Laser Ablation: Principles and Applications

197 Pages·1994·9.55 MB·English

by  J. C. Miller (auth.), Dr. John C. Miller (eds.)

Springer Series in Materials Science 28
Edited by R. M. Osgood
Springer Series in Materials Science
Advisors: M.S. Dresselhaus· H. Kamimura· K.A.Mi.iller
Editors: U. Gonser· R. M. Osgood· M. B. Panish . H. Sakaki
Managing Editor: H. K. V. Lotsch
Chemical Processing with Lasers 15 Crystal Chemistry of
By D. Bauerle High-T. Superconducting Copper Oxides
By B. Raveau, C. Michel, M. Hervieu,
2 Laser-Beam Interactions with Materials
and D. Groult
Physical Principles and Applications
By M. von Allmen 16 Hydrogen in Semiconductors
3 Laser Processing of Thin Films By S. J. Pearton, M. Stavola, and J. W.
Corbett
and Microstructures
Oxidation, Deposition and Etching 17 Ordering at Surfaces and Interfaces
of Insulators Editors: A. Yoshimori, T. Shinjo,
By. I. W. Boyd and H. Watanabe
4 Mlcroclusters 18 Graphite Intercalation Compounds II
Editors: S. Sugano, Y. Nishina, and S. Ohnishi Editors: S. A. Solin and H. Zabel
5 Graphite Fibers and Filaments 19 Laser-Assisted Microtechnology
By M. S. Dresselhaus, G. Dresselhaus,
By S. M. Metev and V. P. Veiko
K. Sugihara, I. L. Spain, and H. A. Goldberg
20 Microcluster Physics
6 Elemental and Molecular Clusters
By S. Sugano
Editors: G. Benedek, T. P. Martin,
and G. Pacchioni 21 The Metal-Hydrogen System
By Y. Fukai
7 Molecular Beam Epitaxy
Fundamentals and Current Status 22 Ion Implantation in Diamond, Graphite
By M. A. Herman and H. Sitter and Related Materials
By M. S. Dresselhaus and R. Kalish
8 Physical Chemistry of, in and on Silicon
By G. F. Cerofolini and L. Meda 23 The Real Structure of High-T.
9 Tritium and Helium-3 in Metals Superconductors
Editor: V. Sh. Shekhtman
ByR. Lasser
10 Computer Simulation 24 Metal Impurities in Silicon Device
of Ion-Solid Interactious Fabrication
By W. Eckstein By K. Graff
II Mechanisms of High 25 Optical Properties of Metal Clusters
Temperature Superconductivity By U. Kreibig and M. Vollmer
Editors: H. Kamimura and A. Oshiyama 26 Gas Source Molecular Beam Epitaxy
12 Dislocation Dynamics and Plasticity Growth and Properties of Phosphorus
By T. Suzuki, S. Takeuchi, and H. Yoshinaga Containing III-V Heterostructures
By M. B. Panish and H. Temki
13 Semiconductor Silicon
Materials Science and Technology 27 Physics of New Materials
Editors: G. Harbeke and M. J. Schulz Editor: F. E. Fujita
14 Graphite Intercalation Compounds I 28 Laser Ablation
Structure and Dynamics Principles and Applications
Editors: H. Zabel and S. A. Solin Editor: J. C. Miller
John C. Miller (Ed.)
Laser Ablation
Principles and Applications
With 85 Figures
Springer-Verlag
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Dr. John C. Miller
Chemical Physics Section, Health Sciences Research Division
Oak Ridge National Laboratory, Building 4500S
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Microelectronics Science Laboratory Institute of Industrial Science
Department of Electrical Engineering University of Tokyo
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New York, NY 10027, USA
Managing Editor: Dr. Helmut K. V. Lotsch
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ISBN-13 :978-3-642-78722-5 e-ISBN -13:978-3-642-78720-1
DOl: 10.1007/978-3-642-78720-1
Library of Congress Cataloging-in-Publication Data. Laser ablation: principles and applications 1 John C. Miller
(ed.); with contributions by L. L. Chase ... let aLl. p. cm. - (Springer series in materials science; v. 28) Includes
bibliographical references and index. ISBN-13:978-3-642-78722-5 I. Laser ablation.
