin implantation effect of diamond-like carbon films by 110 keV nitrogen films prepared by ion-assisted plasma-enhanced chemical vapor ions, 90 deposition, 204 Reaction kinetics electron emission characterization of diamond thin films grown from a analysis of the oxidation kinetics and barrier layer properties of ZrN solid carbon source, 256 and Pt/Ru thin films for DRAM applications, 265 Nickel Reactive pulsed laser deposition graphite formation on Ni film by chemical vapor deposition, 117 effects of substrate temperature on the structure and properties of Nickel oxide reactive pulsed laser deposited CN, films, 1 degradation of the electrochromic nickel oxide film upon redox cycling, 233 Scanning electron microscopy new LaCuy sMnp ;O; thin films deposited by the sol-gel process on Optical properties different substrates, 112 plasma-enhanced chemical vapour deposition of thin films from tetra- Selenides ethoxysilane and methanol: optical properties and XPS analyses, photoconductivity and recombination in amorphous Se/CdSe multi- 26 layers, 51 iron pyrite films prepared by sulfur vapor transport, 56 crystallization kinetics of Sb,Sejo9_ , thin films, 278 degradation of the electrochromic nickel oxide film upon redox Semiconductors cycling, 233 iron pyrite films prepared by sulfur vapor transport, 56 Optical spectroscopy electrochemical deposition of MoS, thin films by reduction of Langmuir—Blodgett films of Cu(II) -tetrakis(3,3-dimethylbutoxy- tetrathiomolybdate, 86 carbonyl) phthalocyanine: a spectrophotometric and TEM analysis site symmetry of Yb** in Ing; Gap5P , 115 of their structure and morphology, 249 electronic properties of the Ge/RbF/GaAs system: the effect of the Optical transmission RDF intralayer, 178 effects of substrate temperature on the structure and properties of semiconducting and structural properties of CrSi, A-type epitaxial reactive pulsed laser deposited CN, films, 1 films on Si(111), 211 Organic substances Silicides photoinduced energy and electron transfer of covalently linked growth of Fe on Si (100) at room temperature and formation of iron zinc(II)-pyropheophytin-anthraquinone molecules in mono- silicide, 171 layers of Langmuir—Blodgett films, 244 Silicon amorphous semiconducting film containing nanometer particles of semiconducting and structural properties of CrSi, A-type epitaxial CuTCNQ: preparation, characterization and electrical switching films on Si( 111), 211 property, 271 Silicon oxide Oxidation chemical—mechanical polishing of SiO, thin films studied by X-ray analysis of the oxidation kinetics and barrier layer properties of ZrN reflectivity, 37 and Pt/Ru thin films for DRAM applications, 265 effect of NxO/SiH, ratio on the properties of low-temperature silicon Oxides oxide films from remote plasma chemical vapour deposition, 43 new LaCuy ;Mny ;O; thin films deposited by the sol-gel process on ultrathin silicon oxide films deposited by synchrotron irradiation of different substrates, 112 condensed layers of silanes and water, 101 the use of Ce( fod), as a precursor for the growth of ceria films by MBE growth and characterization of buried silicon oxide films on metal—organic chemical vapour deposition, 152 Si(100), 107 Solid electrolyte interface Phase transitions the use of Ce( fod), as a precursor for the growth of ceria films by crystallization kinetics of Sb,Sej99_, thin films, 278 metal-organic chemical vapour deposition, 152 Photoconductivity Sputtering photoconductivity and recombination in amorphous Se/CdSe multi- structural, chemical, and electrical characterisation of reactively layers, 51 sputtered WS, thin films, 67 Photothermal deflection spectroscopy the infrared properties of magnetron-sputtered diamond-like thin films, effects of substrate temperature on the structure and properties of 130 reactive pulsed laser deposited CN, films, | grain size and strain in thin sputter-deposited Nip gFe, » and Cu films, Plasma processing and deposition 136 growth of PbS and CdS thin films by low-pressure chemical vapour degradation of the electrochromic nickel oxide film upon redox deposition using dithiocarbamates, 16 cycling, 233 plasma-enhanced chemical vapour deposition of thin films from tetra- analysis of the oxidation kinetics and barrier layer properties of ZrN ethoxysilane and methanol: optical properties and XPS analyses, and Pt/Ru thin films for DRAM applications, 265 26 Stress microstructure of plasma-sprayed Ni—Al alloy coating on mild steel, in-situ measurement of stress generated during electrocrystallization of 188 Fe-Ni alloys, 199 290 Subject Index of Volume 280 / Thin Solid Films 280 (1996) 287-290 degradation of