Materials Science & Engineering A, Structural Materials: Properties, Microstructure and Processing 1991: Vol A139-A140 Index

13 Pages·1991·4.7 MB·English

842 Materials Science and Engineering, A140 (1991) 842-844
Author Index of Vols. 139 and 140
Alimova, .M. A., 372 Davidas, J. P., 49 Gligorijevic, R., 469
Anoun, K., 276 De Schepper, L., 554 Godard, J. L., 9
Antolotti, N., 727 Deschamps, J., 9 Grajewski, V., 339, 345
Araki, T., 461 Desport, J. A., 91 Granier, A., 103
Ariyasu, T., 20 Deutschmann, S., 775 Griem, H. R., 1
Aromaa, J., 722 Diko, P., 479 Grun, R., 435
Asano, I., 461 Dobiasova, L., 660 Grunwald, H., 356
Ayres, C.F. 71, 91 Dodd, R. A., 179 Gu, Z.-M., 687
Dotter, W., 137 Gunther, H.-J., 435
Barth, H. J., 364 Dumbacher, B., 302
Barzen, I., 137 Dworschak, W., 775, 784, 788 Hammer, K., 784
Basner, R., 41 Hammer, P., 334
Baumann, P., 302 Ebberink, J., 830 Hannula, S.-P., 722
Beckmann, R., 394 Ebner, R., 670 Harmand, M. F., 49
Behrndt, H., 58 Echigoya, J., 747 Harnack, J. T., 764
Bell, F., 364 Eguchi, N., 339 Haubold, H.-G., 795
Bell, T., 419 Ehrhardt, H., 137, 775, 784, 788 Haupt, J., 284
Belmahi, M., 29 Ehrich, H., 825 Hecq, M., 144
Benien, H., 126 Eng, L. M., 230 Helmbold, A., 334
Benndorf, C., 764, 795 Engelke, F., 775 Henke, J., 67
Bennett, M. J., 91 Ensinger, W., 625 Henrion, G., 15
Berg, S., 345 Erz, R., 137 Herr, W., 259, 593, 616, 647
Bergmeister, F. J., 159 Heuberger, M., 185
Billard, A., 802 Fabry, M., 15 Heuraux, S., 29
Boisse-Laporte, C., 494 Falk, L., 9, 132 Hilz, G., 268
Bolse, W., 159, 165 Fancey, K. S., 517, 576, 602 Hofmann, D., 290
Bougdira, J., 15 Fella, R., 676 Hohl, F., 593
Bourreau, C., 376 Ferdinandy, M., 479 Holleck, H., 268, 609, 676
Broszeit, E., 259, 593, 602, 616, Fessmann, J., 830 Holmberg, K., 602
647, 722 Fichelscher, A., 412 Hutchings, R., 171
Buck, V., 770 Fontana, R., 816
Bull, S. J., 71, 583 Frantz, C., 702, 802 Ichii, K., 442
Bur am Orde, J., 770 Freller, H., 534 Ikawa, Y., 461
Buvron, M., 454 Frenck, H. J., 394, 715 Iskanderova, Z. A., 372
Frey, H., 185 Iwai, T., 809
Castrischer, G., 302 Fritzsch, H., 780
Catherine, Y., 376 Fromn, E., 339, 345 Jacquot, P., 454, 838
Cavaleiro, A., 631 Fryda, M., 795 James, A. S.,517, 576
Celis, J. P., 554 Fuchs, H., 230 Janczak-Bienk, E., 696
Cérmak, F., 264 Fujimura, K., 442 Jehn, H.A., 185
Chalker, P. R., 71, 583 Fujiyama, H., 79, 307, 312, 563, Jensen, H., 696
Chave, C., 494 569, 682, 691 Jeziorski, L., 474
Chen, W., 294 Jung, K., 137, 775, 784, 789
Coley, K. S., 91 Gantois, M., 132 Jung, T.,528
Coll, B. F., 816 Garcia, P., 376 Jungnickel, G., 401
Colligon, J.S., 199 Garside, B. L., 207
Collins, G. A., 171 Gartner, H., 259 Kacsich, T., 159
Conrad, J. R., 179 Gates, A., 816 Kalivoda, L., 264
Coulon, J. F., 385 Gebauer, A., 61 Kampschulte, G., 830
Crabb, T. A., 284 Gehman, B. L., 359 Kashima, T., 79
Cussenot, J.R., 15 Gerber, J., 775, 788 Kassing, R., 394, 412, 715
Czerwiec, T., 276 Gerstenberg, K. W., 110 Kawasaki, H., 569,682
Gibson, P. N., 284 Keller, G., 137
Damond, E., 838 Giordano, L., 727 Kelm, G., 401
Dauchot, J. P., 144 Gissler, W., 284 Kessler, I., 302
© Elsevier Sequoia/Printed in The Netherlands
843
Kim, S. W., 345 Muhling, I., 755, 780 Schaarschmidt, G., 788
Kinghts, C. F., 91 Muller, J., 380 Scharff, W., 775, 784, 788
Klages, C.-P., 741, 795 Miller, K. G., 825 Schils, H. W., 185
Kleber, R., 775, 784, 788 Muller, W., 165 Schittny, St. U., 359
Kloos, K. H., 259, 593, 616 Munro, H. S., 356 Schmid, H., 408
Klug, W., 523 Murakawa, M., 753, 759 Schmoeckel, D., 593
Knepper, M., 45 Musil, J., 660 Schnatbaum, F., 448
Knotek, O., 655 Scholze, F., 788
Naji, A., 49
Kovarski, L. P., 372 Schonherr, M., 67
Nakashima, T., 682
Krakhmalyov, V. A., 372 Schroder, B., 319
Navinsek, B., 249
Kral, J., 479 Schroer, A., 220, 625
Nieminen, I., 602
Kretschmer, K.-H., 302 Schulz, A., 639
Nitkiewicz, Z., 474
Kruger, A., 775, 784, 788 Schulze, S., 775
Normand, F., 103
Kulisch, W., 394, 715 Schussler, H., 290
Kuwahara, K., 563, 691 Novak, R., 264 Segner, J., 733
Kuzuguchi, A., 20 Novak, S., 249 Sella;C., 49
Nurnberger, G., 593
Shibuki, K., 747
Lahres, M., 609 Shigemizu, T., 312
Oechsner, H., 214
Lau, Y. C., 352 Siegel, J., 780
Oesterschulze, E., 394
Le Chanu, A., 49 Sigailo, A. V., 539
Ohno, N., 307, 312, 569
Lecoeur, J., 49 Simon, C., 29
Ohte, T., 24
Legrand, P. B., 144 Sone, T., 486
Olbrich, W., 831
Leonhardt, A., 67 Sorensen, G., 150, 696
Oseguera, J., 132
Leprince, Ph., 103, 494 Souchard, J. P., 454
Osterschulze, E., 259
Leroy, Ch., 702 Sperling, T., 380
Leyland, A., 576, 602, 722 Pagny, J., 838 Sridharan, K., 179
Li, me. 04229 Paller, G., 647 Stals, L., 242, 554
Lieb, K. P., 165 Pamler, W., 364 van Stappen, M., 242,554
Liska, D., 479 Petat, B., 29 Steinmetz, J., 802
Liu, X.-H., 220 Peters, D., 380 Stenzel, O., 784
Loffler, F., 655 Pfender, E., 352 Stock, H.-R., 593, 639
Lohmann, R., 259 Porsch, S., 788 Straede, C. A., 150
Lorenz, G., 302 Poulek, V., 660 Suchentrunk, R., 126
Lorenz, H. P., 534 Poulsen,J . R., 150 Sugawara, M., 24
Lugscheider, E., 45 Prajzner, A., 33 Sun, Y., 419
Lund, B. M., 150 Szymanowski, H., 120