I. Miller, J. C. (John C.), 1949-. II. Chase, Lloyd L. III. Series. TA1715.L37 1994 621.36'6-dc20 94-5045
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Preface
Ever since the discovery of the laser in 1960, powerful beams of light have been
directed at solid materials for a variety of purposes. Although not recorded, the
first examples of laser ablation surely involved damage to optical components,
either in the laser itself or elsewhere in the experimental arrangement. Later in
the sixties, the process of laser ablation was studied and the roots of the major
applications appeared. But it was not until the mid-eighties that the uses oflaser
ablation catapulted the technique into prominence. In particular, thin-film
growth of high-Tc superconducting materials has been responsible for most of
the papers in the field in the last eight to ten years. Other major applications
such as laser medicine, laser-ablation mass spectrometry and other analytical
techniques have also come to fruition in the late eighties. In the near future,
additional novel uses of laser ablation such as X-ray generation, micro machin
ing and lithography will accelerate.
Although there were focussed sessions or symposia on laser ablation at a
number of conferences in the late eighties, the first meeting devoted solely to the
topic was organized by researchers at Oak Ridge National Laboratory and
Vanderbilt University, and was held in Oak Ridge in April 1991. The three-day
u.s.
workshop, sponsored by the Department of Energy, drew over eighty
participants from five countries. The proceedings were published by Springer
Verlag in the Lecture Notes in Physics Series, Vol. 389, in the same year. The
title, "Laser Ablation - Mechanisms and Applications", mirrored the emphasis
on the fundamental physics and chemistry of laser ablation. Due to the success
of this first workshop, a fully international conference was held two years later in
April 1993.
The present book, like the workshop mentioned above, grew out of the
realization that there was no single place that presented the recent progress in
the diverse fields in which laser ablation was important. The invited speakers
and participants of the Oak Ridge workshop represented a particularly promin
ent group of experts from which the present contributors were solicited.
Following an introductory, historical chapter, the remaining chapters present
an overview of a number of laser ablation applications with emphasis on the
physical principles.
In Chap. 2, R.F. Haglund, Jr. (Vanderbilt University) and N. Hoh (Nagoya
University, Japan) have outlined many of the theoretical ideas important to
laser ablation with an emphasis on semiconductors and insulators. Although
VI Preface
not coordinated with the other contributors, this chapter presents many ideas in
detail which will be revisited briefly in later chapters.
L. Chase (Lawrence Livermore National Laboratory) discusses optical
surface damage due to laser ablation in Chap. 3. Because of the importance of
this area to the development of optics for high-power lasers, optical damage
investigations have a long history.
In Chap. 4 the very important area of laser ablation of high-Tc super
conductors is reviewed by T. Venkatesan (University of Maryland), a leading
practitioner of this art.
R. Srinivasan (UV Technical Associates) has contributed a chapter on laser
ablation of polymers. Ablation of these organic molecular solids is funda
mentally different than that of inorganic materials.
Chapter 6 describes the coupling of laser ablation and mass spectroscopy,
with an emphasis on biomolecules. R.L. Hettich and C. Jin (Oak Ridge National
Laboratory) emphasize Fourier-transform mass spectrometry and describe
work on inorganic clusters and on large molecules of biological interest.
The last (but of course not least) chapter, authored by A.D. Sappey and N.S.
Nogar (Los Alamos National Laboratory), summarizes experiments emphasi
zing analytical applications of laser ablation.
In editing such a multidisciplinary collection of chapters authored by
distinguished scientists from several countries there were a number of trials and
tribulations, all of which were eventually overcome. I wish to thank all of the
authors for their excellent efforts and for their tolerance of my nagging
correspondence. Dr. H. Lotsch of Springer-Verlag gave valuable advice in
planning and executing this project and was extremely patient as the deadlines
were repeatedly broached. Finally, I wish to thank Ms D. Henderson and Ms N.
Currence for their clerical support.
