Memory Effects in Electron Transport in Si Inversion Layers in the Dilute Regime: Individuality versus Universality V. M. Pudalova,b, M. E. Gershensona, and H. Kojimaa a Department of Physics and Astronomy, Rutgers University, New Jersey 08854, USA b P. N. Lebedev Physics Institute, 119991 Moscow, Russia Inordertoseparatetheuniversalandsample-specificeffectsintheconductivityofhigh-mobility 2 Si inversion layers, we studied the electron transport in the same device after cooling it down to 0 4K at different fixed values of the gate voltage Vcool. Different Vcool did not modify significantly 0 eitherthemomentumrelaxationrateorthestrengthofelectron-electroninteractions. However,the 2 temperature dependences of the resistance and the magnetoresistance in parallel magnetic fields, n measured in thevicinityof themetal-insulator transition in2D,carry astrongimprint ofindividu- a alityofthequencheddisorderdeterminedbyVcool. Thisdemonstratesthattheobservedtransition J between “metallic” and insulating regimes involves both universal effects of electron-electron inter- 1 actionandsample-specificeffects. Farawayfromthetransition,atlowercarrierdensitiesandlower resistivities ρ<0.1h/e2, thetransport and magnetotransport become nearly universal. ] l e Afteralmostadecadeofintensiveresearch,theappar- the range n = (0.7−3)×1011cm−2 in a system with a - r ent metal-insulator transition (MIT) in two-dimensional snapshot disorder pattern. Two key features of the 2D t s (2D) systems remains a rapidly evolving field [1]. The MIT, strong dependences of the resistivity on the tem- . t central problem in this field is whether the anomalous perature and parallel magnetic field, have been studied. a low-temperature behavior of the conductivity, observed Wehaveobservedtwodistinctregimesasafunctionof m in high-mobility structures in the dilute limit, signifies a the electron density. At relatively high densities (resis- - d novel quantum ground state in strongly-correlated sys- tivity ρ≤0.1h/e2), the dependences R(T)and R(Bk) in n tems, or this is a semiclassical effect of disorder on elec- weak parallel magnetic fields B are similar for different k o tron transport. Indeed, a great body of experimental cooldowns; the similarity indicates ‘universal’ behavior. c data demonstrates that, at leastat sufficiently large car- In contrast, at low densities (ρ ∼ (0.1−1)h/e2), or in [ rier densities (consequently, weak interactions), the low- moderateandstrongparallelfieldsgµ B ∼E ≫k T, B k F B 1 temperature behavior of disordered systems is governed the cooling conditions affect dramatically the electron v by the universal quantum corrections to the conductiv- transport. This observation provides direct experimen- 1 ity [2]. On the other hand, there are also observations talevidence thatthe behaviorofdilute systems becomes 0 0 that near the apparent 2D MIT, the behavior of dilute sample-specificneartheapparent2DMITnomatterhow 1 systems is very rich, and does not necessarily follow the one approaches the transition (either by decreasing the 0 same pattern (e. g., even for the same system, as Si electron density, or by increasing the parallel magnetic 2 MOSFETs, the ”critical” resistance and the high-field field). 0 magnetoresistancevarysignificantlyfordifferentsamples Theresistivitymeasurementswereperformedonahigh / at [3,4]). This duality (universality versus individuality) is mobility Si-MOSFET sample [17] at the bath tempera- m reflectedintwoapproachestothe theoreticaldescription tures 0.05−1.2K. The crossedmagnetic field system al- of the ”metallic” regime: some models, based on strong lowed to accurately align the magnetic field parallel to - d electron-electron interactions, treat the transition as a the plane of the 2DEG [18]. The carrier density, found n universalphenomenon[5–10],whereastheothersempha- fromtheperiodofShubnikov-deHaas(SdH)oscillations, o sizetheroleofasample-specificdisorder(traps,localized varies linearly with V : n ≈ C ×(V − V ), where C c g g th : spins, potential fluctuations, etc.) [11–15]. (= 1.103×1011/Vcm2 for the studied sample) is deter- v In order to find a definite experimental answer to mined by the oxide thickness. The ‘threshold’ voltage i X thisproblemandtoseparateuniversalandnon-universal Vth varied little (within 0.15V) for different cool-downs r (“individuality”)effectsinthevicinityofthe2DMIT,we andremainedfixedaslongasthesamplewasmaintained a have studied the electron transport in the same Si MOS at low temperatures (up to a few months). structure,whichwasslowlycooleddownfromroomtem- Figure 1 shows the mobility µ versus V for five differ- g perature to T =4K at different fixed values of the gate ent cool-downs with Vcool = 0,5,10,18, and 25V. The voltageV =Vcool [16]. Changingthe coolingconditions peakmobilityfordifferentcool-downsvariesbylessthan g allowedustovarytheconfiningpotentialandthedensity ∼7%);thisdemonstratesthatthemomentumrelaxation of quenched localized states without affecting the main time τ is not strongly affected by the cooling conditions. parameters which control electron-electron interactions We also observed that the amplitudes of the SdH oscil- in the system of mobile electrons: the momentum relax- lations are similar for different cool-downs, as shown in ationrateandtheinteractionconstants. BytuningV at theinsettoFig.1. Thesetwoobservationsareconsistent g low temperatures, we varied the electron density n over with each other, since the quantum lifetime τ is nearly q 1 equal to τ for Si-MOSFETs. criticaldependences ρ (T) suggeststhat a) saturationof c thetemperaturedependencesatn=n ,reportedin[21], c is notauniversaleffect, andb) the criticaldensityis not necessarily associated with the sign change of dρ/dT(n) [19]. 2 0.5 10 Vcool= 5V = 25V s) V 2m/ 5 m ( 1 2h/e)0.4 VVccooooll== 05VV 2e) 3 nc5 21 (xx VVccooooll==1108VV (p/ 3 r Vcool=25V r 4 0.3 n25 5 c 0.0 0.5 B (T) 1.0 6 0 0 2 4 6 8 10 12 1 7 V (V) g FIG. 1. The mobility versus the gate voltage for dif- 0.3 cool ferent cool-downs. The V values for both the main panel and the inset are shown in the figure. Examples 2) e of the SdH oscillations, shown in the inset for the same p/ 8 Vg = 1.15V, T = 0.1K, Bk = 0.03T, demonstrate that ( r the quantum time τq is not very sensitive to the cooling 0.1 9 conditions. Thecarrierdensitiesare(fromtoptobottom) n=1.081, 1.092, 1.070 in units1011cm−2. 10 11 0.5 Figure 2a shows the dependences ρ(T) for two cool- 12 downs in the vicinity of the 2D MIT. Far from the 0.0 0.4 0.8 1.2 transition, where ρ ≪ h/e2, the dependences ρ(T) are T (K) cooldown-independent. However, in the vicinity of the FIG.2. Temperature dependencesof theresistivity for transition (ρ ∼ h/e2), a dramatically different behav- twodifferentcool-downs. Thedensities,whichcorrespond ior is observed. The irreproducibility of ρ(T) for differ- tocurves1to12,areasfollow: 0.783, 0.827,0.882, 0.942, ent cool-downs is clearly seen for the curves in Fig. 2 0.972, 1.001, 1.021, 1.31, 1.53,1.87, 2.29,2.58inunitesof which correspond to the same ρ at the lowest T: these 1011cm−2. curves, being different at higher temperatures, converge with decreasing T. The sample-specific memory effects We now turn to the magnetoresistance (MR) in par- vanishalsoatsufficientlylowtemperatures: thissuggests allel fields; the data are shown in Figs. 3 and 4. This that the underlying mechanism is related to the finite- MR is usually associated with the spin effects [1,4]. In temperatureeffectsinasystemwhichretainsaquenched the theoretical models of the parallel-field MR, based disorder. These results suggest that, in addition to uni- on electron-electron interactions, the MR is controlled versal effects, a finite-temperature and sample-specific by the effective g∗-factor and the momentum relaxation mechanism, which strongly affects the resistivity, comes time τ [5,10,22]. Animportantadvantageofour method into play. isthatcoolingofthe samesampleatdifferentVcool does The ‘critical’ density n , which corresponds to the not affect these parameters. Thus, one might expect to c transition, was found from a linear extrapolationto zero observeasample-independentbehavioriftheMRiscon- of the density dependence of the activation energy ∆(n) trolled solely by the universal interaction effects. in the insulating regime ρ(T) ∝ exp(∆/T) [3,19]. The Firstly,let us considerthe rangeoffields muchweaker dependencesρ(T),whichcorrespondedton=nc fortwo than the field of complete spin polarization (g∗µBBk ≪ cool-downsshowninFig.2a,arehighlightedinbold. Itis EF). The insets to Figs. 3a and 3b show that the MR clearthat(i) the ‘critical’densitiesand‘critical’resistiv- is proportional to Bk2 at g∗µBBk/kBT ≤ 1. We found ities depend on the cooling conditions, and (ii) the ‘crit- that the slope dρ/dB2 is nearly cooldown-independent ical’ dependences ρ(T,n = n ) are non-monotonic (see (i.e. universal)only for the densities n>1.3×1011cm−2 c also Refs. [19,20]). Observation of the non-monotonic (which are by 30% greater than the critical density n ), c 2 or for the resistivities ρ < 0.16h/e2 (compare insets to the intercept of the tangents at fields below and above Figs.3aand3b). Withapproachingn ,thisuniversality MR saturation [4]. c vanishes: Figure 3a shows that even when the zero-field Figure 4c shows the dependences B (n) for differ- sat resistivity is as small as 0.22h/e2, the slope varies by a ent cool-downs. We also plotted here the density depen- factor of 1.3 for different Vcool. dence of the field B = 