Table Of Content

SURFACE AND INTERFACE ANALYSIS, VOL. 25, 989-991 (1997) Author Index to Volume 25 Abbate, M. Demortier, G. Haigh, S. 335 Adnot, A. Deurinck, P. Hammer, P. 301, 629 Albella, J. M. Deus, C. Hasche, K. 606 Alexander, M. R. D’Huysser, A. Hearn, M. J. 261 Algra, E. Dickmann, K. Held, N. 483 Alkemade, P. F. A. 275, 285, Dittmar, H. Herrero, P. 677, 896 Ashwin, M. J. Downing, R. G. Hesjedal, T. 569 Drechsler, D. Hildebrandt, M. 510 Baalmann, A. Drzal, L. T. Hinton, B. R. W. 223 Baker, M. A. Dubbe, A. Hjertson, L. 105 Balkanski, M. Duguet, E. Hoffmann, S. 614 Baltrus, J. P. Dunlop, H. M. Hollricher, O. 492 Bangert, J. Dupuy, J. C. Holubka, J. W. 643 Barger, Jr, W. R. Hucek, S. 683 Barkshire, I. R. Eddrief, M. Hughes, A. E. 223 Barthel, J. Eggers, G. Hiittl, G. 543 Baunack, S. El Gomati, M. M. Bendjus, B. Elsaesser, T. Ichimura, S. 88 Benmalek, M. Espinos, J. P. Idla, K. 837 Bennett, J. Evans, S. limura, K.-I. 650 Benoit, W. Ives, M. 191 Bertrand, P. Fargues, D. Iwai, H. Beszeda, I. Fernandez, A. 292, 707, Beyer, D. Fierro, J. L. G. Jablonski, A. 119, 356, 404, 688 Bhattacharya, A. K. Fischer, D. Jackson, A. R. Bienias, M. Fletcher, I. W. Jacobsson, S. P. Bietsch, A. Forsén, O. Jafri, Z. H. Bischoff, G. Franzreb, K. Jain, V. Bohley, C. Frohlich, H.-J. Jersch, J. Bradt, J. Fuchs, H. Jeynes, C. Braz Fernandes, F. M. Fulghum, J. E. Jiang, Z.-X. Briggs, D. 167, 261, Fumagalli, P. Jiménez, C. Brojerdi, G. Jiménez, V. M. Briickl, H. 496, Galan, L. Brunner, R. Galuska, A. A. Kadyshevitch, A. Burrell, M. C. Gao, S. Kaliaguine, S. Butcher, K. S. A. Garland, N. L. Karbach, A. Gautier, B. Kargov, S. Caballero, A. Gengenbach, T. R. Kasim, S. Carter, G. Gerardi, C. Kato, T. Casalis, L. GeuB, M. Kautek, W. Cassinelli, C. Geus, J. W. Kelling, S. Cavani, F. Gijzeman, O. L. J. Kempter, V. Chao, H. S.-I. Giuntoli, F. Kenny, P. G. Chatelier, R. C. Gland, J. L. Kimber, A. C. Chen-Mayer, H. Gnaser, H. Kingshott, P. Chilla, E. Gomez, P. Kinski, J. Clarke, A. H. Gonzalez-Elipe, A.R. 292, 707, Kiridena, W. Coronado, J. M. Gonzalez-Velasco, J. Kirstein, S. Creemers, C. Gorbunoy, A. A. Kiskinova, M. Cserhati, C. Goto, K. Kittler, M. Cumpson, P. J. 341, 430, Gregoratti, L. Klein, A. Greulich, K.-O. Konkol, A. Danoix-Souchet, R. Griesser, H. J. Krawczyk, M. Darmstadt, H. Groff, G. B. Kretz, L. Dastoor, P. Guerrero-Lemus, R. Kriiger, D. Davies, M. C. Guo, H. Kubalek, E. Davis, G. D. Kuchar, F. de Bernabé, A. Hafner, S. Kudo, M. Demming, F. Hagenhoff, B. Kulik, A. J. © 1997 John Wiley & Sons, Ltd. 990 K. STOEV, J. KNOTH AND H. SCHWENKE Kuo, P: K. Najmi, O. 94 Schonhoff, M. Kiippers, J. Nakamura, K. 88 Schopke, A. Kurokawa, A. Neumann, M. 823 Schreiber, J. Niemi, H. E.-M. 837 Schwank, J. W. Labrugeére, C. Noll, H. 529 Seah, M. P. Lamaze, G. P. N6tzel, R. 583 Seemann, R. Lambacher, A. Seki, S. Lambrakos, S. G. Ohrlund, A. 105 Sewing, A. Langland, J. K. Oiwa, R. 202 Sherwood, P. M. A. Larson, P. E. Oku, M. 161 Shimizu, R. Lassaletta, G. Oswald, S. Short, R. D. Leeson, A. M. Silva, R. J. Lehmberg, C. Paparazzo, E. Skinner, D. K. Leibiger, G. Papp, H. Soriano, L. Lesiak, B. Paufier, P. Sotnik, N. Lewis, D. B. Pearson, P. Sproul, W. D. La xX. Penn, D. R. Srinivasan, S. Lienau, C. Pérez-Casero, R. St John, H. A. W. Liess, H.