Physics of Thin Films: Advances in Research and Development PDF
Preview Physics of Thin Films: Advances in Research and Development
CONTRIBUTORS TO THIS VOLUME F. M. D'HEURLE H. KRESSEL D. B. DOVE H. NELSON W. R. HUNTER R. ROSENBERG V. K. SRIVASTAVA Physics of Thin Films Advances in Research and Development Edited by GEORG HASS Night Vision Laboratory U.S. Army Electronics Command Fort Belvoir, Virginia MAURICE H. FRANCOMBE Research and Development Center Westinghouse Electric Corporation Pittsburghj Pennsylvania RICHARD W. HOFFMAN Department of Physics Case Western Reserve University Cleveland, Ohio VOLUME 7 1973 ACADEMIC PRESS NEW YORK AND LONDON A Subsidiary of Harcourt Brace Jovanovich, Publishers COPYRIGHT © 1973, BY ACADEMIC PRESS, INC. ALL RIGHTS RESERVED. NO PART OF THIS PUBLICATION MAY BE REPRODUCED OR TRANSMITTED IN ANY FORM OR BY ANY MEANS, ELECTRONIC OR MECHANICAL, INCLUDING PHOTOCOPY, RECORDING, OR ANY INFORMATION STORAGE AND RETRIEVAL SYSTEM, WITHOUT PERMISSION IN WRITING FROM THE PUBLISHER. ACADEMIC PRESS, INC. Ill Fifth Avenue, New York, New York 10003 United Kingdom Edition published by ACADEMIC PRESS, INC. (LONDON) LTD. 24/28 Oval Road, London NW1 LIBRARY OF CONGRESS CATALOG CARD NUMBER: 63-16561 PRINTED IN THE UNITED STATES OF AMERICA Contributors to Volume 7 Numbers in parentheses indicate the pages on which the authors' contributions begin. F. M. D'HEURLE {257), IBM Thomas J. Watson Research Center, York- town Heights, New York D. B. DOVE (1), Department of Materials Science and Engineering, Uni- versity of Florida, Gainesville, Florida W. R. HUNTER (43), E. 0. Hulburt Center for Space Research, U.S. Naval Research Laboratory, Washington, D.C. H. KRESSEL (115), RCA Laboratories, Princeton, New Jersey H. NELSON (115), RCA Laboratories, Princeton, New Jersey R. ROSENBERG (257), IBM Thomas J. Watson Research Center, Yorktown Heights, New York V. K. SRIVASTAVA (311), Department of Physics, University of Roorkee, Roorkee, India vii Preface The appearance of Volume 7 in the publication Physics of Thin Films marks the end of the first decade for this series. To date, some 35 review articles have appeared in previous volumes, covering many different aspects of thin film physics and technology. The fact that new topics in thin films continue to emerge and reach a stage where a critical review is called for appears to speak favorably for the essential health and growth potential of this relatively young area of science. The present volume (in common with earlier publications) contains a widely diverse group of topics. Although being treated for the first time, in some respects they complement and extend upon earlier articles. Readers will find that previous reviews, particularly on film growth and structure, optical properties, and semiconducting films, will furnish useful background reading to the subjects covered in this volume. In the first article the status of research on the structure of amorphous films is reviewed by D. B. Dove. This is the first of several reviews which are planned for future volumes on various aspects of the important and rapidly developing field of structurally disordered films. An article dealing with the dc electrical conductivity behavior of amorphous films by A. K. Jonscher and R. M. Hill is scheduled for Volume 8. The second chapter by W. R. Hunter deals with metal film optical filters for use in the extreme ultraviolet. In particular, the preparation, optical properties, and applications of unbacked metal filters in laboratory and space instrumentation are discussed. This article is the tenth in the area of thin film optics to be published in the Physics of Thin Films series, and readers interested in this field will find complete discussions of related aspects in earlier volumes. The third article by H. Kressel and H. Nelson presents a timely review of the impressive body of work that has developed in recent years in the new field of liquid phase epitaxy. This growth technique is rapidly finding application , especially in the fabrication of high-quality single-crystal layers of semiconductor and magnetic oxide materials, and the authors place special and authoritative emphasis on III-V compound layers for use in optical and microwave devices. The fourth review covers a topic which has long been a fundamental interest to metallurgists and thin film physicists, and more recently has ix X PREFACE achieved special significance for the designers of thin film microcircuit components, i.e., electromigration in thin films. F. M. d'Heurle and R. Rosenberg survey recent developments in this technologically important field and discuss both the effects observed in pure metal