Description:Content: Radiation effects on polymeric materials : a brief overview / Elsa Reichmanis, Curtis W. Frank, James H. O'Donnell, and David J.T. Hill -- Dosimetry : the forgotten art / Philip W. Moore -- Heterogeneous nature of radiation effect on polymers / Yoneho Tabata -- Temperature effects on the radiation degradation of poly(isobutene) and poly([alpha]-methylstyrene) / David J.T. Hill, T.T. Le, James H. O'Donnell, M.C. Senake Perera, and Peter J. Pomery -- Radiolytic formation and decay of trans-vinylene unsaturation in polyethylene / B.J. Lyons and W.C. Johnson -- Radiation-induced structural changes in polychloroprene / David J.T. Hill, James H. O'Donnell, M.C. Senake Perera, and Peter J. Pomery -- Applications of radiation treatment of ultradrawn polyethylene / David F. Sangster -- Role of homopolymer suppressors in UV and radiation grafting in the presence of novel additives : significance of processes in analogous curing reactions / P.A. Dworjanyn, J.L. Garnett, M.A. Long, Y.C. Nho, and M.A. Khan -- Photoinitiated polymerization of liquid crystalline monomers bearing nonaromatic mesogenic units / C.E. Hoyle, A.C. Griffin, D. Kang, and C.P. Chawla -- Electronic structure, photophysics, and photochemistry of polysilanes / Josef Michl and Ya-Ping Sun -- Excitation-energy migration and trapping in photoirradiated polymers / K.P. Ghiggino, C.G. Barraclough, and R.J. Harris -- Structure of polymer films studied with picosecond total internal reflection fluorescence spectroscopy / Minoru Toriumi and Hiroshi Masuhara -- X-ray and deep UV radiation response of t-butoxycarbonyl-protected 4-hydroxystyrene-sulfone copolymers / A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, Elsa Reichmanis, and L.F. Thompson -- Polarity change for the design of chemical amplification resists / Hiroshi Ito -- Chemically amplified X-ray resists / J.W. Taylor, C. Babcock, and M. Sullivan -- Diazonaphthoquinone-novolac resist dissolution in composite Langmuir-Blodgett and spin-cast films / Laura L. Kosbar, Curtis W. Frank, R. Fabian W. Pease, and John Hutchinson -- New photoresist processes at UV wavelengths less than 200 nanometers / D.J. Ehrlich, R.R. Kunz, M.A. Hartney, M.W. Horn, and J. Melngailis -- Space environmental effects on selected long duration exposure facility polymeric materials / Philip R. Young and Wayne S. Slemp -- Characterization of matrix polymers for electron-beam-cured fiber-reinforced composites / C.B. Saunders, A. Singh, V.J. Lopata, W. Kremers, and M. Tateishi -- Radiation effects on polymers of biomedical significance / Shalaby W. Shalaby -- Copolymerization of glycolide with polymeric radiostabilizers for the preparation of radiation sterilizable braided sutures / Dennis D. Jamiolkowski, Rao S. Bezwada, and Shalaby W. Shalaby.