Lunk, A., 41, 58, 666 Quaeyhaegens, C., 242
Takase, T., 442
Ma, T.C., 193,225 Radjabov, T. D., 372 Takatsu, S., 747
Mahiout, A., 722 Rangelow, I. W., 412 Takeuchi, S., 759
Mainz, B., 784 Rasulov, P. M., 372 Tanaka, S., 810
Malliet, B., 554 Raub, Ch. J., 185 Taniguchi, S., 220
Marec, J., 103, 494 Remy, M., 15, 29, 276 Taschner, Ch., 67
Markowski, J., 33 Ricard, A., 9, 132 Taube, K., 795
Martin, J. C., 49 Rickerby, D. G., 284 Telle, R., 185
Masui, K., 486 Rickerby, D.S., 71, 91, 583 Tendys,J. , 171
Matl, K., 523 Rie, K.-T., 37, 61, 448 Thoma, K., 259
Matsuda, Y., 79, 563, 569, 691 Robinson, P. A., 576 Tiziani, A., 727
Matthes, B., 259, 593, 602, 616, Rohwer, K. C., 334 Tosic, M. M., 469
647, 722 Ronkainen, H., 602, 722 Tulyaganov, Kh. R., 372
Matthews, A., 517, 576, 602, 722 Roos, J. R., 554 Tumanoyv, Y. N., 539
Mausbach, M., 770, 825 Rossnagel, S. M., 510 Turban, G., 385
Maushart,J. , 126 Rost, A., 290 Tuson, A. T., 91
Mayr, P., 593, 639 Roth, S., 784 Tyczkowski, J., 120
Meissner, D., 334 Rother, B., 780
Metz, M., 775 Rudnicki, J., 505 Ubleis, A., 670
Meyer, M., 126 Uchida, H. H., 339
Michalski, J., 499, 505 Saigoh, M., 307 Ulrich, S., 137
Michel, H., 9, 29, 132, 276, 702 Saijo, K., 747 Upadhya, K., 549
Mitterer, C., 670 Saker, A., 702
Miyake, S., 294, 753 Sanders, F. H. M., 85 Valvoda, V., 660
Mohl, W., 6 Sathrum, P., 816 Vieira, M. T., 631
Muhlhoff, L., 364 Saunders, S. R. J., 91 Vizethum, F., 45
844
Waldorf, J., 214 Wohle, J., 37 Yamawaki, M., 809
Wallendorf, T., 788 Wolf, E., 67 Yang, L-Y., 687
Wang, F. J., 225 Wolf, F., 788
Wang, L., 687 Wolf, G. K., 220, 625 Zalar, A., 249
Wang, Y., 239 Worzala, F. J., 179 Zambon, A., 727
Wang, Y. K., 225 Zdanowski, J., 33
Watanabe, S., 753 Zdunek, K., 709
Xiang, L., 193
Weber, Th., 45 Zhang, N., 239
Xie, L., 179
Weigert, M., 359 Zhou, J.-K., 220
Westphal, A., 528 Zhu, H., 352
Wierzchon, T., 499, 505 Yagi, M., 747 Zhu, Y. C., 193
Wilhelm, T., 356 Yamaguchi, K., 809 Zoller, A., 523
Witt, M., 715 Yamauchi, T., 20 Zou, S.-C., 220
Materials Science and Engineering, A141 (1991) 845-853
Subject Index of Vols. 139 and 140
Acoustic emission analysis Argon
study of Al,O, and NiAI-AlI,O, coatings with acoustic averaging effect of radical particle profile by the scanning
emission analysis, 264 plasma method in SiH,-Ar plasmas, 569
Activated reactive evaporation nitrogen atoms in Ar-N, flowing microwave discharges
the parameters of a discharge in an AT-1 biased activated for steel surface nitriding, 9
reactive evaporation system for TiN deposition, 33 spectroscopic investigation of N,-H,-Ar-TiCl,-assisted
Adhesion chemical vapour deposition discharge for plasma of
effect of contamination on mechanical properties and TiN, 37
adhesion of magnetron-sputtered TiN coatings on high Argon irradiation
speed steel substrates, 345 xenon and argon irradiation of TiN films on Al-3wt.%Mg,
influence of deposition conditions on the adhesion of sput- 165
ter-deposited W-C-(Co) films, 631 Atmospheric plasma spraying
manufacture of c-BN films with improved adhesion, 753 production of biocompatible coatings by atmospheric
on the adhesion of plasma-deposited TiN on M2 steel, 85 plasma spraying, 45
the influence of titanium interlayers on the adhesion of Auger electron spectroscopy
titanium nitride coatings obtained by plasma-assisted analysis of r.f.-sputtered TiB, hard coatings by means of X-
chemical vapour deposition, 7 1 ray diffractometry and Auger electron spectroscopy, 259
Adsorbate-covered surfaces sputter cleaning of iron substrates and contamination of
investigation and modification of free and adsorbate- TiN coatings studied by in situ Auger electron spectros-
covered surfaces by scanning tunnelling microscopy, copy measurements in an ultrahigh vacuum physical
230 vapour deposition apparatus, 339
Alumina powders Austenitic steels
modification of alumina powders by nickel and platinum properties of sputtered stainless steel—-nitrogen coatings
coating, 185 and structural analogy with low temperature plasma
Aluminium nitrided layers of austenitic steels, 702
a comparative study of the corrosion performance of TiN, sputtering, deposition, and diffusion in ion-nitriding of an
Ti(B,N) and (Ti,AIl)N coatings produced by physical austenitic stainless steel, 442
vapour deposition methods, 722
formation of TiAl, layer on titanium alloys, 479 Bias voltages
modification of Cr,N coatings on Al-3wt.%Mg substrates cathodic arc deposition of diamond-like carbon: effect of
by xenon irradiation, 159 bias voltage and deposition angle, 780
structure and properties of ion-plated aluminium bronze Biocompatibility
films, 687 biocompatibility and corrosion resistance in biological
study of Al,O, and NiAI-Al,O, coatings wit!: acoustic media of hard ceramic coatings sputter deposited on
emission analysis, 264 metal implants, 49
the influence of the reactive gas flow on the properties of biocompatibility of TiN preclinical and clinical investiga-
AIN sputter-deposited films, 696 tions, 58
(Ti-Al)N advanced films prepared by arc process, 816 Biocompatible coatings