films and the inhibiting influence of alloying additives. Incidentally, newcomers to the field of metal films should find that previous articles in this series on film growth and structure (Volume 4) and mechanical properties (Volume 3) provide useful supplementary reading. In the fifth and final chapter of this volume, a novel thin film topic not hitherto included in this series is introduced. V. K. Srivastava covers in some detail the historical background, preparation, and structural, optical, and electrical properties of built-up molecular films, and concludes by summarizing some of the interesting and diverse applications of such layers, e.g., in thickness gauges, optical and X-ray gratings, chemical analyses, and dielectric film devices. As a closing note for this preface, and in preparation for entry into a second decade of publication for these volumes, we wish to reiterate a plea made in the preface to Volume 1. Criticisms, suggestions, and com- ments by readers (and contributors) are invited and welcomed. Inputs of this kind are invaluable to the editors in helping to respond to and anticipate the needs of thin film workers for up-to-date critical reviews. G. HASS M. H. FRANCOMBE R. W. HOFFMAN Contents of Previous Volumes Volume 1 Ultra-High Vacuum Evaporators and Residual Gas Analysis Hollis L. Caswell Theory and Calculations of Optical Thin Films Peter H. Berning Preparation and Measurement of Reflecting Coatings for the Vacuum Ultraviolet Robert P. Madden Structure of Thin Films Rudolf E. Thun Low Temperature Films William B. Ittnery III Magnetic Films of Nickel-Iron Emerson W. Pugh AUTHOR INDEX-SUBJECT INDEX Volume 2 Structural Disorder Phenomena in Thin Metal Films C. A. Neugebauer Interaction of Electron Beams with Thin Films C. J. Calbick The Insulated-Gate Thin-Film Transistor Paul K. Weimer Measurement of Optical Constants of Thin Films 0. S. Heavens Antireflection Coatings for Optical and Infrared Optical Materials J. Thomas Cox and Georg Hass Solar Absorptance and Thermal Emittance of Evaporated Coatings Louis F. Drummeter, Jr. and Georg Hass Thin Film Components and Circuits N. Schwartz and R. W. Berry AUTHOR INDEX-SUBJECT INDEX xi xii CONTENTS OF PREVIOUS VOLUMES Volume 3 Film-Thickness and Deposition-Rate Monitoring Devices and Techniques for Producing Films of Uniform Thickness Klaus H. Behrndt The Deposition of Thin Films by Cathode Sputtering Leon I. Maissel Gas-Phase Deposition of Insulating Films L. V. Gregor Methods of Activating and Recrystallizing Thin Films of ll-VI Compounds A. Vecht The Mechanical Properties of Thin Condensed Films R. W. Hoffman Lead Salt Detectors D. E. Bode AUTHOR INDEX-SUBJECT INDEX Volume 4 Precision Measurements in Thin Film Optics H. E. Bennett and Jean M. Bennett Nucleation Processes in Thin Film Formation J. P. Hirth and K. L. Moazed Evaporated Single-Crystal Films J. W. Matthews The Growth and Structure of Electrodeposits Kenneth R. Lawless Thin Glass Films W. A. Pliskin, D. R. Kerr, and J. A. Perri Hot-Electron Transport and Electron Tunneling in Thin Film Structures C. R. Crowell and S. M. Sze AUTHOR INDEX-SUBJECT INDEX Volume 5 Interference Photocathodes D. Kossel, K. Deutscher, and K. Hirschberg CONTENTS OF PREVIOUS VOLUMES xiii Design of Multilayer Interference Filters Alfred Thelen Oxide Layers Deposited from Organic Solutions H. Schroeder The Preparation and Properties of Semiconductor Films M. H. Francombe and J. E. Johnson The Preparation of Films by Chemical Vapor Deposition W. M. Feisty S. R. Steele, and D. W. Readey AUTHOR INDEX-SUBJECT INDEX Volume 6 Anodic Oxide Films C. </. Dell'Oca, D. L. Pulfrey, and L. Young Size-Dependent Electrical Conduction in Thin Metal Films and Wires D. C. Larson Optical Properties of Metallic Films F. Abeles Interactions in Multilayer Magnetic Films Arthur Yelon Diffusion in Metallic Films C. Weaver AUTHOR INDEX-SUBJECT INDEX Articles Planned for Future Volumes Metal-Dielectric Interference Filters P. W. Baumeister and Verne Robert Costich Thin Film Transducers J. deKlerk Design and Manufacture of Nonconventional Optical-Thin-Film Filters J. A. Dobrowolski Inhomogeneous and Coevaporated Homogeneous Films for Optical Applications Roland Jacobsson Electrical Conduction in Disordered Nonmetallic Films A. K. Jonscher and R. M. Hill Discontinuous and Cermet Films Z. H. Meiksin Topologically Structured Thin Films in Semiconductor Device Operation H. C. Nathanson and Jens Guldberg Film Materials for Optical Applications E. Ritter Dielectric Films for Passivation and Protection of Semiconductor Devices J. R. Szedon Thin Films for Integrated Optics R. Ulrich
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