Modeling, Characterization and Production of Nanomaterials: Electronics, Photonics and Energy Applications PDF
Preview Modeling, Characterization and Production of Nanomaterials: Electronics, Photonics and Energy Applications
Modeling, Characterization and Production of Nanomaterials Related titles Semiconductornanowires:Materials,synthesis,characterizationandapplications (ISBN978-1-78242-253-2) Nanosensorsforchemicalandbiologicalapplications:Sensingwithnanotubes,nanowires andnanoparticles (ISBN978-0-85709-660-9) Handbookofmagneticnano-andmicrowires (ISBN978-0-08100-164-6) Woodhead Publishing Series in Electronic and Optical Materials: Number 73 Modeling, Characterization and Production of Nanomaterials Electronics, Photonics and Energy Applications Edited by Vinod K. Tewary and Yong Zhang AMSTERDAM(cid:129)BOSTON(cid:129)CAMBRIDGE (cid:129)HEIDELBERG LONDON (cid:129)NEWYORK(cid:129)OXFORD(cid:129)PARIS(cid:129)SANDIEGO SANFRANCISCO(cid:129)SINGAPORE(cid:129)SYDNEY(cid:129)TOKYO Woodhead Publishing is an imprint of Elsevier WoodheadPublishingisanimprintofElsevier 80HighStreet,Sawston,Cambridge,CB223HJ,UK 225WymanStreet,Waltham,MA02451,USA LangfordLane,Kidlington,OX51GB,UK Copyright©2015ElsevierLtd.Allrightsreserved. Exceptionstotheabove: Chapters2,3,6and14werepreparedbyUSGovernmentemployees;theyarethereforeinthe publicdomainandcannotbecopyrighted.PublishedbyElsevierLtd. Nopartofthispublicationmaybereproduced,storedinaretrievalsystemortransmitted inanyformorbyanymeanselectronic,mechanical,photocopying,recordingorotherwise withoutthepriorwrittenpermissionofthepublisher. 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BritishLibraryCataloguing-in-PublicationData AcataloguerecordforthisbookisavailablefromtheBritishLibrary LibraryofCongressControlNumber:2014954544 ISBN978-1-78242-228-0(print) ISBN978-1-78242-235-8(online) ForinformationonallWoodheadPublishingpublications visitourwebsiteathttp://store.elsevier.com/ TypesetbySPiGlobal www.spi-global.com PrintedandboundintheUnitedKingdom List of contributors D. Balzar University ofDenver, Denver, CO,USA D.M.Bortz University ofColorado,Boulder, CO,USA B. Cao Universityof New Orleans, New Orleans, LA, USA D. Casimir Howard University,Washington, DC, USA J. Chen Universityof New Orleans, New Orleans,LA, USA C.V. Ciobanu ColoradoSchool ofMines,Golden, CO,USA H. Cronk StateUniversityofNew York at Binghamton,Binghamton, NY, USA M.M. De Souza University ofSheffield,Sheffield, UK J. DeJoannis Accelrys, Inc., Burlington,MA,USA J. Eymery Univ. GrenobleAlpes, Grenoble, France; CEA, INAC-SP2M, Grenoble, France; CEA-CNRS-UJF group “Nanophysics and Semiconductors”, Grenoble, France G. Fitzgerald Accelrys, Inc., San Diego, CA, USA R. Garcia-Sanchez Howard University,Washington, DC,USA B. Gittleman AppliedScience and TechnologyConsulting LLC, Centennial, CO, USA M.K.Harbola Indian Institute ofTechnology Kanpur (IITK), Kanpur, India L. Hu JiangnanUniversity,Wuxi, PRChina M. Hu RWTH AachenUniversity, Aachen, Germany P. Joseph StateUniversityofNew York at Binghamton,Binghamton, NY, USA N. Kang StateUniversityof New York at Binghamton,Binghamton, NY, USA xii Listofcontributors D. Le SiDang Univ. GrenobleAlpes, Grenoble, France; CNRS, Institut Ne´el, Grenoble, France; CEA-CNRS-UJF group “Nanophysics andSemiconductors”, Grenoble, France G. Li Northeastern University,Shenyang, China J. Li State Universityof New Yorkat Binghamton, Binghamton, NY, USA J. Luo State UniversityofNew York at Binghamton, Binghamton, NY,USA E. Mansfield National Instituteof Standards andTechnology, Boulder, CO, USA M. Meunier Accelrys Limited,Cambridge,UK P. Misra Howard University,Washington, DC, USA A. Mookerjee S NBoseNational Centre for Basic Sciences, Kolkata, India P. Pillai Universityof Sheffield, Sheffield,UK L. Rast National Institute ofStandards and Technology, Boulder,CO, USA S. Shan State Universityof New York at Binghamton, Binghamton, NY, USA P. Singh Ames Laboratory, Ames, IA,USA Z. Skeete State Universityof New Yorkat Binghamton,Binghamton, NY, USA A. Smolyanitsky National