X-ray studies of Al/Al,O, multilayered films, 239 production of biocompatible coatings by atmospheric
xenon and argon irradiation of TiN films on Al-3wt.%Mg, plasma spraying, 45
165 Boron - 2
Amorphous phases a comparative study of the corrosion performance of TiN,
amorphous and crystalline phases in PVD coatings after Ti(B,N) and (Ti,AI)N coatings produced by physical
laser treatment, 655 vapour deposition methods, 722
Anodic arc technique analysis of r.f.-sputtered TiB, hard coatings by means of
deposition of diamond-like carbon films by the anodic arc X-ray diffractometry and Auger electron spectroscopy,
technique, 770 259
Anodic vacuum arcs characterization of microstructure and interfaces in
relations between plasma properties and properties of thin TiC-TiB, coatings, 268
copper films produced by an anodic vacuum arc, 825 fundamental properties and wear resistance of r.f.-sput-
Arc evaporation techniques tered TiB, and Ti(B,N) coatings, 616
TiC,N,_ , coatings by using the arc evaporation technique, manufacture of c-BN films with improved adhesion, 753
838 sputter deposition of wear-resistant coatings within the
Arc process system Zr-B-N, 670
(Ti-Al)N advanced films prepared by arc process, 816 two-phase TiC/TiB, hard coatings, 609
© Elsevier Sequoia/Printed in The Netherlands
846
Boron nitride films insulation and passivation of three-dimensional substrates
evidence for mixed-phase nanocrystalline boron nitride by plasma-CVD thin films using silicon-organic com-
films, 284 pounds, 380
Bronze microstructure of diamond films near the interface with
structure and properties of ion-plated aluminium bronze WC substrate, 816
films, 687 plasma impulse chemical vapour deposition—a novel
technique for the production of high power laser
mirrors, 733
Carbide-forming metals plasma-assisted chemical vapour deposition of hard coat-
the deposition of Ag—C:H films: a tool to understand the ings with metallo-organic compounds, 61
role of carbide-forming metals in the Me-C:H deposi- spectroscopic investigation of N,—-H,-Ar-TiCl,-assisted
tion process, 764 chemical vapour deposition discharge for plasma of
Carbon TiN, 37
cathodic arc deposition of TiN and Zr(C,N) at low sub- structure and properties of TiC, layers prepared by
strate temperatures using a pulsed bias voltage, 830 plasma-assisted chemical vapour deposition methods,
characterization of microstructure and interfaces in 67
TiC-TiB, coatings, 268 the influence of titanium interlayers on the adhesion of
electrical characterization of plasma-deposited hydro- titanium nitride coatings obtained by plasma-assisted
genated amorphous carbon films, 334 chemical vapour deposition, 71
influence of deposition conditions on the adhesion of sput- tin plasma CVD coatings deposited by different excitation
ter-deposited W-C-(Co) films, 631 methods for the gas discharge, 534
microstructure of diamond films near the interface with Chemiluminescence
WC substrate, 747 effect of process parameters on the atomic nitrogen con-
preparation and properties of metastable TiC/SiC PVD centration as measured by chemiluminescence in a post-
coatings for wear protection, 676 discharge nitriding reactor, 132
properties and performance of plasma-assisted physically Chlorine
vapor-deposited TiC coatings, 549 spectroscopic investigation of N,-H,-Ar-TiCl,-assisted
structure and properties of TiC, layers prepared by chemical vapour deposition discharge for plasma of
plasma-assisted chemical vapour deposition methods, TiN, 37
67 Chromium
the deposition of Ag-C:H films: a tool to understand the a comparison of the corrosion behaviour and hardness of
role of carbide-forming metals in the Me-C:H deposi- steel samples (100Cr6) coated with titanium nitride and
tion process, 764 chromium nitride by different institutions using differ-
TiC,N, _ , coatings by using the arc evaporation technique, ent deposition techniques, 625
838 characterization of surface chromium and molybdenum
two-phase TiC/TiB, hard coatings, 609 alloying on gray cast iron obtained by the plasma-trans-
wear-resistant steel surfaces obtained by high dose implan- ferred arc technique, 727
tation of carbon, 150 d.c. magnetron sputtering of oxidation-resistant chromium
Carbon coatings and CrN films monitored by optical emission spec-
sputtered stainless steel-carbon coatings as a substitute for trometry, 126
hard electrolytic chromium for potential applications in modification of Cr,N coatings on Al-3wt.%Mg substrates
mechanics, 802 by xenon irradiation, 159
Carbon layers plasma carburization of wear-resistant high chromium
microwave plasma apparatus for deposition of hydro- iron, 461
genated amorphous carbon layers, 784 plasma overcarburizing of chromium steels for hot work-
Cathodic arc deposition ing and wear applications, 454
cathodic arc deposition of TiN and Zr(C,N) at low sub- sputtered stainless steel-carbon coatings as a substitute for
strate temperatures using a pulsed bias voltage, 830 hard electrolytic chromium for potential applications in
cathodic arc deposition of diamond-like carbon: effect of mechanics, 802