-D. Pérez-Rigueiro, J. Stavrev, M. Lindau, S. Peterson, G. S. Stipp, S. L. S. Liu, G.-Y. Pippan, M. Stribley, K. Lochner, B. Pleschinger, A. Sumiya, H. Lohr, F. Ploog, K. H. Siimmchen, L. Lopez Granados, M. Pompe, W. Siiptitz, M. Lopez, S. Potts, A. W. Suzuki, N. ind: <. P. Poulter, R. R. Suzuki, S. Lutz, J. Powell, C. J. Takahashi, M. Prieto, C. McElrath, K. O. Takakuwa-Hongo, C. Procop, M. McIntyre, N. S. Takeichi, Y. Prost, R. Maeckel, R. Talo, A. Prudon, G. Magtoto, N. P. Tamura, H. Prutton, M. Mahl, S. Tanaka, A. Pyke, D. R. Malherbe, J. B. Tansley, T. L. Marcos, M. L. Tanuma, S. Quintin Odendaal, R. Margaritondo, G. Taylor, K. F. Quinton, J. Markwitz, A. Taylor, R. J. Marschmeyer, S. Thiele, K. Marti, O. Radelaar, S. Thiele, U. Martinez-Duart, J. M. Ramsteiner, M. Thomas, J. Martin-Palma, R. J. Rank, R. Thomsen, L. Rechenberg, I. Matern, D. Thurgate, S. M. Mathieu, H. J. Reiss, G. Tielsch, B. J. Matthew, J. A. D. Ren, J. Tilinin, I. S. Maus-Friedrichs, W. Richardson, H. H. Titchmarsh, J. M. Medve, F. Richter, A. Tomandl, G. Meerman, T. P. Richter, H. Tomita, M. Meissner, O. Richter, J. Tomm, J. W. Meister, W.-V. Ro, C.-U. Toth, J. Mens, A. J. M. Roberts, R. H. Tougaard, S. 119, 137, 404, Rodney Diehl, J. Menyhard, M. Tourillon, G. 315, Mertesdorf, M. Roland, U. Trifiro, F. Mertig, M. Rooke, M. A. Trigo, J. F. Rosenberger, A. Mertin, W. Trzaskoma-Paulette, P. P. Mirwald, S. Roy, C. Turner, M. R. Monajembashi, S. Tyuliev, G. Monch, I. Sadaoka, Y. Montero, I. Sahre, M. Unger, E. Moreno, J. D. Saito, Y. Morra, M. Sanchez-Lopez, J. C. Vajo, J. J. Morrison, G. R. Sanz, J. M. van der Heide, P. A. W. Miller, E. Satoh, S. Vanden Eynde, X. Muto, K. Schimmel, T. Vatter, I. A. Schlett, V. Vinzelberg, H. Naaman, R. Schmitz, P. J. Viswanathan, H. 409 © 1997 John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 989-991 (1997) AUTHOR INDEX TO VOLUME 25 von Toussaint, U. Wenzel, C. Yoshihara, K. Voogt, E. H. Werrett, C. R. Yoshitake, M. Vreugdenhil, F. Wiegrabe, W. Wolf, B. Wagter, M. L. Wong, M.-S. Zahn, W. Walton, R. M. Wurster, R. Zalm, P. C. Waseda, Y. Zatorski, R. A. Webb, R. P. Xie, M. Zemek, J. Weitzsacker, C. L. Zhao, P. Wendrock, H. Yamazaki, H. Zommer, L. Weng, L. T. Ylasaari, S. Zosch, A. © 1997 John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 989-991 (1997) SURFACE AND INTERFACE ANALYSIS, VOL. 25, 992-994 (1997) Subject Index to Volume 25 A new surface analytical technique Chemical vapour-deposited silicon Escape probability of photoelectrons Abbe error Chloride ESDMS Absolute composition determination Chromium ESR Absolute spectra Chromosome EXAFS probing depth Absorption Coal Excitation depth distribution function Achromatic Coating thickness EXP Acidity Coatings Extrusion Adhesion 53, 366, 931 Cobalt Adlayer domain organization 614 Coincidence spectroscopy Factor analysis Adsorption 81, 88 Colour-PSTM Fermi edge Adventitious 924 Compensation by software Ferritic steels AES 17, 132, 137, 235, 275, 315, 335, 430, Composites FeSi, film 447, 458, 760, 827 Compound semiconductors Field-induced migration AFM 418, 488, 510, 522, 543, 650, 788, Computer simulation Film 837, 959 Confidence