NiCr/CuNiMn/NiCr films on alumina substrates, 227 Langmuir—Blodgett films of Cu(II) -tetrakis(3,3-dimethylbutoxy- Structural properties carbonyl) phthalocyanine: a spectrophotometric and TEM analysis grain size and strain in thin sputter-deposited Nip gFep and Cu films, of their structure and morphology, 249 136 Transmission electron microscopy (TEM) twinning of YBa,Cu,O, thin films on different substrates, 147 growth structure investigation of MgF, and NdF; films grown by semiconducting and structural properties of CrSi, A-type epitaxial molecular beam deposition on CaF,(111) substrates, 5 films on Si(111), 211 Tungsten degradation of NiCr/CuNiMn/NiCr films on alumina substrates, 227 structural, chemical, and electrical characterisation of reactively Langmuir—Blodgett films of Cu(II) -tetrakis(3,3-dimethylbutoxy- sputtered WS, thin films, 67 carbonyl) phthalocyanine: a spectrophotometric and TEM analysis Tungsten oxide of their structure and morphology, 249 the effect of the isopoly tungstate anion on the composition and crystallization kinetics of Sb,Sejo9_, thin films, 278 conductivity of polypyrrole composite films, 124 Sulphides X-ray diffraction growth of PbS and CdS thin films by low-pressure chemical vapour effects of substrate temperature on the structure and properties of deposition using dithiocarbamates, 16 reactive pulsed laser deposited CN, films, | electrodeposition of CulnS, from aqueous solution. Part I. Electro- growth of PbS and CdS thin films by low-pressure chemical vapour deposition of Cu-—S film, 160 deposition using dithiocarbamates, 16 electroluminescent zinc sulphide devices produced by sol—gel XPS and X-ray diffraction studies of aluminum-doped zinc oxide processing, 221 transparent conducting films, 20 Sulphur pulsed laser deposition of Bi,Te, thin films, 61 iron pyrite films prepared by sulfur vapor transport, 56 new LaCuy ;sMny ;O; thin films deposited by the sol-gel process on a trough with radial compression for studies of monolayers and different substrates, 112 fabrication of Langmuir—Blodgett films, 238 grain size and strain in thin sputter-deposited Nig gFe, 2 and Cu films, Surface composition 136 pulsed laser deposition of Bi,Te, thin films, 61 twinning of YBa,Cu,O, thin films on different substrates, 147 application of Rachinger’s method to separate overlapped doublets in X-ray emission the X-ray photoelectron spectrum, 167 application of Rachinger’s method to separate overlapped doublets in Surface defects the X-ray photoelectron spectrum, 167 deposition of CeO, films including areas with the different orientation X-ray photoelectron spectroscopy and sharp border between them, 163 effects of substrate temperature on the structure and properties of Surface morphology reactive pulsed laser deposited CN, films, 1 new LaCuy ;sMng ;O; thin films deposited by the sol-gel process on XPS and X-ray diffraction studies of aluminum-doped zinc oxide different substrates, 112 transparent conducting films, 20 titanium-containing hydrofluoric acid pretreatment for aluminum plasma-enhanced chemical vapour deposition of thin films from tetra- chemical vapor deposition, 142 ethoxysilane and methanol: optical properties and XPS analyses, Surface pressure 26 a trough with radial compression for studies of monolayers and application of Rachinger’s method to separate overlapped doublets in fabrication of Langmuir—Blodgett films, 238 the X-ray photoelectron spectrum, 167 Surface roughness X-ray photoelectron spectroscopy (XPS) chemical—mechanical polishing of SiO, thin films studied by X-ray ultrathin silicon oxide films deposited by synchrotron irradiation of reflectivity, 37 condensed layers of silanes and water, 101 Surface structure growth of Fe on Si (100) at room temperature and formation of iron thickness correlated effects of the crystal and surface structure of Ceo silicide, 171 thin films grown on mica by hot wall epitaxy, 83 Ytterbium site symmetry of Yb** in Ing ;Gag 5P, 115 Tellurium pulsed laser deposition of Bi,Te; thin films, 61 Zinc Titanium electroluminescent zinc sulphide devices produced by sol-gel titanium-containing hydrofluoric acid pretreatment for aluminum processing, 221 chemical vapor deposition, 142 photoinduced energy and electron transfer of covalently linked Transmission electron microscopy zinc(I1)-pyropheophytin-anthraquinone molecules in mono- grain size and strain in thin sputter-deposited Nig ,Fe, » and Cu films, layers of Langmuir—Blodgett films, 244 136 Zinc oxide microstructure of plasma-sprayed Ni—Al alloy coating on mild steel, XPS and X-ray diffraction studies of aluminum-doped zinc oxide 188 transparent conducting films, 20