2E∗/g∗µ = nπ¯h2/m∗g∗µ , pol F B B For the intermediate fields, kBT < g∗µBBk < EF, for the complete spin polarization of mobile electrons the ρ(Bk) behavior is not universal over the whole den- (m∗ istherenormalizedeffectivemass). Thedependence sity range n = (1−3)×1011cm−2 (Figs. 3a,b). As n B (n) was calculated using sample-independent (uni- pol decreases and approaches nc, the cooldown-dependent versal) g∗m∗ values [18]. Comparison between Bsat and variations of R(Bk) increase progressively. Observation Bpol shows that Bsat does not necessarily manifest the of large (∼ 50%) non-universal variations of the MR at complete spin polarization, and that the coincidence of intermediate fields makes the scaling analysis [23] of the B with B reported in Ref. [24] may be rather acci- sat pol MR in this field range dubious. dental. This non-universal, sample-dependent behavior ofB agreeswithearlierobservationsmadeondifferent sat 5 samples [4]. We emphasize that the curves for different Vcool (in eachofFigs.4a andb) correspondto the same 0.4 4 2e) density, as follows from Hall voltage and/or SdH oscilla- 2 (h/e) 3 00..23r (h/ tdpieaoprnaeslnlmedleefinaetsludprsaermisaemnnoetttse.sro,TleshluyegrgfeaelcsatttsetdhthattaotBsptshainte-ipMsoaRlarciioznoaltsditoornwonnog-f r 2 0.00 0.02B2 (T2)0.04 mobile electrons; we speculate that it also reflects the spinpolarizationofthesample-specificlocalizedelectron 10V states, which might have the effective g-factor quite dif- 18V 1 25V ferent from that for the mobile electrons [4]. a) 0.0 0.1 0.2 0.3 a) b) B2 (T2) 10 n=1.092 n=1.330 ) 25V 0.25 2e) T=0.3K T=0.3K 12/e 2 15V8V 0.202 (h/e) r (h/ 1 VVccooooll==11 08VV r (h r Vcool= 5V 2) (h/e 10.00 0.03 B2 (T20).06 0.15 0 2 4 B (T) 6 0 2 B (T4) 6 0.1 r 25V c) 5V ) 6 18V b) (T B 00.0 0.2 0.4 0.6 pol pol B2 (T2) 2 B, Bsat 4 Vcool=5V FIG. 3. Examples of the dependences ρ(Bk) at Vcool=10V T =0.3Kforthecarrierdensity(a)1.20×1011cm−2 and Vcool=18V (b) 1.34×1011cm−2. The insets blow up the low-field Vcool=25V region of the quadratic behavior. The values of Vcool are 2 1.0 1.2 1.4 indicated for each curve. density (1011cm-2) The influence of cooldown conditions becomes even more dramatic in strong fields, B >∼ EF/g∗µB. De- cooFlI-Gdo.w4n.sRaetsisttwivoitdyevnssitinie-sp:laan)e nma=gn1et.0ic92fie×ld1f0o1r1ctmhr−e2e spite the fact that the dependences µ(n) for different and b) n = 1.33 × 1011cm−2. c) The saturation field cool-downs are very similar (Fig. 1), we observed very Bsat versusnforfourdifferentcool-downs. Solidlinesare large variations in the strong-field MR. Figures 4a and guidestotheeye. Dashedlineshowsthefieldofcomplete 4b show R(Bk) for different cool-downs at two values of spin polarization calculated on the basis of direct mea- n. The cooldown conditions cause factor-of-five changes surements of the spin susceptibility for mobile electrons inρ(B)inhighfieldsandfactor-of-twochangesintheval- [18]. ues of B =B at which the MR ‘saturates’ at a given k sat carrierdensity. Thelatterquantitywasdeterminedfrom It is worth mentioning that the influence of vari- 3 able disorder on transport and magnetotransport in Si- [3] V. M. Pudalov, G. Brunthaler, A. Prinz, and G. Bauer, MOSFETshasbeenobservedearlier. Boththetempera- JETP Lett., 68, 442 (1998). turedependenceρ(T)andmagnetoresistanceρ(B )were [4] V.M.Pudalov,G.Brunthaler,A.Prinz,G.Bauer,cond- k found to be different in samples with different mobility mat/0004206; cond-mat/0103087. [5] A. M. Finkelstein, Sov. Sci. Reviews/section A- Physics [3,4] and in samples cooled downwith different values of Reviews, Ed. I.M. Khalatnikov, 14, 3 (1990). substratebiasvoltage[25]. Inthesestudies,however,the [6] C. Castellani et al. Phys. Rev. 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F B (g∗µBB >∼ EF∗) fields: it extends to much higher elec- [15] Y.coMoleir, cond-mat/0009106. [16] V determinesthedepthoftheconfiningpotentialwell tron densities (we observed pronounced non-universality of R(B ) over a wide range n = (1−3)×1011cm−2). and, simultaneously, the number of interface traps sunk k undertheFermilevel,andthedensityoflocalized states Ourresultsclearlydemonstratethattheapparentmetal- from the tails of upper subbands. At low temperatures, insulator transition in 2D involves both universal and whenever gate voltage is varied, the potential well re- sample-specific effects. These results also help to estab- mains almost unchanged and memorizes an imprint of lish the borderline between the regimes where the elec- the disorder formed during its cooling down. tron transport in high-mobility Si MOS-structures is ei- [17] Sample Si6-14 with 190nm thick gate oxide was fabri- ther universal or sample-specific. 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