Ion Beams in Nanoscience and Technology PDF
Preview Ion Beams in Nanoscience and Technology
Ion Beams in Nanoscience and Technology Particle Acceleration and Detection TheseriesParticleAccelerationandDetectionisdevotedtomonographtextsdeal- ing with all aspects of particle acceleration and detection research and advanced teaching. The scope also includes topics such as beam physics and instrumenta- tionaswellasapplications.Presentationsshouldstronglyemphasizetheunderlying physicalandengineeringsciences.Ofparticularinterestare (cid:129) contributions which relate fundamental research to new applications beyond the immediaterealmoftheoriginalfieldofresearch (cid:129) contributionswhichconnectfundamentalresearchintheaforementionedfieldsto fundamentalresearchinrelatedphysicalorengineeringsciences (cid:129) concise accounts of newly emerging important topics that are embedded in a broader framework in order to provide quick but readable access of very new materialtoalargeraudience Thebooksformingthiscollectionwillbeofimportanceforgraduatestudentsand activeresearchersalike. SeriesEditors: AlexanderChao SLAC 2575SandHillRoad MenloPark,CA94025 USA ChristianW.Fabjan CERN PPEDivision 1211Gene`ve23 Switzerland FrankZimmermann CERN SL-Division APGroup 1211Gene`ve23 Switzerland Forfurthervolumes: http://www.springer.com/series/5267 · · Ragnar Hellborg Harry J. Whitlow Yanwen Zhang Editors Ion Beams in Nanoscience and Technology With a Foreword by Sir Michael W. Thompson 123 Editors RagnarHellborg HarryJ.Whitlow LundUniversity DepartmentofPhysics DepartmentofPhysics UniversityofJyva¨skyla¨ So¨lvegatan14 FI-40014Jyva¨skyla¨ SE-22362Lund Finland Sweden [email protected] YanwenZhang PacificNorthwestNationalLaboratory P.O.Box999 RichlandWA99352 USA ISSN1611-1052 ISBN978-3-642-00622-7 e-ISBN978-3-642-00623-4 DOI10.1007/978-3-642-00623-4 SpringerHeidelbergDordrechtLondonNewYork LibraryofCongressControlNumber:2009927002 (cid:2)c Springer-VerlagBerlinHeidelberg2009 Thisworkissubjecttocopyright.Allrightsarereserved,whetherthewholeorpartofthematerialis concerned,specificallytherightsoftranslation,reprinting,reuseofillustrations,recitation,broadcasting, reproductiononmicrofilmorinanyotherway,andstorageindatabanks.Duplicationofthispublication orpartsthereofispermittedonlyundertheprovisionsoftheGermanCopyrightLawofSeptember9, 1965,initscurrentversion,andpermissionforusemustalwaysbeobtainedfromSpringer.Violations areliabletoprosecutionundertheGermanCopyrightLaw. Theuseofgeneraldescriptivenames,registerednames,trademarks,etc.inthispublicationdoesnot imply,evenintheabsenceofaspecificstatement,thatsuchnamesareexemptfromtherelevantprotective lawsandregulationsandthereforefreeforgeneraluse. Coverdesign:WMXDesignGmbH,Heidelberg Printedonacid-freepaper SpringerispartofSpringerScience+BusinessMedia(www.springer.com) ToGun,IngegerdandBill Foreword Tomakethings,howeverlargeorsmall,oneneedstoolsandmeasuringinstruments. Butbeforeanythingcanbemadebytechnologyonemustunderstandthroughsci- encehowthetoolsandinstrumentswork.Thisbookisforthosewhowishtomake thingsthataresosmallthatthepositionandsizeofindividualatomsbegintomatter, andwheredimensionsaremeasuredinnanometres. Howcanonecontrolthemakingprocessforsuchthingsandhowcanwevisu- alise what has been made? Such abilities came with the invention of microscopes based upon electron or ion optics and devices based upon ion scattering or sput- teringthatprobebeneathasurface.Theseareinstrumentswhichcanmeasurewith nanometreprecision. Whattoolsareavailableforthemakingprocess?Somecamethroughunderstand- ing atomic collision processes under surfaces bombarded by energetic ions. Some others came from understanding how energy is lost from ions penetrating beneath thesurface.Thatsciencegaveussomeofthetoolsfornanotechnologyintheform of ion accelerators. With these one can precisely shape a surface by sputtering it away and modify the layer beneath by radiation damage. Also one can make new alloys or compounds in very thin layers by implanting energetic ions beneath the surface. Suchwasthestartingpointformanyendeavoursreportedinthisbook;andhav- ing been absent myself from any laboratory for many years, it is gratifying to see howmuchmoreofthescienceiswellunderstoodandhowmanythingsofvalueto theworldcanbemadethroughthiskindoftechnology. From the beginning the electronics industry took a commendably long view by promoting this research in the universities as well as in its own laborato- ries.Exchanges ofstafftookplaceandcollaboration ensuredtheopportunities for youngscientiststopursuetheircareersthroughindustrialresearchanddevelopment. Geographically the field initiated in North America, Europe, and Australasia but interestquicklyspreadtoAsia,becomingamajoractivityintheburgeoningopto- electronicsindustriesthere.Industrialscaleplantsarecommonplaceinproduction units,andthenewerapplicationsextendintothebiomedicalsciencesandelectrome- chanical engineering. On the human side one could properly say there is now a third generation of scientists and engineers using ion beams in nanoscience and technology. vii viii Iexpectthatnewunderstandinggainedthroughcurrentresearchwillenableyet morenewthingstobemade.Thisbookshouldassistbothactivities.Tothosewho willmakethediscoveriesandinventionsIexpressthehopethattheymayexperience