level Film formation Alloy 223 Contamination Fluid inclusions Alloys 356 Conversion coating Fluoride Al-Si alloy 809 Copper Focusing Aluminium 223 Copper-nickel Force measurement Aluminium nitride 99 Correlation Force modulation microscopy Aluminium oxide 390, 683 Corrosion Force sensor Aluminum 366 Coulomb blockade 611 Forster theory Amorphous films 522 Crack formation 561 Fourier spectral analysis Amorphous materials 36 Cross-talk 606 Fourier transform infrared spectroscopy 548 Amorphous silicon 529 Cu spectrum 209 Fractal dimension Amorphous solids 952 Curvature 741 FTIR Analysis 860, 924 Cyclindrical mirror analyser 17 Angle resolved XPS 99, 869 GaN Annealing 596, 747 Decay length 295 Garnet films Atomic force microscope 593 Deconvolution 464 GDOES Atomic force microscopy 383, 500, 529, 561, Dental implants 983 Ge 741, 959 Depth distribution function 341 Giemsa Atomic force microscopy/lateral force Depth profile 191, 454 Global analysis microscopy (AFM/LFM) 620 Depth profile analysis 5 Glow discharge Atomic resolution 620 Depth profiling 99, 155;:217,, 295, 339. Grazing incidence Atomic scale friction 620 458, 699, 869, 942 Attenuation length 430, 650 Depth resolution 397, 464, 966 Au-Al interdiffusion 889 Detection limits 737 High depth resolution Auger depth profile 5 Dewetting 514 High mass resolution Auger electron emission 10 Dielectric breakdown 94 High sensitivity Auger electron spectroscopy 209, 330, 356 Diffraction 202 Highly oriented pyrolytic graphite (HOPG) Auger electrons 688 Diffusion 948 620 Auger parameter 94, 292 Diffusion barriers 522 Hybridization 315, 827 Digital video disk 966 B 285 DNA 510 Imaging 335, 788, 948, 959 Backscattering 17 DVD 966 IMFP Ballistic pendulum 505 Implant Band structure 71 EAM 177 Impurity BASTIN 86 algorithm 688 EELS 235 Impurity influence Blue laser 966 Efficient Monte Carlo simulation 275 IMSP Bonding 366 Elastic compliance 383 In situ analysis Boron 217, 464 Elastic constants 324 In situ RBS Brillouin light scattering 324 Elastic peak electron spectroscopy 699 Incidence angle Buried interfaces 548 Elastic scattering 119, 404, 430, 447 Indentation Elasticity 383 Inelastic electron scattering CaCO, 959 Elastomer 418 Inelastic electron scattering cross-section Calcite 959 Electrochemical conversion 548 Infrared Calcium carbonate 959 Electrochemical corrosion 548 Infrared spectroscopy Calculated IMFP 25 Electron affinity 966 InGaAs Carbon 94,924 Electron escape depth 119 InSe Carbon black 245 Electron inelastic mean free path 25 Insulating surfaces Carbon contamination 983 Electron multiplier 209 Interface 191, 837, Carbon fiber 409 Electron take-off angle 650 Intermetallic compounds Carbon fibers 53 Electron transport 341 Ion beam bevelling Carbon monoxide 81 Electronic structure 804 Ion beam damage Carbon nitride 301, 315, 629, 827 Electron-stimulated Desorption 390 Ion bombardment 36, 111, 161, Catalyst 292 Elliptical mirror 202 Ion implantation Cesium 454 Energy calibration ThE Ion irradiation Charge compensation 295 Energy distribution 71, 202 Ion mixing Charging 904 Energy transfer 492 IR Charging effects 942 Environmental AES 390 Iron Chemical shift 161 Epoxy 53 Chemical state plot 292 ESCA 