bias voltage and deposition angle, 780 Clinical investigations
Chemical vapour deposition biocompatibility of TiN preclinical and clinical investiga-
characterization of remote plasma-enhanced chemical tions, 58
vapour deposition processes, 715 Coating-substrate adhesion
corrosion-resistant silica coatings obtained by plasma- a review of the methods for the evaluation of coating-sub-
assisted chemical vapour deposition, 91 strate adhesion, 583
development of the quadrupole plasma chemical vapour Coatings
deposition method for low temperature, high speed amorphous and crystalline phases in PVD coatings after
coating on an optical fibre, 79 laser treatment, 655
formation of TiN layers by plasma-assisted chemical Cobalt
vapour deposition at temperatures greater than 823 K, improved magnetic behaviour of cobalt-based-alloy sput-
499 ter-target material, 359
hydrogen in plasma-enhanced chemical vapour deposition influence of deposition conditions on the adhesion of sput-
insulating films, 401 ter-deposited W-C-(Co) films, 631
847
Composite layers Diagnostics
properties of composite layers produced on stainless steel in-situ diagnostics/spectroscopy, |
under glow discharge conditions, 505 Diamond films
Contamination deposition and properties of diamond thin films, 741
effect of contamination on mechanical properties and forming of a grinding wheel using a dresser with brazed
adhesion of magnetron-sputtered TiN coatings on high diamond form, 759
speed steel substrates, 345 microstructure of diamond films near the interface with
Control WC substrate, 747
mechanism of controlling the self-bias voltage in a flat-bed Diamond-like carbon
reactor, 24 cathodic arc deposition of diamond-like carbon: effect of
Cooling speeds bias voltage and deposition angle, 780
measurement of temperature distribution and cooling deposition of diamond-like carbon films by the anodic arc
speed in metal on IR radiation, 20 technique, 770
Corrosion investigations of the structure of a-C:H films, 775
a comparative study of the corrosion performance of TiN, plasma and particle flux characterization of the a-C:H
Ti(B,N) and (Ti,AI)N coatings produced by physical deposition process by ion-assisted methods, 788
vapour deposition methods, 722 structural and mechanical properties of niobium-contain-
a comparison of the corrosion behaviour and hardness of ing amorphous hydrogenated carbon films (Nb-C:H),
steel samples (100Cr6) coated with titanium nitride and 795
chromium nitride by different institutions using differ- Dielectric coatings
ent deposition techniques, 625 production of thin metallic and dielectric coatings by a
Corrosion resistance plasma technique and their investigation, 372
biocompatibility and corrosion resistance in biological Diffusion
media of hard ceramic coatings sputter deposited on sputtering, deposition, and diffusion in ion-nitriding of an
metal implants, 49 austenitic stainless steel, 442
Corrosion-resistant silicon coatings Discharge
corrosion-resistant silica coatings obtained by plasma- the parameters of a discharge in an AT-1 biased activated
assisted chemical vapour deposition, 91 reactive evaporation system for TiN deposition, 33
Crystalline phases Disintegrated solutions
amorphous and crystalline phases in PVD coatings after plasma synthesis of disperse oxide materials from disinte-
laser treatment, 655 grated solutions, 539
D.c. magnetron sputtering Electron beam heat treatment
d.c. magnetron sputtering of oxidation-resistant chromium physical vapour deposition of TiN hard coatings with
and CrN films monitored by optical emission spec- additional electron beam heat treatment, 639
trometry, 126 Electron cyclotron resonance
D.c. pulsed plasma an electron cyclotron resonance plasma source, 302
low frequency d.c. pulsed plasma for iron nitriding, 15 characteristics of ECR plasmas for weakly resonant condi-
Deposition tions, 307
a comparison of the corrosion behaviour and hardness of characterization of electron cyclotron process plasma and
steel samples (100Cr6) coated with titanium nitride and film deposition, 294
chromium nitride by different institutions using differ- development of coaxial ECR plasma source for tube inner
ent deposition techniques, 625 coating, 312
cathodic arc deposition of diamond-like carbon: effect of microwave plasma apparatus for deposition of hydro-
bias voltage and deposition angle, 780 genated amorphous carbon layers, 784
deposition and properties of diamond thin films, 741 Energetic hydrogen isotope beams
deposition of diamond-like carbon films by the anodic arc interaction of graphite with an energetic hydrogen isotope
technique, 770 beam, 809
influence of deposition conditions on the adhesion of sput- Etching devices
ter-deposited W-C-(Co) films, 631 microwave etching device for reactive ion etching, 408
Langmuir probe plasma diagnostics during TiN, deposi-
tion, 41 Fatigue properties
microwave plasma apparatus for deposition of hydrog- plasma nitriding improvements of fatigue properties of
enated amorphous carbon layers, 784 nodular cast iron crankshafts, 469