Oak Ridge, Tennessee John C. Miller
April 1994
Contents
1. History, Scope, and the Future of Laser Ablation
By J.C. Miller. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1
1.1 Introduction. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1
1.2 History of Laser Ablation Studies and Applications . . . . . 2
1.2.1 The Sixties . . . . . . . . . . . . . . . . . . . . . . . . . . 3
1.2.2 The Seventies. . . . . . . . . . . . . . . . . . . . . . . . . 6
1.2.3 The Eighties . . . . . . . . . . . . . . . . . . . . . . . . . 6
1.2.4 The Nineties . . . . . . . . . . . . . . . . . . . . . . . . . 8
References . . . . . . . . . . . . ... . . . . . . . . . . . . . . . . . . 9
2. Electronic Processes in Laser Ablation of Semiconductors
and Insulators
By R.F. Haglund, Jr. and N. Itoh (With 18 Figures). . . . . . . . 11
2.1 Electronic Mechanisms in Desorption and Ablation. . . . . 12
2.2 Interaction of Photons with Solids. . . . . . . . . . . . . . . . 14
2.2.1 Creation of Electron-Hole Pairs and Excitons . . . . . 14
2.2.2 Excitation of Electrons and Holes
Localized on Defects . . . . . . . . . . . . . . . . . . . . 16
2.2.3 Collective Effects: Free-Electron Heating
and Plasma Effects. . . . . . . . . . . . . . . . . . . . . . 17
2.2.4 Density of Electronic Excitation. . . . . . . . . . . . . . 17
2.3 Electron-Lattice Interactions
and the Localized Excited State. . . . . . . . . . . . . . . . . 18
2.3.1 Interactions Between Free Carriers and Phonons . . . 18
2.3.2 Capture of Charge Carriers at Defect Sites . . . . . . . 20
2.3.3 Lattice-Induced Localization of Free Carriers
and Excitons . . . . . . . . . . . . . . . . . . . . . . . . . 21
2.4 Creation and De-Excitation
of the Localized Excited State . . . . . . . . . . . . . . . . . . 23
2.4.1 Non-Radiative De-Excitation . . . . . . . . . . . . . . . 23
2.4.2 Transfer of Electronic to Configurational Energy. . . . 25
2.4.3 Other Non-Radiative De-Excitation Channels. . . . . 26
2.5 Survey of Experimental Results . . . . . . . . . . . . . . . . . 26
2.5.1 Alkali Halides and Alkaline-Earth Fluorides . . . . . . 27
VIII Contents
2.5.2 Oxides. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28
2.5.3 Compound Semiconductors . . . . . . . . . . . . . . . . 30
2.6 Models of Laser-Induced Desorption. . . . . . . . . . . . . . 33
2.6.1 Models of Electronic Processes
in Laser-Induced Desorption. . . . . . . . . . . . . . . . 33
2.6.2 Calculation Techniques. . . . . . . . . . . . . . . . . . . 36
2.7 Simulation of Laser Ablation. . . . . . . . . . . . . . . . . . . 39
2.7.1 Models of Laser Ablation . . . . . . . . . . . . . . . . . 40
2.7.2 Model Calculations of Laser Ablation. . . . . . . . . . 42
2.8 Summary and Conclusions. . . . . . . . . . . . . . . . . . . . 47
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 48
3. Laser Ablation and Optical Surface Damage
By L.L. Chase (With 17 Figures) . . . . . . . . . . . . . . . . . . . 53
3.1 Introductory Remarks. . . . . . . . . . . . . . . . . . . . . . . 53
3.2 Characteristics of Optical Surface Damage. . . . . . . . . . . 55
3.3 Possible Causes of Optical Damage. . . . . . . . . . . . . . . 58
3.4 Investigation of Optical Surface Damage Mechanisms. . . . 63
3.4.1 Laser Ablation as a Probe of Optical Damage . . . . . 63
3.4.2 Surface Analytical Techniques. . . . . . . . . . . . . . . 71
3.4.3 Laser Pump-Probe Measurements. . . . . . . . . . . . 74
