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Applied Surface Science 1992 - 1993: Vol 62-71 Index PDF

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Preview Applied Surface Science 1992 - 1993: Vol 62-71 Index

ISSN 0169-4332 | Surface science PAW (o)0igat-|mel-)1/0)(-10m (oe-le)0)|[=1e 8a)\ "zc(e1x ) and chemistry of surfaces and interfaces North-Holland APPLIED SURFACE SCIENCE Editors: L.C. Feldman, J. Nishizawa, W.F. van der Weg Founding Editor: R.L. Park Advisory Editorial Board: D.E. Aspnes, Red Bank, NJ S. Hofmann, Stuttgart, Germany G.A. Somorjai, Berkeley, CA M. Balkanski, Paris, France H. Ishiwara, Yokohama, Japan S. Ushioda, Sendai, Japan J.C. Bean, Murray Hill, NJ D.A. King, Cambridge, UK W.H. Weinberg, Santa Barbara, CA S. Chambers, Richmond, WA K.M. Maex, Leuven, Belgium J.M. White, Austin, TX J. Chikawa, Hyogo, Japan J.W. Niemantsverdriet, Eindhoven, The Netherlands Xie Xide, Shanghai, China R.B. Hall, Annandale, NJ P.R. Norton, London, Canada J.T. Yates, Pittsburgh, PA M. Henzler, Hannover, Germany C.J. Powell, Gaithersburg, MD M.L. Yu, Yorktown Heights, NY M. Hirose, Hiroshima, Japan E. Rimini, Catania, Italy Scope: Applied Surface Science is concerned with applied physics and chemistry of surfaces and interfaces and with the atomistic description of processing, modification and characterization of surfaces, interfaces and thin films. These include growth and epitaxy, oxidation, reactivity as well as surface modification by directed energy deposition (lasers, ion or electron beams) or other techniques (i.e. plasma etching). Important areas in the field are electronic materials (i.e. semiconductors, organic films, ceramics) and chemical processes at surfaces (catalysis, corrosion, reactivity). Information for Authors: Contributions shall be written in English and should be submitted in triplicate directly to one of the editors listed below: Dr. L.C. Feldman Professor Jun-ichi Nishizawa Professor W.F. van der Weg Room 1E-351 Tohoku University Department of Atomic and Interface Physics AT&T Bell Laboratories 2-1-1 Katahira University of Utrecht Murray Hill, New Jersey 07974 Aoba-ku, Sendai P.O. Box 80.000, 3508 TA Utrecht USA Japan 980 The Netherlands FAX: + 1-908-582 4228 FAX: +81-22-262 3180 FAX: +31-30-543 165 E-Mail: [email protected] Detailed information on the preparation of manuscripts may be found on the inside back cover. All correspondence with the publisher regarding manuscripts accepted for publication should be addressed to: Applied Surface Science Technical Editors P.O. Box 103 1000 AC Amsterdam The Netherlands FAX: + 31-20-5862 580 Applied Surface Science is published semimonthly in January, March, April, May, June, July and monthly in February, August, September, October, November and December (total 18 issues) by Elsevier Science Publishers. For 1993, 9 volumes have been announced. The subscription price for these volumes is Dfl. 3060.00 (US$ 1700). Postage and handling amount to Dfl. 297 (US$ 165). Therefore the total price is Dfl. 3357.00 (US$ 1865). The price for a combined subscription to the 1993 volumes of Applied Surface Science, Surface Science and Surface Science Reports is Dfl. 12648.00 (US$ 7027), including postage and handling. The Dutch guilder prices are definitive; the currency equivalents are for your guidance only. Subscriptions should be sent to the Publisher, Elsevier Science Publishers B.V., Journals Department, P.O. Box 211, 1000 AE Amsterdam, or to any subscription agent or bookseller. Claims for issues not received should be made within six months of publication. If not, they cannot be honoured free of charge. Elsevier Science Publishers B.V. All rights reserved. No part of this publication may be reproduced, stored in a retrieval system or transmitted in any form or by any means, electronic, mechanical, photocopying, recording or otherwise, without the written permission of the Publisher, Elsevier Science Publishers B.V., Copyright & Permissions