plasma and particle flux characterization of the a-C:H Film deposition
deposition process by ion-assisted methods, 788 characterization of electron, cyclotron resonance process
sputtering, deposition, and diffusion in ion-nitriding of an plasma and film deposition, 294
austenitic stainless steel, 442 Flat-bed reactors
the deposition of Ag-C:H films: a tool to understand the mechanism of controlling the self-bias voltage in a flat-bed
role of carbide-forming metals in the Me-C:H deposi- reactor, 24
tion process, 764 Fluorine
the parameters of a discharge in an AT-1 biased activated an XPS study of photoresist surfaces in SF,-O, rf.
reactive evaporation system for TiN deposition, 33 plasmas, 385
848
Free surfaces influence of the phase transformation of a metal on hollow
investigation and modification of free and adsorbate- cathode discharge characteristics, 29
covered surfaces by scanning tunnelling microscopy, Hydrogen
230 averaging effect of radical particle profile by the scanning
plasma method in SiH,-Ar plasmas, 569
Gas discharge hydrogen in plasma-enhanced chemical vapour deposition
tin plasma CVD coatings deposited by different excitation insulating films, 401
methods for the gas discharge, 534 spectroscopic investigation of N,-H,-Ar-TiCl,-assisted
Glow discharge chemical vapour deposition discharge for plasma of
experimental study of a glow discharge electron source for TiN, 37
soft X-ray spectroscopy, 144 the deposition of Ag-C:H films: a tool to understand the
properties of composite layers produced on stainless steel role of carbide-forming metals in the Me-C:H deposi-
under glow discharge conditions, 505 tion process, 764
Gradient thin films Hydrogenated amorphous carbon films
synthesis of gradient thin films by ion beam enhanced de- electrical characterization of plasma-deposited hydro-
position, 220 genated amorphous carbon films, 334
Graphite Hydrogenated amorphous silicon
interaction of graphite with an energetic hydrogen isotope thin film technology based on hydrogenated amorphous
beam, 809 silicon, 319
Growth kinetics
growth kinetics and step coverage in plasma deposition of Inclined electrodes
silicon dioxide from organosilicon compounds, 376 development of large area sputter-coating method using
magnetized a.c. plasmas with inclined electrodes, 563
Hard coatings Insulation
analysis of r.f.-sputtered TiB, hard coatings by means of hydrogen in plasma-enhanced chemical vapour deposition
X-ray diffractometry and Auger electron spectroscopy, insulating films, 401
259 insulation and passivation of three-dimensional substrates
biocompatibility and corrosion resistance in biological by plasma-CVD thin films using silicon-organic com-
media of hard ceramic coatings sputter deposited on pounds, 380
metal implants, 49 Interface problems
deposition of hard coatings by a hollow-cathode arc interface problems in metallurgical coatings, 249
evaporation device, 666 Intrinsic oxide layers
physical vapour deposition of TiN hard coatings with formation of intrinsic oxide layers by ion implantation of
additional electron beam heat treatment, 639 silicon and titanium in the low kiloelectronvolt regime,
plasma-assisted chemical vapour deposition of hard coat- 214
ings with metallo-organic compounds, 61 Iodine
tribological properties of r.f.-sputtered titanium-based thin conductive films made by plasma polymerization of
hard coatings and their behaviour under plastics-pro- 2-chloroacrylonitrile in the presence of iodine, 356
cessing conditions, 647 Ion beams
two-phase TiC/TiB, hard coatings, 609 plasma diagnostics of an ECR ion beam system, 6
High dose implantation stitching TiN films on high speed steel substrates by ion
wear-resistant steel surfaces obtained by high dose beams, 193
implantation of carbon, 150 synthesis of gradient thin films by ion beam enhanced
High power laser mirrors deposition, 220
plasma impulse chemical vapour deposition—a_ novel Ion implantation
technique for the production of high power laser formation of intrinsic oxide layers by ion implantation of
mirrors, 733 silicon and titanium in the low kiloelectronvolt regime,
High speed coatings 214
high speed pipe inner coating using magnetron hollow- influence of temperature on nitrogen ion implantation of
cathode discharge in a magnetic field, 682 Incoloy alloys 908 and 909, 179
High speed steel plasma immersion ion implantation of steels, 171
effect of contamination on mechanical properties and the economics of ion implantation, 207
adhesion of magnetron-sputtered TiN coatings on high Ion nitriding
speed steel substrates, 345 application of ion nitriding to wire-electrical-discharge-
stitching TiN films on high speed steel substrates by ion machined blanking dies, 486
beams, 193 Ion-beam-assisted deposition
High-thermal-resistant dielectric coatings applications of ion-beam-assisted deposition, 199
high-thermal-resistant dielectric coating deposited by ion-assisted deposition with a new plasma source, 523
plasma polymerization, 120 Ion-beam-enhanced deposition
Hollow cathodes characterization of TiN coatings prepared by ion-beam-