105 Karyotype © 1997 John Wiley & Sons, Ltd. SUBJECT INDEX TO VOLUME 25 993 Langmuir films 715 Parameter fitting 209 Scanning probe microscopy 611 Langmuir—Blodgett film 492, 650 Particle detection 505 Scanning tunnelling microscope 593 Laser 500 Particles 132 Scanning tunnelling microscopy 500, 596 Laser diodes 573 Partitioning 335 Scanning x-ray probe 202 Laser-interferometric calibration 606 PCA 5, 105 Scattering 71 Lateral force microscope 593 PdCl, 46 Schottky barrier 896 Layer thickness 404 Peak location 777 Second harmonic generation 88, 715 Layered material 111 Photocurrent spectroscopy 573 Secondary ion mass spectrometry 295 Layered structure 650 Photoelectron 71 Segregation 760, 809 LEIS 177 Photoelectron emission 10 Selective oxidation 667 Lever deflection 505 Photoelectron spectroscopy 823 Self-assembled monolayers 383 Light irradiation 677 Photoluminescence spectroscopy 583 Semi-conductor lasers 573 Liquid cell 543 Piezolever 505 Semiconductors 235, 583 LV-SEM 983 Piezoresistive effect 505 Separability 464 Plasma spray 366 Sequencing 1 Magnetic field mapping 533 Platinum 81, 177 SFM 510, 959 Magnetic-sector SIMS 817 PLS 105 Shear force 755 Magneto resistive 533 PMMA Si 285 Magneto-optic Faraday effect 483 Polyamide Si/Ge superlattices 324 Magnetron sputtering 488 Polycrystalline silicon Silane, y-MPS 917 Magnetron-sputtered film 5, 827 Polycrystalline thin films Silicidation 896 Material contrast 496 Polyimide Silicides 335 Measurement accuracy 254 Polymer 790, 878, 904 Silicon 88, 464, 677, 937 Metal multilayers 596 Polymer surface analysis 799 Silicon oxide 390 Metal oxide surfaces 931 Polymer toxicity 41 SIMS 105, 155, 245, 285, 295, 397, 454, Metal-containing polymer 46 Polymers 537 464, 737, 788, 790, 937, 948, 966 Methacrylate copolymers 725 Poly(methyl methacrylate) 41, 167 SIMS-ESDMS technique 155 Micro characterisation 533 Polyphenylene sulfide 53 Simulation 202, 301, 629 Microanalysis 235 Polypyrrole 837 Single crystal surfaces 177 Microscopy 496 Polystyrene 41, 878 Single electron effects 611 Migration 295 Poly(vinyl chloride) 167 SiO, 94, 295, 543 M,,5N,4.sNq,5 process 10 Polyvinylpyrrolidone 46 SNOM 510, 755 MOCVD 966 Porphyrin surface orientation 715 Sodium 959 Molecular weight 878 Potassium 161, 959 Solid electrolyte: Auger electron Molecular weight effect 261 Preferential sputtering 161 spectroscopy 352 Molecular weight effects on intensities 790 Principal component analysis 35 2, 878 Solid-state diffusion 959 Monochromatic 409 Propidium iodide 510 Spatial dependence 606 Monochromator 202 Protein adsorption 755 Spectral processing Monomeric collagen 514 PVD 315, 827 Spectrometer function Monovalent ions 959 Pyrite 64 Spectroscopy Monte Carlo calculations 688 Sputer-depth profiling Monte Carlo simulation 341 Quantification 725, 924 Sputtering Morphology , 837 Quantitative 937 Standards Multilayered structures 341 Quantitative analysis 1 Static SIMS Multilayers 741 Quantitative spectrum analysis 275 Stationary phases Multivariate 105 Quantitative surface analysis 137, 404 Statistical noise Quantum wells 397 Steamed zeolites Na 295 Quantum wires 583 Steel Nanocrystalline films 522 Quartz microbalance 548 STEM-EDX Nanoprocessing 