Rochester Institute of Technology RIT Scholar Works Theses Thesis/Dissertation Collections 6-1-1986 CMOS analog transmission gate design Cynthia S. Bell Follow this and additional works at:http://scholarworks.rit.edu/theses Recommended Citation Bell, Cynthia S., "CMOS analog transmission gate design" (1986). Thesis. Rochester Institute of Technology. Accessed from This Thesis is brought to you for free and open access by the Thesis/Dissertation Collections at RIT Scholar Works. It has been accepted for inclusion in Theses by an authorized administrator of RIT Scholar Works. For more information, please [email protected]. CMOS ANALOG TRANSMISSION GATE DESIGN by Cynthia S. Bell A Thesis Submitted in Partial Fulfillment of the Requirements for the Degree of MASTER OF SCIENCE in Electrical Engineering Approved by: _Ly .::.-n_n_F_e _Fu _I_1e _r_ _ Prof. ._N_a_m_e_lIl_e-=g~ib_le_ __ Prof ._N_a_m_e_lIl_e-=g~ib_le_ __ Prof Prof. ___________________________ _ DEPARTMENT OF ELECTRICAL ENGINEERING COLLEGE OF ENGINEERING ROCHESTER INSTITUTE OF TECHNOLOGY ROCHESTER, NEW YORK JUNE, 1986 ~J~ Tmtls.OIt~'7i\ &w.l~§~ CMOS Title of Theda C__y_ n__ t_h_ia_S_u_e_B_e_II_ _______ bereb~. I __ (grant, deny) permission to the Wallace Memorial L1braryl of R.I'-T. , to , reproduce my thesis in whole or in part. Any reproduction will not be tor commercial use or profit. -XI- ABSTRACT CMOS technology has provided an integrated circuit equivalent for the conventional electromechanical switch: the transmission gate. CMOS analog transmission gates degrade signals passed through them with noise due to gate clock feedthrough transients. A SPICE parameter model for the Eastman Kodak CMOS process has been developed and timing requirements for feedthrough cancellation in typically structured transmission gate devices have been studied. An alternate device structure for improved performance is proposed. -iii- TABLE OF CONTENTS Page LIST OF FIGURES iv LIST OF TABLES V LIST OF SYMBOLS vi INTRODUCTION 1 BACKGROUND & THEORY 2 DISCUSSION A. Transmission Gate Test Structure Evaluation 12 B. Transistor Evaluation 17 1 Experimental Procedures . a. I-V Test Procedures 18 b. gjj Test Procedures 19 c . VT , 7 Test Procedures . . 20 2. Modified Gate and Channel Transistor Evaluation 22 3. CMOS Process Characterization Measurements 24 RESULTS A CMOS Process Parameters 29 . B. Transmission Gate Model and Timing Requirements 33 C. Proposed Structure for Improved Performance 39 CONCLUSIONS 41 APPENDIX A - Modified Gate and Channel Transistor Data APPENDIX B - CMOS Process Characterization Transistor Data APPENDIX C - Parameter Extraction Calculations APPENDIX D - Gate Clock Timing SPICE Simulations -iv- LIST OF FIGURES Figure 1 Simple FET Switch 2 . Figure 2. Improved Switch 4 Figure 3. Improved Switch Cross-Section 5 Figure 4. Schematic Transmission Gate 6 Figure 5. Clock-Phase Controller 8 Figure 6. Circular Pass Transistor 8 Figure 7. Ron vs. Vin 9 Figure 8 Transmission Gate Leakage Model 10 . Figure 9 Alternative Transmission Gate 10 . Figure 10. Transmission Gate Test Structure 13 Figure 11. P- and n-channel Ron Vs . Vin 14 Figure 12. Transmission gate Ron vs. Vin vs. VG 14 Figure 13. Asymmetrical Clock Circuit 16 Figure 14. Drain Voltage and P Gate Clock 17 Figure 15. Drain Voltage and N Gate Clock 17 Figure 16. Typical I-V curve 19 Figure 17. Typical gM curve 21 Figure 18. Typical VT J curve 21 , Figure 19. Flared Buried Channel FET 22 Figure 20. Segmented Drain FET 23 Figure 21. Photomicrograph of Segmented Drain Device 24 Figure 22. Die Position vs. VT 26 Figure 23. I-V Curve: Model and Data T2 6u 31 Figure 24. I-V Curve: Model and Data T2 80u 31 -v- Figure 25. I-V Curve: Model and Data T4 6u 32 