deposition of hard coatings by a hollow-cathode arc enhanced deposition, 225
evaporation device, 666 Ion-plated films
high speed pipe inner coating using magnetron hollow- structure and properties of ion-plated aluminium bronze
cathode discharge in a magnetic field, 682 films, 687
849
IR radiation Metallic coatings
measurement of temperature distribution and cooling formation of metallic coatings on non-heated substrates by
speed in metal on IR radiation, 20 the impulse plasma method, 709
Iron Metallo-organic compounds
characterization of surface chromium and molybdenum plasma-assisted chemical vapour deposition of hard coat-
alloying on gray cast iron obtained by the plasma-trans- ings with metallo-organic compounds, 61
ferred arc technique, 727 Metallurgical coatings
low frequency d.c. pulsed plasma for iron nitriding, 15 interface problems in metallurgical coatings, 249
plasma carburization of wear-resistant high chromium Microstructure
iron, 461 characterization of microstructure and interfaces in
sputter cleaning of iron substrates and contamination of TiC-TiB, coatings, 268
TiN coatings studied by in situ Auger electron spectros- microstructure of diamond films near the interface with
copy measurements in an ultrahigh vacuum physical WC substrate, 747
vapour deposition apparatus, 339 plasma heat treatment of steel: microstructure, properties
and applications, 474
Langmuir probes Microwave discharges
Langmuir probe plasma diagnostics during TiN, deposi- nitrogen atoms in Ar-N, flowing microwave discharges
tion, 41 for steel surface nitriding, 9
Large area sputter-coatings nitrogen microwave discharge as a source of excited
development of a large area sputter-coating method using neutral species for possible surface treatment, 494
a new magnetron discharge, 691 Microwave plasma
Laser treatment microwave plasma apparatus for deposition of hydro-
amorphous and crystalline phases in PVD coatings after genated amorphous carbon layers, 809
laser treatment, 655 Molybdenum
Low energy particle bombardment characterization of surface chromium and molybdenum
zirconia thin film deposition on silicon by reactive gas flow alloying on gray cast iron obtained by the plasma-trans-
sputtering: the influence of low energy particle bom- ferred arc technique, 727
bardment, 528 Multilayered films
Low frequency r.f. glow discharges X-ray studies of Al/Al,O, multilayered films, 239
an investigation into the effects of plasma bombardment Multiphase films
anisotropy in low frequency r.f. glow discharges, 517 Ti-N films created in close vicinity of transition from a-
Ti(N) to 6-TiN, phase, 660
Magnesium
modification of Cr,N coatings on Al-3wt.%Mg substrates Nickel
by xenon irradiation, 159 modification of alumina powders by nickel and platinum
xenon and argon irradiation of TiN films on Al-3wt.%Mg, coating, 185
165 study of Al,O, and NiAI-Al,O, coatings with acoustic
Magnetic fields emission analysis, 264
high speed pipe inner coating using magnetron hollow- Niobium
cathode discharge in a magnetic field, 682 structural and mechanical properties of niobium-contain-
Magnetism ing amorphous hydrogenated carbon films (Nb-C:H),
improved magnetic behaviour of cobalt-based-alloy sput- 795
ter-target material, 359 Nitride layers
Magnetized a.c. plasmas influence of pulsed d.c.-glow-discharge on the phase con-
development of large area sputter-coating method using stitution of nitride layers during plasma nitrocarburizing
magnetized a.c. plasmas with inclined electrodes, 563 of sintered materials, 448
Magnetron deposition systems Nitrogen
dynamic interactions in the physical properties of magne- a comparative study of the corrosion performance of TiN,
tron deposition systems, 510 Ti(B,N) and (Ti,Al)N coatings produced by physical
Magnetron discharges vapour deposition methods, 722
development of a large area sputter-coating method using a comparison of the corrosion behaviour and hardness of
a new magnetron discharge, 691 steel samples (100Cr6) coated with titanium nitride and
Martensitic hot-worked tool steel chromium nitride by different institutions using differ-
texture analysis of martensitic hot-worked tool steel H13 ent deposition techniques, 625
coated with TiN by physical vapour deposition, 242 biocompatibility of TiN preclinical and clinical investiga-
Metal alkoxides tions, 58
low temperature remote plasma-enhanced deposition of cathodic arc deposition of TiN and Zr(C,N) at low sub-
thin metal oxide films by decomposition of metal strate temperatures using a pulsed bias voltage, 831
alkoxides, 394 characterization of TiN coatings prepared by ion-beam-
Metal implants enhanced deposition, 225
biocompatibility and corrosion resistance in biological characterization of TiN coatings deposited on plasma
media of hard ceramic coatings sputter deposited on nitrided tool steel surfaces, 554
metal implants, 49 d.c. magnetron sputtering of oxidation-resistant chromium
850
and CrN films monitored by optical emission spec- Optical fibres
trometry, 126 development of the quadrupole plasma chemical vapour