500 Quasicrystals 561 Stick-slip processes Nanostructures 611 STM Nanotechnology 596 Raman spectroscopy 245 Sulphur enrichment in aerosols Near-field microscopy , 583 Rapid thermal annealing 896 Superlattices Near-field optics 496 RBS 254 Supermodulus effect Near-field technology 500 Recrystallization, phosphorus doping 529 Surface acoustic waves Network structures 514 REELS 137 Surface analysis Neutrons 217 Reflection 81 Surface composition NiAl 561 Regeneration of depth profiles 869 Surface conductivity Nitrogen 217 Relative ion intensities 261 Surface contamination 983 NMR 917 Replica techniques 593 Surface migration Non-linear force curve 569 Resolution 191 Surface segregation 177, 356, 747 Non-linearity of scales 606 Respirable ambient aerosol particles 970 Surface sound velocity 324 NSOM , 510 Ripple initiation 952 Surface techniques 931 Nucleic acids 614 Rocking curve 202 Surface tension 677 Nylon-6,6 799 Roughness 741 Surface thermodynamics 177 Round robin 209 Surface treatment 366 Optical emission 19] Optical ray tracing 202 Sampling cooling 295 Ta 522 Optics 573 Sampling with Battelle cascade impactor 970 Te-doped GaAs 737 Organosilanes 931 SAW imaging 569 Temperature 295 Overlayers 904 Scanning electron microscopy 223 Temperature-programmed desorption 667 Overlayer/substrate structure 683 Scanning force microscope 510, 606 Tensile tester 537 Oxidation , 747 Scanning force microscopy 514, 537, 548, The Common Data Processing System 209 Oxide growth 809 569, 614, 959 Thermoplastic olefin (TPO) 643 Oxides 707 Scanning high-energy ion microscopy 889 Thin film 295, 301, 629, 948, 966 Oxidize 409 Scanning Kelvin microscope 855 Thin films 488, 596, 931 Ozone 88 Scanning near-field optical microscope 510 Ti oxides 804 Scanning near-field optical microscopy Time-of-flight secondary ion mass Palladium 132, 356 483, 492 spectrometry 959 © 1997 John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 992-994 (1997) 994 SUBJECT INDEX TO VOLUME 25 Time-resolved current measurement 533 Ultrafiltration membrane surface 593 Xanthate 64 TiO, 292 Ultrasound detection 569 XPS 46, 53, 64, 111, 119, 132, 137, 202, Tip modification 543 Universal cross-section 688 275, 292, 301, 315, 404, 409, 430, 447, 629, Tip, substrate and imaging procedure Used tyre 245 643, 650, 660, 667, 741, 747, 777, 809, 827, variation 614 837, 904, 924, 942 Titanium 366 Vacuum pyrolysis 245 XPS-EPMA-EDX, PTFE sampler for XPS Titanium silicide 896 Valence band 99, 643 and EDX 970 Titanium surfaces 983 Vanadium phosphate 667 x-ray absorption spectroscopy 707, 804 ToF-SIMS 41, 167, 261, 315, 725, 790, Vinyl ester 53 x-ray diffractometry 548 799, 827, 878, 959 Viscoelastic building 952 x-ray photoelectron spectroscopy ToF-SIMS, ethylene—propylene Viscoelastic relaxation 36 76, 161, 223, 356, 777, 917 copolymers 1 Voids 889 x-ray photoelectron spectrosopy 683 Toluene sulphonate 837 x-ray-induced metal reduction 46 Topography 788 White light 496 Total electron yield 707 Zircon 917 Transmission electron microscopy 677 XAES 660 Zirconia 917 Transport mean free path 447 XANES 315, 827 Zismann method 855 © 1997 John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 992-994 (1997) aa