Figure 26. I-V Curve: Model and Data T4 80u 32 Figure 27. SPICE Transmission Gate Circuit Model 33 Figure 28 . Model of N-channel Transient 35 Figure 29 . Model of P-channel Transient 35 Figure 30. Model with Misaligned Gate Clocks 36 Figure 31. Model with Aligned Gate Clocks 36 Figure 32. Model with Retarded N-channel Clock Slope 37 Figure 33. Model with .03 Nanosecond N-channel Clock Lag.. 37 Figure 34. Model with .04 Nanosecond N-channel Clock Lag.. 38 Figure 35. Model with .05 Nanosecond N-channel Clock Lag.. 38 Figure 36. New Transmission Gate Structure 40 LIST OF TABLES Table 1. Resistance Variation with Gate Voltage 15 Table 2. Resistance Variation with Device Width 15 Table 3. Agreement of Simulated and Measured I-V Curves... 29 Table 4. SPICE Parameters for CMOS Process 30 -VI- LIST OF SYMBOLS Symbol Definition, units Nsub Substrate (or tub) dopant concentration, atoms/cm3 ni Intrinsic carrier concentration, atoms/cm3 Permittivity, Farads/meter t Thickness, meters *f Fermi potential U Micron (10-6 meters) P Mobility, centimeters2/Volt-second W Device channel width, meters L Device channel length, meters 7 Body effect factor A Channel length modulation factor vG Gate voltage, Volts vD Drain voltage, Volts vs Source voltage. Volts Vin Input (signal) voltage. Volts VT Threshold voltage. Volts VT0 Zero bias threshold voltage, Volts Q Resistance, Ohms K Boltzmann's constant, 1.38*1023 Joules/0 Kelvin Kilo (103) vk T Temperature, Kelvin q Charge, Coulombs ys MOSFET gain factor INTRODUCTION CMOS technology has provided an integrated circuit equivalent for the conventional electromechanical switch: the transmission gate. The use of transmission gates can lead to more efficient layouts and can reduce logic, thus reducing die size and improving circuit speed. This gate is often used to multiplex signals into analog- to-digital converters, to tristate lines, and to isolate sections of circuits. The transmission gate has become a major building block for logic design, data filtering, data conversion, and other signal processing circuits. Transmission gates can benefit many functions, but they have limitations which are a result of their resistive nature. They have no drive capability of their own. An ideal semiconductor switch would have infinite off-resistance, zero on-resistance , no leakage, no parasitic capacitance, and would consume no power. Since the transmission gate is not ideal, the integrated circuit designer must optimize performance by using the switch configuration that most closely meets circuit requirements. In this work, emphasis is placed on transmission gates which rapidly switch small signals with minimum signal distortion. Further, a transmission gate configuration suitable for the CMOS process at the Eastman Kodak Company is sought . 2 - BACKGROUND AND THEORY The simplest switch implementation is a pass transistor, such as the Field Effect Transistor (FET) shown in figure 1. FET switches can be used to transfer voltage to nodes with large impedances, to switch currents between two alternative loops, or to transfer charge, as with switched capacitor filters, where charge is conserved. ^ l 1 <R Figure 1. Simple FET Switch The signal at the output, Vout , Vout = IdR (D depends on the current through the device, ID , iDsat = ;8(Vgs - VT)2 (2a) where JS is composed of the fabrication and geometrical parameters, = //OXW / 2toxL( 1 + AVDS) (2b) With the appropriate biases, the voltage on the gate of the device, VGS, controls the blockage or passage of signals. This switch implementation has three important limitations. The first is a result of the requirement for conduction: the voltage
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