effect of contamination on mechanical properties and deposition method for low temperature, high speed
adhesion of magnetron-sputtered TiN coatings on high coating on an optical fibre, 79
speed steel substrates, 345 Organosilicon compounds
effect of process parameters on the atomic nitrogen con- growth kinetics and step coverage in plasma deposition of
centration as measured by chemiluminescence in a post- silicon dioxide from organosilicon compounds, 376
discharge nitriding reactor, 132 insulation and passivation of three-dimensional substrates
formation of TiN layers by plasma-assisted chemical by plasma-CVD thin films using silicon-organic com-
vapour deposition at temperatures greater than 823 K, pounds, 380
499 Oxide materials
fundamental properties and wear resistance of r.f.-sput- plasma synthesis of disperse oxide materials from disinte-
tered TiB, and Ti(B,N) coatings, 616 grated solutions, 539
influence of temperature on nitrogen ion implantation of Oxygen
incoloy alloys 908 and 909, 179 an XPS study of photoresist surfaces in SF,-O, rf. plas-
Langmuir probe plasma diagnostics during TiN, deposi- mas, 385
tion, 41 study of Al,O, and NiAI-Al,O, coatings with acoustic
manufacture of c-BN films with improved adhesion, 753 emission analysis, 264
modification of Cr, coatings on Al-3wt.%Mg substrates X-ray studies of Al/Al,O, multilayered films, 239
by xenon irradiation, 159 XPS investigation of polymer residues in reactive ion etch-
nitrogen atoms in Ar-N, flowing microwave discharges ing of SiO, over poly-silicon, 364
for steel surface nitriding, 9 Oxygen microwave discharge
nitrogen microwave discharge as a source of excited surface treatment of polypropylene by oxygen microwave
neutral species for possible surface treatment, 494 discharge, 103
on the adhesion of plasma-deposited TiN on M2 steel, 85
physical vapour deposition of TiN hard coatings with Particle flux characterization
additional electron beam heat treatment, 639 plasma and particle flux characterization of the a-C:H
plasma surface engineering of low alloy steel, 419 deposition process by ion-assisted methods, 788
properties of sputtered stainless steel—-nitrogen coatings Particle flux parameters
and structural analogy with low temperature plasma correlation of particle flux parameters with the properties
nitrided layers of austenitic steels, 702 of thin tungsten carbide films, 137
spectroscopic investigation of N,-H,-Ar-TiCl,-assisted Passivation
chemical vapour deposition discharge for plasma of insulation and passivation of three-dimensional substrates
TiN, 37 by plasma-CVD thin films using silicon-organic com-
sputter cleaning of iron substrates and contamination of pounds, 380
TiN coatings studied by in situ Auger electron spectros- Phase constitutions
copy measurements in an ultrahigh vacuum physical influence of pulsed d.c.-glow-discharge on the phase con-
vapour deposition apparatus, 339 stitution of nitride layers during plasma nitrocarburizing
sputter deposition of wear-resistant coatings within the of sintered materials, 448
system Zr-B-N, 670 Phase transformation
stitching TiN films on high speed steel substrates by ion influence of the phase transformation of a metal on hollow
beams, 193 cathode discharge characteristics, 29
texture analysis of martensitic hot-worked tool steel H13 Physical vapour deposition
coated with TiN by physical vapour deposition, 242 a coating thickness uniformity model for physical vapour
the influence of the reactive gas flow on the properties of deposition systems —further validity tests, 576
AIN sputter-deposited films, 696 a comparative study of the corrosion performance of TiN,
the parameters of a discharge in an AT-1 biased activated Ti(B,N) and (Ti,Al)N coatings produced by physical
reactive evaporation system for TiN deposition, 33 vapour deposition methods, 722
(Ti-Al)N advanced films prepared by arc process, 816 amorphous and crystalline phases in PVD coatings after
Ti-N films created in close vicinity of transition from a- laser treatment, 655
Ti(N) to 6-TiN, phase, 660 interface problems in metallurgical coatings, 249
TiC,N, _, coatings by using the arc evaporation technique, physical vapour deposition of TiN hard coatings with
755 additional electron beam heat treatment, 639
xenon and argon irradiation of TiN films on Al-3wt.%Mg, preparation and properties of metastable TiC/SiC PVD
165 coatings for wear protection, 676
Non-heated substrates properties and performance of plasma-assisted physically
formation of metallic coatings on non-heated substrates by vapor-deposited TiC coatings, 549
the impulse plasma method, 709 sputter cleaning of iron substrates and contamination of
TiN coatings studied by in situ Auger electron spectros-
Optical emission spectrometry copy measurements in an ultrahigh vacuum physical
d.c. magnetron sputtering of oxidation-resistant chromium vapour deposition apparatus, 339
and CrN films monitored by optical emission spec- texture analysis of martensitic hot-worked tool steel H13
