Table Of Content

ADVANCES IN UNCONVENTIONAL LITHOGRAPHY Edited by Gorgi Kostovski Advances in Unconventional Lithography Edited by Gorgi Kostovski Published by InTech Janeza Trdine 9, 51000 Rijeka, Croatia Copyright © 2011 InTech All chapters are Open Access articles distributed under the Creative Commons Non Commercial Share Alike Attribution 3.0 license, which permits to copy, distribute, transmit, and adapt the work in any medium, so long as the original work is properly cited. After this work has been published by InTech, authors have the right to republish it, in whole or part, in any publication of which they are the author, and to make other personal use of the work. Any republication, referencing or personal use of the work must explicitly identify the original source. Statements and opinions expressed in the chapters are these of the individual contributors and not necessarily those of the editors or publisher. No responsibility is accepted for the accuracy of information contained in the published articles. The publisher assumes no responsibility for any damage or injury to persons or property arising out of the use of any materials, instructions, methods or ideas contained in the book. Publishing Process Manager Alenka Urbancic Technical Editor Teodora Smiljanic Cover Designer Jan Hyrat Image Copyright Triff, 2011. Used under license from Shutterstock.com First published October, 2011 Printed in Croatia A free online edition of this book is available at www.intechopen.com Additional hard copies can be obtained from [email protected] Advances in Unconventional Lithography, Edited by Gorgi Kostovski p. cm. ISBN 978-953-307-607-2 free online editions of InTech Books and Journals can be found at www.intechopen.com Contents Preface IX Part 1 Nanoimprint Lithographies 1 Chapter 1 Soft UV Nanoimprint Lithography: A Tool to Design Plasmonic Nanobiosensors 3 Grégory Barbillon Part 2 Lithographies for Biological Applications 15 Chapter 2 Application of Soft Lithography and Micro-Fabrication on Neurobiology 17 Gao Kan, Chen Haifeng, Liu Bing-Fang and Xu Qun-Yuan Chapter 3 Toward the Precise Control of Cell Differentiation Processes by Using Micro and Soft Lithography 35 Yuzo Takayama, Hiroyuki Moriguchi, Kiyoshi Kotani, Takafumi Suzuki, Kunihiko Mabuchi and Yasuhiko Jimbo Part 3 Self-Assembled Colloidal Substrates for Nanofabrication 51 Chapter 4 Fabrication of Surfaces with Bimodal Roughness Through Polyelectrolyte/Colloid Assembly 53 Christine C. Dupont-Gillain, Cristèle J. Nonckreman, Yasmine Adriaensen and Paul G. Rouxhet Chapter 5 Physical Deposition Assisted Colloidal Lithography: A Technique to Ordered Micro/Nanostructured Arrays 71 Yue Li, Shuyan Gao, Guotao Duan, Naoto Koshizaki and Weiping Cai Part 4 Periodic Structures for Diffractive Optics and Surface Wetting 117 Chapter 6 Design of Circular Dammann Grating: Fabrication and Analysis 119 Fung Jacky Wen and Po Sheun Chung VI Contents Chapter 7 Fabrication of Binary Diffractive Lens on Optical Films by Electron Beam Lithography 139 Atsushi Motogaito and Kazumasa Hiramatsu Chapter 8 Photocontrolled Reversible Dimensional Changes of Microstructured Photochromic Polymers 149 Despina Fragouli, Roberto Cingolani and Athanassia Athanassiou Part 5 Extreme UV Lithography 165 Chapter 9 Approach to EUV Lithography Simulation 167 Atsushi Sekiguchi Preface The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate many diverse research fields. Today, greater flexibility and affordability is demanded from lithography than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book provides an overview of some of the varied approaches and applications of lithography today. Nano-imprint lithography is regarded a one of the most competitive alternative fabrication technologies available today. It offers exceptional resolution, high throughput and simple execution at very low cost. The first section of this book, by Barbillon, provides an introduction to nano-imprinting by describing the fabrication of nano-structures for plasmonic biosensing. Soft lithographies, derived from nano-imprint technologies, operate at largely ambient environmental conditions. This makes them inherently compatible with delicate biological materials such as proteins. Section 2 describes the application of soft lithography in the context of neurobiology. The work by Kan et al. investigates techniques for directing the growth of neurons, with the intention of creating complex neural networks of specific geometry. Similarly, Takayama et al. explore techniques for controlling the differentiation of stem cells. Self-assembly techniques are often employed for their capacity to pattern large substrate areas with nanoscale resolution at a very low cost. Colloids are a well established platform in the self-assembly arena, and have been applied in areas as diverse as photonic crystals and nanoscale plasmonics. In Section 3, sub-micron colloidal particles are employed as nonplanar substrates for the controlled deposition of a second tier of self-assembled nano-structures. Nonckreman et al. pursue this objective by demonstrating the controlled deposition of nano-sized colloids on top of sub-micron colloids, while Li et al. investigate the self-assembled nano-structuring of thin films as they are deposited on top of close-packed colloids. Diffractive optical elements typically require fabrication of periodic sub-wavelength elements. For the visible spectrum, this typically translates to sub-micron and X Preface nanoscale dimensions. In Section 4, Wen et al. investigate the design and fabrication of circular Dammann diffractive gratings, while Motogaito et al. demonstrate binary diffractive lenses via electron beam lithography. Finally, Fragouli et al. bring this section to a close by demonstrating very interesting work with photochromic polymers. These are imprinted with grating structures, and then shown to be capable of reversible dimensional changes when illuminated with specific wavelengths. Their application to tuneable wetting and tuneable diffraction is also demonstrated. Section 5 concludes this book by describing some of the challenges faced by the next generation optical lithography technique. Here, shorter wavelengths, in the extreme ultraviolet regime, are harnessed to enable enhanced nanoscale fabrication. This book represents the collective efforts and creative talents of many researchers worldwide. On behalf of these authors, and the staff at InTech publishing, I hope that you find these collected works informative, and a pleasure to read. Gorgi Kostovski RMIT University Australia