personalfulfilmentthroughtherealisationoftheirideas. Cornwall MichaelThompson June2009 Editor’s note: Professor Sir Michael W. Thompson was one of the early pio- neersofatomiccollisionsinsolids,whichformedtheseedfromwhichthemodern applications of ion beams in nanoscience and technology grew. His contributions includecornerstonedevelopmentsinsputteringinamorphousmaterialsandsingle crystalssputtering,surfacescatteringprocesses,andchannelling.Subsequently,Sir Michael was appointed vice-chancellor of the University of East Anglia and then Birmingham before a period working in a leading position in the financial sector afterretirementfromacademiclife. Preface Energeticionbeamirradiationisthebasisofawideplethoraofpowerfulresearch and fabrication techniques for materials characterisation and processing on a nanometrescale.Ionimplantationisincreasinglyemployedtotailorvariousmate- rialproperties,focusedionbeamscanbeusedtomachineawayanddepositmate- rial on a scale of nanometres, and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics. More recent developments are the use of MeV proton beams and other ions to fabricate 3D nanostructures with extreme aspect ratios for tissue engineering and nanofluidics lab-on-a-chipdevices. The potency of these energetic ion beam techniques lies in the electrostatic Coulomb interaction between energetic ions and individual atoms of the material. This allows substantial amounts of energy and momentum to be transferred to a singleatomorelectroninawaythatisnotpossiblewithotherprobessuchasener- geticelectrons,photons,etc.Sincethestartofthedevelopmentofionaccelerators in the 1930s that were capable of producing high quality ion beams, energetic ion beammethodshaveplayedaleadingpartattheveryforefrontofthedevelopmentof ourmodernhightechnologysociety.Thetechnologybehindtheseacceleratorshas developed in synergy with this technological development of materials. Dedicated ionimplantationmachinesevolvedfromtheearlyisotopeseparatorsbyadditionof sophisticatedtargethandlingsystems.Atthesametime,spurredonbythequestfor higherenergyionsforfundamentalnuclearscience,higherenergymachinesevolved from the single-ended belt-driven machines to tandem accelerators. Since about the mid 1970s, more machines were installed for materials research than nuclear research. The requirements of energy stability and small machines led to intro- ductionofthepellet-chaincharged(Pelletron)andmorerecentlyrectifier-capacitor machines(firstusedbyCockroftandWaltoninthebeginningofthe1930s). Certainly, the development of today’s powerful personal computers and mobile communications would not have been possible without the use of energetic ion beams in nanotechnology. At the time of writing this book preface, society is fac- ingnewchallenges,suchasthedevelopmentofsustainabletechnologies,pandemic diseasecontrol,andenvironmentalissues.Thebroadrangeofapplicationsandthe usefulness of nanoscience and -technology methods using ion beams makes them reallyusefultoolsformeetingthesechallenges.Alreadytheyhavebeenemployed ix x fordevelopingbymutagenisishigh-yieldingandresistantcashcropsanddeveloping efficientcoatingsforsolarenergyconversion. Inthiswork,establishedscientistsfromaroundtheworldhavecontributeddeep knowledgeintheirrespectivefields.Thegoalistoproduceaworkthatisnotonlya guidetopractitioners,researchers,andstudentsacrossthewholecross-disciplinary spanofnanoscienceandtechnology,butalsoservestostimulateworkinnewareas where energetic ion beam methods can contribute to front-line research. Through- out the book the general recommendations of the International Union of Pure and AppliedPhysics(IUPAP)aboutunitshavebeenfollowed. WeareespeciallygratefultoProfessorSirMichaelThompsonforkindlyaccept- ingourinvitationtowritetheForewardtothisbook.SirMichaelwasoneoftheearly pioneersinthefieldofionbeamsinnanoscience.Testimonialstohisinfluenceand relevanceinthefieldarethathisresearchondefectsandradiationdamage,under- standingofthesputteringprocess,andalsothescatteringofionsfromthesurface layersinmaterialsarereoccurringthemesinmanycontributionstothisbook. Lund,Sweden RagnarHellborg Jvya¨skyla¨,Finland HarryJ.Whitlow Richland,Washington YanwenZhang June2009 Contents PartI TrendsinNanoscienceandTechnology NanoscaleEngineeringintheBiosciences ............................. 3 DanielJ.WhiteandHarryJ.Whitlow HighSpeedElectronics ............................................. 21 MikaelO¨stlingandB.GunnarMalm SurfaceModificationUsingReactiveLandingofMass-SelectedIons ..... 37 PengWangandJuliaLaskin PartII BasicIon-MatterInteractionsinNanometreScaleMaterials BasicsofIonScatteringinNanoscaleMaterials ........................ 69 HarryJ.WhitlowandYanwenZhang Box1:StoppingofIonsinNanomaterials ............................. 87 YanwenZhangandWilliamJ.Weber Box2:Sputtering .................................................. 95 HansHenrikAndersen Box3:IonRanges .................................................103 YanwenZhang ComputerSimulationMethodsforDefectConfigurationsandNanoscale Structures ........................................................107 FeiGao CharacterizingNanoscaleCrystalPerfectionbyCrystalMapping .......129 SachikoT.Nakagawa xi
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