trometry, 126 coated with TiN by physical vapour deposition, 242
851
Plasma bombardment anisotropy ferred arc technique, 727
an investigation into the effects of plasma bombardment Plastics-processing equipment
anisotropy in low frequency r.f. glow discharges, 517 tribological properties of r.f.-sputtered titanium-based
Plasma carburization hard coatings and their behaviour under plastics-pro-
influence of pulsed d.c.-glow-discharge on the phase con- cessing conditions, 647
stitution of nitride layers during plasma nitrocarburizing Platinum coatings
of sintered materials, 448 modification of alumina powders by nickel and platinum
plasma carburization of wear-resistant high chromium coating, 185
iron, 461 Polymers
plasma overcarburizing of chromium steels for hot work- a reactor for plasma polymerization on polymer films, 110
ing and wear applications, 454 XPS investigation of polymer residues in reactive ion etch-
Plasma characterization ing of SiO, over poly-silicon, 364
plasma and particle flux characterization of the a-C:H Polypropylene
deposition process by ion-assisted methods, 788 surface treatment of polypropylene by oxygen microwave
Plasma deposition discharge, 103
electrical characterization of plasma-deposited hydro- Post-discharge nitriding reactor
genated amorphous carbon films, 334 effect of process parameters on the atomic nitrogen con-
growth kinetics and step coverage in plasma deposition of centration as measured by chemiluminescence in a post-
silicon dioxide from organosilicon compounds, 376 discharge nitriding reactor, 132
on the adhesion of plasma-deposited TiN on M2 steel, 85 Preclinical investigations
plasma deposition of superconducting films, 352 biocompatibility of TiN preclinical and clinical investiga-
production of thin metallic and dielectric coatings by a tions, 58
plasma technique and their investigation, 372 Pulsed bias voltages
Plasma diagnostics cathodic arc deposition of TiN and Zr(C,N) at low sub-
Langmuir probe plasma diagnostics during TiN, deposi- strate temperatures using a pulsed bias voltage, 830
tion, 41 Pulsed d.c.-glow-discharge
plasma diagnostics of an ECR ion beam system, 6 influence of pulsed d.c.-glow-discharge on the phase con-
structural study of titanium nitride coating interfaces stitution of nitride layers during plasma nitrocarburizing
related to plasma diagnostics, 276 of sintered materials, 448
Plasma heat treatment
plasma heat treatment of steel: microstructure, properties R.f.-sputtering
and applications, 474 fundamental properties and wear resistance of r.f.-
Plasma immersion ion implantation sputtered TiB, and Ti(B,N) coatings, 616
plasma immersion ion implantation of steels, 171 tribological properties of r.f.-sputtered titanium-based
Plasma nitriding hard coatings and their behaviour under plastics-
characterization of TiN coatings deposited on plasma processing conditions, 647
nitrided tool steel surfaces, 554 Radical particles
plasma nitriding improvements of fatigue properties of averaging effect of radical particle profile by the scanning
nodular cast iron crankshafts, 469 plasma method in SiH,-Ar plasmas, 569
plasma nitriding in indu—s ptrobrleyms , new solutions and Reactive gas flow
limits, 435 the influence of the reactive gas flow on the properties of
plasma surface engineering of low alloy steel, 419 AIN sputter-deposited films, 696
properties of sputtered stainless steel—nitrogen coatings zirconia thin film deposition on silicon by reactive gas flow
and structural analogy with low temperature plasma sputtering: the influence of low energy particle bom-
nitrided layers of austenitic steels, 702 bardment, 528
Plasma polymerization Reactive ion etching
a reactor for plasma polymerization on polymer films, 110 microwave etching device for reactive ion etching, 408
high-thermal-resistant dielectric coating deposited by simulation of reactive ion-etching processes considering
plasma polymerization, 120 sheath dynamics, 412
thin conductive films made by plasma polymerization of XPS investigation of polymer residues in reactive ion etch-
2-chloroacrylonitrile in the presence of iodine, 356 ing of SiO, over poly-silicon, 364
Plasma properties
relations between plasma properties and properties of thin Scanning tunnelling microscopy
copper films produced by an anodic vacuum arc, 742 investigation and modification of free and adsorbate-
Plasma synthesis covered surfaces by scanning tunnelling microscopy,
plasma synthesis of disperse oxide materials from disinte- 230
grated solutions, 539 Self-bias voltages
Plasma-enhanced deposition mechanism of controlling the self-bias voltage in a flat-bed
low temperature remote plasma-enhanced deposition of reactor, 24
thin metal oxide films by decomposition of metal alk- Sheath dynamics
oxides, 394 simulation of reactive ion-etching processes considering
Plasma-transferred arc technique sheath dynamics, 412
characterization of surface chromium and molybdenum Sheet-metal-forming conditions
alloying on gray cast iron obtained by the plasma-trans- tribological properties and wear behaviour of sputtered