Department, P.O. Box 521, 1000 AM Amsterdam, The Netherlands. Special regulations for authors — Upon acceptance of an article by the journal, the author(s) will be asked to transfer copyright of the article to the Publisher. This transfer will ensure the widest possible dissemination of information. Special regulations for readers in the USA — This journal has been registered with the Copyright Clearance Center, Inc. Consent is given for copying of articles for personal or internal use, or for the personal use of specific clients. This consent is given on the condition that the copier pays through the Center the per-copy fee stated in the code on the first page of each article for copying beyond that permitted by Sections 107 or 108 of the US Copyright Law. The appropriate fee should be forwarded with a copy of the first page of the article to the Copyright Clearance Center, Inc., 21 Congress Street, Salem, MA 01970, USA. If no code appears in an article, the author has not given broad consent to copy and permission to copy must be obtained directly from the author. All articles published prior to 1981 may be copied for a per-copy fee of US$ 2.25, also payable through the center. (N.B. For review journals this fee is US$ 0.20 per copy per page.) This consent does not extend to other kinds of copying, such as for general distribution, resale, advertising and promotion purposes, or for creating new collective works. Special written permission must be obtained from the Publisher for such copying. US mailing notice — Applied Surface Science (ISSN 0169-4332) is published semimonthly in January, March, April, May, June, July and monthly in February, August, September, October, November and December (total 18 issues) by Elsevier Science Publishers, Molenwerf 1, P.O. Box 211, 1000 AE Amsterdam, The Netherlands. Annual subscription price in the USA is US$ 1865 (subject to change), including air speed delivery. Application to mail at second class postage rate is pending at Jamaica NY 11431. USA POSTMASTERS: Send address changes to Applied Surface Science, Publications Expediting, Inc., 200 Meacham Avenue, Elmont NY 11003. Airfreight and mailing in the USA by Publications Expediting. No responsibility is assumed by the Publisher for any injury and/or damage to persons or property as a matter of products liability, negligence or otherwise, or from any use or operation of any methods, products, instructions or ideas contained in the material herein. Although all advertising material is expected to conform to ethical standards, inclusion in this publication does not constitute a guarantee or endorsement of the quality or value of such product or of the claims made of it by its manufacturer. This issue is printed on acid-tree paper. Printed in The Netherlands APPLIED SURFACE SCIENCE Editorial Board Dr. L.C. Feldman Professor Jun-ichi Nishizawa Professor W.F. van der Weg Room 1E-351 Tohoku University Department of Atomic and AT&T Bell Laboratories 2-1-1 Katahira Interface Physics Murray Hill, New Jersey 07974 Aoba-ku, Sendai University of Utrecht USA Japan 980 P.O. Box 80.000, 3508 TA Utrecht The Netherlands FAX: + 1-908-582 4228 FAX: + 81-22-262 3180 FAX: +31-30-543 165 E-Mail: [email protected] Advisory Editorial Board D.E. Aspnes S. Hofmann E. Rimini Bell Communications Research Max-Planck-Institut Universita di Catania Red Bank, NJ 07701, USA fir Metallforschung 1-95129 Catania, Italy D-7000 Stuttgart 1, Germany M. Balkanski G.A. Somorjai Université Pierre et Marie Curie H. Ishiwara University of California 75230 Paris Cedex 05, France Tokyo Institute of Technology Berkeley, CA 94720, USA Yokohama 227, Japan J.C. Bean S. Ushioda AT&T Bell Laboratories D.A. King Tohoku University Murray Hill, NJ 07974, USA University of Cambridge Aoba-ku, Sendai 980, Japan Cambridge CB2 1EW, UK S. Chambers W.H. Weinberg Pacific Northwest Laboratory K.M. Maex University of California Richland, WA 99352, USA IMEC vzw Santa Barbara, CA 93106, USA