Institute ofStandards and Technology, Boulder,CO, USA;NIST Centerfor Nanoscale Science, andTechnology (CNST), Gaithersburg, MD, USA M. Stowell Advanced TechnologiesGroup, AppliedMaterials, Santa Clara, CA, USA V.K.Tewary NationalInstituteofStandardsandTechnology,Boulder,CO,USA K. Wang Northeastern University, Shenyang, China K. Wang Universityof New Orleans, New Orleans, LA, USA Q. Wang Northeastern University, Shenyang, China H. Wu Zhejiang University,Hangzhou, PR China Listofcontributors xiii J. Wu State Universityof New York at Binghamton,Binghamton, NY, USA S. Yan State UniversityofNew York at Binghamton, Binghamton, NY, USA N. Yue The Universityof North Carolina at Charlotte,Charlotte,NC, USA Y. Zhang TheUniversity ofNorth Carolina at Charlotte,Charlotte, NC,USA W. Zhao State University ofNew York at Binghamton, Binghamton, NY,USA Y. Zhao State Universityof New Yorkat Binghamton,Binghamton, NY, USA C.-J.Zhong StateUniversityofNewYorkatBinghamton,Binghamton,NY,USA W. Zhou Universityof New Orleans, New Orleans,LA, USA S. Zhuiykov CSIRO,MaterialsScience and EngineeringDivision,Highett,VIC, Australia Woodhead Publishing Series in Electronic and Optical Materials 1 Circuitanalysis J.E.Whitehouse 2 Signalprocessinginelectroniccommunications:Forengineersandmathematicians M.J.Chapman,D.P.GoodallandN.C.Steele 3 Patternrecognitionandimageprocessing D.Luo 4 Digitalfiltersandsignalprocessinginelectronicengineering:Theory,applications,architecture, code S.M.BozicandR.J.Chance 5 Cableengineeringforlocalareanetworks B.J.Elliott 6 DesigningastructuredcablingsystemtoISO11801:Cross-referencedtoEuropeanCENELEC andAmericanStandards Secondedition B.J.Elliott 7 Microscopytechniquesformaterialsscience A.ClarkeandC.Eberhardt 8 Materialsforenergyconversiondevices EditedbyC.C.Sorrell,J.NowotnyandS.Sugihara 9 Digitalimageprocessing:Mathematicalandcomputationalmethods Secondedition J.M.Blackledge 10 Nanolithographyandpatterningtechniquesinmicroelectronics EditedbyD.Bucknall 11 Digitalsignalprocessing:Mathematicalandcomputationalmethods,softwaredevelopment andapplications Secondedition J.M.Blackledge 12 Handbookofadvanceddielectric,piezoelectricandferroelectricmaterials:Synthesis,properties andapplications EditedbyZ.-G.Ye 13 Materialsforfuelcells EditedbyM.Gasik 14 Solid-statehydrogenstorage:Materialsandchemistry EditedbyG.Walker 15 Lasercoolingofsolids S.V.PetrushkinandV.V.Samartsev 16 Polymerelectrolytes:Fundamentalsandapplications EditedbyC.A.C.SequeiraandD.A.F.Santos 17 Advancedpiezoelectricmaterials:Scienceandtechnology EditedbyK.Uchino xvi WoodheadPublishingSeriesinElectronicandOpticalMaterials 18 Opticalswitches:Materialsanddesign EditedbyS.J.ChuaandB.Li 19 Advancedadhesivesinelectronics:Materials,propertiesandapplications EditedbyM.O.AlamandC.Bailey 20 Thinfilmgrowth:Physics,materialsscienceandapplications EditedbyZ.Cao 21 Electromigrationinthinfilmsandelectronicdevices:Materialsandreliability EditedbyC.-U.Kim 22 Insitucharacterizationofthinfilmgrowth 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Handbookofterahertztechnologyforimaging,sensingandcommunications EditedbyD.Saeedkia 35 Handbookofsolid-statelasers:Materials,systemsandapplications EditedbyB.DenkerandE.Shklovsky 36 Organiclight-emittingdiodes(OLEDs):Materials,devicesandapplications EditedbyA.Buckley 37 Lasersformedicalapplications:Diagnostics,therapyandsurgery EditedbyH.Jelı´nkova´ 38 Semiconductorgassensors EditedbyR.JaanisoandO.K.Tan 39 Handbookoforganicmaterialsforopticaland(opto)electronicdevices:Properties andapplications EditedbyO.Ostroverkhova 40 Metallicfilmsforelectronic,opticalandmagneticapplications:Structure,processing andproperties EditedbyK.BarmakandK.Coffey 41 Handbookoflaserweldingtechnologies EditedbyS.Katayama 42 Nanolithography:Theartoffabricatingnanoelectronicandnanophotonicdevicesandsystems EditedbyM.Feldman 43 Laserspectroscopyforsensing:Fundamentals,techniquesandapplications EditedbyM.Baudelet WoodheadPublishingSeriesinElectronicandOpticalMaterials xvii 44 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