3.5 Concluding Remarks. . . . . . . . . . . . . . . . . . . . . . . . 82
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 82
4. Pulsed-Laser Deposition of High-Temperature
Superconducting Thin Filins
By T.V. Venkatesan (With 17 Figures). . . . . . . . . . . . . . . . 85
4.1 Advantages of Pulsed-Laser Deposition. . . . . . . . . . . . . 85
4.2 Materials Base . . . . . . . . . . . . . . . . . . . . . . . . . . . 87
4.3 Laser-Beam-Target Interaction . . . . . . . . . . . . . . . . . 88
4.3.1 Target Texturing. . . . . . . . . . . . . . . . . . . . . . . 88
4.3.2 Particle Deposition . . . . . . . ... . . . . . . . . . . . 89
4.4 Dynamics of the Laser-Produced Plume. . . . . . . . . . . 91
4.5 Evaporant-Substrate Interaction. . . . . . . . . . . . . . . . 93
4.6 Frontiers of High-Temperature Superconducting
Thin-Film Research . . . . . . . . . . . . . . . . . . . . . . . . 94
4.6.1 Epitaxial Multilayers . . . . . . . . . . . . . . . . . . . . 94
4.6.2 Work on Ultrathin Films. . . . . . . . . . . . . . . . . . 96
4.6.3 Control of Phase and Crystallinity in Thin-Film Form 97
4.7 Scaling-up to Larger Areas. . . . . . . . . . . . . . . . . . . . 98
4.8 Future Directions. . . . . . . . . . . . . . . . . . . . . . . . . . 102
4.8.1 Component Development. . . . . . . . . . . . . . . . . 102
4.8.2 System Issues. . . . . . . . . . . . . . . . . . . . . . . . . 102
4.9 Summary. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 104
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 104
Contents IX
5. Interaction of Laser Radiation with Organic Polymers
By R. Srinivasan (With 21 Figures). . . . . 107
5.1 History. . . . . . . . . . . . . . . . . . . . . 107
5.2 Characteristics of UV-Laser Ablation. . . 108
5.3 Chemical Physics of the Ablation Process 113
5.3.1 Ablation Products. . . . . 114
5.3.2 Time Profile of Ablation. . . 115
a) Polyimide . . . . . . . . . . 116
b) Polymethyl Methacrylate. 123
5.4 Theories of Ultraviolet-Laser Ablation. 129
5.5 Contemporary Trends in UV-Laser Ablation 130
References . . . . . . . . . . . . : . . . . . . . . . . 131
6. Laser Ablation and Laser Desorption Techniques
with Fourier-Transform Mass Spectrometry (FTMS)
By R.L. Hettich and C. Jin (With 7 Figures) . . . . . 135
6.1 Principles of FTMS Operation. . . . . . . . . . . 136
6.1.1 Ion Formation. 136
6.1.2 Ion Trapping. . . . . . . . 137
6.1.3 Ion Detection. . . . . . . . 138
6.1.4 Ion Structural Techniques 139
6.2 Laser-Ablation FTMS for Clusters 140
6.2.1 Cluster Formation. . . . . . . 140
6.2.2 Accurate Mass
and High-Resolution Measurements 143
6.2.3 Ion-Molecule Reactions. . . . . . . 144
6.2.4 Collision-Activated Dissociation. . . . 146
6.3 Laser-Desorption FTMS for Biomolecules . 147
6.3.1 Development of Matrix-Assisted
Laser Desorption . . . . . . . . . . . . . 147
6.3.2 Interfacing MALDI with FTMS . . . . 148
6.3.3 Ion-Trapping Considerations for MALDI-FTMS 149
6.3.4 Combining Separation Methods
with MALDI-FTMS 152
6.4 Future Directions. 152
6.5 Conclusions. 154
References . . . . . . . 154
7. Diagnostic Studies of Laser Ablation for Chemical Analysis
By A.D. Sappey and N.S. Nogar (With 5 Figures) . 157
7.1 Laser Ablation in Vacuum . . . . . . . . . . . . . . . . . 158
7.1.1 Instrumentation . . . . . . . . . . . . . . . . . . . . 159
7.1.2 Physical Processes for Laser Ablation In Vacuo. 162
7.1.3 Examples . . . . . . . . . . . . . . . . . . . . . . . . 165