B-3030 Leuven, Belgium J. Chikawa J.M. White Himeji Institute of Technology J.W. Niemantsverdriet University of Texas at Austin Ako-gun, Hyogo 678-12, Japan Eindhoven University Austin, TX 78712, USA of Technology R.B. Hall NL-5600 MB Eindhoven Xie Xide Exxon Research and Engineering The Netherlands Fudan University Annandale, NJ 08801, USA Shanghai, China P.R. Norton M. Henzler University of Western Ontario J.T. Yates, Jr. Universitat Hannover London, Ontario N6A 5B7, Canada University of Pittsburgh D-3000 Hannover 1, Germany Pittsburgh, PA 15260, USA C.J. Powell M. Hirose National Institute of Standards M.L. Yu Hiroshima University and Technology IBM T.J. Watson Research Center Higashi-Hiroshima 724, Japan Gaithersburg, MD 20899, USA Yorktown Heights, NY 10598, USA applied Surface science A JOURNAL DEVOTED TO APPLIED PHYSICS AND CHEMISTRY OF SURFACES AND INTERFACES Editors: L.C. Feldman, Murray Hill, NJ, USA J. Nishizawa, Sendai, Japan W.F. van der Weg, Utrecht, The Netherlands Master Index to Volumes 62-71 NORTH-HOLLAND © 1993 Elsevier Science Publishers B.V. All rights reserved No part of this publication may be reproduced, stored in a retrieval system or transmitted in any form or by any means, electronic, mechanical, photocopying, recording or otherwise, without the written permission of the Publisher, Elsevier Science Publishers B.V., Copyright & Permissions Department, P.O. Box 521, 1000 AM Amsterdam, The Netherlands. Special regulations for authors — Upon acceptance of an article by the journal, the author(s) will be asked to transfer copyright of the article to the Publisher. This transfer will ensure the widest possible dissemination of information. Special regulations for readers in the USA — This journal has been registered with the Copyright Clearance Center, Inc. Consent is given for copying of articles for personal or internal use, or for the personal use of specific clients. This consent is given on the condition that the copier pays through the Center the per-copy fee stated in the code on the first page of each article for copying beyond that permitted by Sections 107 or 108 of the US Copyright Law. The appropriate fee should be forwarded with a copy of the first page of the article to the Copyright Clearance Center, Inc., 21 Congress Street, Salem, MA 01970, USA. If no code appears in an article, the author has not given broad consent to copy and permission to copy must be obtained directly from the author. All articles published prior to 1981 may be copied for a per-copy fee of US$ 2.25, also payable through the Center. (N.B. For review journals this fee is US$ 0.20 per copy per page.) This consent does not extend to other kinds of copying, such as for general distribution, resale, advertising and promotion purposes, or for creating new collective works. Special written permission must be obtained from the Publisher for such copying. No responsibility is assumed by the Publisher for any injury and/or damage to persons or property as a matter of products liability, negligence or otherwise, or from any use or operation of any methods, products, instructions or ideas contained in the material herein. Although all advertising material is expected to conform to ethical standards, inclusion in this publication does not constitute a guarantee or endorsement of the quality or value of such product or of the claims made of it by its manufacturer. This volume is printed on acid-free paper. PRINTED IN THE NETHERLANDS MASTER INDEX Volumes 62-71 Author index Subject index List of terms used in the subject index Author index to volumes 62-71 Abraham, P., see Benyattou, T. 63 (1993) 197 Allan, G., see Lannoo, M. 65 /66 (19936)7 6 Abraham, P., Y. Monteil, M. Sacilotti, T. Allinger, Th. and J.A. Schaefer, Hydro- Benyattou, M.A. Garcia, S. Moneger, carbon-based etching of InP 65 /66 (19936)1 4 A. Tabata, R. Landers, J. Morais and Alonso, M., see Chassé, Th. 64 (1993) 329 M. Pitaval, Optical studies of InP /In- Alsina, F., see Peyre, H. 63 (1993) 177 AIlAs/InP interface recombinations 65/66 (1993) 777 Alterovitz, S.A., see Yao, H. 63 (1993) 52 Abstreiter, G., see Geiler, H.D. 63 (1993) 260 Alunovic, M., see Voss, A. 69 (1993) 174 Ache, H.J., see Goschnick, J. 70/71 (1993) 63 Alvarez, J., A.L. Vazquez de Parga, J.J. Adamchuk, V.K., see Shikin, A.M. 68 (19934)8 1 Hinarejos, J. De la Figuera, E.G. Addonizio, M.L., see Conte, G. 70/71 (1993) 660 Michel, C. Ocal and R. Miranda, 70/71 (1993) 664 Adriaenssens, G.J., see Demichelis, F. Structural phase transition during Afonso, C.N., F. Vega, J. Gonzalo and C. heteroepitaxial growth of iron sili- Zaldo, Lithium niobate films grown cides on Si(111) 70/71 (1993) 578 69 (19931)4 9 by excimer laser deposition Aman, C. and L. Holmlid, Desorption Afonso, C.N., see Téth, Z. 69 (19933)3 0 and emission of potassium Rydberg Afonso, C.N., see Vega, F. 69 (19934)0 3 atoms and clusters from iron oxide Aguiar, R., see Sanchez, F. 69 (19932)2 1 catalyst surfaces 62 (1992) 201 70/71 (1993) 94 Aguiar, R., see Sanchez, F. Aman, C. and L. Holmlid, Field ioniza- 67 (1993) 36 Aizawa, T., see Ishizawa, Y. tion of Rydberg alkali states outside Aizenberg, G.E., P.L. Swart and B.M. iron oxide catalyst surfaces: peaked Lacquet, Optical characterization of angular distributions of ions 64 (1993) 71 semiconductors containing inhomoge- Amato, G., see Demichelis, F. 70/71 (1993) 664 neous layers 63 (19932)4 9 Ameziane, E.L., see Ijdiyaou, Y. 70/71 (1993) 447 Akahane, T., see Yasui, K. 65/66 (1993) 265 Anderson, T.J., see Fang, J. 70/71 (1993) 701 Akimoto, M., see Okada, K. 65/66 (1993) 758 Andersson, T.G., see Linnarsson, M.K. 70/71 (1993) 40 Akimoto, M., see Ishikawa, K. 70/71 (1993) 691 Andrade, R.F.S., see De Castilho, C.M.C. 67 (1993) 97 Alameh, R., see Borensztein, Y. 65/66 (1993) 735 Andrén, H.-O., see Hu, Q.-H. 67 (1993) 419 Alaoui, M., see Ringeisen, F. 62 (1992) 167 Andreu, J., see Maass, F. 70/71 (1993) 768 Albella, J.M., see Najmi, O. 70/71 (1993) 217 Andritschky, M., see Meng, L. 65 /66 (19932)3 5 Albella, J.M., see Jiménez, C. 70/71 (1993) 475 Andijar, J.L., see Lopez, F. 70/71 (1993) 680 Albers, T., M. Neumann, D. Lipinsky Andijar, J.L., see Campmany, J. 70/71 (1993) 695 and A. Benninghoven, XPS and Angermann, H.-H. and G. Ho6rz, Influ- SIMS/SNMS measurements on thin ence of sulfur on surface carbon 70/71 (1993) 49 metal oxide layers monolayer formation and graphite Alfonsetti, R., L. Lozzi, M. Passacan- growth on nickel 70/71 (1993) 163 tando, P. Picozzi and S. Santucci, XPS Anyele, H.T., A.A. Cafolla and C.C. studies on SiO, thin films 70/71 (1993) 222 Matthai, A study of the electronic Aliouchouche, A., J. Boulmer, B. Bour- structure and Schottky barriers at re- guignon, J.-P. Budin, D. Débarre and constructed Sn/Si interfaces 70/71 (1993) 433 A. Desmur, Laser etching of silicon Anzai, M., see Wada, T. 65 /66 (19933)7 6 by chlorine: effect of post-desorption Arabezyk, W., F. Storbeck and HJ. collisions and chlorine in-diffusion on Miissig, Electron spectroscopy studies the laser desorption yield 69 (1993) 52 on carbon segregation from a mono- 65/66 (1993) 94 Alkemade, P.F.A., K. Werner, S. Rade- crystalline a-Fe(111) specimen laar and W.G. Sloof, A fast method Arabczyk, W., Reinterpretation of the for the simulation of XPS and AES adsorption kinetics data measured by spectra 70/71 (1993) 24 AES and XPS 68 (1993) 369 Allan, G., see Proot, J.P. 65 /66 (19934)2 3 Arakawa, I., see Hoshino, A. 70/71 (1993) 308 Author index to volumes 62-71 Arbab, M., see Colaianni, M.L. 68 (1993) 467 electron spectroscope studies of Ge Arena, A., G. Galli, R. Giorgi, A.M. on Ir 67 (1993) 43 Mezzasalma, S. Patane and G. Saitta, Ashkenazi, A., see Zolotoyabko, E. 63 (1993) 126 Optical properties of (AgI),-(Ag,O0- Ashkenazi, A., Y. Komem and I. Lerner, 2B,0;),_, glasses 65/66 (1993) 302 Microstructural and composition- Arena, C., L. Tarricone, F. Genova and al characterization of TiW/ AI- 65/66 (1993) 746 G. Morello, Temperature depen- (0.8%Si) /T iW/ PtSi/(100)Si dence analysis of the optical transmis- Atkinson, A. and P.T. Moseley, Thin film 65 /66 (19932)1 2 sion spectra in InGaAs/InP multi electroceramics quantum well structures 63 (1993) 202 Aubreton, J., see Champeaux, C. 69 (19931)6 9 Arenholz, E., J. Heitz, M. Wagner, D. Aubreton, J., see Champeaux, C. 69 (19933)3 5 69 (19933)5 9 Bauerle, H. Hibst and A. Hagemeyer, Aubreton, J., see Germain, C. 67 (19933)4 2 Laser-induced surface modification Auger, P., see Pareige, P. and structure formation of polymers 69 (1993) 16 Auger, P., see Danoix, F. 67 (19933)4 8 Aristov, V.Yu., see Le Lay, G. 70/71 (1993) 502 Auret, F.D., see Myburg, G. 70/71 (1993) 511 Armigliato, A., see Vanhellemont, J. 63 (1993) 45 Auret, F.D., see Barnard, W.O. 70/71 (1993) 515 Armigliato, A., see Vanhellemont, J. 63 (1993) 119 Autric, M., see Montagne, J.E. 69 (19931)0 8 69 (1993) 79 Armstrong, S.R., R.D. Hoare, I.M. Povey, Auvert, G., see Boughaba, S. M.E. Pemble, A. Stafford, A.G. Tay- Avila, R.E., see Pilleux, M.E. 65/66 (1993) 283 70/71 (1993) 447 lor and D.R. Klug, Reflectance Azizan, M., see Ijdiyaou, Y. anisotropy from (001) GaAs surfaces during pseudo-ALE growth of GaAs 69 (1993) 46 Baazi, T., E.J. Knystautas and M. Fiset, Arnaud, Y.P., Surface coordination num- Abrasive wear of nitrogen-implanted ber and surface redox couples on cat- boron-coated Ti-6Al-4V and tem- alyst oxides, a new approach of the perature effect on microhardness and 64 (19931)3 3 interpretation of activity and selectiv- sliding friction coefficient 70/71 (1993) 742 ity. I. Interpretation of oxygen ther- Baba, S., see Kinbara, A. mal desorption spectra 62 (1992) 21 Babonneau, F., see Ingo, G.M. 70/71 (1993) 230 Arnaud, Y.P., Surface coordination num- Babu, S.S., K. Hono and T. Sakurai, AP- ber and surface redox couples on cat- FIM studies on martensite tempering alyst oxides, a new approach of the of Fe—C-Si-Mn low alloy steel 67 (1992) 321 interpretation of activity and selectiv- Babu, S.S., K. Hono, R. Okano and T. ity. II. Experimental and theoretical Sakurai, APFIM studies of some alu- bases 62 (1992) 37 minum alloys 67 (1993) 361 Arnaud, Y.P., Surface coordination num- Babu, S.S., see Hono, K. 67 (1993) 391 ber and surface redox couples on cat- Badaev, Yu.B., see Morozenko, E.S. 68 (19934)9 1 alyst oxides, a new approach of the Badan, V.E., see Vladimirov, V.V. 65/66 (1993) 1 interpretation of activity and selectiv- Badawi, K.F., A. Naudon and P. Gou- ity. III. Interpretation of chemical and deau, Residual stress determination catalytic oxidation reactions on some by X-ray diffraction in tungsten thin oxides 62 (1992) 47 films 65/66 (1993) 99 Arnott, D.R., A.R. Wilson, A.N. Rider, Badoz, P.A., see Bomchil, G. 65/66 (1993) 394 L.T. Lambrianidis and N.G. Farr, Badzian, A., see Lamaze, G.P. 65/66 (1993) 587 Studies of the degradation of metal- Badzian, T., see Lamaze, G.P. 65/66 (1993) 587 adhesive interfaces with surface anal- Bahners, T., W. Kesting and E. Scholl- ysis techniques 70/71 (1993) 109 meyer, Designing surface properties Arvia, A.J., see Egli, W.A. 68 (1993) 583 of textile fibers by UV-laser irradia- Arvia, A.J., see Vazquez, L. 70/71 (1993) 413 tion 69 (1993) 12 Ascarelli, P. and S. Fontana, Dissimilar Bai, C., T. Hashizume, D. Jeon and T. grit-size dependence of the diamond Sakurai, Field ion-scanning tunneling nucleation density on substrate sur- microscope investigation of sodium face pretreatments 64 (19933)0 7 adsorption on the GaAs(110)1 x 1 Asensi, J.M., see Lopez, F. 70/71 (1993) 68 surface 67 (1993) 252 Asensi, J.M., see Maass, F. 70/71 (1993) 768 Baillieu, F., see Bourouina, T. 65 /66 (1993) 536 Ashfold, M.N.R., see May, P.W. 68 (19932)9 9 Bak, K. and L. Hilaire, Quantitative XPS Ashino, M., M. Tomitori and O. Nishika- analysis of the oxidation state of wa, Atom-probe and field emission cerium in Pt-CeO,/AlI,O, catalysts 70/71 (1993) 191

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